| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 03/04/2009 | EP2031082A1 Metal substrate with crystallographic texture, crystallographic texture device, photovoltaic cell and module comprising such a device and method of depositing fine layers |
| 03/04/2009 | EP2030958A1 Polycrystalline monolithic magnesium aluminate spinels |
| 03/04/2009 | EP2030227A2 Methods and systems for selectively depositing si-containing films using chloropolysilanes |
| 03/04/2009 | EP2029792A2 Systems and methods for roll-to-roll atomic layer deposition on continuously fed objects |
| 03/04/2009 | EP2029791A2 Method of forming dielectric films, new precursors and their use in the semi-conductor manufacturing |
| 03/04/2009 | EP2029790A1 Method of forming high-k dielectric films based on novel titanium, zirconium, and hafnium precursors and their use for semiconductor manufacturing |
| 03/04/2009 | EP2029291A1 Method and device for treating the surfaces of containers and objects |
| 03/04/2009 | EP1878039B1 Plasma amplifier for plasma treatment plant |
| 03/04/2009 | EP1357583B1 Sheet-fed treating device |
| 03/04/2009 | EP1313891B1 Cvd coating device |
| 03/04/2009 | CN101379215A Protective coating of silver |
| 03/04/2009 | CN101379214A Epitaxial deposition process and apparatus |
| 03/04/2009 | CN101378030A Electrostatic chuck |
| 03/04/2009 | CN101378029A Dual-electrode electrostatic chuck |
| 03/04/2009 | CN101378028A Device for clamping wafer |
| 03/04/2009 | CN101378027A Electrostatic chuck |
| 03/04/2009 | CN101378007A Plasma processing apparatus |
| 03/04/2009 | CN101378003A Alternate gas delivery and evacuation system for plasma processing apparatuses |
| 03/04/2009 | CN101376968A Normal atmosphere plasma strip steel film coating process |
| 03/04/2009 | CN101376967A Organic metal compound supply container |
| 03/04/2009 | CN101376966A Novel electrode box |
| 03/04/2009 | CN100466162C Edge flow faceplate used for improving CVD film properties |
| 03/04/2009 | CN100465341C A forming method of copper for chrome-plating of printed circuit boards |
| 03/04/2009 | CN100465334C A preparation method of diamond film coating layer bearing supporters |
| 03/04/2009 | CN100465333C A cooling furnace wall for chemical vapor deposition high temperature furnaces |
| 03/04/2009 | CN100465116C A method for preparing layers and layer systems and coating substrates |
| 03/04/2009 | CN100464654C A method for making aluminum zippers with colorful galvanized coating |
| 03/03/2009 | US7499259 Capacitor with hafnium, lanthanum and oxygen mixed dielectric and method for fabricating the same |
| 03/03/2009 | US7498272 Method of depositing rare earth oxide thin films |
| 03/03/2009 | US7498089 First layer of a compound formed from Al and Cr and carbon, nitrogen, oxygen, and/or boron; second layer of a compound formed from a group IVb, group Vb, or a group VIb element, or Si and carbon, nitrogen, oxygen, and/or boron; at least one of the layers contains chlorine; wear resistance; drills |
| 03/03/2009 | US7498060 Method for controlling at nanometric scale the growth of thin films of conjugated organic molecules |
| 03/03/2009 | US7498059 Method for growing thin films |
| 03/03/2009 | US7498058 Substrates coated with a polycrystalline functional coating |
| 03/03/2009 | US7498057 Chemical vapor deposition, while the substrate is within the deposition chamber, emitting reactive purge gas to the chamber to form a reactive gas curtain over the chamber surface and away from the substrate, reacting with adhering deposits on the chamber walls |
| 03/03/2009 | US7497912 Substrate processing apparatus |
| 03/03/2009 | US7497420 Safe liquid source containers |
| 03/03/2009 | US7497221 Method for cleaning deposition chamber |
| 02/26/2009 | WO2009025362A1 Vaporizer, material gas supply system including vaporizer and film forming apparatus using such system |
| 02/26/2009 | WO2009024533A1 Apparatus and method for producing epitaxial layers |
| 02/26/2009 | WO2009024460A2 System and process for the continous vacuum coating of a material in web form |
| 02/26/2009 | WO2009009121A4 Movable injectors in rotating disc gas reactors |
| 02/26/2009 | WO2008154446A3 An apparatus for depositing a uniform silicon film and methods for manufacturing the same |
| 02/26/2009 | WO2008125969A3 Slabs of stone material, resistant to wear5 to corrosion caused by acids and to the staining action of oily substances. |
| 02/26/2009 | WO2008121478A3 Roll-to-roll plasma enhanced chemical vapor deposition method of barrier layers comprising silicon and carbon |
| 02/26/2009 | WO2008121173A3 Microwave plasma apparatus and method for materials processing |
| 02/26/2009 | WO2008009715A9 Method for depositing non-oxide ceramic coatings |
| 02/26/2009 | US20090054674 Mechanical Enhancement of Dense and Porous Organosilicate Materials by UV Exposure |
| 02/26/2009 | US20090054277 Sliding member and production process thereof |
| 02/26/2009 | US20090053902 Low dielectric (low k) barrier films with oxygen doping by plasma-enhanced chemical vapor deposition (pecvd) |
| 02/26/2009 | US20090053900 Processing Apparatus and Processing Method |
| 02/26/2009 | US20090053882 Krypton sputtering of thin tungsten layer for integrated circuits |
| 02/26/2009 | US20090053554 Thermal barrier coating system for thermal mechanical fatigue resistance |
| 02/26/2009 | US20090053526 Gas barrier laminate and production method of the same |
| 02/26/2009 | US20090053507 Convergent-divergent-convergent nozzle focusing of aerosol particles for micron-scale direct writing |
| 02/26/2009 | US20090053488 Organic electroluminescence device and method for producing organic electroluminescence device |
| 02/26/2009 | US20090053482 Method of reducing image fade |
| 02/26/2009 | US20090053413 Method of Densifying Porous Articles |
| 02/26/2009 | US20090050902 Semiconductor device having silicon carbide and conductive pathway interface |
| 02/26/2009 | US20090050272 Deposition ring and cover ring to extend process components life and performance for process chambers |
| 02/26/2009 | US20090050270 Sensors for dynamically detecting substrate breakage and misalignment of a moving substrate |
| 02/26/2009 | US20090050210 Methods for Operating Liquid Chemical Delivery Systems Having Recycling Elements |
| 02/26/2009 | US20090050059 Cathode evaporation machine |
| 02/26/2009 | US20090050058 Programmed high speed deposition of amorphous, nanocrystalline, microcrystalline, or polycrystalline materials having low intrinsic defect density |
| 02/26/2009 | US20090050057 Apparatus for continuous coating |
| 02/26/2009 | DE19982566B4 Einrichtung und Verfahren zum Bearbeiten eines Substrats Apparatus and method for processing a substrate |
| 02/26/2009 | DE19882883B4 System für die chemische Abscheidung aus der Gasphase zum Herstellen polykristalliner Siliziumstangen System for chemical deposition from the gas phase polycrystalline silicon rods for manufacturing |
| 02/26/2009 | DE112006003485T5 Vorrichtung zum Herstellen einer Halbleiterdünnschicht An apparatus for manufacturing a semiconductor thin film |
| 02/26/2009 | DE10206822B4 Vorrichtung zum Beschichten von Flaschen oder sonstigen Hohlkörpern Apparatus for coating bottles or other hollow bodies |
| 02/26/2009 | DE102007040098A1 Trägerfolie Support film |
| 02/26/2009 | DE10119766B4 RF Plasma Reaktor RF plasma reactor |
| 02/26/2009 | CA2703499A1 Apparatus and method for producing epitaxial layers |
| 02/25/2009 | EP2027304A2 Method of forming a layer of material using an atomic layer deposition process |
| 02/25/2009 | EP2027303A1 Methods for preparation of high-purity polysilicon rods using a metallic core means |
| 02/25/2009 | EP1904665B1 Improved support structure for radiative heat transfer |
| 02/25/2009 | EP1633903A4 Hydrophilic dlc on substrate with oxygen and/or hot water treatment |
| 02/25/2009 | EP1340269B1 Thin films for magnetic devices |
| 02/25/2009 | EP1187187B1 Plasma processing apparatus |
| 02/25/2009 | CN101375377A Plasma reactor with a dynamically adjustable plasma source power applicator |
| 02/25/2009 | CN101374973A Substrate processing apparatus and substrate placing table |
| 02/25/2009 | CN101373731A Electrostatic chuck apparatus and temperature control method thereof |
| 02/25/2009 | CN101373707A Processing device |
| 02/25/2009 | CN101373703A Cap-opening mechanism and semiconductor processing device and cap-opening control method thereof |
| 02/25/2009 | CN101373702A Cavity inner lining and reaction cavity |
| 02/25/2009 | CN101372739A Method for removing metal impurity from quartz component part used in heat processing apparatus of batch type |
| 02/25/2009 | CN101371958A Exhaust gas collection device |
| 02/25/2009 | CN100464395C Process for film production and semiconductor device utilizing film produced by the process |
| 02/24/2009 | US7496255 Radiation-transmissive films on glass articles |
| 02/24/2009 | US7494941 Manufacturing method of semiconductor device, and substrate processing apparatus |
| 02/24/2009 | US7494908 Apparatus for integration of barrier layer and seed layer |
| 02/24/2009 | US7494628 F2 abatement is efficiently performed by directly injecting H2 in line with a foreline exiting the processing chamber; tube which is highly resistant to oxidation and corrosive gases, even at high temperature, is connected in line with the foreline as part of the exhaust line of the processing chamber |
| 02/24/2009 | US7494562 Vapor phase growth apparatus |
| 02/24/2009 | US7494561 Plasma processing apparatus and method, and electrode plate for plasma processing apparatus |
| 02/24/2009 | US7494560 Non-plasma reaction apparatus and method |
| 02/24/2009 | US7493869 Very large area/volume microwave ECR plasma and ion source |
| 02/19/2009 | WO2009022582A1 Temperature control device and temperature control method |
| 02/19/2009 | WO2009022526A1 Biodegradable resin container having deposited film, and method for formation of deposited film |
| 02/19/2009 | WO2009021340A1 Method for producing a metal-oxide-coated workpiece surface with predeterminable hydrophobic behaviour |
| 02/19/2009 | WO2009003206A3 Al-Ti-Ru-N-C HARD MATERIAL COATING |
| 02/19/2009 | WO2009002028A3 Method and apparatus for depositing thin film |
| 02/19/2009 | WO2008156958A3 Electrode assembly and plasma processing chamber utilizing thermally conductive gasket and o-rings |