| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 02/19/2009 | WO2008152126A4 Device for coating substrates disposed on a susceptor |
| 02/19/2009 | WO2008151067A3 CHEMICAL VAPOR DEPOSITION OF CuInXGa1- X(SeyS1-y)2 THIN FILMS AND USES THEREOF |
| 02/19/2009 | WO2008146126A3 Reactor for growing crystals with cooled inlets |
| 02/19/2009 | WO2008142115A4 Device for coating a plurality of closest-packed substrates arranged on a susceptor |
| 02/19/2009 | WO2006137873A3 A chemical vapor deposition (cvd) apparatus usable in the manufacture of superconducting conductors |
| 02/19/2009 | US20090047778 Plasma oxidation method and method for manufacturing semiconductor device |
| 02/19/2009 | US20090047774 Plasma CVD apparatus, method for manufacturing microcrystalline semiconductor layer, and method for manufacturing thin film transistor |
| 02/19/2009 | US20090047528 Surface treatment method of aluminum extruding die, and aluminum extruding die |
| 02/19/2009 | US20090047520 Graphene hybrid material and method for preparing same using chemical vapor deposition |
| 02/19/2009 | US20090047510 Coated product and method of production thereof |
| 02/19/2009 | US20090047447 Method for removing surface deposits and passivating interior surfaces of the interior of a chemical vapor deposition reactor |
| 02/19/2009 | US20090047446 delivering a processing gas into a chemical vapor deposition chamber through a first gas pathway that includes flow through a first apertures in a blocker plate, reacting the gases to deposit a layer on a substrate, now a etching gas ( F2, CHCL3) is delivered through second aperture to etch the deposit |
| 02/19/2009 | US20090047429 Apparatus and Method for Deposition For Organic Thin Films |
| 02/19/2009 | US20090047428 Method for manufacturing carbon fibrous structures |
| 02/19/2009 | US20090047427 Ultrahigh vacuum process for the deposition of nanotubes and nanowires |
| 02/19/2009 | US20090047426 Deposition apparatus |
| 02/19/2009 | US20090047416 Method for forming thin films and apparatus therefor |
| 02/19/2009 | US20090046362 Roll to roll nanoimprint lithography |
| 02/19/2009 | US20090045531 Liquid substance supply device for vaporizing system, vaporizer, vaporization performance appraisal method |
| 02/19/2009 | US20090045517 Method for forming tungsten film, film-forming apparatus, storage medium and semiconductor device |
| 02/19/2009 | US20090044910 Plasma Processing Apparatus |
| 02/19/2009 | US20090044909 Plasma processing apparatus |
| 02/19/2009 | US20090044754 Suction device for plasma coating chamber |
| 02/19/2009 | US20090044752 Plasma processing apparatus, electrode temperature adjustment device and electrode temperature adjustment method |
| 02/19/2009 | US20090044751 Structure for preventing gap formation and plasma processing equipment having the same |
| 02/19/2009 | US20090044750 Apparatus for wafer level arc detection at an electrostatic chuck electrode |
| 02/19/2009 | US20090044749 Substrate processing apparatus |
| 02/19/2009 | US20090044748 System with multi-location arc threshold comparators and communication channels for carrying arc detection flags and threshold updating |
| 02/19/2009 | DE10197206B4 System und Verfahren zur Aufteilung einer Strömung System and method for allocating a flow |
| 02/18/2009 | EP2025775A1 Photon induced cleaning of a reaction chamber |
| 02/18/2009 | EP2024994A1 Method to prevent metal contamination by a substrate holder |
| 02/18/2009 | EP2024533A1 Method and apparatus for deposition using pulsed atmospheric pressure glow discharge |
| 02/18/2009 | EP2024532A2 Chemical vapor deposition of high quality flow-like silicon dioxide using a silicon containing precursor and atomic oxygen |
| 02/18/2009 | EP2024528A1 Multifunctional hard material layers |
| 02/18/2009 | EP2024428A1 Photochromatic effect for polycarbonate glazing applications |
| 02/18/2009 | EP2024291A2 Method of depositing zinc oxide coatings on a substrate |
| 02/18/2009 | EP2024104A2 Machine for plasma treatment of containers comprising an integrated vacuum circuit |
| 02/18/2009 | EP1570108B1 Susceptor system |
| 02/18/2009 | EP1118102B1 Low-pressure apparatus and pressure control valve |
| 02/18/2009 | CN201195747Y Flat-plate silicon nitride film PECVD deposition system |
| 02/18/2009 | CN201195746Y Device for lot manufacture of diamond coating drawing die |
| 02/18/2009 | CN101371341A Plasma processing apparatus |
| 02/18/2009 | CN101370992A Method for preventing metal leaching from copper and its alloys |
| 02/18/2009 | CN101370963A High temperature ald inlet manifold |
| 02/18/2009 | CN101370962A Methods and arrangement for a highly efficient gas distribution arrangement |
| 02/18/2009 | CN101369637A Organic el device and method of manufacturing the same |
| 02/18/2009 | CN101369527A Vacuum processor |
| 02/18/2009 | CN101368267A Plasma cvd apparatus, manufacture of microcrystalline semiconductor layer and thin film transistor |
| 02/18/2009 | CN101368266A Chemical vapor deposition apparatus for flat display |
| 02/18/2009 | CN101368265A Gas path system of apparatus for preparing gallium nitride thin film |
| 02/18/2009 | CN101368264A Organic electroluminescent device |
| 02/18/2009 | CN101367756A Tellurium (Te) precursor for manufacturing phase-change memory material |
| 02/18/2009 | CN100463112C Apparatus for semiconductor device |
| 02/18/2009 | CN100462478C Microwave plasma back-coating and re-coating method for CVD diamond coating cutter |
| 02/18/2009 | CN100462477C Method and apparatus for forming thin film |
| 02/18/2009 | CN100462476C Production of multifunctional gas-phase depositer and solid oxide fuel single cell |
| 02/18/2009 | CN100462475C Apparatus and method for plasma processing |
| 02/18/2009 | CN100462320C Preparation method of photo catalytic activation self cleaning product |
| 02/17/2009 | US7491913 Bake apparatus for use in spin-coating equipment |
| 02/17/2009 | US7491660 Method of forming nitride films with high compressive stress for improved PFET device performance |
| 02/17/2009 | US7491659 APCVD method of forming silicon oxide using an organic silane, oxidizing agent, and catalyst-formed hydrogen radical |
| 02/17/2009 | US7491649 Plasma processing apparatus |
| 02/17/2009 | US7491432 Ceramic substrate, one side thereof having wafer-retaining face having resistive heating element provided either superficially or interiorly in the substrate and a recess formed in wafer-retaining face with room to carry semiconductor manufacturing wafer |
| 02/17/2009 | US7491431 Dense coating formation by reactive deposition |
| 02/17/2009 | US7491429 Method and arrangement for generating an atmospheric pressure glow discharge plasma (APG) |
| 02/17/2009 | US7491421 Made by mixing nanometered graphite powder with bonding agent to form graphite mixture, grinding and processing mixture into graphite mass with high pressure by means of hot press, cold press and vibration, and dipping mass in liquid phase asphalt, baking, coating with metal to form heat sink |
| 02/12/2009 | WO2009021199A1 Production of bulk silicon carbide with hot-filament chemical vapor deposition |
| 02/12/2009 | WO2009020888A1 Strontium and barium precursors for use in chemical vapor deposition, atomic layer deposition and rapid vapor deposition |
| 02/12/2009 | WO2009020235A1 Group iii nitride semiconductor epitaxial substrate |
| 02/12/2009 | WO2009019417A1 Method of manufacturing a dye sensitized solar cell by atmospheric pressure atomic layer deposition (ald) |
| 02/12/2009 | WO2008156631A3 Reactive flow deposition and synthesis of inorganic foils |
| 02/12/2009 | WO2008145102A3 Method for coating a substrate |
| 02/12/2009 | WO2008100691A3 Vapor deposition methods for forming a metal- containing layer on a substrate |
| 02/12/2009 | WO2007127294A9 Exhaust system |
| 02/12/2009 | WO2006098792A3 High accuracy vapor generation and delivery for thin film deposition |
| 02/12/2009 | US20090043003 Inorganic mesoporous material having chiral twisted structure and process for producing the same |
| 02/12/2009 | US20090042406 Systems and methods for forming metal oxides using metal compounds containing aminosilane ligands |
| 02/12/2009 | US20090042404 Semiconductor processing |
| 02/12/2009 | US20090042394 Manufacturing method for wiring |
| 02/12/2009 | US20090042384 Semiconductor device manufacturing method and target substrate processing system |
| 02/12/2009 | US20090042321 Apparatus and method for plasma doping |
| 02/12/2009 | US20090042059 Method for producing a coated substrate body, substrate body comprising a coating and use of the coated substrate body |
| 02/12/2009 | US20090042054 Nb-si based alloys having an al-containing coating, articles, and processes |
| 02/12/2009 | US20090041950 Method and system for improving sidewall coverage in a deposition system |
| 02/12/2009 | US20090041936 Composite reflective barrier |
| 02/12/2009 | US20090041935 Method for causing particulate base material to carry alloy particle |
| 02/12/2009 | US20090041929 Film Forming Apparatus and Film Forming Method |
| 02/12/2009 | US20090041926 Coating and developing apparatus, substrate processing method and computer-readable recording medium |
| 02/12/2009 | US20090041925 System and Method for Endpoint Detection of a Process in a Chamber |
| 02/12/2009 | US20090041640 Plasma processing apparatus |
| 02/12/2009 | US20090041514 Intermediate transfer member, method of manufacturing intermediate transfer member, and image forming apparatus |
| 02/12/2009 | US20090040620 Disk structure, manufacturing method thereof and optical tweezers device using the same |
| 02/12/2009 | US20090039517 Chemical vapor deposition of titanium |
| 02/12/2009 | US20090039475 Apparatus and Method for Manufacturing Semiconductor |
| 02/12/2009 | US20090039415 Method of forming dielectric including dysprosium and scandium by atomic layer deposition and integrated circuit device including the dielectric layer |
| 02/12/2009 | US20090039266 Monitoring system comprising infrared thermopile detector |
| 02/12/2009 | US20090038934 Apparatus and method for diamond production |
| 02/12/2009 | US20090038549 Shaped crucible and evaporation apparatus having same |
| 02/12/2009 | US20090038548 Substrate treating apparatus and treating gas emitting mechanism |
| 02/12/2009 | DE102008035484A1 Plasmabehandlung beim Drucken Plasma treatment when printing |