Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23C - Coating metallic material; Coating material with metallic material; Surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general › C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes
Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
11/2008
11/19/2008CN101310047A Process for producing diamond having structure of acicular projection array disposed on surface thereof, diamond maerial, electrode and electronic device
11/19/2008CN101310044A Arrangement in connection with ALD reactor
11/19/2008CN101310043A Ald reactor
11/19/2008CN101310042A Improved bubbler for the transportation of substances by a carrier gas
11/19/2008CN101310041A Vacuum processing apparatus and method
11/19/2008CN101310040A Manufacturing method of ti system film and storage medium
11/19/2008CN101310039A Chemical vapor deposition of high quality flow-like silicon dioxide using a silicon containing precursor and atomic oxygen
11/19/2008CN101310038A Composition for chemical vapor deposition film-formation and method for production of low dielectric constant film
11/19/2008CN101310037A Cyclopentadienyl type hafnium and zirconium precursors and use thereof in atomic layer deposition
11/19/2008CN101308795A Low-temp annealing method for MOCVD to grow doping semi-conducting material
11/19/2008CN101308794A Atomic layer deposition of tungsten material
11/19/2008CN101308771A Gas flow diffuser
11/19/2008CN101307437A Radio frequency electrode and film preparing device
11/19/2008CN101307436A Supporting device for base plate
11/19/2008CN101307435A Liquid supplying unit and method, facility for treating substrates with the unit, and method for treating substrates
11/19/2008CN101307434A Gradient heater for substrate
11/19/2008CN101306379A Preparation method and use of silicon carbide nano-wire catalyst for making hydrogen
11/19/2008CN101306295A Fluid purification device
11/19/2008CN101306294A Method for supplying high purity fluid
11/19/2008CN100435312C Substrate treatment apparatus, substrate holding device, and semiconductor device manufacturing method
11/19/2008CN100435294C Process for producing oxide thin film and production apparatus therefor
11/19/2008CN100435281C Method for preparing GaN base diluted magnetic semiconductor material
11/19/2008CN100435276C Vacuum processing apparatus
11/19/2008CN100435274C Shower head of a wafer treatment apparatus having a gap controller
11/19/2008CN100434566C Rotary machine for CVD coatings
11/19/2008CN100434564C Hot press forming method, and a plated steel material therefor and its manufacturing method
11/19/2008CN100434196C Corrosion resistant component of semiconductor processing equipment and method of manufacture thereof
11/18/2008US7453072 Method for depositing a film using a charged particle beam, method for performing selective etching using the same, and charged particle beam equipment therefor
11/18/2008US7453051 System and process for heating semiconductor wafers by optimizing absorption of electromagnetic energy
11/18/2008US7452829 Plasma CVD method
11/18/2008US7452827 Gas distribution showerhead featuring exhaust apertures
11/18/2008US7452794 Manufacturing method of a thin film semiconductor device
11/18/2008US7452569 Organic aluminum precursor and method of manufacturing a metal wiring using the same
11/18/2008US7452475 Cleaning process and apparatus for silicate materials
11/18/2008US7452424 Vaporizer
11/18/2008US7452423 Diffusion system
11/18/2008US7452420 Apparatus and method for diamond production
11/13/2008WO2008137588A1 Edge healing and field repair of plasma coating
11/13/2008WO2008137239A1 Atomic layer deposition methods, methods of forming dielectric materials, methods of forming capacitors, and methods of forming dram unit cells
11/13/2008WO2008137070A1 Tungsten digitlines and methods of forming and operating the same
11/13/2008WO2008136882A2 Fabrication method of size-controlled, spatially distributed nanostructures by atomic layer deposition
11/13/2008WO2008136832A1 Apparatus and method for moving a substrate
11/13/2008WO2008136502A1 Valve open/close operation check method, gas treatment device, and storage medium
11/13/2008WO2008136491A1 Method for manufacturing roller member for electrophotography
11/13/2008WO2008136260A1 Ti-film formation method
11/13/2008WO2008136029A1 Apparatus for the cold plasma treatment of a continuous web material
11/13/2008WO2008135948A1 Method of cleaning stannane distribution system
11/13/2008WO2008135542A1 Modified multichannel structures
11/13/2008WO2008135516A2 Gas supply system and method for providing a gaseous deposition medium
11/13/2008WO2008135444A1 Method and device for preparing a multilayered coating on a substrate
11/13/2008WO2008135109A1 Transparent barrier film and method for producing the same
11/13/2008WO2008106955A3 Method and devices for the application of transparent silicon dioxide layers from the gas phase
11/13/2008WO2008089168A3 Plasma immersion chamber
11/13/2008WO2008076320A3 Processing apparatus, coated article and associated method
11/13/2008WO2008027215A3 Apparatus and method for integrated surface treatment and deposition for copper interconnect
11/13/2008WO2008021791A3 Nano structured phased hydrophobic layers on substrates
11/13/2008WO2007118252A3 System architecture and method for solar panel formation
11/13/2008WO2007008677A3 Load port module
11/13/2008US20080280158 Coated Sanitaryware Item
11/13/2008US20080280067 Method of forming a carbon film on a metal substrate at a low temperature
11/13/2008US20080280066 Apparatus and Method for Coating a Substrate
11/13/2008US20080280039 Sequential chemical vapor deposition
11/13/2008US20080280038 Applying catalyst to surface of metal substrate; vapor deposition using hydrocarbon gas; segments of fabric are prefeential removed to form pattern
11/13/2008US20080280027 Visible inspection coating of metal, or alloy thereof , for tightness; applying current to object until maximum potential is reached; colorimetic analysis; if defect is present there is no color change
11/13/2008US20080277063 Apparatus for treating substrate using plasma
11/13/2008US20080277062 Plasma Processor
11/13/2008US20080276957 Method of cleaning a cvd device
11/13/2008US20080276869 Substrate holder
11/13/2008US20080276868 Rigid rf transmission line with easy removal section
11/13/2008US20080276867 Transfer chamber with vacuum extension for shutter disks
11/13/2008US20080276860 Cross flow apparatus and method for hydride vapor phase deposition
11/13/2008DE102007022431A1 Plasma-coating assembly for flat surfaces e.g. thin film solar cells has moving electrode and fixed electrode
11/13/2008DE102006033072B4 Verfahren und Vorrichtung zum Beschichten von Substraten durch Tauchen in eine Metallschmelze Method and device for coating substrates by dipping in a molten metal
11/13/2008CA2685586A1 Method and device for preparing a multilayered coating on a substrate
11/12/2008EP1990564A1 Sliding member and production process thereof
11/12/2008EP1990443A2 Method and apparatus for DC plasma assisted chemical vapor deposition in the absence of a positive column, and diamond thin film fabricated thereby
11/12/2008EP1990345A1 Organometallic germanium compounds suitable for use in vapor deposition processes
11/12/2008EP1989007A2 Integrated capacitive and inductive power sources for a plasma etching chamber
11/12/2008EP1676306A4 Synergetic sp-sp2-sp3 carbon materials and deposition methods thereof
11/12/2008EP1646735B1 Method for processing surfaces of aluminium alloy sheets and strips
11/12/2008EP1511880B1 Surface treatment system
11/12/2008CN201148466Y Film coating apparatus of dispersed plate having dispersed gas
11/12/2008CN201148465Y Double-temperature field chemical vapor deposition apparatus
11/12/2008CN201148464Y Electrode plate
11/12/2008CN101305451A Shower plate and plasma treatment apparatus using shower plate
11/12/2008CN101305112A Method for producing a coated substrate body, substrate body comprising a coating and use of the coated substrate body
11/12/2008CN101304964A Titanium complexes, process for production thereof, titanium-containing thin films, and method for formation thereof
11/12/2008CN101304815A Process for producing semi-conductor coated substrate
11/12/2008CN101304630A Internal balanced coil for inductively coupled high density plasma processing chamber
11/12/2008CN101304089A Phosphorizing nickel cathode material for lithium ion battery and preparation method thereof
11/12/2008CN101304001A Improved gap-fill depositions in the formation of silicon containing dielectric materials
11/12/2008CN101302610A Process chamber component having yttrium-aluminum coating
11/12/2008CN101302609A Preparation of Ti5Si3 by normal pressure chemical vapor deposition
11/12/2008CN101302608A Film forming method of metal oxide film
11/12/2008CN101301686A Fe/Ni-based carbide alloy coating cutter material for cutting rolled steel and preparation thereof
11/12/2008CN100433403C Organic elctroluminescence device and method of manufacturing the same
11/12/2008CN100433273C Method for generating plasma, method for cleaning and method for treating substrate
11/12/2008CN100433272C Substrate processing apparatus
11/12/2008CN100433264C Semiconductor manufacturing apparatus
11/12/2008CN100433263C Device and method for surface treatment such as plasma treatment
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