Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
02/2009
02/11/2009EP2023381A1 Method of selectively forming atomically flat plane on diamond surface, diamond substrate produced by the method, and semiconductor element employing the same
02/11/2009EP2022872A1 Thin film production equipment and inner block for thin film production equipment
02/11/2009EP2022087A2 Process chamber for dielectric gapfill
02/11/2009EP2021532A1 Source container of a vpe reactor
02/11/2009EP2021525A2 Gas manifolds for use during epitaxial film formation
02/11/2009EP2021297A1 Method and apparatus for coating glass
02/11/2009EP1651793B1 Simple chemical vapor deposition system and methods for depositing multiple-metal aluminide coatings
02/11/2009EP1633904B1 Methods for forming aluminum containing films utilizing amino aluminum precursors
02/11/2009EP1620497B1 Object with a stratified composite material
02/11/2009CN201193243Y Mask device for manufacturing coated plug
02/11/2009CN101366103A Process for producing siliceous film and substrate with siliceous film produced thereby
02/11/2009CN101366099A Placement table construction, and heat treatment equipment
02/11/2009CN101365823A Film forming apparatus and film forming method
02/11/2009CN101365822A Substrate processing apparatus, program, recording medium and conditioning necessity determining method
02/11/2009CN101365821A Method for depositing metallic film
02/11/2009CN101365657A Deposition of ruthenium oxide coatings on a substrate
02/11/2009CN101363118A Capacitance coupling plasma apparatus and method for growing silicon carbide film on silicon substrate
02/11/2009CN100461475C Method of forming a low temperature-grown buffer layer and method for manufacturing light emitting element
02/11/2009CN100461343C Method for depositing atomic-layer to semiconductor device by pretreatment materials
02/11/2009CN100461334C Apparatus to improve wafer temperature uniformity for face-up wet processing
02/11/2009CN100460558C Component for vacuum film deposition system, vacuum film deposition system using the same and sighting board device
02/10/2009US7489857 Process and apparatus for producing powders of metal compound containing oxygen, and the powders produced by the process
02/10/2009US7488922 Susceptor system
02/10/2009US7488694 Methods of forming silicon nitride layers using nitrogenous compositions
02/10/2009US7488693 Method for producing silicon oxide film
02/10/2009US7488683 Forming a vapor deposited film of a silicon oxide on the surface of a substrate by holding the substrate to be treated in a plasma-treating chamber, and effecting the treatment with a chemical plasma by feeding an organosilicon compound and an oxidizing gas into the treating chamber
02/10/2009US7488536 Coating for a mechanical part, comprising at least one hydrogenated amorphous carbon, and method of depositing one such coating
02/10/2009US7488514 chemical vapor deposition of dielectric layers on substrates by flowing gases of barium, strontium, titanium and oxidizers to chemical reactors
02/10/2009US7488455 Apparatus for the production of carbon nanotubes
02/10/2009US7488435 Copper(I) complexes and processes for deposition of copper films by atomic layer deposition
02/10/2009US7488389 Nozzle device, film forming apparatus and method using the same, inorganic electroluminescence device, inkjet head, and ultrasonic transducer array
02/10/2009US7488386 Atomic layer deposition methods and chemical vapor deposition methods
02/10/2009US7488374 Trapping device, processing system, and method removing impurities
02/10/2009US7487956 Method and apparatus to help promote contact of gas with vaporized material
02/10/2009US7487806 Source liquid supply apparatus having a cleaning function
02/10/2009US7487740 Voltage non-uniformity compensation method for high frequency plasma reactor for the treatment of rectangular large area substrates
02/10/2009US7487739 Sublimation containment apparatus and method for developing latent fingerprints
02/05/2009WO2009017964A1 Atmospheric pressure plasma enhanced chemical vapor deposition process
02/05/2009WO2009017766A1 Method of coating semiconductor processing apparatus with protective yttrium-containing coatings
02/05/2009WO2009017322A1 Reactor for depositing thin film on wafer
02/05/2009WO2009017207A1 Electrophotographic photoreceptor, method for production thereof, and image-forming device
02/05/2009WO2009016870A1 Heat treatment apparatus and heat treatment method
02/05/2009WO2008156562A3 Showerhead electrode assemblies for plasma processing apparatuses
02/05/2009WO2008112673A3 Dynamic temperature backside gas control for improved within-substrate processing uniformity
02/05/2009WO2007131057A3 Vacuum processing chamber suitable for etching high aspect ratio features and components of same
02/05/2009WO2007109114A3 Self-supporting multilayer films having a diamond-like carbon layer
02/05/2009US20090035950 Nitriding method of gate oxide film
02/05/2009US20090035949 Method of depositing rare earth oxide thin films
02/05/2009US20090035947 Manufacturing Method of Semiconductor Device, and Substrate Processing Apparatus
02/05/2009US20090035946 In situ deposition of different metal-containing films using cyclopentadienyl metal precursors
02/05/2009US20090035941 Methods and apparatus for manufacturing a semiconductor device in a processing chamber
02/05/2009US20090035927 Method of forming dielectric layers on a substrate and apparatus therefor
02/05/2009US20090035877 Methods of forming a ferroelectric layer and methods of manufacturing a ferroelectric capacitor including the same
02/05/2009US20090035632 Solid oxide fuel cell electrode systems and methods
02/05/2009US20090035601 Zirconium modified protective coating
02/05/2009US20090035523 Surface-Modified Member, Surface-Treating Process and Apparatus Therefor
02/05/2009US20090035516 Organometallic precursor, thin film having the same, metal wiring including the thin film, method of forming a thin film and method of manufacturing a metal wiring using the same
02/05/2009US20090035484 Plasma processing method
02/05/2009US20090035483 generating plasma that includes ions of coating material to be deposited on surfaces of workpiece, securing using support, increasing ionization of said plasma within workpiece by applying hollow cathode techniques, including biasing and tuning pressure to induce oscillation of electrons
02/05/2009US20090035481 Process for diffusing titanium and nitride into a material having a coating thereon and products produced thereby
02/05/2009US20090035466 Ruthenium film formation method and computer readable storage medium
02/05/2009US20090035465 Chemical vaporizer for material deposition systems and associated methods
02/05/2009US20090035464 having a specific amino alcohol as a ligand containing hafnium metal; as a precursor in thin film formation involving vaporization, such as chemical vapor deposition and atomic layer deposition
02/05/2009US20090035463 Thermal processing system and method for forming an oxide layer on substrates
02/05/2009US20090035462 repeatability for rf mgo tmr barrier layer process by implementing ti pasting
02/05/2009US20090035341 Coating material
02/05/2009US20090032950 Film forming method, semiconductor device manufacturing method, semiconductor device, program and recording medium
02/05/2009US20090032191 High Density Plasma Source
02/05/2009US20090032143 Electron beam enhanced nitriding system
02/05/2009US20090032056 Contaminant removing method, contaminant removing mechanism, and vacuum thin film formation processing apparatus
02/05/2009US20090031957 High resolution substrate holder leveling device and method
02/05/2009US20090031956 Apparatus for decorating objects by sublimation
02/05/2009US20090031955 Vacuum chucking heater of axisymmetrical and uniform thermal profile
02/05/2009US20090031954 Susceptor and apparatus for manufacturing epitaxial wafer
02/05/2009US20090031953 Chemical vapor deposition of high quality flow-like silicon dioxide using a silicon containing precursor and atomic oxygen
02/05/2009US20090031947 Reactor
02/05/2009DE102007036796A1 Treating a pipe inner surface of a molded part such as plastic tube with reactive substances formed by combusting silanes in a separate combustion chamber, comprises guiding the formed reactive substances to the surface of the molded part
02/05/2009DE102007035736A1 Coating polyethylene terephthalate-preforms comprises hydrophilizing and ionizing preforms, coating preforms with agent and stretching, where preform is subjected, before/after coating, with hot water and agent is warmed before applying
02/05/2009DE102006023046B4 Verfahren und Ausgangsmaterial zum Bereitstellen eines gasförmigen Precursors Processes and starting material for providing a gaseous precursor
02/04/2009EP2020400A1 Amorphous carbon film, method for forming amorphous carbon film, electroconductive member comprising amorphous carbon film, and separator for fuel battery
02/04/2009EP1247292B1 Method of forming copper interconnections and thin films using chemical vapor deposition with catalyst
02/04/2009CN201190182Y Automatic loading trolleys by electro-magnetism vapor deposition method
02/04/2009CN201190181Y Multi-sheet movable electroplating carriage table of chemical vapor deposition system
02/04/2009CN101360846A Electrode and vacuum processing apparatus
02/04/2009CN101360845A Thin-film multilayer structure, component comprising said structure and its method of deposition
02/04/2009CN101359805A Growing method for epitaxial wafer of 780nm-850nm non-aluminum laser
02/04/2009CN101359614A Improved standard type bearing strip pinching tool
02/04/2009CN101359610A Method for detecting considerable wafer on vertical crystal boat
02/04/2009CN101359594A Semiconductor manufacture device, semiconductor manufacture method and electric machine
02/04/2009CN101359589A Composite material and wafer supporting member and manufacturing method thereof
02/04/2009CN101359588A Substrate processing apparatus, load-lock chamber unit, and method of carrying out a transfer device
02/04/2009CN101359586A Manufacturing method of semiconductor integrated circuit device
02/04/2009CN101359585A Apparatus for manufacturing thin-film laminated member
02/04/2009CN101359583A Plasma processing apparatus of batch type
02/04/2009CN101359579A Vacuum chamber for vacuum processing appartaus
02/04/2009CN101358356A Method for preparing high specific surface diamond electrode
02/04/2009CN101358338A Vacuum chucking heater of axisymmetrical and uniform thermal profile
02/04/2009CN101358337A Growth method of nonpolar GaN film
02/04/2009CN101358336A Multi-step dep-etch-dep high density plasma chemical vapor deposition processes for dielectric gapfills
02/04/2009CN101358335A Growth method of high homogeneity (In)GasP/(AlGa)0.5In0.5P epitaxial wafer