Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23C - Coating metallic material; Coating material with metallic material; Surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general › C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes
Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
10/2008
10/15/2008CN101285179A Method for monitoring cleanliness and washing process of chemical vapour deposition reaction chamber
10/15/2008CN101285178A Vaporizer and semiconductor processing system
10/15/2008CN101285177A Chemical vapor deposition apparatus for planer display
10/15/2008CN101285176A Method and device for realizing matrix temperature equalization in preparation process of diamond film spherical cap
10/15/2008CN101285175A Process for preparing graphenes by chemical vapour deposition method
10/15/2008CN101285174A Plasma-induced charge damage control for plasma enhanced chemical vapor deposition processes
10/15/2008CN100426475C Method and apparatus for forming silicon oxide film
10/15/2008CN100426474C Film formation method and apparatus for semiconductor process
10/15/2008CN100426463C Film forming apparatus
10/15/2008CN100426454C Load fixing device, processing system and method
10/15/2008CN100425833C Swash plate compressor
10/15/2008CN100425391C Tools coated with cemented carbides
10/14/2008US7437060 Delivery systems for efficient vaporization of precursor source material
10/14/2008US7436526 Real-time system for monitoring and controlling film uniformity and method of applying the same
10/14/2008US7436068 Components for film forming device
10/14/2008US7435983 Device for injecting electromagnetic radiation into a reactor
10/14/2008US7435973 Material processing system and method
10/14/2008US7435486 Insert for metal cutting
10/14/2008US7435445 Method for manufacturing semiconductor device
10/14/2008US7435377 Weldable ultrahard materials and associated methods of manufacture
10/14/2008US7435363 Method for manufacturing diamond film
10/14/2008US7435300 Dynamic film thickness control system/method and its utilization
10/14/2008US7434537 Device for the coating of objects
10/14/2008CA2327855C Method of making spinner discs for rotary fiberization processes
10/13/2008CA2629117A1 Process for applying a multilayered coating to workpieces and/or materials
10/09/2008WO2008121655A1 Method and apparatus for dc voltage control on rf-powered electrode
10/09/2008WO2008121601A1 Vapor deposition system and method of operating
10/09/2008WO2008121478A2 Roll-to-roll plasma enhanced chemical vapor deposition method of barrier layers comprising silicon and carbon
10/09/2008WO2008121288A1 Showerhead electrodes and showerhead electrode assemblies having low-particle performance for semiconductor material processing apparatuses
10/09/2008WO2008121173A2 Microwave plasma apparatus and method for materials processing
10/09/2008WO2008120794A1 Method of cleaning powdery source supply system, storage medium, substrate treating system and method of substrate treatment
10/09/2008WO2008120610A1 Deposition source unit, deposition apparatus and temperature control apparatus for deposition source unit
10/09/2008WO2008120531A1 Vaporizer, vaporization module, and film forming device
10/09/2008WO2008120505A1 Water repellent article, window glass for construction and window glass for vehicle
10/09/2008WO2008120185A1 Cutting insert having ceramic coating
10/09/2008WO2008119514A1 Method and device for coating particularly rounded objects by means of a pvd and/or cvd or pacvd method in a vacuum system
10/09/2008WO2008119095A1 Multilayer cvd coating
10/09/2008WO2008048862A3 Formation of high quality dielectric films of silicon dioxide for sti: usage of different siloxane-based precursors for harp ii - remote plasma enhanced deposition processes
10/09/2008WO2007146537A3 Method of forming a layer of material using an atomic layer deposition process
10/09/2008WO2007116176A3 Composite material component with silicon-containing ceramic matrix, protected against corrosion
10/09/2008US20080248603 Nitride-based semiconductor element and method of preparing nitride-based semiconductor
10/09/2008US20080248595 Method for Manufacturing Semiconductor Device and Computer Storage Medium
10/09/2008US20080248301 Semi-continuous vapor grown carbon fiber, method for fabricating the same and applications thereof
10/09/2008US20080248291 Methods of obtaining photoactive coatings and/or anatase crystalline phase of titanium oxides and articles made thereby
10/09/2008US20080248263 Method of creating super-hydrophobic and-or super-hydrophilic surfaces on substrates, and articles created thereby
10/09/2008US20080248218 forming a catalytic metal layer on a substrate;forming an insulation layer on the catalytic metal layer; andforming carbon nanotubes on the insulation layer
10/09/2008US20080248217 rod-like core member is disposed through center of hollow interior of connecting portion of hose body so as to occupy center; plasma gas is fed to interior of innermost layer of connecting portion to modify inner surface; coating an elastic material for sealing layer on inner surface
10/09/2008US20080248200 apparatus and method for growing films on substrates; improving deposition thickness uniformity and quality
10/09/2008US20080247687 Object Comprising a Friction-reducing Coating, and Method for the Production of a Coating
10/09/2008US20080246493 Semiconductor Processing System With Integrated Showerhead Distance Measuring Device
10/09/2008US20080246053 P-Type Group III Nitride Semiconductor and Production Method Thereof
10/09/2008US20080245770 Positive Displacement Pumping Chamber
10/09/2008US20080245478 Surface treatment apparatus
10/09/2008US20080245306 Vaporizer and semiconductor processing system
10/09/2008US20080245305 Metal Evaporation Heating Element and Method for Evaporating Metal
10/09/2008US20080245304 System for selective depositions of materials to surfaces and substrates
10/09/2008US20080245303 Manufacturing method of semiconductor apparatus
10/09/2008US20080245302 Simple chemical vapor deposition systems for depositing multiple-metal aluminide coatings
10/09/2008US20080245301 Deposition Apparatuses
10/09/2008US20080245300 Apparatus and method for continuously coating strip substrates
10/09/2008DE102007016360A1 Production of scratch-resistant coatings on substrates comprises applying alternating layers of silica and metal oxide using plasma-enhanced chemical vapor deposition
10/09/2008DE10032213B4 Verfahren zur Herstellung eines Kondensators für ein Halbleiterspeicherbauelement A method of manufacturing a capacitor for a semiconductor memory device
10/08/2008EP1978548A1 Process for producing siliceous film and substrate with siliceous film produced thereby
10/08/2008EP1977454A1 Process for producing a silicon film on a substrate surface by vapor deposition
10/08/2008EP1977025A1 Two-dimensional aperture array for vapor deposition
10/08/2008EP1977024A1 Rotatable aperture mask assembly and deposition system
10/08/2008EP1117968A4 Method and apparatus for thermal processing of semiconductor substrates
10/08/2008CN101283456A Manufacturing method of group III-V nitride semiconductor and manufacturing method of lighting device
10/08/2008CN101283455A Silicon-based thin film photoelectric converter, and method and apparatus for manufacturing same
10/08/2008CN101283115A Method and apparatus for the low temperature deposition of doped silicon nitride films
10/08/2008CN101282836A Wide range pressure control using turbo pump
10/08/2008CN101280424A Method for determining optimum high frequency voltage bias value
10/08/2008CN101280423A Manufacturing method of small aperture diamond coating drawing die
10/08/2008CN101280422A Device for lot manufactureof diamond coating drawing die
10/08/2008CN100425105C Plasma processing method and apparatus
10/08/2008CN100424899C Preparing high conductivity suede non-blended ZnO film by MOCVD method
10/08/2008CN100424849C Electrostatically clamped edge ring for plasma processing
10/08/2008CN100424814C Vacuum processing device
10/08/2008CN100424811C Upper electrode plate with deposition shield in a plasma processing system
10/08/2008CN100424376C One piece shim
10/07/2008US7433655 Battery-operated wireless-communication apparatus and method
10/07/2008US7432476 Substrate heat treatment apparatus
10/07/2008US7432215 Semiconductor device manufacturing method and semiconductor manufacturing apparatus
10/07/2008US7431998 Tool and method for the chemical vapor deposition of a two-phase layer on a substrate member
10/07/2008US7431969 Contacting surface of article with reactive mixture of gaseous acrylic ester or amide or other monomer, initiator peroxides, hydroperoxides, and diazenes), a gaseous crosslinker (diacrylate or dimethacrylate) for forming a polymer coating; swelling properties
10/07/2008US7431968 Process and apparatus for organic vapor jet deposition
10/07/2008US7431967 Limited thermal budget formation of PMD layers
10/07/2008US7431966 Atomic layer deposition method of depositing an oxide on a substrate
10/07/2008US7431965 Continuous growth of single-wall carbon nanotubes using chemical vapor deposition
10/07/2008US7431813 Multi-chambered substrate processing equipment having sealing structure between chambers thereof, and method of assembling such equipment
10/07/2008US7431807 Evaporation method using infrared guiding heater
10/07/2008US7431797 Plasma reactor with a dynamically adjustable plasma source power applicator
10/07/2008US7431795 Cluster tool and method for process integration in manufacture of a gate structure of a field effect transistor
10/07/2008US7431773 Atomic layer deposition apparatus and method
10/07/2008US7431772 Gas distributor having directed gas flow and cleaning method
10/07/2008US7431767 Apparatus and method for growth of a thin film
10/07/2008US7431542 Coated cutting insert
10/07/2008US7431225 Methods of operating a liquid vaporizer
10/07/2008US7430986 Plasma confinement ring assemblies having reduced polymer deposition characteristics
10/07/2008US7430985 Plasma processing equipment
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