| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 12/04/2008 | DE102007025152A1 Verfahren zum Beschichten eines Substrats A method for coating a substrate |
| 12/04/2008 | DE102007025068A1 Gasbrenner Gas burner |
| 12/04/2008 | DE102007023970A1 Vorrichtung zum Beschichten einer Vielzahl in dichtester Packung auf einem Suszeptor angeordneter Substrate Apparatus for coating a plurality close-packed on a susceptor arranged substrates |
| 12/04/2008 | DE10045958B4 Vorrichtung zum Leiten eines gasförmigen Mediums in eine und/oder aus einer Prozeßkammer Means for conducting a gaseous medium into and / or out of a process chamber |
| 12/04/2008 | CA2686445A1 Vacuum treatment installation and vacuum treatment method |
| 12/03/2008 | EP1997938A2 Coated cutting tool insert |
| 12/03/2008 | EP1997937A1 Aluminium gear with hard carbon coating |
| 12/03/2008 | EP1997620A1 Laminated body and carbon film deposition method |
| 12/03/2008 | EP1997565A2 Article with plasmopolymeric coating and method for its manufacture |
| 12/03/2008 | EP1996988A1 Pressure control system with optimized performance |
| 12/03/2008 | EP1996647A1 Glazing system with high glass transition temperature decorative ink |
| 12/03/2008 | EP1996397A2 Self-supporting multilayer films having a diamond-like carbon layer |
| 12/03/2008 | EP0938740B1 Particle controlling method and plasma processing chamber |
| 12/03/2008 | CN201158705Y Air-intake electrode plate for plasma reinforcing chemical vapor deposition |
| 12/03/2008 | CN101317247A Epitaxial growth of nitride compound semiconductors structures |
| 12/03/2008 | CN101317136A Intermediate transfer member, process for producing the same and image forming apparatus |
| 12/03/2008 | CN101316951A Diamond electrode, method for producing same, and electrolytic bath |
| 12/03/2008 | CN101316946A Plasma treatment device |
| 12/03/2008 | CN101316945A A method to improve the ashing/wet etch damage resistance and integration stability of low dielectric constant films |
| 12/03/2008 | CN101316855A Organometallic compounds and methods of use thereof |
| 12/03/2008 | CN101315880A Gas distribution device and plasma processing apparatus adopting the same |
| 12/03/2008 | CN101315875A Plasma generator and workpiece processing apparatus using the same |
| 12/03/2008 | CN101315502A Method for improving medium layer defect between micro-reflection mirrors and producing silicon based LCD |
| 12/03/2008 | CN101314847A Plasma cvd apparatus having non-metal susceptor |
| 12/03/2008 | CN101314846A Substrate carrying mechanism and substrate treating device having the same |
| 12/03/2008 | CN101314845A Independent MO source pipe line of semiconductor material growth apparatus and application thereof |
| 12/03/2008 | CN101314844A MOCVD reaction chamber with horizontal tangential inlet, and center vertical outlet |
| 12/03/2008 | CN100440462C Method and apparatus for fabricating semiconductor device |
| 12/03/2008 | CN100440454C Gas supply integration unit |
| 12/03/2008 | CN100440452C Plasma processing system |
| 12/03/2008 | CN100440451C Substrate processing apparatus |
| 12/03/2008 | CN100440427C Plasma processing chamber |
| 12/03/2008 | CN100440425C Structure for mounting loading table device, processing device, discharge prevention method between feeder lines |
| 12/03/2008 | CN100440422C Substrate support having dynamic temperature control |
| 12/03/2008 | CN100440020C Micro Nano silicon based optical amplifier, and method for preparing gain medium of the amplifier |
| 12/03/2008 | CN100439563C Chemical vapor deposition equipment |
| 12/03/2008 | CN100439562C Process chamber component having electroplated yttrium containing coating |
| 12/03/2008 | CN100439561C System for depositing a film onto a substrate using a low vapor pressure gas precursor |
| 12/03/2008 | CN100439560C Installation for the vacuum treatment in particular of substrates |
| 12/03/2008 | CN100439017C Hard coated layer with good anti-tipping property surface coated with metal ceramic made cutting tool |
| 12/03/2008 | CN100438960C Vaporizer delivery ampoule |
| 12/02/2008 | US7459405 Method using TEOS ramp-up during TEOS/ozone CVD for improved gap-fill |
| 12/02/2008 | US7459404 Adhesion improvement for low k dielectrics |
| 12/02/2008 | US7459187 Uniform thickness achieved by rotating the rotor around the axis almost perpendicular to the base material-conveying direction in the state where it faces, via a narrow gap; gas is dragged into gap by rotation of the rotor and blown out onto the base material surface. |
| 12/02/2008 | US7459175 Creating a dynamic model of monolayer deposition processing system and incorporating virtual sensors in the dynamic model; includes using intelligent set points, dynamic models, and/or virtual sensors; depositing a film on a substrate in a semiconductor device |
| 12/02/2008 | US7458585 Sliding member and production process thereof |
| 12/02/2008 | US7458335 Uniform magnetically enhanced reactive ion etching using nested electromagnetic coils |
| 11/27/2008 | WO2008144658A1 Apparatus and method for depositing multiple coating materials in a common plasma coating zone |
| 11/27/2008 | WO2008144615A1 Coated object |
| 11/27/2008 | WO2008143659A2 Plasma generator apparatus |
| 11/27/2008 | WO2008143197A1 Method and apparatus for production of metal oxide thin film |
| 11/27/2008 | WO2008143024A1 Thin film forming apparatus |
| 11/27/2008 | WO2008142652A1 New metal precursors for semiconductor applications |
| 11/27/2008 | WO2008142115A1 Device for coating a plurality of closest-packed substrates arranged on a susceptor |
| 11/27/2008 | WO2008142043A1 Method for controlling process gas concentration |
| 11/27/2008 | WO2008141850A1 Aluminum gear with hard carbon coating |
| 11/27/2008 | WO2008094845A3 System and method for glass sheet semiconductor coating |
| 11/27/2008 | WO2008045130A8 Property modification during film growth |
| 11/27/2008 | WO2007121383A3 Method and apparatus to form thin layers of materials on a base |
| 11/27/2008 | WO2007112179A3 Method and apparatus for improving uniformity of large-area substrates |
| 11/27/2008 | US20080293256 Method for forming bismuth titanium silicon oxide thin film |
| 11/27/2008 | US20080292895 Method of Producing a Gas Barrier Polymer Foil and a Gas Barrier Polymer Foil |
| 11/27/2008 | US20080292878 Polyimide film with improved adhesion, process for its fabrication and laminated body |
| 11/27/2008 | US20080292811 Chamber idle process for improved repeatability of films |
| 11/27/2008 | US20080292789 One-dimensional metal and metal oxide nanostructures |
| 11/27/2008 | US20080292781 Method for Monitoring a Plasma, Device for Carrying Out this Method, Use of this Method for Depositing a Film Onto a Pet Hollow Body |
| 11/27/2008 | US20080292780 Method of inspecting a substrate and method of preparing a substrate for lithography |
| 11/27/2008 | US20080290522 Carbon containing silicon oxide film having high ashing tolerance and adhesion |
| 11/27/2008 | US20080290473 Method of manufacturing semiconductor device |
| 11/27/2008 | US20080290326 Controlled alignment of catalytically grown nanostructures in a large-scale synthesis process |
| 11/27/2008 | US20080290325 MEMS Passivation with Phosphonate Surfactants |
| 11/27/2008 | US20080290320 Amphoteric stilbene composition |
| 11/27/2008 | US20080289690 Process For Producing a Silicon Film on a Substrate Surface By Vapor Deposition |
| 11/27/2008 | US20080289686 Method and apparatus for depositing a silicon layer on a transmitting conductive oxide layer suitable for use in solar cell applications |
| 11/27/2008 | US20080289577 Workpiece processing apparatus |
| 11/27/2008 | US20080289576 Plasma based ion implantation system |
| 11/27/2008 | US20080289575 Methods and apparatus for depositing a group iii-v film using a hydride vapor phase epitaxy process |
| 11/27/2008 | US20080289123 Reactive Dyes, Their Preparation and Their Use |
| 11/27/2008 | DE202008004128U1 Geschlitzte Elektrode und Plasmaapparatur, die dieselbe verwendet Slotted electrode and plasma apparatus that uses the same |
| 11/27/2008 | DE102007024798A1 Device for depositing nitrogen and gallium, indium or aluminum containing semiconductor layers on substrate, comprises process chamber, first inlet for gallium chloride-containing process gas, and second inlet for ammonia-containing gas |
| 11/27/2008 | DE102007023803A1 Preparing layer systems, useful in an article, comprises applying a layer system with two layers on an article, an intermediate layer between the layers and an organic and inorganic precursors into the coating- or reaction chamber |
| 11/27/2008 | DE102005004242B4 Verfahren zur Herstellung von Triebwerkteilen Process for the preparation of engine parts |
| 11/26/2008 | EP1995770A1 Method of seasoning film-forming apparatus |
| 11/26/2008 | EP1995347A1 Method of forming metal film |
| 11/26/2008 | EP1995345A1 Method for manufacturing a substance resistant to high temperatures |
| 11/26/2008 | EP1995236A1 Tellurium (Te) precursors for making phase change memory materials |
| 11/26/2008 | EP1994559A2 High throughput deposition apparatus with magnetic support |
| 11/26/2008 | EP1994550A2 Method and apparatus for combinatorially varying materials, unit process and process sequence |
| 11/26/2008 | EP1994202A1 Protective coating of silver |
| 11/26/2008 | EP1994201A2 Epitaxial deposition process and apparatus |
| 11/26/2008 | EP1994200A1 Method for production of diamond electrodes |
| 11/26/2008 | EP1994199A1 Apparatus for treating a gas stream |
| 11/26/2008 | EP1994198A1 Method and device for coating an inner surface of a hollow endless geometry, in particular of a pipe |
| 11/26/2008 | EP1994197A2 Methods of using halogen-containing organic compounds to remove deposits from internal surfaces of turbine engine components |
| 11/26/2008 | EP1685272B1 Thermal cvd apparatus |
| 11/26/2008 | CN201154987Y Novel liquid phase vaporization densification device for preparing C/C component |
| 11/26/2008 | CN101313092A Interconnects and heat dissipators based on nanostructures |
| 11/26/2008 | CN101313086A Method for depositing layers in a cvd reactor and gas inlet element for a cvd reactor |
| 11/26/2008 | CN101313085A Method of removing surface deposits and passivating interior surfaces of the interior of a chemical vapour deposition (cvd) chamber |
| 11/26/2008 | CN101312927A Laminated hard alloy piece |