| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 11/12/2008 | CN100433262C Heater of chemical vapor deposition apparatus for manufacturing a thin film |
| 11/12/2008 | CN100433257C Process for producing monocrystal thin film and monocrystal thin film device |
| 11/12/2008 | CN100433249C Substrate processing device |
| 11/12/2008 | CN100433236C Use of pulsed votage in a plasma reactor |
| 11/12/2008 | CN100432289C Corona-generated chemical vapor deposition on a substrate |
| 11/12/2008 | CN100432288C Method and apparatus for modifyig polymer high-molecular material surface |
| 11/12/2008 | CN100432287C Process for preparing diamond film under strong magnetic field |
| 11/11/2008 | US7449233 Nano structured phased hydrophobic layers on substrates |
| 11/11/2008 | US7449220 Method for manufacturing a plate-shaped workpiece |
| 11/11/2008 | US7449218 Heat treatable coated article with diamond-like carbon (DLC) and/or zirconium in coating |
| 11/11/2008 | US7449071 Wafer holder with peripheral lift ring |
| 11/11/2008 | US7448397 Apparatus for applying disparate etching solutions to interior and exterior surfaces |
| 11/06/2008 | WO2008134467A1 Apparatuses and methods for cryogenic cooling in thermal surface treatment processes |
| 11/06/2008 | WO2008134075A1 Magnetic floating gate flash memory structures |
| 11/06/2008 | WO2008132459A1 A continuous process for preparing and collecting nanotube films that are supported by a substrate |
| 11/06/2008 | WO2008106634A3 Floating slit valve for transfer chamber interface |
| 11/06/2008 | WO2008105736A3 Method, material and apparatus for enhancing dynamic stiffness |
| 11/06/2008 | WO2008100846A3 Atomic layer deposition systems and methods |
| 11/06/2008 | WO2008085474A3 Delivery device for thin film deposition |
| 11/06/2008 | US20080274625 METHODS OF FORMING ELECTRONIC DEVICES CONTAINING Zr-Sn-Ti-O FILMS |
| 11/06/2008 | US20080274604 Susceptor with backside area of constant emissivity |
| 11/06/2008 | US20080274582 Method of Making Silicon Solar Cells Containing μC Silicon Layers |
| 11/06/2008 | US20080274392 Method and Apparatus for Producing Catalyst Layer for Fuel Cell |
| 11/06/2008 | US20080274333 Composite structure and production method thereof |
| 11/06/2008 | US20080274302 Film formation method and apparatus for semiconductor process |
| 11/06/2008 | US20080274300 Apparatus for carrying out plasma chemical vapour deposition and method of manufacturing an optical preform |
| 11/06/2008 | US20080274299 Apparatus and method for hybrid chemical processing |
| 11/06/2008 | US20080274298 Plant for the Plasma Surface Treatment of an Alveolar Sheet of Plastic Material |
| 11/06/2008 | US20080274297 Plasma processing enclosure for chemical vapor deposition; grounded support panels; connecting vertical, flexible grounding straps; vacuum enclosure; shortening passageway for radio frequency; uniform deposits |
| 11/06/2008 | US20080274282 Fabrication method of size-controlled, spatially distributed nanostructures by atomic layer deposition |
| 11/06/2008 | US20080274281 Treatment of a substrate (sio2) with a vaporous, halogen-containing compound (sicl4) under vacuum and heating where an organic precursor containing a nucleophilic functional group (1,6-hexanediol) reacts with halogenated surface to attach an organic coating; batch processing; controlling; microbiochips |
| 11/06/2008 | US20080274280 Honeycomb-like structure and porous plate are adapted such that when a gas mixture passes through the porous plate it is substantially uniformly distributed over a catalyst supported by the porous plate to promote interaction of the gas mixture with the catalyst;quality; purity; energy efficiency |
| 11/06/2008 | US20080274279 Forming a cobalt layer on a tungsten barrier layer using a cyclical deposition process to sequentially expose the substrate to a precursor gas of cobalt having a cyclopentadienyl ligand and a silicon reducing gas; copper plating to fill high aspect ratio, nano-interconnect semiconductor features |
| 11/06/2008 | US20080274278 Method for Depositing in Particular Metal Oxides by Means of Discontinuous Precursor Injection |
| 11/06/2008 | US20080274277 Continuous process for producing carbon nanotubes |
| 11/06/2008 | US20080274276 Vaporization by efficient heating of a mixture of precursor and thermoconductive material; silicon carbide as powder, beads, rods, fibers; chemical vapor deposition, atomic layer deposition, thin films of uniform thickness; stable, saturated vapor pressure; hafnium chloride vapor, moisture for oxide |
| 11/06/2008 | US20080274267 Method and device for metering a coating liquid in a processing machine |
| 11/06/2008 | US20080272463 Method and Apparatus for Growing a Group (III) Metal Nitride Film and a Group (III) Metal Nitride Film |
| 11/06/2008 | US20080272299 Probe System Comprising an Electric-Field-Aligned Probe Tip and Method for Fabricating the Same |
| 11/06/2008 | US20080272008 includes a converter, a hydrogen (in a condensed state) storage container including a carbon-based nanostructured material, a charger, a discharger; uses a substantially carbon-free hydrogen |
| 11/06/2008 | US20080271676 Plasma treatment method and plasma treatment apparatus |
| 11/06/2008 | US20080271675 Method of forming thin film solar cells |
| 11/06/2008 | US20080271640 Mixing of glass with hydrocarbons; chemical vapor deposition; mixing organosilane and/or organosiloxane precursors with porogens; neohexyl-1,3,5,7-tetramethylcyclo-tetrasiloxane |
| 11/06/2008 | US20080271471 Temperature Controlling Method for Substrate Processing System and Substrate Processing System |
| 11/06/2008 | DE10341806B4 Verfahren zur Herstellung einer epitaktischen Silizium-Germanium Basisschicht eines heterobipolaren pnp Transistors A process for producing an epitaxial silicon-germanium base layer of a PNP transistor heterobipolaren |
| 11/06/2008 | DE10239875B4 Verfahren und Vorrichtung zur großflächigen Beschichtung von Substraten bei Atmosphärendruckbedingungen Method and device for large-area coating of substrates under atmospheric pressure conditions |
| 11/06/2008 | DE102007020852A1 Gasversorgungssystem und Verfahren zur Bereitstellung eines gasförmigen Abscheidungsmediums Gas supply system and method for providing a gaseous deposition medium |
| 11/06/2008 | DE102007020800A1 Modifizierte Multikanalstrukturen Modified multi-channel structures |
| 11/06/2008 | CA2681875A1 Apparatuses and methods for cryogenic cooling in thermal surface treatment processes |
| 11/05/2008 | EP1988188A2 Apparatus and method for producing films |
| 11/05/2008 | EP1988187A2 Apparatus and method which reduce the erosion rate of surfaces exposed to halogen-containing plasmas |
| 11/05/2008 | EP1874979A4 Reactor |
| 11/05/2008 | EP1805356A4 Surface and composition enhancements to high aspect ratio c-mems |
| 11/05/2008 | EP1634314A4 Vuv-excited device with blue-emitting phosphor |
| 11/05/2008 | EP1511957B1 Connector for expandable downhole tubulars |
| 11/05/2008 | CN201144282Y Temperature gradient direction flow vapor deposition furnace for preparing charcoal/charcoal member |
| 11/05/2008 | CN101300373A Method for monitoring a plasma, device for carrying out this method, use of this method for depositing a film onto a PET hollow body |
| 11/05/2008 | CN101300096A Production of nano-scale metal particles |
| 11/05/2008 | CN101298676A Manufacturing method of insulation heat-conducting metal substrate |
| 11/05/2008 | CN101298673A Preparation of insulated heat conducting metal substrate |
| 11/05/2008 | CN101298670A Asymmetric grounding of rectangular susceptor |
| 11/05/2008 | CN101298669A Process chamber, inline coating installation and method for treating a substrate |
| 11/05/2008 | CN101298668A Plasma generating device |
| 11/05/2008 | CN101298667A Film forming method |
| 11/05/2008 | CN101298666A Gas source supply device and method |
| 11/05/2008 | CN101298665A Chemical vapor deposition device for plane display |
| 11/05/2008 | CN101298664A Apparatus for carrying out plasma chemical vapour deposition and method of manufacturing an optical precast product |
| 11/05/2008 | CN101298663A Methods for depositing a high-k dielectric material using chemical vapor deposition process |
| 11/05/2008 | CN101298457A Method for producing higher silanes |
| 11/05/2008 | CN100431110C Low-dielectric silicon nitride film and method of making the same, seimiconductor device and fabrication process thereof |
| 11/05/2008 | CN100431102C Vacuum deposition apparatus and method and solar cell material |
| 11/05/2008 | CN100431097C Top electrode, plasma processing device and method |
| 11/05/2008 | CN100431068C Ceramic laminated body and its manufacturing method |
| 11/05/2008 | CN100431013C Apparatus, method and system for fabricating servo patterns on high density patterned media |
| 11/05/2008 | CN100430516C Method of preparing carbon-carbon composite material surface silicon carbide nano wire |
| 11/05/2008 | CN100430170C Cermet cutting tool with hard blade-turning preventing surface coating layer |
| 11/04/2008 | US7446217 Composition and method for low temperature deposition of silicon-containing films |
| 11/04/2008 | US7446060 Thin-film forming method using silane and an oxidizing gas |
| 11/04/2008 | US7446056 Method for increasing polysilicon grain size |
| 11/04/2008 | US7446023 High-density plasma hydrogenation |
| 11/04/2008 | US7445813 Method for forming thin films and apparatus therefor |
| 11/04/2008 | US7445810 Creating a tantalum layer disposed on a first layer region of a first layer and on a second layer region of a second layer; tantalum layer has a substantially body-centered-cubic (bcc)-phase tantalum region on the first layer region, and a non-bcc-phase tantalum region on the second layer region |
| 11/04/2008 | US7445690 Plasma processing apparatus |
| 11/04/2008 | US7445675 Sensor for monitoring material deposition |
| 11/04/2008 | US7445535 Electron source producing apparatus and method |
| 11/04/2008 | US7445023 Apparatus for conveying gases to and from a chamber |
| 11/04/2008 | US7444955 Apparatus for directing plasma flow to coat internal passageways |
| 10/30/2008 | WO2008130369A1 Apparatus and method for atomic layer deposition |
| 10/30/2008 | WO2008129977A1 Film forming apparatus |
| 10/30/2008 | WO2008129688A1 Molded plastic with vapor-deposited film and process for producing the same |
| 10/30/2008 | WO2008129569A1 Coated plastic film |
| 10/30/2008 | WO2008128849A1 Method for applying a wear-resistant coating |
| 10/30/2008 | WO2007140421A3 Process chamber for dielectric gapfill |
| 10/30/2008 | WO2007103902A3 Notched deposition ring |
| 10/30/2008 | US20080268653 Method of forming high dielectric film using atomic layer deposition and method of manufacturing capacitor having the high dielectric film |
| 10/30/2008 | US20080268645 Method for front end of line fabrication |
| 10/30/2008 | US20080268636 Deposition methods for barrier and tungsten materials |
| 10/30/2008 | US20080268564 industrial scale production of semiconductor silicon film on photovoltaic devices for solar cells, by plasma enhanced chemical vapor deposition; generating a self-bias voltage value at an electrode; uniform thickenss; stable, high productivity, with a high photoelectric conversion efficiency |
| 10/30/2008 | US20080268343 Forming an active material layer on a current collector producing an electrode precursor; vapor deposition of lithium vapor and a vapor of an element having a larger atomic weight than lithium |
| 10/30/2008 | US20080268294 Disk; a magnetic layer formed on a nonmagnetic glass substrate and a protection layer formed of carbon, nitrogen and hydrogen; disk heads |