Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
03/2009
03/12/2009DE102007042833A1 Strahlbehandelter Schneideinsatz und Verfahren Beam-treated cutting insert and methods
03/12/2009DE102007040655A1 Functional layer transfer assembly, useful in the manufacture and transfer of the functional layer, comprises a carrier, a functional layer and a separating layer, which is between the carrier and functional layer
03/12/2009DE10064067B4 Verfahren zur Herstellung eines Kondensators einer Halbleitereinrichtung A method for manufacturing a capacitor of a semiconductor device
03/11/2009EP2034048A1 Heating apparatus
03/11/2009EP2034047A1 Vaporizer/supplier of material and automatic pressure regulator for use therein
03/11/2009EP2034046A2 Improved cleaning of plasma chamber walls by adding of noble gas cleaning step
03/11/2009EP2034045A2 Reduction of etch-rate drift in HDP processes
03/11/2009EP2034044A2 Impurity control in HDP-CVD DEP/ETCH/DEP processes
03/11/2009EP2033214A2 A method for depositing and curing low-k films for gapfill and conformal film applications
03/11/2009EP2033213A2 Compressive nitride film and method of manufacturing thereof
03/11/2009EP2032738A1 Method and apparatus for atomic layer deposition using an atmospheric pressure glow discharge plasma
03/11/2009EP2032737A2 Batch processing chamber with diffuser plate and injector assembly
03/11/2009EP2032529A1 Metal(iv) tetra-amidinate compounds and their use in vapor deposition
03/11/2009EP2032390A1 A method of depositing an abrasion-resistant layer onto an electroluminescent plastic window
03/11/2009EP2032244A1 System and method for delivery of precursor material
03/11/2009EP1649520A4 Method for manufacturing absorber layers for solar cell
03/11/2009EP1397830A4 Copper vias in low-k technology
03/11/2009EP1325170A4 Fabrication of high current coated high temperature superconducting tapes
03/11/2009EP1320879A4 System and method for cleaning semiconductor fabrication equipment parts
03/11/2009EP1090159B1 Deposition of coatings using an atmospheric pressure plasma jet
03/11/2009CN101385129A Microwave plasma source and plasma processing apparatus
03/11/2009CN101384749A Film precursor evaporation system and method of using
03/11/2009CN101384748A Deposition process
03/11/2009CN101384747A Dual mode ion source for ion implantation
03/11/2009CN101384336A Method of making hcd gas harmless and apparatus therefor
03/11/2009CN101383314A Substrate table substrate processing apparatus and temperature control method
03/11/2009CN101381864A Method for improving stability of chemical vapour deposition technique
03/11/2009CN101381863A Source gas supply device
03/11/2009CN101381862A Device for controlling treatment of gas flow in treatment chamber
03/11/2009CN101381861A Film formation method
03/11/2009CN100468965C LiNbO3/ZnO/diamond multi-layered film structure surface acoustic wave device and its preparing method
03/11/2009CN100468809C Method and apparatus for manufacturing luminant device
03/11/2009CN100468654C Light irradiation heat treatment method and light irradiation heat treatment apparatus
03/11/2009CN100468648C Atomic layer deposition of high k metal oxide
03/11/2009CN100468631C Susceptor
03/11/2009CN100467988C System and method for controlling movement of a workpiece in a thermal processing system
03/11/2009CN100467665C Container internal surface chemical vapor depositon coating method
03/11/2009CN100467664C Method for manufacturing diamond-like film and part with coating manufactured thereby
03/11/2009CN100467663C Device and method for surface treatment of hollow cathode plasma in inner surface of slimline
03/10/2009USRE40647 Method of producing plasma display panel with protective layer of an alkaline earth oxide
03/10/2009US7501370 Producing devices for semiconductor wafer fabrication; molding powder material, sintering, strong acid washing and oxidation treatment; reducing or eliminating iron, copper, nickel and chromium content
03/10/2009US7501344 Formation of boride barrier layers using chemisorption techniques
03/10/2009US7501343 Formation of boride barrier layers using chemisorption techniques
03/10/2009US7501293 Semiconductor device in which zinc oxide is used as a semiconductor material and method for manufacturing the semiconductor device
03/10/2009US7501191 Atomic layer deposition; for use in semiconductors, dynamic random access memory (DRAM)
03/10/2009US7501187 Thermal barrier coating method and article
03/10/2009US7501161 Placing a substrate on a substrate holder of a plasma chamber; positioning a cover frame adjacent and below a perimeter of the substrate; employing the cover frame to reduce arcing during plasma processing within the plasma chamber; display and/or semiconductor device manufacturing
03/10/2009US7501155 producing phosphor or scintillator plates or panels, the layer thickness is constant over large surface areas, panels produced on very large flexible substrates which are cut into size and protected against physical, chemical or mechanical damage, high energy radiation detection and imaging, radiography
03/10/2009US7501154 Surface modification of CVD polymer films
03/10/2009US7501153 Iron tertiaryaminoalkyl alcohol; iron bismuth oxide chemical vapor deposition; easily adjusted decomposition behavior
03/10/2009US7501152 Delivering particulate material to a vaporization zone
03/10/2009US7501151 Delivering particulate material to a vaporization zone
03/10/2009US7500445 Method and apparatus for cleaning a CVD chamber
03/10/2009CA2294658C Lamp reflector with a barrier coating of a plasma polymer
03/05/2009WO2009029942A2 Mechanically integrated and closely coupled print head and mist source
03/05/2009WO2009029939A2 Aerosol jet® printing system for photovoltaic applications
03/05/2009WO2009029938A2 Apparatus for anisotropic focusing
03/05/2009WO2009028974A1 Method for the production of semiconductor ribbons from a gaseous feedstock
03/05/2009WO2009028619A1 Treating-gas supply system and treating apparatus
03/05/2009WO2009028376A1 Top panel and plasma processing apparatus
03/05/2009WO2009028314A1 Semiconductor device manufacturing method
03/05/2009WO2009028308A1 Diamond thin-film laminate
03/05/2009WO2009028084A1 Apparatus for generating dielectric barrier discharge gas
03/05/2009WO2009009272A3 Conformal doping using high neutral plasma implant
03/05/2009WO2009006072A3 Methods and arrangements for plasma processing system with tunable capacitance
03/05/2009WO2008017880A9 Apparatus for conveying a waste stream
03/05/2009WO2007120776A8 Plasma deposition apparatus and method for making solar cells
03/05/2009US20090061651 Substrate processing apparatus and method for manufacturing semiconductor device
03/05/2009US20090061536 Si/Si3N4 SYSTEM NANOSIZED PARTICLES, BIOSUBSTANCE LABELING AGENT EMPLOYING THE NANOSIZED PARTICLES, AND METHOD OF MANUFACTURING THE NANOSIZED PARTICLES
03/05/2009US20090061254 Polycrystalline monolithic magnesium aluminate spinels
03/05/2009US20090061217 Nanostructure production methods and apparatus
03/05/2009US20090061208 Carbon nanotube composite preform and method for making the same
03/05/2009US20090061184 Processes for Applying a Conversion Coating with Conductive Additive(S) and the Resultant Coated Articles
03/05/2009US20090061156 Multifunctional hard material coating
03/05/2009US20090061111 Apparatus for manufacturing gas barrier plastic container, method for manufacturing the container, and the container
03/05/2009US20090061110 Process for treating a surface
03/05/2009US20090061092 Film forming method and film forming apparatus
03/05/2009US20090061091 Alumina layer with enhanced texture
03/05/2009US20090061090 Vapor deposition apparatus for an organic vapor deposition material and a method for producing an organic film
03/05/2009US20090061089 Mechanically Integrated and Closely Coupled Print Head and Mist Source
03/05/2009US20090061088 Method and device for producing and processing layers of substrates under a defined processing atmosphere
03/05/2009US20090061087 Combinatorial process system
03/05/2009US20090061086 Coating systems containing rhodium aluminide-based layers
03/05/2009US20090061085 Expedited manufacture of carbon-carbon composite brake discs
03/05/2009US20090061084 Vapor deposition system and vapor deposition method
03/05/2009US20090061083 Vapor based combinatorial processing
03/05/2009US20090061074 Technology of detecting abnormal operation of plasma process
03/05/2009US20090060820 Method for producing trichlorosilane and method for producing polycrystalline silicon
03/05/2009US20090056991 Methods of Treating a Surface to Promote Binding of Molecule(s) of Interest, Coatings and Devices Formed Therefrom
03/05/2009US20090056877 Plasma processing apparatus
03/05/2009US20090056876 Work Processing System and Plasma Generating Apparatus
03/05/2009US20090056631 Apparatus for manufacturing semiconductor layer
03/05/2009US20090056630 Workpiece support system and method
03/05/2009US20090056629 Cathode liner with wafer edge gas injection in a plasma reactor chamber
03/05/2009US20090056628 Process and apparatus for forming nanoparticles using radiofrequency plasmas
03/05/2009US20090056626 Apparatus for cyclical depositing of thin films
03/05/2009DE102004013626B4 Verfahren und Vorrichtung zur Abscheidung dünner Schichten Method and device for depositing thin layers
03/04/2009EP2031606A1 Superconducting thin film material and method for producing the same
03/04/2009EP2031091A1 Protective coating applied to metallic reactor components to reduce corrosion products released into a nuclear reactor environment
03/04/2009EP2031088A2 Wet clean process for recovery of chamber parts