Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
01/2009
01/27/2009US7481889 Film forming apparatus and film forming method
01/27/2009US7481888 Heat treatment jig and heat treatment method for silicon wafer
01/27/2009US7481887 Apparatus for controlling gas pulsing in processes for depositing materials onto micro-device workpieces
01/27/2009US7481886 Plasma process system and plasma process method
01/27/2009US7481882 Method for forming a thin film
01/22/2009WO2009012341A2 Group iv complexes as cvd and ald precursors for forming metal-containing thin films
01/22/2009WO2009012180A1 Ultrananocrystalline diamond film deposition for spm probes
01/22/2009WO2009012159A1 Clean rate improvement by pressure controlled remote plasma source
01/22/2009WO2009011801A1 Corrosion-resistant internal coating method using a germanium-containing precursor and hollow cathode techniques
01/22/2009WO2009011745A1 Plasma enhanced bonding for improving adhesion and corrosion resistance of deposited films
01/22/2009WO2009011648A1 Textured alpha- alumina coated cutting tool insert for turning of steel
01/22/2009WO2009011425A1 Organic platinum complex and method for producing platinum-containing thin film by chemical vapor deposition using the platinum complex
01/22/2009WO2009011166A1 Vacuum processing device and vacuum processing method
01/22/2009WO2009011015A1 High-frequency induction heating apparatus and plasma cvd apparatus
01/22/2009US20090023301 Film deposition apparatus, method of manufacturing a semiconductor device, and method of coating the film deposition apparatus
01/22/2009US20090023274 Hybrid Chemical Vapor Deposition Process Combining Hot-Wire CVD and Plasma-Enhanced CVD
01/22/2009US20090022997 Transparent Conductive Oxide Films Having Enhanced Electron Concentration/Mobility, and Method of Making Same
01/22/2009US20090022905 Rf choke for gas delivery to an rf driven electrode in a plasma processing apparatus
01/22/2009US20090022891 Method of forming metal film
01/22/2009US20090022879 Method for applying paints to surfaces in a controlled, position-dependent manner
01/22/2009US20090020790 Method for fabricating polysilicon film, a gas phase deposition apparatus and an electronic device formed thereby
01/22/2009US20090020210 Fluorescent dye to improve primer coverage accuracy for bonding applications
01/22/2009US20090020072 Chemical solution vaporizing tank and chemical solution treating system
01/22/2009DE112007000541T5 Selektive Trennverfahren Selective separation process
01/22/2009DE102007033665A1 Method for producing a layer system on a dielectric substrate having a first reflecting metal layer and a layer structure, comprises applying the first metal layer on the substrate by a vacuum coating process
01/21/2009EP2017368A2 Precursor Compositions And Methods
01/21/2009EP2016206A1 Device for introducing, injecting or spraying a mixture of a carrier gas and liquid compounds and method for implementing said device
01/21/2009EP2016205A2 Semiconductor buffer structures
01/21/2009EP2016204A2 Controlling plasma processing using parameters derived through the use of a planar ion flux probing arrangement
01/21/2009EP1470264B1 Methods for silicon oxide and oxynitride deposition using single wafer low pressure cvd
01/21/2009EP1394844B1 Method of fabricating semiconductor device
01/21/2009CN201183823Y Graphitic rack guide rail for solar cell production line PECVD link
01/21/2009CN201183822Y Thin film deposition apparatus
01/21/2009CN101352108A Stage apparatus and plasma processing apparatus
01/21/2009CN101351572A Rotatable aperture mask assembly and deposition system
01/21/2009CN101350294A System and process for heating semiconductor wafers by optimizing absorption of electromagnetic energy
01/21/2009CN101348936A Orientational alignment carbon nano-tube and carbon coating cobalt nano-particle complex and preparation thereof
01/21/2009CN101348904A Semiconductor manufacturing device
01/21/2009CN101348903A Multifunctional small film deposition equipment
01/21/2009CN101348902A Diffuser plate with slit valve compensation
01/21/2009CN101348901A Preparation and apparatus of high quality and high yield carbon nano-tube array
01/21/2009CN101348900A Organometallic compounds
01/21/2009CN101348899A Plasma generation apparatus having cleaning function
01/21/2009CN101348249A Method for preparing carbon nano-tube array on particle interior surface
01/21/2009CN100455158C Plasma process apparatus and its processor
01/21/2009CN100454597C Nitride semiconductor element and process for producing the same
01/21/2009CN100454526C Thermo-interface material producing method
01/21/2009CN100454515C Method for forming aluminium lead wire
01/21/2009CN100454514C Film tray for fabricating flexible display
01/21/2009CN100454498C Plasma processing apparatus and controlling method for plasma processing apparatus
01/21/2009CN100454497C Method of filling gaps and methods of depositing materials using high density plasma chemical vapor deposition
01/21/2009CN100454495C Semiconductor manufacturing equipment
01/21/2009CN100453788C Member for internal combustion engine and production method thereof
01/21/2009CN100453696C CVD diamond film continuous preparation system
01/21/2009CN100453695C Microwave plasma processing device and plasma processing gas supply member
01/21/2009CN100453694C Plasma processing apparatus, semiconductor manufacturing apparatus and electrostatic chucking unit used thereof
01/21/2009CN100453693C New type diamondlike film sedimentation technology
01/21/2009CN100453692C Aluminium material surface modifying diamond-like film coating process and apparatus
01/20/2009US7479619 Thermal processing unit
01/20/2009US7479325 Isotope-doped carbon nanotube
01/20/2009US7479306 SiCOH dielectric material with improved toughness and improved Si-C bonding, semiconductor device containing the same, and method to make the same
01/20/2009US7479304 Fluoridating the surface of a substrate of yttrium oxide including 0-10% by volume aluminum oxide; and creating openings through the substrate, especially using ultrasonic frequency drilling; semiconductors
01/20/2009US7479303 Method for chemical vapor deposition (CVD) with showerhead and method thereof
01/20/2009US7479302 Actively-cooled fiber-reinforced ceramic matrix composite rocket propulsion thrust chamber and method of producing the same
01/20/2009US7479301 Method for modifying a metallic surface
01/20/2009US7479187 Method for manufacturing silicon epitaxial wafer
01/20/2009US7479052 Method of growing carbon nanotubes and method of manufacturing field emission device using the same
01/20/2009US7478844 Pre-expanded connector for expandable downhole tubulars
01/20/2009US7478609 Plasma process apparatus and its processor
01/15/2009WO2009009604A2 Diamond film deposition
01/15/2009WO2009009306A2 Multilayer barrier stacks and methods for making them
01/15/2009WO2009009272A2 Conformal doping using high neutral plasma implant
01/15/2009WO2009009206A2 Method of depositing silicon on carbon materials and forming an anode for use in lithium ion batteries
01/15/2009WO2009009121A1 Movable injectors in rotating disc gas reactors
01/15/2009WO2009008442A1 Method and apparatus for manufacturing magnetic recording medium
01/15/2009WO2009008376A1 Process for producing semiconductor device, semiconductor device, semiconductor production apparatus, and storage medium
01/15/2009WO2009008324A1 Method and apparatus for manufacturing magnetic recording medium
01/15/2009WO2009007745A1 Deposition process
01/15/2009WO2009007654A1 Plasma-deposited barrier coating including at least three layers, method for obtaining one such coating and container coated with same
01/15/2009WO2009007524A2 Method for plasma-assisted vapour-phase chemical deposition of a carbon/metal film
01/15/2009WO2009007448A2 Magnetron co-sputtering device
01/15/2009WO2008142653A3 New cobalt precursors for semiconductor applications
01/15/2009WO2008098963A3 Method of forming an oxide thin film
01/15/2009US20090017638 Substrate processing apparatus and method for manufacturing semiconductor device
01/15/2009US20090017637 Method and apparatus for batch processing in a vertical reactor
01/15/2009US20090017326 Method for forming an acoustic mirror with reduced metal layer roughness and related structure
01/15/2009US20090017292 Reactive flow deposition and synthesis of inorganic foils
01/15/2009US20090017258 Diamond film deposition
01/15/2009US20090017230 Corrosion-resistant internal coating method using a germanium-containing precursor and hollow cathode techniques
01/15/2009US20090017229 Processing System Platen having a Variable Thermal Conductivity Profile
01/15/2009US20090017228 Apparatus and method for centering a substrate in a process chamber
01/15/2009US20090017227 Remote Plasma Source for Pre-Treatment of Substrates Prior to Deposition
01/15/2009US20090017218 Manufacturing Method for Producing Wick Structures of a Vapor Chamber by Using a Powder Thermal Spray Gun
01/15/2009US20090017217 Apparatus and method for applying coatings onto the interior surfaces of components and related structures produced therefrom
01/15/2009US20090017208 Precursor compositions and methods
01/15/2009US20090017207 Formation of Selenide, Sulfide or Mixed Selenide-Sulfide Films on Metal or Metal Coated Substrates
01/15/2009US20090017206 Methods and apparatus for reducing the consumption of reagents in electronic device manufacturing processes
01/15/2009US20090017192 Vapor deposition method and apparatus
01/15/2009US20090017190 Movable injectors in rotating disc gas reactors
01/15/2009US20090017189 Method and apparatus for forming protective layer