| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 03/31/2009 | US7511327 Capacitive electrode having semiconductor layers with an interface of separated grain boundaries |
| 03/31/2009 | US7511206 Carbon nanotubes and method of manufacturing same, electron emission source, and display |
| 03/31/2009 | US7510901 Conveyor device and film formation apparatus for a flexible substrate |
| 03/31/2009 | US7510742 Multilayered boron nitride/silicon nitride fiber coatings |
| 03/31/2009 | US7510664 Apparatus and method for atmospheric pressure reactive atom plasma processing for shaping of damage free surfaces |
| 03/31/2009 | US7510624 Self-cooling gas delivery apparatus under high vacuum for high density plasma applications |
| 03/26/2009 | WO2009039343A1 Pecvd process chamber with cooled backing plate |
| 03/26/2009 | WO2009039216A1 Neutral ligand containing precursors and methods for deposition of a metal containing film |
| 03/26/2009 | WO2009039187A1 Tellurium precursors for gst film deposition |
| 03/26/2009 | WO2009038193A1 Carbon material and method for producing the same |
| 03/26/2009 | WO2009038168A1 Film forming apparatus and film forming method |
| 03/26/2009 | WO2009037991A1 Cleaning method and substrate processing apparatus |
| 03/26/2009 | WO2009037930A1 Vaporization apparatus, film forming apparatus, film forming method, computer program and storage medium |
| 03/26/2009 | WO2009037814A1 Photovoltaic element and its manufacturing method |
| 03/26/2009 | WO2009037397A1 Method for preparation of a nanocomposite material by vapour phase chemical deposition |
| 03/26/2009 | WO2009037331A1 A method for stable hydrophilicity enhancement of a substrate by atmospheric pressure plasma deposition |
| 03/26/2009 | WO2009037073A1 Method for the transparent coating of a substrate with plasma at atmospheric pressure |
| 03/26/2009 | WO2009036776A1 Corrosion-resistant pressure vessel steel product, a process for the production thereof and a gas turbine component |
| 03/26/2009 | WO2005054537A3 System and method for forming multi-component films |
| 03/26/2009 | WO2004065294A3 Systems and methods for producing single-walled carbon nanotubes (swnts) on a substrate |
| 03/26/2009 | US20090081887 Heat treatment method and heat treatment apparatus |
| 03/26/2009 | US20090081886 System for thin film deposition utilizing compensating forces |
| 03/26/2009 | US20090081885 Deposition system for thin film formation |
| 03/26/2009 | US20090081853 Process for depositing layers containing silicon and germanium |
| 03/26/2009 | US20090081827 Process for selective area deposition of inorganic materials |
| 03/26/2009 | US20090081819 Method and apparatus for managing manufacturing equipment, method for manufacturing device thereby |
| 03/26/2009 | US20090081425 Precious metal jewelry and process for producing the same |
| 03/26/2009 | US20090081415 Controlled alignment of catalytically grown nanostructures in a large-scale synthesis process |
| 03/26/2009 | US20090081383 Carbon Nanotube Infused Composites via Plasma Processing |
| 03/26/2009 | US20090081382 Plasma Processing Plant |
| 03/26/2009 | US20090081380 Reactor for polycrystalline silicon and polycrystalline silicon production method |
| 03/26/2009 | US20090081366 Delivery device for deposition |
| 03/26/2009 | US20090081365 Deposition apparatus for temperature sensitive materials |
| 03/26/2009 | US20090081364 Evaporation apparatus |
| 03/26/2009 | US20090079797 Liquid ejection head, liquid ejection apparatus and method of manufacturing liquid ejection head |
| 03/26/2009 | US20090079016 Method for forming a dielectric stack |
| 03/26/2009 | US20090078375 Plasma Processing Apparatus And Method |
| 03/26/2009 | US20090078374 Apparatus and methods for transporting and processing substrates |
| 03/26/2009 | US20090078326 Light-driven microfluidic devices and amplification of stimulus-induced wetting |
| 03/26/2009 | US20090078204 Deposition system for thin film formation |
| 03/26/2009 | US20090078203 Hot source |
| 03/26/2009 | US20090078201 Vertical plasma processing apparatus for semiconductor process |
| 03/26/2009 | US20090078200 Apparatus for manufacturing flat-panel display |
| 03/26/2009 | US20090078199 Plasma enhanced chemical vapor deposition apparatus |
| 03/26/2009 | US20090078123 Trap device |
| 03/25/2009 | EP2039800A2 Plasma treatment facility |
| 03/25/2009 | EP2039799A1 Film forming apparatus and barrier film manufacturing method |
| 03/25/2009 | EP2000562A9 Electrode and vacuum processing apparatus |
| 03/25/2009 | EP1907601B1 Apparatus for plasma-enhanced chemical vapour deposition (pecvd) of an internal barrier layer on a container |
| 03/25/2009 | EP1618225A4 Porous materials functionalized by vacuum deposition |
| 03/25/2009 | EP1491255A4 Method for carrying out homogeneous and heterogeneous chemical reactions using plasma |
| 03/25/2009 | EP1412550B1 Support with getter-material for micromechanical device |
| 03/25/2009 | CN101395298A Method of densifying porous articles |
| 03/25/2009 | CN101395297A Methods of depositing ruthenium film and memory medium readable by computer |
| 03/25/2009 | CN101395246A Beam detecting member and beam detector using it |
| 03/25/2009 | CN101393869A Forming method for silicon nitride film and contact etching stop layer |
| 03/25/2009 | CN101393854A Forming method for thin-film |
| 03/25/2009 | CN101392369A Door closure device and vacuum device with door closure device |
| 03/25/2009 | CN101392368A Plasma treatment facility and plasma treatment method for bottle |
| 03/25/2009 | CN101392367A Semiconductor processing parts having apertures with deposited coatings and methods for forming the same |
| 03/25/2009 | CN101392366A Method for preparing rapid chemical vapor infiltration of carbon/carbon composite material flat plate |
| 03/25/2009 | CN101392365A Disposal method of residual gas in reaction chamber |
| 03/25/2009 | CN101392364A Pre-cleaning method of reactive system |
| 03/25/2009 | CN100472760C Forming a plurality of thin-film devices |
| 03/25/2009 | CN100472724C Method for depositing metal layers using sequential flow deposition |
| 03/25/2009 | CN100472718C Free-standing substrate, manufacturing method thereof and semiconductor light-emitting device |
| 03/25/2009 | CN100471993C Apparatus for treating surfaces of a substrate with atmospheric pressure plasma |
| 03/25/2009 | CN100471992C Semiconductor manufacture reactor |
| 03/25/2009 | CN100471991C Silicon-containing layer deposition with silicon compounds |
| 03/25/2009 | CN100471990C Film forming method and film forming device using plasma CVD |
| 03/25/2009 | CN100471984C Method of depositing a material layer |
| 03/24/2009 | US7507848 Vapor deposition of metal oxides, silicates and phosphates, and silicon dioxide |
| 03/24/2009 | US7507660 Deposition processes for tungsten-containing barrier layers |
| 03/24/2009 | US7507442 Heat treatable coated article with diamond-like carbon (DLC) and/or zirconium in coating |
| 03/24/2009 | US7507441 vapor depositing a first layer on at least a portion of substrate, then depositing a second layer over the first layer, each layer has different density, having a density gradient; forming a multilayer thin films on electronics and electrooptics; applying yttria*zirconia on silicon semiconductors |
| 03/24/2009 | US7507390 integrated circuit formed by chemical vapor deposition from organophosphorus metal complexes of manganese, technetium, rhenium, iron, cobalt, nickel, ruthenium, rhodium, palladium, osmium, iridium or platinum, particularly as silicides |
| 03/24/2009 | US7506654 Accelerated plasma clean |
| 03/24/2009 | US7506610 Plasma processing apparatus and method |
| 03/24/2009 | US7506609 System for generating a local electron-cyclotron microwave low-pressure plasma at a predetermined location within a processing chamber |
| 03/24/2009 | US7506440 treating a titanium gas turbine engine component. The method includes providing a gas turbine engine component having a titanium-containing surface. The component is heated to a temperature sufficient to diffuse carbon into the titanium and below |
| 03/19/2009 | WO2009036046A1 Methods of preparing thin films by atomic layer deposition using monocyclopentadienyl trialkoxy hafnium and zirconium precursors |
| 03/19/2009 | WO2009036045A1 Methods of preparing titanium containing thin films by atomic layer deposition using monocyclopentadienyl titanium-based precursors |
| 03/19/2009 | WO2009035405A1 Cvd coated cutting tool insert for milling |
| 03/19/2009 | WO2009035393A1 Connecting and bonding adjacent layers with nanostructures |
| 03/19/2009 | WO2009035095A1 EPITAXIAL SiC SINGLE CRYSTAL SUBSTRATE AND METHOD FOR MANUFACTURING EPITAXIAL SiC SINGLE CRYSTAL SUBSTRATE |
| 03/19/2009 | WO2009034898A1 Film forming apparatus and film forming method |
| 03/19/2009 | WO2009034895A1 Substrate placing mechanism and substrate processing apparatus |
| 03/19/2009 | WO2009034893A1 Substrate placing mechanism, substrate processing apparatus, method for suppressing film deposition on substrate placing mechanism, and storage medium |
| 03/19/2009 | WO2009034869A1 Vacuum processing system and substrate transfer method |
| 03/19/2009 | WO2009034865A1 Exhaust system structure of film forming apparatus, film forming apparatus and method of disposing of exhaust gas |
| 03/19/2009 | WO2009034822A1 Substrate processing apparatus, method for suppressing contamination of substrate processing apparatus, and storage medium |
| 03/19/2009 | WO2009034716A1 Composite material and coated cutting tool |
| 03/19/2009 | WO2009034359A1 Coatings to resist and protect against aquatic biofouling |
| 03/19/2009 | WO2009034036A1 Jet-treated cutting insert and method |
| 03/19/2009 | WO2009014741A3 A plasma processing method for forming a film and an electronic component manufactured by the method |
| 03/19/2009 | WO2009007448A3 Magnetron co-sputtering device |
| 03/19/2009 | WO2008155087A3 Plasma reactor, and method for the production of monocrystalline diamond layers |
| 03/19/2009 | WO2008073750A3 Technique for atomic layer deposition |
| 03/19/2009 | WO2008057625A3 Systems and methods for roll-to-roll atomic layer deposition on continuously fed objects |
| 03/19/2009 | WO2007131057A4 Vacuum processing chamber suitable for etching high aspect ratio features and components of same |