Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
01/2009
01/15/2009US20090014881 Semiconductor device, and method and apparatus for manufacturing same
01/15/2009US20090014864 Thermal interface material having carbon nanotubes, component package having the same and method for making the component package
01/15/2009US20090014412 Film forming apparatus and method for manufacturing light emitting element
01/15/2009US20090013933 Semiconductor manufacturing device
01/15/2009US20090013932 Substrate processing apparatus
01/15/2009US20090013931 Continuous Growth Of Single-Wall Carbon Nanotubes Using Chemical Vapor Deposition
01/15/2009US20090013930 Gas distributor with pre-chambers disposed in planes
01/15/2009US20090013826 Alkali Metal Dispenser and Uses for Same
01/15/2009DE102007004744A1 Halogen gas process and assembly to apply a partial coating to a component forming part of an aircraft gas turbine engine
01/15/2009DE10022333B4 CVD-Verfahren zu Herstellung eines siliciumcarbidbeschichteten Graphitwerkstoff und Verwendung eines siliciumcarbidbeschichteten Graphitwerkstoffs CVD process for producing a siliciumcarbidbeschichteten graphite material and using a siliciumcarbidbeschichteten graphite material
01/14/2009EP2014791A1 Apparatus and method for coating internal surfaces of a turbine engine component
01/14/2009EP2014790A1 Process for forming continuous copper thin films via vapor deposition
01/14/2009EP2014789A1 Coated cutting tool
01/14/2009EP2014142A2 Dual plasma beam sources and method
01/14/2009EP2013378A2 Exhaust system
01/14/2009EP2013377A1 Hot source
01/14/2009EP2013376A2 Increased polysilicon deposition in a cvd reactor
01/14/2009EP2013375A2 System and method for transport
01/14/2009EP1781837B1 Plasma arc coating system
01/14/2009CN101346802A Method of film deposition and apparatus for treating substrate
01/14/2009CN101346492A Apparatus for an optimized plasma chamber grounded electrode assembly
01/14/2009CN101345210A Process for forming continuous copper thin films via vapor deposition
01/14/2009CN101345204A Retaining device and temperature control method for processed body
01/14/2009CN101345203A Processed body retaining device
01/14/2009CN101345186A Method and apparatus for batch processing in a vertical reactor
01/14/2009CN101345184A Plasma processing apparatus, gas dispensing device and gas delivery method
01/14/2009CN101343776A Chemical vapor deposition preparation apparatus method for oxide
01/14/2009CN101343734A Method for removing forerunner of atom layer deposition process
01/14/2009CN101343733A Method for MOVCD growth nitride epitaxial layer
01/14/2009CN101343732A Metal precursor solutions for chemical vapor deposition
01/14/2009CN101342602A Coated cutting tool
01/14/2009CN100452582C Semiconductor laser and method for manufacturing the same
01/14/2009CN100452449C Nitride semiconductors on silicon substrate and method of manufacturing the same
01/14/2009CN100452318C Method for producing gate stack sidewall spacers
01/14/2009CN100452315C Substrate processing apparatus and method for manufacturing semiconductor device
01/14/2009CN100452306C Substrate holder having a fluid gap and method of fabricating the substrate holder
01/14/2009CN100452297C Method of depositing thin film on wafer
01/14/2009CN100452291C Retainer tectosome, insulation tectosome and heating arrangement of heater
01/14/2009CN100452290C Plasma processing apparatus
01/14/2009CN100451830C Organic polymeric antireflective coatings deposited by chemical vapor deposition
01/14/2009CN100451745C Apparatus having edge frame and its using method
01/14/2009CN100451163C Gas distribution device for treating reactor by semiconductor technological element and reactor thereof
01/14/2009CN100451162C Method of chemical gas phase precipitation for growing carbon doped silicon germanium alloy buffer layer and germanium film
01/14/2009CN100450978C Tantalum carbide-covered carbon material and process for producing the same
01/14/2009CN100450647C Glow discharge-generated chemical vapor deposition
01/14/2009CN100450646C Ion beam-assisted high-temperature superconductor (HTS) deposition for thick film tape
01/13/2009US7476627 Surface preparation prior to deposition
01/13/2009US7476617 Semiconductor device with epitaxial C49-titanium silicide (TiSi2) layer and method for fabricating the same
01/13/2009US7476450 Fourth generation single crystal superalloy substrate having a bond coat containing Ni; Pt, Pd and/or Ir; Al, Co, Cr, Mo, Re, Ta and W and overcoated with a barrier coating, e.g., ZrO2 stabilized with Y2O3, Gd2O3, Ce2O3 or Sc2O3; turbine blades or vanes; low aluminum content (5-10%)
01/13/2009US7476420 Process for producing metal oxide films at low temperatures
01/13/2009US7476419 Chemical vapor infiltration/deposition (CVI/CVD) by flowing a reactant gas through the center opening of a porous stack and around the exterior; densification of carbon-fiber disc brakes using a hydrocarbon gas; uniformity; microstructure quality
01/13/2009US7476418 Etching and planarizing a substrate by irradiation with a focused ion beam, decomposing and depositing an organic gas into a columnar electrode, and then attaching the nanotubes to the electrode; maintained electroconductivity between nanotubes and electrodes
01/13/2009US7476301 Procedure and device for the production of a plasma
01/13/2009US7476278 Roll to roll manufacturing of organic solar modules
01/13/2009US7475762 Aircraft wheel part having improved corrosion resistance
01/13/2009CA2375662C Process for the production of photocatalytic coatings on substrates
01/13/2009CA2364884C Method for treating polymer surface
01/08/2009WO2009006179A1 Method for producing amorphous carbon coatings on external surfaces using diamondoid precursors
01/08/2009WO2009006178A1 Method for producing diamond-like carbon coatings using diamondoid precursors on internal surfaces
01/08/2009WO2009006072A2 Methods and arrangements for plasma processing system with tunable capacitance
01/08/2009WO2009005126A1 Iii nitride semiconductor light emitting element, method for manufacturing the iii nitride semiconductor light emitting element, and lamp
01/08/2009WO2009004117A1 Method in depositing metal oxide materials
01/08/2009WO2009003901A1 Process for metalizing polyamide blends
01/08/2009WO2009003206A2 Al-Ti-Ru-N-C HARD MATERIAL COATING
01/08/2009WO2008136029A8 Apparatus for the cold plasma treatment of a continuous web material
01/08/2009WO2008128141A3 Zirconium, hafnuim, titanium, and silicon precursors for ald/cvd
01/08/2009WO2008116222A3 A modular cluster tool
01/08/2009WO2008054591A3 Treatment of effluent in the deposition of carbon-doped silicon
01/08/2009WO2007139379A9 Method and apparatus for deposition using pulsed atmospheric pressure glow discharge
01/08/2009US20090011606 Substrate Processing Apparatus and Semiconductor Device Producing Method
01/08/2009US20090011535 Apparatus and Method of Manufacturing Solar Cells
01/08/2009US20090011232 Aligned carbon nanotubes for dry adhesives and methods for producing same
01/08/2009US20090011206 Coated Substrate and Process for the Production of a Coated Substrate
01/08/2009US20090011204 Carbon nanostructures and methods of making and using the same
01/08/2009US20090011194 Substrate processing method
01/08/2009US20090011150 Remote Plasma Atomic Layer Deposition Apparatus and Method Using Dc Bias
01/08/2009US20090011149 Substrate processing method
01/08/2009US20090011148 Methods and apparatuses promoting adhesion of dielectric barrier film to copper
01/08/2009US20090011147 Photon induced formation of metal comprising elongated nanostructures
01/08/2009US20090011146 Method of Forming Vapor Deposited Layer by Surface-Wave Plasma and Apparatus Therefor
01/08/2009US20090011145 Method of Manufacturing Vanadium Oxide Thin Film
01/08/2009US20090011129 Method and apparatus for providing precursor gas to a processing chamber
01/08/2009US20090011128 Method for manufacturing carbon nano tube
01/08/2009US20090011127 Process and apparatus for superimposing a layer of a separating agent
01/08/2009US20090011120 Plasma Treating Apparatus, Electrode Member for Plasma Treating Apparatus, Electrode Member Manufacturing Method and Recycling Method
01/08/2009US20090011119 Droplet jetting apparatus and display device manufacturing method
01/08/2009US20090010822 Apparatus for the production of carbon nanotubes
01/08/2009US20090010814 Effluent gas stream treatment system having utility for oxidation treatment of semiconductor manufacturing effluent gases
01/08/2009US20090010724 Coated cemented carbide inserts
01/08/2009US20090008752 Ceramic Thin Film On Various Substrates, and Process for Producing Same
01/08/2009US20090008239 Remote inductively coupled plasma source for cvd chamber cleaning
01/08/2009US20090007846 Diffuser gravity support
01/08/2009CA2692147A1 Method for producing amorphous carbon coatings on external surfaces using diamondoid precursors
01/08/2009CA2691544A1 Method for producing diamond-like carbon coatings using diamondoid precursors on internal surfaces
01/08/2009CA2690978A1 Method in depositing metal oxide materials
01/07/2009EP2012345A1 Semiconductor production plant
01/07/2009EP2011898A1 Method in depositing metal oxide materials
01/07/2009EP2011897A2 Methods and apparatus for cleaning deposition chamber parts using selective spray etch
01/07/2009EP2011894A1 Cemented carbide inserts for parting, grooving and threading
01/07/2009EP2011145A2 Method of forming mixed rare earth oxynitride and aluminum oxynitride films by atomic layer deposition