Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
04/2009
04/15/2009CN100478489C Deposit film and its producing method
04/14/2009US7518007 Ge precursor, GST thin layer formed using the same, phase-change memory device including the GST thin layer, and method of manufacturing the GST thin layer
04/14/2009US7517803 Silicon parts having reduced metallic impurity concentration for plasma reaction chambers
04/14/2009US7517800 Chemical vapor deposition of a titanium nitride film from a titanium halide and ammonia at 300-450 degrees C; annealing; purging the ammonia; and repeating the steps at least once; supressed generation of irregularly grown objects in the film
04/14/2009US7517562 Placing a substrate on a susceptor including a center pin for lifting the substrate; energizing an electrode to applying a uniform electric field to the substrate; grounding the center pin; and forming a film on the substrate by chemical vapor deposition; uniform thickness
04/14/2009US7517558 Controlling placement of nanoparticles by positioning a mask having funnel-like openings between a dusty plasma of carbon nanotubes and desired target and extinguishing the plasma; the nanotubes fall on the target through the mask pattern; parallel spaced-apart conductive plates count exiting nanotubes
04/14/2009US7517557 Oxide films, a method of producing the same and structures having the same
04/14/2009US7517551 Method of manufacturing a light-emitting device
04/14/2009US7517443 Tin plating electrolyte composition and method for electroplating surfaces with tin
04/14/2009US7517430 Method and apparatus for the controlled formation of cavitation bubbles
04/14/2009US7517141 Simultaneous control of deposition time and temperature of multi-zone furnaces
04/09/2009WO2009046418A1 Chemical vapor deposition (cvd) polymerization onto nucleophilic surfaces
04/09/2009WO2009045947A1 Wafer processing hardware for epitaxial deposition with reduced backside deposition and defects
04/09/2009WO2009045740A2 Method for depositing films using gas cluster ion beam processing
04/09/2009WO2009045155A1 A new product and method for its manufacture within material processing
04/09/2009WO2009044882A1 Isotope diamond laminate
04/09/2009WO2009006072A4 Methods and arrangements for plasma processing system with tunable capacitance
04/09/2009WO2008145102A4 Method for coating a substrate
04/09/2009WO2008057616A3 Antimony and germanium complexes useful for cvd/ald of metal thin films
04/09/2009WO2008027086A8 Method of making a low-resistivity, doped zinc oxide coated glass article and the coated glass article made thereby
04/09/2009WO2008010943A3 Hybrid rf capacitively and inductively coupled plasma source using multifrequency rf powers and methods of use thereof
04/09/2009WO2007041041A3 Bonded multi-layer rf window
04/09/2009WO2006127037A3 Atmospheric pressure processing using microwave-generated plasmas
04/09/2009WO2006091448A3 Chemical vapor deposition reactor having multiple inlets
04/09/2009WO2006078286A3 Patterning carbon nanotube coatings by selective chemical modification
04/09/2009WO2006069256A3 Integrated thermal unit
04/09/2009WO2006039503A3 Method and apparatus for low temperature dielectric for deposition using monomolecular precursors
04/09/2009WO2006001840A3 System and method for quality testing of superconductivity tape
04/09/2009WO2005121038A3 Coating for glass molding dies and forming tools
04/09/2009US20090093130 Silicon oxycarbide, growth method of silicon oxycarbide layer, semiconductor device and manufacture method for semiconductor device
04/09/2009US20090092844 Method and apparatus for lightning protection of a composite structure
04/09/2009US20090092826 Process for the vapor phase aluminization of a turbomachine metal part and donor liner and turbomachine vane comprising such a liner
04/09/2009US20090092763 Method and Device for Testing the Quality of a Metallic Coating
04/09/2009US20090092754 Film formation method, mask for film formation and film formation device
04/09/2009US20090092744 Roll to Roll Evaporation Tool for Solar Absorber Precursor Formation
04/09/2009US20090091337 Carbon film composite, method of manufacturing a carbon film composite and sensor made therewith
04/09/2009US20090091260 Protective layer, method of manufacturing the same, and plasma display panel including the same
04/09/2009US20090090301 Compensation plate used in a film coating device
04/09/2009DE10230164B4 Verfahren zur Herstellung eines Körpers für einen Induktionsmagneten zur Verwendung bei der Erzeugung eines hoch-dichten Plasmas sowie Halbleiterherstellungsgrät, das einen nach diesem Verfahren hergestellten Induktionsmagneten verwendet A method of producing a body for an induction magnet for use in generating a high-density plasma and Halbleiterherstellungsgrät that uses an induction magnet manufactured according to this method
04/09/2009DE102007043333A1 Method for the treatment and defect detection of cavity, hollow body or capillary of components e.g. catheters, comprises producing primary plasma beam in primary plasma source, and passing noble gas e.g. argon through the components
04/08/2009EP2045358A2 Reducing the consumption of process gases during chemical gas phase separation of silicon layers during which hydrogen is produced in addition to the separating layer as a reaction product
04/08/2009EP2045357A1 Method of forming silicon nitride films
04/08/2009EP2045356A1 Method of forming silicon nitride films
04/08/2009EP2045355A1 Gas-barrier film and organic device comprising same
04/08/2009EP2045354A1 Method for aluminising the hollow metal parts of a turbomachine in vapour phase
04/08/2009EP2045351A1 Method and plant for simultaneously coating internal and external surfaces of metal elements, in particular blades for turbines
04/08/2009EP2044623A2 Method and system for isolated and discretized process sequence integration
04/08/2009EP2044618A2 Batch processing platform for ald and cvd
04/08/2009EP2044240A2 Method for applying a coating material and coating for a metallic surface
04/08/2009EP2044238A2 System and method for deposition of a material on a substrate
04/08/2009EP2043781A1 Arrangement comprising nanoparticles, and method for the production thereof
04/08/2009EP2001062A9 Membrane structure element and method for manufacturing same
04/08/2009EP1841897B1 Member for cavitation erosion resistance and method for manufacturing same
04/08/2009EP1831424B1 Method for fabricating an ultra hydrophilic ti-o-c based nano film
04/08/2009EP1779419A4 Direct liquid injection system and method for forming multi-component dielectric films
04/08/2009CN201217693Y Clamp mechanical device of back plate for placing in PECVD cavity
04/08/2009CN101405845A Surface processing apparatus
04/08/2009CN101405433A Method and apparatus for reducing particle contamination in a deposition system
04/08/2009CN101405431A Notched deposition ring
04/08/2009CN101404249A Method for preparing silicon carbide epitaxial layer without step appearance
04/08/2009CN101403109A Radio frequency electrode discharging apparatus
04/08/2009CN101403108A Chemical vapor deposition reactor and chemical vapor deposition method
04/08/2009CN101403107A Cyclopentene as a precursor for carbon-based films
04/08/2009CN101403106A Technique for producing high-insulativity SiO2 film
04/08/2009CN101403105A Preparation method for carbon-coating nickel nano-particle reinforced silver-based composite material
04/08/2009CN101403104A Apparatus for injection of gas and method for generating in situ doping polysilicon by using the apparatus
04/08/2009CN101403103A Method for aluminising the hollow metal parts of a turbomachine in vapour phase
04/08/2009CN101403079A Method of manufacturing carbon/carbon-copper composite material
04/08/2009CN101403078A Method of manufacturing carbon/carbon-copper composite material
04/08/2009CN101402147A Coated cutting insert for milling applications
04/08/2009CN100477295C Method for processing surface oxidation film of mercury cadmium telluride film material
04/08/2009CN100477119C Film forming method, semiconductor device manufacturing method, semiconductor device and film forming device
04/08/2009CN100477116C Method and apparatus for forming silicon oxide film
04/08/2009CN100477115C Method and system for forming graded dielectric films on lower cushion
04/08/2009CN100477113C Method for producing material of electronic device
04/08/2009CN100477112C Methods of forming deuterated silicon nitride-containing materials
04/08/2009CN100477108C Film forming method and film forming apparatus
04/08/2009CN100477105C Substrate processor and method for manufacturing device
04/08/2009CN100477097C Film-forming method
04/08/2009CN100477091C Processor
04/08/2009CN100477089C Crystal growing method for single-crystal gallium nitride
04/08/2009CN100477088C Vapor phase growing device
04/08/2009CN100477087C Loading table and heat treating apparatus having the loading table
04/08/2009CN100477078C Substrate processing apparatus and substrate processing method
04/08/2009CN100477020C Superconducting wire and production method thereof
04/08/2009CN100476045C Gallium-nitride metal organic-matter chemical gas-phase depositing apparatus for super-high vertical reactor
04/08/2009CN100476037C Film-forming apparatus component and method for cleaning same
04/08/2009CN100476023C Method for preparing semiconductor material on diamond surface by using arc discharge plasma chemical gas phase precipitation method
04/08/2009CN100476022C Method for preparing bilaminar composite film of aluminum / hydrogenized amorphous silicon carbon alloy
04/08/2009CN100476021C Method to deposit an impermeable film onto a porous low-K dielectric film
04/08/2009CN100476020C Active atom beam spraying DC discharging process for preparing nano carbon nitride film
04/08/2009CN100476015C Component for film forming device and method of washing the component
04/08/2009CN100475472C Honeycomb structural body forming ferrule, and method of manufacturing
04/08/2009CN100475315C Gas supplying method and system
04/07/2009US7514358 Sequential deposition of tantalum nitride using a tantalum-containing precursor and a nitrogen-containing precursor
04/07/2009US7514342 Method and apparatus for forming deposited film
04/07/2009US7514120 Titanium nitride film; titanium chloride precursor; ammonia reducing agent; oxygen, water, oxidants; thermal CVD means forming a film by thermochemical reaction without using a plasma
04/07/2009US7514119 Method and apparatus for using solution based precursors for atomic layer deposition
04/07/2009US7514116 Horizontal Carbon Nanotubes by Vertical Growth and Rolling
04/07/2009US7514114 Printing large-area electronics on a substrate that detects failure of a primary ejector by inducing the ejector to periodically print test patterns in remote test areas, and analyzing the test patterns to identify failure; a second ejector overprints unsuccessful pattern printings