| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 12/11/2008 | US20080302761 Plasma processing system and use thereof |
| 12/11/2008 | US20080302482 Substrate processing apparatus |
| 12/11/2008 | US20080302303 Methods and apparatus for depositing a uniform silicon film with flow gradient designs |
| 12/11/2008 | US20080302302 Substrate Processing System |
| 12/11/2008 | DE102007026349A1 Aus einer Vielzahl diffusionsverschweißter Scheiben bestehender Gasverteiler For a variety diffusion-welded discs of existing gas distribution |
| 12/11/2008 | DE102007026348A1 Verfahren und Vorrichtung zur Temperatursteuerung der Oberflächentemperaturen von Substraten in einem CVD-Reaktor Method and apparatus for temperature control of the surface temperatures of substrates in a CVD reactor |
| 12/11/2008 | DE102004061464B4 Substrat mit feinlaminarer Barriereschutzschicht und Verfahren zu dessen Herstellung Substrate having fine-laminar barrier protective layer and method for its production |
| 12/11/2008 | CA2687838A1 Automated yield monitoring and control |
| 12/10/2008 | EP2001062A2 Membrane structure element and method for manufacturing same |
| 12/10/2008 | EP2001045A1 Plasma cvd apparatus, method for forming thin film and semiconductor device |
| 12/10/2008 | EP2000562A2 Electrode and vacuum processing apparatus |
| 12/10/2008 | EP2000561A1 Organometallic compounds |
| 12/10/2008 | EP2000560A1 Hard coating and coated member |
| 12/10/2008 | EP2000297A1 Transparent barrier sheet and method for producing transparent barrier sheet |
| 12/10/2008 | EP2000296A2 Transparent barrier sheet and production method of transparent barrier sheet |
| 12/10/2008 | EP2000195A2 Method of making hcd gas harmless and apparatus therefor |
| 12/10/2008 | EP2000008A1 Atomic layer deposition system and method for coating flexible substrates |
| 12/10/2008 | EP1999296A2 Apparatus for atomic layer deposition |
| 12/10/2008 | EP1999295A2 Process for atomic layer deposition |
| 12/10/2008 | EP1999294A2 Process for preparing substrates with porous surface |
| 12/10/2008 | EP1885907A4 Systems and methods for thermal management of electronic components |
| 12/10/2008 | EP1668167B1 Protection of metallic surfaces against thermally-induced wrinkling (rumpling) |
| 12/10/2008 | EP1469508B1 Boat for heat treatment and vertical heat treatment equipment |
| 12/10/2008 | EP1384571B1 Laminated body |
| 12/10/2008 | EP1370709B1 Method and Apparatus for Synthesizing Diamond by Chemical Vapor Deposition |
| 12/10/2008 | EP1316110B1 Electrostatic chuck with porous regions |
| 12/10/2008 | EP1097251B1 System and method for reducing particles in epitaxial reactors |
| 12/10/2008 | CN201162044Y Air-injection device and low-pressure chemical vapor deposition equipment |
| 12/10/2008 | CN101322226A Substrate treating apparatus and treating gas emitting mechanism |
| 12/10/2008 | CN101321893A Gas head and thin-film manufacturing device |
| 12/10/2008 | CN101321892A Member for cavitation erosion resistance and method for manufacturing same |
| 12/10/2008 | CN101321891A Substrate support structure with rapid temperature change |
| 12/10/2008 | CN101321890A Silicon gas injector and method of making |
| 12/10/2008 | CN101321427A DC magnetic filtering cathode vacuum arc plasma source |
| 12/10/2008 | CN101320765A Photoelectric conversion device and manufacturing method |
| 12/10/2008 | CN101320680A Anti-arc protection device and its assembling method |
| 12/10/2008 | CN101320679A Plasma processing system |
| 12/10/2008 | CN101320675A Plasma processing device, electrode temperature adjusting device and method |
| 12/10/2008 | CN101319325A Method of manufacturing fine helical nickel-carbon alloy material |
| 12/10/2008 | CN101319324A Diamond-like film preparation method |
| 12/10/2008 | CN101319313A Power transport mechanism and plasma auxiliary chemical vapor deposition apparatus using the same |
| 12/10/2008 | CN101319312A Rolling base isolation foundation structure having rubber layer |
| 12/10/2008 | CN101319311A Method and apparatus for silicon oxide deposition on large area substrates |
| 12/10/2008 | CN101319310A Plasma chemical vapor deposition vacuum apparatus for photovoltaic assembly scale manufacture |
| 12/10/2008 | CN101319309A Methods and apparatus for depositing a uniform silicon film with flow gradient designs |
| 12/10/2008 | CN101319308A Chemical vapor deposition stove for manufacturing carbon brake disc of airplane |
| 12/10/2008 | CN101318186A Refurbishment of a coated chamber component |
| 12/10/2008 | CN100442574C Deposition method and device for organic electroluminescent protective film |
| 12/10/2008 | CN100442550C Semiconductor light-emitting element and method for manufacturing same, integrated semiconductor light-emitting device and method for manufacturing same, image display and method for manufacturing sam |
| 12/10/2008 | CN100442454C Method for forming dielectric film |
| 12/10/2008 | CN100442443C Method for preparing high electron mobility hydrogenated nano-crystalline silicon thin films using crystal lattice strain |
| 12/10/2008 | CN100442430C Plasma processor with electrode simultaneously responsive to plural frequencies |
| 12/10/2008 | CN100442429C Multi-part electrode for a semiconductor processing plasma reactor and method of replacing a portion of a mutli-part electrode |
| 12/10/2008 | CN100441734C Efficient lining heat resisting active oxygen corrosion |
| 12/10/2008 | CN100441639C Color shifting carbon-containing interference pigments |
| 12/09/2008 | US7462732 Volatile nickel aminoalkoxide complex and deposition of nickel thin film using same |
| 12/09/2008 | US7462572 Plasma treatment apparatus and method for plasma treatment |
| 12/09/2008 | US7462564 Processing system and method for treating a substrate |
| 12/09/2008 | US7462407 Group IIIA element fluoride-containing coating having better corrosion resistance to corrosive halogen species; at least 50% of a crystalline phase of the orthorhombic system belonging to space group Pnma. |
| 12/09/2008 | US7462379 Exposing substrate to reactive plasma generated by supplying power of 1 W/cm2 or more at a voltage exceeding 100 kHz using electrode with dielectric layer having a void volume of 10% or less formed by thermally spraying ceramic sealed with an organic compound hardened by sol-gel reaction; antireflection |
| 12/09/2008 | US7462376 CVD method for forming silicon nitride film |
| 12/09/2008 | US7462375 Physical or cathodic arc deposition of multili alternate layer of nitride of aluminum, chromium, titanium, and chromium nitride; nonsticky kitchenware (pots, pans); heat/corrosion/wear resistance, color stability |
| 12/09/2008 | US7462372 Light emitting device, method of manufacturing the same, and thin film forming apparatus |
| 12/09/2008 | US7462335 Optical monitoring and control system and method for plasma reactors |
| 12/09/2008 | US7462293 Method and apparatus for measuring electron density of plasma and plasma processing apparatus |
| 12/09/2008 | US7462246 Modified susceptor for barrel reactor |
| 12/09/2008 | US7462245 Single-wafer-processing type CVD apparatus |
| 12/09/2008 | US7462244 Device and method for vacuum film formation |
| 12/09/2008 | US7462243 Chemical processing system and method |
| 12/09/2008 | US7462239 Low temperature load and bake |
| 12/09/2008 | US7461794 Substrate temperature regulating support pins |
| 12/09/2008 | CA2483260C Sputter coating apparatus including ion beam source(s), and corresponding method |
| 12/04/2008 | WO2008147804A1 Plasma immersion ion processing for coating of hollow substrates |
| 12/04/2008 | WO2008146918A1 Methods for manufacturing and reclaiming electrode for plasma processing apparatus |
| 12/04/2008 | WO2008146779A1 Fluid control apparatus and method for assembling the same |
| 12/04/2008 | WO2008146778A1 Fluid control apparatus |
| 12/04/2008 | WO2008146608A1 Vaporizing apparatus and film forming apparatus provided with vaporizing apparatus |
| 12/04/2008 | WO2008146575A1 Compound-type thin film, method for compound-type thin film formation, and electronic apparatus using the thin film |
| 12/04/2008 | WO2008145459A1 Vacuum treatment unit and vacuum treatment process |
| 12/04/2008 | WO2008024392A3 Inductive plasma source with high coupling efficiency |
| 12/04/2008 | WO2007130448A8 Method of depositing zinc oxide coatings on a substrate |
| 12/04/2008 | US20080299383 Fine grained cemented carbide cutting tool insert |
| 12/04/2008 | US20080299326 Plasma cvd apparatus having non-metal susceptor |
| 12/04/2008 | US20080299314 Enhanced alumina layer with texture |
| 12/04/2008 | US20080299313 Film forming apparatus and film forming method |
| 12/04/2008 | US20080299312 Raw Material Solution for Metal Organic Chemical Vapor Deposition Method and Method for Manufacturing Composite Oxide Film Containing Hf-Si Using the Raw Material Solution |
| 12/04/2008 | US20080299311 Process and Apparatus for Organic Vapor Jet Deposition |
| 12/04/2008 | US20080299310 Nickel-base superalloy having an optimized platinum-aluminide coating |
| 12/04/2008 | US20080299308 Method for making branched carbon nanotubes |
| 12/04/2008 | US20080299307 Methods of making carbon nanotube films, layers, fabrics, ribbons, elements and articles |
| 12/04/2008 | US20080299292 Method of coating substrate |
| 12/04/2008 | US20080299288 Durable, heat-resistant multi-layer coatings and coated articles |
| 12/04/2008 | US20080298921 Coated cutting tool insert |
| 12/04/2008 | US20080296660 Low resistivity conductive structures, devices and systems including same, and methods forming same |
| 12/04/2008 | US20080295965 Plasma processing apparatus |
| 12/04/2008 | US20080295963 Gas supply system and gas supply accumulation unit of semiconductor manufacturing apparatus |
| 12/04/2008 | US20080295773 Substrate support, substrate processing device and method of placing a substrate |
| 12/04/2008 | US20080295772 Chemical vapor deposition apparatus and plasma enhanced chemical vapor deposition apparatus |
| 12/04/2008 | US20080295771 Power-delivery mechanism and apparatus of plasma-enhanced chemical vapor deposition using the same |
| 12/04/2008 | US20080295770 Liquid substance supply device for vaporizing system, vaporizer, vaporization performance appraisal method |