| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 11/26/2008 | CN101312225A Method for depositing a silicon layer on a transmitting conductive oxide layer suitable for use in solar cell applications |
| 11/26/2008 | CN101312156A Method for manufacturing organic el element |
| 11/26/2008 | CN101312144A Chuck assembly and high density plasma device possessing the assembly |
| 11/26/2008 | CN101312126A Method for forming amorphous carbon film and method for manufacturing semiconductor device using the method |
| 11/26/2008 | CN101311336A Film formation apparatus and method for using the same |
| 11/26/2008 | CN101311304A Process for measuring temperature of reaction chamber of vapor deposition equipment |
| 11/26/2008 | CN101311303A Surface treatment process for ultra-low friction film |
| 11/26/2008 | CN101311302A Chemical vapour deposition equipment and furnace tube |
| 11/26/2008 | CN101310971A Ni-base superalloy complex gradient coating and preparation technique thereof |
| 11/26/2008 | CN100438143C Negative electrode for non-aqueous electrolyte secondary battery, production method thereof and non-aqueous electrolyte secondary battery |
| 11/26/2008 | CN100438088C Method for producing light-emitting device |
| 11/26/2008 | CN100437937C Method and apparatus for forming metal silicate film, and method for manufacturing semiconductor device |
| 11/26/2008 | CN100437934C Method for decreasing granule amount of material layer with low dielectric constant |
| 11/26/2008 | CN100437933C Method of improving interlayer adhesion |
| 11/26/2008 | CN100437932C Manufacturing method for high dielectric constant oxidation film, capacitor therewith and manufacturing method thereof |
| 11/26/2008 | CN100437931C Electric liquid chamber and method of processing substrate in the chamber |
| 11/26/2008 | CN100437901C Particle sticking prevention apparatus and plasma processing apparatus |
| 11/26/2008 | CN100437900C Gate valve apparatus and processing system |
| 11/26/2008 | CN100437897C Method and apparatus for controlling the volume of a plasma |
| 11/26/2008 | CN100437896C Plasma processing apparatus and plasma processing method |
| 11/26/2008 | CN100437893C Susceptor shaft vacuum pumping |
| 11/26/2008 | CN100436642C Device for manufacturing dlc film-coated plastic container |
| 11/25/2008 | US7456429 Apparatus for atomic layer deposition |
| 11/25/2008 | US7456116 Gap-fill depositions in the formation of silicon containing dielectric materials |
| 11/25/2008 | US7456109 Method for cleaning substrate processing chamber |
| 11/25/2008 | US7456064 High K dielectric material and method of making a high K dielectric material |
| 11/25/2008 | US7455918 chemical vapor deposited layer that exhibits a lenticular or polyhedra-lenticular grain morphology; improve useful life of the cutting insert, used in material removal applications; wear resistance |
| 11/25/2008 | US7455906 Injection needle or valve; conveying surface; diamond-like carbon coating |
| 11/25/2008 | US7455900 Alumina layer with enhanced texture |
| 11/25/2008 | US7455893 Staggered in-situ deposition and etching of a dielectric layer for HDP-CVD |
| 11/25/2008 | US7455892 Method and apparatus for forming a coating |
| 11/25/2008 | US7455884 Atomic layer deposition with point of use generated reactive gas species |
| 11/25/2008 | US7455824 Amorphous carbon, amorphous-carbon coated member, and process for forming amorphous carbon film |
| 11/25/2008 | US7455748 Magnetic enhancement for mechanical confinement of plasma |
| 11/25/2008 | US7455747 Substrate processing apparatus, control method for the apparatus, and program for implementing the method |
| 11/25/2008 | US7455735 Width adjustable substrate support for plasma processing |
| 11/25/2008 | US7455734 Substrate processing apparatus, substrate holder, and manufacturing method of semiconductor device |
| 11/25/2008 | US7455030 Plasma generating apparatus |
| 11/20/2008 | WO2008141193A1 Batch equipment robots and methods of array to array work-piece transfer for photovoltaic factory |
| 11/20/2008 | WO2008141191A1 Batch equipment robots and methods within equipment work-piece transfer for photovoltaic factory |
| 11/20/2008 | WO2008140501A2 Ring plasma jet method and apparatus for making an optical fiber preform |
| 11/20/2008 | WO2008139875A1 Vacuum treatment device |
| 11/20/2008 | WO2008139871A1 Purge gas assembly |
| 11/20/2008 | WO2008139361A1 Method and system for rapid thermal processing |
| 11/20/2008 | WO2008138608A1 Semiconductor component, method for the production thereof, and use thereof |
| 11/20/2008 | WO2008138384A1 Material composition for use as a masking material for the protection of regions of a turbine component that are not to be coated and method for coating turbine components |
| 11/20/2008 | WO2008118534A3 Conductive polymer films grafted on organic substrates |
| 11/20/2008 | WO2008118191A3 Reprogrammable parallel nanomanufacturing |
| 11/20/2008 | WO2008116159A3 Mechanical parts having increased wear-resistance |
| 11/20/2008 | WO2008016373A3 Method and systems for forming and using nanoengineered sculptured thin films |
| 11/20/2008 | WO2007139981A3 Linearly distributed semiconductor workpiece processing tool |
| 11/20/2008 | WO2007127657A3 Increased polysilicon deposition in a cvd reactor |
| 11/20/2008 | WO2007117305A3 High-throughput deposition system for oxide thin film growth by reactive coevaportation |
| 11/20/2008 | WO2007109198A3 Mirror magnetron plasma source |
| 11/20/2008 | WO2007095194A3 Method and apparatus for combinatorially varying materials, unit process and process sequence |
| 11/20/2008 | US20080286981 In situ silicon and titanium nitride deposition |
| 11/20/2008 | US20080286595 R-Fe-B Rare Earth Sintered Magnet and Method for Producing Same |
| 11/20/2008 | US20080286589 chemical vapor deposition; atomic layer deposition; integrated circuits |
| 11/20/2008 | US20080286588 Metallic component with wear and corrosion resistant coatings and methods therefor |
| 11/20/2008 | US20080286586 Polypropylene Modification for Improved Adhesion of Polypropylene-Based Multilayer Packaging Film Structure to Vaccum Deposited Aluminum |
| 11/20/2008 | US20080286537 Pre-dry treatment of ink in decorative plastic glazing |
| 11/20/2008 | US20080286495 System and method for power function ramping of split antenna pecvd discharge sources |
| 11/20/2008 | US20080286494 Plasma enhanced chemical vapor deposition and spin-on process to form inorgani productof silicon, carbon, oxygen and hydrogen; curing film in environment of 0-10 ppm oxygen; andom 0 to 10 ppm.; use as an intralevel/interlevel dielectric in an ultra-large-scale integration back-end-of-the-line wiring |
| 11/20/2008 | US20080286492 Apparatus and method for depositing multiple coating materials in a common plasma coating zone |
| 11/20/2008 | US20080286491 Substrate processing apparatus and substrate processing method |
| 11/20/2008 | US20080286464 Group 2 Metal Precursors For Depositing Multi-Component Metal Oxide Films |
| 11/20/2008 | US20080286463 Rf shutter |
| 11/20/2008 | US20080286462 Coated insert |
| 11/20/2008 | US20080286461 Vacuum evaporation method |
| 11/20/2008 | US20080286444 In Situ Substrate Holder Leveling Method and Apparatus |
| 11/20/2008 | US20080286443 Apparatus and process for coating a component with aligning device |
| 11/20/2008 | US20080286441 Spin coating of liquid photoresist; characterized in that a viscosimeter is provided to determine the actual viscosity of the fluid prior to the application of the fluid; compensate detected changes in the viscosity by the variation of parameters, so that the coating can be carried out efficiently |
| 11/20/2008 | US20080283972 Silicon Compounds for Producing Sio2-Containing Insulating Layers on Chips |
| 11/20/2008 | US20080283499 Corrosion-Resistant Member, Treatment Apparatus and Sample Treatment Method Using the Member, and Method for Manufacture of Corrosion-Resistant Member |
| 11/20/2008 | US20080283490 Protection layer for fabricating a solar cell |
| 11/20/2008 | US20080283156 precoating strip with aluminum or aluminum alloy, cold deformation of strip, cutting excess sheet with view to final geometry of part, heating to form intermetallic compound from steel/precoat interface and to austenitize steel, cooling, forming martensitic or bainitic structure; vehicles; lightweight |
| 11/20/2008 | US20080283088 Plasma processing apparatus, plasma processing method and cleaning time prediction program |
| 11/20/2008 | US20080283086 Substrate processing apparatus and cleaning method therefor |
| 11/20/2008 | US20080282984 Method of fabricating light-emitting device and apparatus for manufacturing light-emitting device |
| 11/20/2008 | US20080282983 High Temperature Vacuum Evaporation Apparatus |
| 11/20/2008 | US20080282982 Apparatus and method for deposition over large area substrates |
| 11/20/2008 | US20080282981 Method and system for forming thin films |
| 11/20/2008 | US20080282980 Cooled Device for Plasma Depositing a Barrier Layer Onto a Container |
| 11/20/2008 | US20080282979 Method and system for introducing process fluid through a chamber component |
| 11/20/2008 | US20080282978 Process For Manufacturing A Gallium Rich Gallium Nitride Film |
| 11/20/2008 | US20080282977 Gas processing apparatus, gas processing method and integrated valve unit for gas processing apparatus |
| 11/20/2008 | US20080282976 Film formation apparatus and method for using the same |
| 11/20/2008 | US20080282975 Gas Feed Installation for Machines Depositing a Barrier Layer on Containers |
| 11/20/2008 | US20080282970 Cyclopentadienyl Type Hafnium and Zirconium Precursors and Use Thereof in Atomic Layer Deposition |
| 11/20/2008 | DE102007022621A1 Verfahren zur Herstellung einer dielektrischen Deckschicht für eine Kupfermetallisierung unter Anwendung einer thermisch-chemischen Behandlung auf Wasserstoffbasis A process for producing a dielectric covering layer for a copper metallization using a thermal-chemical treatment based on hydrogen |
| 11/20/2008 | DE10085212B4 Dielektrische Schicht, integrierte Schaltung und Verfahren zu deren Herstellung Dielectric layer, integrated circuit and methods for their preparation |
| 11/19/2008 | EP1993140A1 Nitride-based semiconductor substrate and semiconductor device |
| 11/19/2008 | EP1992593A2 Polycrystalline silicon rod for floating zone method and a process for the production thereof |
| 11/19/2008 | EP1992007A2 Apparatus and method for large area multi-layer atomic layer chemical vapor processing of thin films |
| 11/19/2008 | EP1991824A1 Porous layer |
| 11/19/2008 | EP1991717A1 Processing assembly and method for processing a wafer in such a processing assembly |
| 11/19/2008 | EP1991632A1 Heat reservoir and method for processing a substrate coupled to a heat reservoir |
| 11/19/2008 | EP1991345A2 Direct liquid injector device |
| 11/19/2008 | EP1390375B1 Synthesis of bis (cyclopendadienyl) and bis (indenyl) ruthenium complexes |
| 11/19/2008 | CN201151741Y Reaction device for processing silicon wafer by non-electrochemical metalliferous deposit |