Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
10/2008
10/30/2008US20080268288 Spinodally Patterned Nanostructures
10/30/2008US20080268280 Method of preparing low resistance metal line, patterned metal line structure, and display device using the same
10/30/2008US20080268178 Method of producing encapsulated nanopowders and installation for its realization
10/30/2008US20080268177 Porogens, Porogenated Precursors and Methods for Using the Same to Provide Porous Organosilica Glass Films with Low Dielectric Constants
10/30/2008US20080268176 Method of improving the uniformity of PECVD-deposited thin films
10/30/2008US20080268175 Method of controlling film uniformity of a cvd-deposited silicon nitride film during deposition over a large substrate surface
10/30/2008US20080268174 Using novel insert tube that is strategically positioned within quartz substrate tube during internal vapor deposition; high quality quartz reduces undesirable side effects such as deposition defects, contamination, formation of bubbles
10/30/2008US20080268172 Layer forming method using plasma discharge
10/30/2008US20080268171 Plasma baffle assembly for receiving process gas within plasma-enhanced vapor deposition chamber
10/30/2008US20080268164 Apparatuses and Methods for Cryogenic Cooling in Thermal Surface Treatment Processes
10/30/2008US20080268154 suitable for flash memory fabrication; supplying a gas mixture containing an oxygen containing gas and aluminum containing compound into the chamber, heating the substrate, and depositing an aluminum oxide layer having a dielectric constant greater than 8 on the heated substrate
10/30/2008US20080268153 suctioning a flow of a film-forming gas from both sides of a conveyance path while conveying a wafer along the conveyance path
10/30/2008US20080268151 Organometallic compounds and their use as precursors for forming films and powders of metal or metal derivatives
10/30/2008US20080268150 Method of Coating for Diamond Electrode
10/30/2008US20080268143 Device For Providing Vapors Of A Solid Precursor To A Processing Device
10/30/2008US20080267675 Intermediate Transfer Member, Method of Manufacturing Intermediate Transfer Member, and Image Forming Apparatus
10/30/2008US20080265341 Manufacture of semiconductor device having insulation film of high dielectric constant
10/30/2008US20080264903 Method of producing an article having patterned decorative coating
10/30/2008US20080264565 Method and apparatus which reduce the erosion rate of surfaces exposed to halogen-containing plasmas
10/30/2008US20080264343 Vertical heat treatment apparatus and method of transferring substrates to be processed
10/30/2008US20080264342 Deposition apparatus
10/30/2008US20080264341 Apparatus for cathodic vacuum-arc coating deposition
10/30/2008US20080264340 Moving interleaved sputter chamber shields
10/30/2008US20080264337 Substrate processing apparatus and method for manufacturing semiconductor device
10/30/2008US20080264336 Mechanical and acoustical suspension coating of medical implants
10/30/2008DE102006041515B4 Verfahren zur Herstellung von ein- oder mehrwandigen, mit einem oder mehreren Übergangsmetallen beschichteten Kohlenstoff-Nanoröhren Process for the preparation of single- or multi-walled coated with one or more transition metals, carbon nanotubes
10/30/2008CA2630122A1 Method of deposition onto a sic-covered substrate
10/29/2008EP1986242A2 Method of manufacturing a semiconductor film using hot wire CVD and method of manufacturing a photovoltaic element
10/29/2008EP1986225A1 Plasma etching method
10/29/2008EP1985584A1 Method for producing a carbon-containing material by carbon electron-beam vaporisation in a vacuum and a subsequent condensation thereof on a substrate and a device for carrying out said method
10/29/2008EP1292726B8 Single crystal diamond prepared by cvd
10/29/2008CN201142322Y Improved structure of carrier disk
10/29/2008CN201141389Y Planetary gear shaft of vehicle differential gear
10/29/2008CN201140291Y Mirror polishing solid carbide for diamond coating
10/29/2008CN101297066A Copper based composite base material for electronic part, electronic part and process for producing copper based composite base material for electronic part
10/29/2008CN101297065A Cooled device for plasma depositing a barrier layer onto a container
10/29/2008CN101297064A Method of and apparatus for treating particulate materials for improving the surface characteristics thereof
10/29/2008CN101297063A Method of treating gas
10/29/2008CN101297062A Plasma reactor
10/29/2008CN101297061A Surface-coated member, method for manufacture thereof, and cutting tool
10/29/2008CN101296745A Plasma abatement device
10/29/2008CN101296554A Plasma processing device and electric pole plate thereof
10/29/2008CN101295639A Method of manufacturing a semiconductor film using hot wire cvd and method of manufacturing a photovoltaic element
10/29/2008CN101294279A Plasma film coating apparatus for particle surface modification
10/29/2008CN101294278A Source air supplying device
10/29/2008CN101294277A Thin film deposition method
10/29/2008CN101294276A Process for producing mix laminated shield membrane with high-selection ratio
10/29/2008CN101294275A Coaxial spray type showerhead and uses thereof
10/29/2008CN101294274A Method for growing high quality nano-diamond membrane with low cost
10/29/2008CN101294273A Preparation of strontium-barium titanate film material
10/29/2008CN100429756C Composite material and chip holding component and making method thereof
10/28/2008US7443032 Memory device with chemical vapor deposition of titanium for titanium silicide contacts
10/28/2008US7442900 Chamber for uniform heating of large area substrates
10/28/2008US7442665 Forming intermetallics, alloy, ceramic or composite
10/28/2008US7442656 Method and apparatus for forming silicon oxide film
10/28/2008US7442627 Transparent conductive layer forming method, transparent conductive layer formed by the method, and material comprising the layer
10/28/2008US7442432 Alumina layer with controlled texture
10/28/2008US7442431 enhanced wear resistance and toughness; utilizing short pulses of precursors followed by purging steps with an inert gas such as Ar
10/28/2008US7442417 Method for reaction control coating
10/28/2008US7442415 very uniform deposition of dense metal oxide films at low temperatures; efficiently removing excess ligands before the ligand buildup is so great that the ligands cannot all be removed by a post deposition anneal
10/28/2008US7442414 Methods for producing reinforced carbon nanotubes
10/28/2008US7442413 treating a photovoltaic precursor with a vaporous element, for example, selenium or sulfur, to produce thin film CIGS or CIGSS solar cells
10/28/2008US7442412 Hydrophobic coating for oxide surfaces
10/28/2008US7442285 Common rack for electroplating and PVD coating operations
10/28/2008US7442275 Lateral temperature equalizing system for large area surfaces during processing
10/28/2008US7442273 Apparatus using hybrid coupled plasma
10/28/2008US7442272 Apparatus for manufacturing semiconductor device
10/28/2008US7442271 Miniature microwave plasma torch application and method of use thereof
10/28/2008US7442258 Organic electroluminescent device for fabricating shadow mask
10/28/2008US7442254 Nitride semiconductor device having a nitride semiconductor substrate and an indium containing active layer
10/28/2008US7441513 apparatus for plasma polymerize coating of medical devices, such as stents, is disclosed. A method for forming plasma-polymerized coating for implantable medical devices is also disclosed such as stents
10/23/2008WO2008128141A2 Zirconium, hafnuim, titanium, and silicon precursors for ald/cvd
10/23/2008WO2008126776A1 Fabrication method of a semiconductor device and a semiconductor device
10/23/2008WO2008126622A1 Method for film formation, apparatus for film formation, and recording medium
10/23/2008WO2008126595A1 Plasma treatment apparatus and method of plasma treatment
10/23/2008WO2008126532A1 Substrate for epitaxial growth and method for producing nitride compound semiconductor single crystal
10/23/2008WO2008125607A2 Method for the application of a high-strength coating to workpieces and/or materials
10/23/2008WO2008125606A1 Method for the application of a multi-layer coating to workpieces and/or materials
10/23/2008WO2008106545A3 Pecvd process chamber backing plate reinforcement
10/23/2008WO2008106520A3 Single wafer anneal processor
10/23/2008WO2008028170A3 Solid precursor-based delivery of fluid utilizing controlled solids morphology
10/23/2008WO2008005754A3 Modular chemical vapor deposition (cvd) reactor
10/23/2008WO2007140426A9 Process chamber for dielectric gapfill
10/23/2008WO2007126469A3 Method for conditioning a process chamber
10/23/2008WO2007100528A3 Integrated capacitive and inductive power sources for a plasma etching chamber
10/23/2008US20080261412 Apparatus and method for atomic layer deposition
10/23/2008US20080261410 Thermally growing an interfacial oxide layer of silicon dioxide over silicon substrate; treating surface with an aqueous ammonium hydroxide (NH4OH) containing solution; and, depositing a high-K (dielectric) material such as hafnium oxide over interfacial oxide layer; atomic layer or vapor deposition
10/23/2008US20080261112 Electrode material for electrochemcial device, method for producing the same, electrode using the electrode material, and electrochemical device using the electrode material
10/23/2008US20080261070 Sputtering an oxide of Indium, Zinc, Gallium, Cadmium, and tin using vapor deposition; liquid crystal displays, touch panel devices, personal digital assistants, electronic controllers
10/23/2008US20080261058 Coated cutting tool, cutting member or wear part
10/23/2008US20080261056 Coating; a photocatalytic compound in intimate association with Gallium Phosphide, Cadmium Sulfide, oxide of potassium, tantallum and Niobium, Cadmium Selenide, oxide of Strontium Titanium, TiO2, ZnO, Fe2O3, WO3, Nb2O5, V2O5 and Eu2O3.
10/23/2008US20080260991 Catalyst supporting honeycomb and method of manufacturing the same
10/23/2008US20080260969 Method for Producing Silicon Nitride Films
10/23/2008US20080260967 Apparatus and method for integrated surface treatment and film deposition
10/23/2008US20080260965 Coating of a Polymer Layer Using Low Powder Pulsed Plasma in a Plasma Chamber of a Large Volume
10/23/2008US20080260947 Method of making a cvd coating scheme including alumina and/or titanium-containing materials
10/23/2008US20080260946 Cleaning a pedestal separated from the carrier ring, and an area lay between the pedestal and the carrier ring with a gas; andperforming a full flush
10/23/2008US20080259976 Organic Columnar Thin Films
10/23/2008US20080257864 Methods and devices to reduce defects in dielectric stack structures
10/23/2008US20080257498 Plasma processing apparatus