| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 12/23/2008 | CA2400407C Tumble coater |
| 12/18/2008 | WO2008154446A2 An apparatus for depositing a uniform silicon film and methods for manufacturing the same |
| 12/18/2008 | WO2008154293A1 Recycle and reuse of silane |
| 12/18/2008 | WO2008153609A1 Methods for the production of aligned carbon nanotubes and nanostructured material containing the same |
| 12/18/2008 | WO2008153064A1 Plasma processing apparatus and plasma processing method |
| 12/18/2008 | WO2008152666A1 Process for the deposition of layers of hydrogenated silicon carbide |
| 12/18/2008 | WO2008152126A1 Device for coating substrates disposed on a susceptor |
| 12/18/2008 | WO2008151947A1 Extrusion die orifice for producing ceramic honeycomb bodies |
| 12/18/2008 | WO2008151335A1 Apparatus for the production of plasma or radicals by means of microwaves |
| 12/18/2008 | WO2008129508A3 Deposition of transition metal carbide containing films |
| 12/18/2008 | WO2008104169A9 Method and apparatus for the treatment of strip-shaped substrate in a vacuum coating system |
| 12/18/2008 | WO2008083304A3 Method of making inorganic or inorganic/organic hybrid films |
| 12/18/2008 | WO2008039465A3 Method for removing surface deposits in the interior of a chemical vapor deposition reactor |
| 12/18/2008 | WO2008015902A8 Method of manufacturing liquid crystal display device, and liquid crystal display device |
| 12/18/2008 | WO2007146803B1 Methods and apparatus for preventing plasma un-confinement events in a plasma processing chamber |
| 12/18/2008 | WO2007146537B1 Method of forming a layer of material using an atomic layer deposition process |
| 12/18/2008 | US20080312356 Vapor-deposited biocompatible coatings which adhere to various plastics and metal |
| 12/18/2008 | US20080311731 Low pressure chemical vapor deposition of polysilicon on a wafer |
| 12/18/2008 | US20080311690 Eliminate release etch attack by interface modification in sacrificial layers |
| 12/18/2008 | US20080311508 Process of making a semiconductor device using multiple antireflective materials |
| 12/18/2008 | US20080311310 DLC Coating System and Process and Apparatus for Making Coating System |
| 12/18/2008 | US20080311297 Cvd method using metal carbonyl gas and computer storage medium storing program for controlling same |
| 12/18/2008 | US20080311296 Organic vapor phase deposition (OVPD) uses carrier gas to transport organic vapors into deposition chamber, where molecules diffuse across a boundary layer and physisorb on the substrate, patterned deposition without shadow mask; controlled separation; sharp-edged pixels with a resolution of 1 mu m |
| 12/18/2008 | US20080311295 Film deposition processing apparatus and film deposition processing method |
| 12/18/2008 | US20080311294 Vapor-phase growth apparatus and vapor-phase growth method |
| 12/18/2008 | US20080311290 Alumina layer with controlled texture |
| 12/18/2008 | US20080308898 Plasma Excited Chemical Vapor Deposition Method Silicon/Oxygen/Nitrogen-Containing-Material and Layered Assembly |
| 12/18/2008 | US20080308229 Electrode assembly and plasma processing chamber utilizing thermally conductive gasket and o-rings |
| 12/18/2008 | US20080308042 Apparatus for plasma-processing flexible printed circuit boards |
| 12/18/2008 | US20080308041 Plasma processing apparatus |
| 12/18/2008 | US20080308040 Cvd Reactor Comprising a Gas Inlet Member |
| 12/18/2008 | DE19924174B4 Verbundwerkstoff Composite material |
| 12/18/2008 | DE102007027704A1 Vorrichtung zum Beschichten von auf einem Suszeptor angeordneten Substraten Apparatus for coating disposed on a susceptor substrates |
| 12/18/2008 | DE102007027474A1 Flat layer formation from diamond material on surface of workpiece, involves utilizing well-known diamond coating technology, particularly chemical vapor deposition coating process |
| 12/17/2008 | EP2003230A2 GaN substrate, substrate with an epitaxial layer, semiconductor device, and GaN substrate manufacturing method |
| 12/17/2008 | EP2002031A2 Composite material component with silicon-containing ceramic matrix, protected against corrosion |
| 12/17/2008 | EP1899048B1 Low wetting hysteresis hydrophobic surface coating, method for depositing same, microcomponent and use |
| 12/17/2008 | EP1664378B1 Deposition method using a thermal plasma expanded by a replaceable plate |
| 12/17/2008 | EP1507881B1 Process of masking cooling holes of a gas turbine component |
| 12/17/2008 | EP1155442B1 Method for fabricating a multilayer structure with controlled internal stresses |
| 12/17/2008 | CN101326305A Methods of making shape memory films by chemical vapor deposition and shape memory devices made thereby |
| 12/17/2008 | CN101325836A Plasma cvd apparatus and film deposition method |
| 12/17/2008 | CN101325174A Method for forming Ti film and TiN film, contact structure, computer readable storing medium and computer program |
| 12/17/2008 | CN101325160A Film formation method and apparatus for semiconductor process |
| 12/17/2008 | CN101325153A Method for preparing heat sink composite material for semiconductor substrate |
| 12/17/2008 | CN101323947A Localized heating chemical vapor deposition apparatus and method |
| 12/17/2008 | CN100444332C Unit layer posttreating catalytic chemical vapor deposition apparatus and method of film formation therewith |
| 12/17/2008 | CN100444311C Vacuum processor |
| 12/17/2008 | CN100444308C Wide temperature range chuck system |
| 12/17/2008 | CN100444306C Polymer anti-reflective coatings deposited by plasma enhanced chemical vapor deposition |
| 12/17/2008 | CN100443630C Method and apparatus for preparing vaporized reactants for chemical vapor deposition |
| 12/17/2008 | CN100443629C Diamond thin-film reinforcement on tantalum spinning head surface by chemical gas phase deposition |
| 12/16/2008 | US7466892 Optical and optoelectronic articles |
| 12/16/2008 | US7466069 Carbon nanotube device fabrication |
| 12/16/2008 | US7466002 Incident light angle detector for light sensitive integrated circuit |
| 12/16/2008 | US7465966 Film formation method and manufacturing method of semiconductor device |
| 12/16/2008 | US7465666 Method for forming tungsten materials during vapor deposition processes |
| 12/16/2008 | US7465665 Method for depositing tungsten-containing layers by vapor deposition techniques |
| 12/16/2008 | US7465659 Low dielectric (low k) barrier films with oxygen doping by plasma-enhanced chemical vapor deposition (PECVD) |
| 12/16/2008 | US7465658 Oxygen bridge structures and methods to form oxygen bridge structures |
| 12/16/2008 | US7465626 Method for forming a high-k dielectric stack |
| 12/16/2008 | US7465475 Method for controlling the deposition of vaporized organic material |
| 12/16/2008 | US7465407 Plasma processing method and apparatus |
| 12/16/2008 | US7465387 Efficient evaporative distillation; friction product; aircraft brake |
| 12/16/2008 | US7465385 Gold alloy electrolytes |
| 12/16/2008 | US7465357 Computer-readable medium that contains software for executing a method for cleaning a CVD chamber |
| 12/16/2008 | US7464717 Method for cleaning a CVD chamber |
| 12/16/2008 | US7464663 Roll-vortex plasma chemical vapor deposition system |
| 12/16/2008 | US7464662 Compact, distributed inductive element for large scale inductively-coupled plasma sources |
| 12/11/2008 | WO2008151281A1 Automated yield monitoring and control |
| 12/11/2008 | WO2008151094A1 Metal inks, methods of making the same, and methods for printing and/or forming metal films |
| 12/11/2008 | WO2008151067A2 CHEMICAL VAPOR DEPOSITION OF CuInXGa1- X(SeyS1-y)2 THIN FILMS AND USES THEREOF |
| 12/11/2008 | WO2008150739A1 Apparatus and methods for improving treatment uniformity in a plasma process |
| 12/11/2008 | WO2008149918A1 Biodegradable resin bottle and process for producing the same |
| 12/11/2008 | WO2008149844A1 Film forming method and film forming apparatus |
| 12/11/2008 | WO2008149702A1 Fluid control apparatus |
| 12/11/2008 | WO2008149325A1 Non-flammable solvents for semiconductor applications |
| 12/11/2008 | WO2008148773A1 Gas distributor comprising a plurality of diffusion-welded panes and a method for the production of such a gas distributor |
| 12/11/2008 | WO2008148759A1 Device for the temperature control of the surface temperatures of substrates in a cvd reactor |
| 12/11/2008 | WO2008052047A3 Vortex chamber lids for atomic layer deposition |
| 12/11/2008 | WO2008008750A3 Resonant infrared laser-assisted nanoparticle transfer and applications of same |
| 12/11/2008 | WO2007140426A3 Process chamber for dielectric gapfill |
| 12/11/2008 | WO2007137035A3 In situ cleaning of cvd system exhaust |
| 12/11/2008 | US20080306119 Method for the Protection of Materials |
| 12/11/2008 | US20080305629 Tungsten nitride atomic layer deposition processes |
| 12/11/2008 | US20080305364 Magnetic Recording Media and Production Process Thereof |
| 12/11/2008 | US20080305278 Glass coating of polymers |
| 12/11/2008 | US20080305277 Method and apparatus for making diamond-like carbon films |
| 12/11/2008 | US20080305276 Method of Applying Hot Gas Anticorrosion Layers |
| 12/11/2008 | US20080305275 CVD system and substrate cleaning method |
| 12/11/2008 | US20080305269 Formation of CIGS absorber layer materials using atomic layer deposition and high throughput surface treatment |
| 12/11/2008 | US20080305260 Organometallic compounds |
| 12/11/2008 | US20080305259 Firing jig and method for manufacturing honeycomb structure |
| 12/11/2008 | US20080305246 Apparatus for depositing a uniform silicon film and methods for manufacturing the same |
| 12/11/2008 | US20080305244 Monitoring a coating applied to a metal surface |
| 12/11/2008 | US20080304131 Electrochromic devices and fabrication methods |
| 12/11/2008 | US20080304068 Biochip Production Method, Biochip, Biochip Analysis Apparatus, and Biochip Analysis Method |
| 12/11/2008 | US20080303744 Plasma processing system, antenna, and use of plasma processing system |
| 12/11/2008 | US20080303054 Apparatus for producing group-iii nitride semiconductor layer, method of producing group-iii nitride semiconductor layer, method of producing group-iii nitride semiconductor light-emitting device, group-iii nitride semiconductor light-emitting device thereof, and lamp thereof |
| 12/11/2008 | US20080302982 Polarizer elements and systems using the same |