Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23C - Coating metallic material; Coating material with metallic material; Surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general › C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes
Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
10/2008
10/23/2008US20080257494 Substrate processing apparatus
10/23/2008US20080257264 Facility for depositing lubricant coating on hard magnetic disks
10/23/2008US20080257262 Susceptor Designs for Silicon Carbide Thin Films
10/23/2008US20080257260 Batch wafer handling system
10/23/2008US20080257014 Partial pressure measuring method and partial pressure measuring apparatus
10/23/2008DE102007018716A1 Verfahren zum Aufbringen einer verschleißfesten Beschichtung A method of applying a wear-resistant coating
10/23/2008DE102007018013A1 Dielektrische Schicht sowie Verfahren zur Herstellung einer dielektrischen Schicht Dielectric layer and method of making a dielectric layer
10/23/2008CA2684019A1 Method for applying a high-strength coating to workpieces and/or materials
10/22/2008EP1983579A2 Method of manufacturing semiconductor film and method of manufacturing photovoltaic element
10/22/2008EP1983565A2 Surface treatment method and surface treatment apparatus
10/22/2008EP1983080A2 Single crystal diamond prepared by CVD
10/22/2008EP1983073A1 Metal precursor solutions for chemical vapor deposition
10/22/2008EP1982955A2 Method for producing hydrogen gas separation material
10/22/2008EP1982371A1 Dli-mocvd process for making electrodes for electrochemical reactors
10/22/2008EP1982004A2 Multiple precursor dispensing apparatus
10/22/2008EP1981822A2 Coated substrates having undercoating layers that exhibit improved photocatalytic activity
10/22/2008EP1831429A4 Methods and apparatus for sequentially alternating among plasma processes in order to optimize a substrate
10/22/2008EP1631696A4 A method to encapsulate phosphor via chemical vapor deposition
10/22/2008EP1449407B1 Induction heating devices and methods for controllably heating an article
10/22/2008CN201136895Y Chemical vapor deposition apparatus
10/22/2008CN201136894Y Device for supplying gaseous hydrogen fluoride
10/22/2008CN201136893Y Low pressure chemical vapor deposition reaction system
10/22/2008CN201136892Y Low pressure chemical vapor deposition reaction system
10/22/2008CN101292059A Cleaning means for large area pecvd devices using a remote plasma source
10/22/2008CN101291876A Method of forming metal oxide film, metal oxide film and optical electronic device
10/22/2008CN101290902A Manufacturing method of support pin, support pin, heat treatment device and base board sintering furnace
10/22/2008CN101290878A Method of manufacturing semiconductor film and method of manufacturing photovoltaic element
10/22/2008CN101289739A Procedure for polysilicon deposition
10/22/2008CN101289736A Partial pressure measuring method and partial pressure measuring apparatus
10/22/2008CN100428502C Method for preparation of a-b orientated ZnO nanometer linear array
10/22/2008CN100428495C P-type and N-type zinc oxide thin film and producing method thereof
10/22/2008CN100428424C Doped nitride film, doped oxide film and other doped films
10/22/2008CN100428412C Substrate processing system
10/22/2008CN100428410C Homogeneity improving method and device for hydride gaseous epitaxially groven GaN material
10/22/2008CN100428400C Apparatus and method for thermally isolating a heat chamber
10/22/2008CN100427641C Superhigh vacuum chemical vapor deposition epitoxy system with rotary lining
10/22/2008CN100427254C Cutting blade with coating
10/21/2008US7439678 Magnetic and electrostatic confinement of plasma with tuning of electrostatic field
10/21/2008US7439338 Vapor deposition; atomic layer deposition; dielectrics; integrated circuits
10/21/2008US7439195 Systems and methods for forming metal oxides using metal compounds containing aminosilane ligands
10/21/2008US7439191 Deposition of silicon layers for active matrix liquid crystal display (AMLCD) applications
10/21/2008US7439188 Reactor with heated and textured electrodes and surfaces
10/21/2008US7439181 Method for processing interior of vapor phase deposition apparatus, method for depositing thin film and method for manufacturing semiconductor device
10/21/2008US7438955 Titanium nitride thin film formation on metal substrate by chemical vapor deposition in a magnetized sheet plasma source
10/21/2008US7438949 Ruthenium containing layer deposition method
10/21/2008US7438884 chemical vapor deposited, beta phase polycrystalline; reduced stacking faults; thermoelectric coolers, heat sinks and fans
10/21/2008US7438882 oxidatively treating tetramethylcylcotetrasiloxane lliquid in a non-thermal equilibrium plasma discharge and/or an ionised gas stream resulting therefrom, and collecting the white powder of polydimethylsiloxane in resin form
10/21/2008US7438872 Steam oxidation apparatus
10/21/2008US7438783 Plasma processing apparatus and plasma processing method
10/21/2008US7438765 Adjustable shielding plate for adjusting an etching area of a semiconductor wafer and related apparatus and methods
10/16/2008WO2008124599A1 Deposition precursors for semiconductor applications
10/16/2008WO2008123411A1 Plasma generating apparatus and plasma film forming apparatus
10/16/2008WO2008123309A1 Gas supply method and gas supply device
10/16/2008WO2008123300A1 Plasma processing apparatus
10/16/2008WO2008123295A1 Plasma processing apparatus
10/16/2008WO2008123288A1 Trap apparatus, exhaust system, and treating system using the same
10/16/2008WO2008123242A1 Substrate for epitaxial growth and epitaxial growth process
10/16/2008WO2008123060A1 Vacuum processing apparatus
10/16/2008WO2008122957A1 Deposition of ta- or nb-doped high-k films
10/16/2008WO2008122133A1 Method for producing a workpiece surface and workpiece with predefinable hydrophilic wetting characteristics for said surface
10/16/2008WO2008106542B1 Apparatus and method for deposition over large area substrates
10/16/2008WO2007117576A3 Gas manifolds for use during epitaxial film formation
10/16/2008US20080254644 Method of Substrate Treatment, Computer-Readable Recording Medium, Substrate Treating Apparatus and Substrate Treating System
10/16/2008US20080254641 Manufacturing Method Of Semiconductor Device And Film Deposition System
10/16/2008US20080254353 Electrochemical device, manufacturing method of electrode thereof and processing apparatus for electrode of electrochemical device
10/16/2008US20080254232 Cobalt nitride layers for copper interconnects and methods for forming them
10/16/2008US20080254231 Method of forming protection layer on contour of workpiece
10/16/2008US20080254230 Uniform particle size; vapor deposition; plasma generator; gas flow controllers
10/16/2008US20080254220 Tubal container with openings; dielectric top plate; transmitting electromagnetic waves; discharge prevention member
10/16/2008US20080254219 Method And Device For Preparing Powder On Which Nano Metal, Alloy, And Ceramic Particles Are Uniformly Vacuum-Deposited
10/16/2008US20080254217 Fine control of vaporized organic material
10/16/2008US20080254216 complex capable of being used for chemical vapor deposition of thin metal , or metal oxide films
10/16/2008US20080252671 Computerized Apparatus and Method for Applying Graphics to Surfaces
10/16/2008US20080251828 Enhanced atomic layer deposition
10/16/2008US20080251020 Cvd-Reactor with Slidingly Mounted Susceptor Holder
10/16/2008US20080251018 Gas supply system for semiconductor manufacturing apparatus
10/16/2008US20080251017 Fastening Unit for Ignition Units and Device for Carbon Deposition
10/16/2008US20080251016 Bubbler For the Transportation of Substances By a Carrier Gas
10/16/2008US20080251015 Substrate Processing Apparatus and Reaction Container
10/16/2008US20080251014 Substrate Processing Apparatus and Reaction Container
10/16/2008US20080251008 Substrate Processing Apparatus and Semiconductor Device Producing Method
10/16/2008US20080250978 Wetting agent solvent of ketone, an aliphatic hydrocarbon, an alcohol, a glycol ether, a glycol, or a polyglycol; nanoparticles of treated fumed silica, treated hydrophobic titania, zinc oxides; cationic, nonionic or anionic surfactants; a water carrier; and
10/16/2008US20080250619 Vertical type semiconductor device producing apparatus
10/16/2008DE112006003315T5 Gaskopf und Dünnfilm-Herstellungsvorrichtung Gas head and the thin film forming apparatus
10/16/2008DE102007058484A1 Verfahren zum Aufbringen einer mehrlagigen Beschichtung auf Werkstücke und/oder Werkstoffe A method of applying a multilayer coating to workpieces and / or materials
10/16/2008DE102007047629A1 Verfahren zum Aufbringen einer hochfesten Beschichtung auf Werkstücke und/oder Werkstoffe A method of applying a high strength coating to workpieces and / or materials
10/16/2008DE102004026344B4 Verfahren zum Herstellen einer hydrophoben Beschichtung, Vorrichtung zum Durchführen des Verfahrens und Substrat mit einer hydrophoben Beschichtung A method for producing a hydrophobic coating apparatus for performing the method and substrate with a hydrophobic coating
10/15/2008EP1981077A2 Surface treatment method and surface treatment apparatus
10/15/2008EP1981069A2 Method of producing group III-V compound semiconductor, Schottky barrier diode, light emitting diode, laser diode, and method of fabricating the diodes
10/15/2008EP1980776A2 Valve component for faucet
10/15/2008EP1980649A1 Cutting insert having ceramic coating
10/15/2008EP1980646A1 Improved gap-fill despositions in the formation of silicon containing dielectric materials
10/15/2008EP1980645A1 Method for applying a multi-layer coating to workpieces and/or work materials
10/15/2008EP1980493A2 Plastic container having a carbon-treated internal surface
10/15/2008EP1979965A1 Cathode for electrochemical reactor, electrochemical reactor incorporating such cathodes and method for making said cathode
10/15/2008EP1415018B1 Composite material made from a substrate material and a barrier layer material
10/15/2008CN201132851Y Hook of CVD film-plating machine
10/15/2008CN101288158A Heat treatment apparatus
10/15/2008CN101288157A Substrate processing apparatus and substrate processing method
10/15/2008CN101287859A Process for producing metal foams having uniform cell structure
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