Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
04/2009
04/07/2009US7514015 Method for surface cleaning
04/07/2009US7513971 Flat style coil for improved precision etch uniformity
04/07/2009US7513961 High strength alloys and methods for making same
04/07/2009US7513954 Plasma processing apparatus and substrate mounting table employed therein
04/07/2009US7513953 Continuous system for depositing films onto plastic bottles and method
04/07/2009US7513215 Systems and methods for the production of highly tetrahedral amorphous carbon coatings
04/07/2009US7513214 Plasma processing method and apparatus
04/07/2009US7513063 Substrate processing apparatus
04/03/2009CA2640224A1 Vapour phase aluminizing process for a metal turbine engine part and donor liner and turbine engine blade with such liner
04/03/2009CA2640209A1 Vapour phase aluminizing process on hollow metal turbine engine parts
04/02/2009WO2009042636A2 Method of preparing cross-linked organic glasses for air-gap sacrificial layers
04/02/2009WO2009042147A1 Process and deposition system for thin film formation with gas delivery head having spatial separation of reactive gases and movement of the substrate passed the delivery head
04/02/2009WO2009042146A1 Deposition system for thin film formation
04/02/2009WO2009042145A2 Delivery device for deposition
04/02/2009WO2009042084A1 Process of making an optical film by atomic layer deposition (ald) at atmospheric pressure
04/02/2009WO2009042059A1 Process for making thin film transistors by atomic layer deposition
04/02/2009WO2009042046A1 Process for selective area deposition of inorganic materials
04/02/2009WO2009042044A1 Process and deposition system for thin film formation with gas delivery head having spatial separation of reactive gases and movement of the substrate passed the delivery head
04/02/2009WO2009041893A1 Cutting tool for chip forming machining of metals
04/02/2009WO2009041774A2 Electrospray vaporizer
04/02/2009WO2009041499A1 Plasma processing apparatus and gas exhaust method
04/02/2009WO2009041412A1 Cemented carbide tool for fine machining
04/02/2009WO2009041397A1 Raw gas supply system, and filming apparatus
04/02/2009WO2009041283A1 Gas supplying apparatus
04/02/2009WO2009041282A1 Film forming apparatus, film forming method, storage medium and gas supplying apparatus
04/02/2009WO2009041219A1 Method for sr-ti-o-base film formation and recording medium
04/02/2009WO2009041189A1 Vaporizer and film forming apparatus
04/02/2009WO2009040973A1 Gas feeding device for semiconductor manufacturing facilities
04/02/2009WO2009040542A2 Vapour delivery system
04/02/2009WO2009040536A1 Vapour delivery system
04/02/2009WO2009040501A2 Method of patterning vapour deposition by printing
04/02/2009WO2009040499A1 Method of patterning a mesoporous nano particulate layer
04/02/2009WO2009015270A4 Organometallic precursors for use in chemical phase deposition processes
04/02/2009WO2009012341A3 Group iv complexes as cvd and ald precursors for forming metal-containing thin films
04/02/2009WO2007106076A3 Apparatus and method for large area multi-layer atomic layer chemical vapor processing of thin films
04/02/2009WO2006062619A3 Method to facilitate the printing of electronic components
04/02/2009WO2006007336A3 Atmospheric glow discharge with concurrent coating deposition
04/02/2009US20090088001 Substrate processing apparatus and manufacturing method of semiconductor device
04/02/2009US20090087634 Golden Ornament and Process for Producing the Same
04/02/2009US20090087628 Liquid droplet ejection apparatus, method of manufacturing electrooptical device, electrooptical device, and electronic apparatus
04/02/2009US20090087615 Corrosion-resistant gas distribution plate for plasma processing chamber
04/02/2009US20090087588 Edge densification for film boiling process
04/02/2009US20090087583 Film Deposition Method, Film Deposition Apparatus, and Storage Medium
04/02/2009US20090087581 Manufacturing diffractive optical elements
04/02/2009US20090087572 Gas turbines; intermetallics comprised of aluminum, nickel, and platinum; vapor deposition; heat treatment; electrodeposition
04/02/2009US20090087564 Substrate processing system
04/02/2009US20090087563 Coating of displacer components (tooth components) for providing a displacer unit with chemical resistance and tribological protection against wear
04/02/2009US20090087562 Method of preparing cross-linked organic glasses for air-gap sacrificial layers
04/02/2009US20090087561 Metal and metalloid silylamides, ketimates, tetraalkylguanidinates and dianionic guanidinates useful for cvd/ald of thin films
04/02/2009US20090087560 Epitaxial growth film formation method
04/02/2009US20090087550 Sequential flow deposition of a tungsten silicide gate electrode film
04/02/2009US20090087545 Film Forming Apparatus, Evaporating Jig, and Measurement Method
04/02/2009US20090087543 Templated growth of graphenic materials
04/02/2009US20090087542 Film position adjusting method, memory medium and substrate processing system
04/02/2009US20090087339 METHOD FOR FORMING RUTHENIUM COMPLEX FILM USING Beta-DIKETONE-COORDINATED RUTHENIUM PRECURSOR
04/02/2009US20090085172 Deposition Method, Deposition Apparatus, Computer Readable Medium, and Semiconductor Device
04/02/2009US20090085130 Semiconductor device
04/02/2009US20090085086 Capacitive electrode having semiconductor layers with an interface of separated grain boundaries
04/02/2009US20090084500 Processing apparatus, exhaust processing process and plasma processing process
04/02/2009US20090084317 Atomic layer deposition chamber and components
04/02/2009US20090084316 Apparatus for manufacturing flat-panel display
04/02/2009US20090084315 Method and apparatus for particle filtration and enhancing tool performance in film deposition
04/02/2009US20090084288 Vapor deposition using amine containing organosilicon compound; integrated circuits; disilane derivative compound that is fully substituted with alkylamino and/or dialkylamino functional groups
04/02/2009DE10215773B4 Verfahren zur Herstellung einer Halbleitervorrichtung mit einer Isolierschicht A process for producing a semiconductor device with an insulating layer
04/02/2009DE102008010041A1 Layer deposition apparatus, e.g. for epitaxial deposition of compound semiconductor layers, has segmented process gas enclosure in which substrate is moved relative to partition
04/02/2009DE102007045216A1 Vorrichtung zur Plasmabehandlung von Werkstücken Apparatus for plasma treatment of workpieces
04/02/2009DE102007045141A1 Plasmabehandlungsanlage Plasma treatment plant
04/02/2009DE102006043036B4 Verfahren zur Modifizierung von Innenoberflächen A method for the modification of internal surfaces
04/02/2009CA2700491A1 Vapour delivery system
04/02/2009CA2699775A1 Vapour delivery system
04/01/2009EP2043143A2 electrostatic chuck apparatus
04/01/2009EP2042922A2 Cyclopentene as a precursor for carbon-based films
04/01/2009EP2042619A2 Coating apparatus and method for its operation
04/01/2009EP2041797A2 Methods and apparatus for depositing a microcrystalline silicon film for photovoltaic device
04/01/2009EP2041775A1 Automatically replaceable apparatus for collecting byproducts and the controlling method thereof in equipment producing semiconductor
04/01/2009EP2041332A1 Method and device for plasma-assisted chemical vapour deposition on the inner wall of a hollow body
04/01/2009EP1697557A4 Playing field obstacle device
04/01/2009EP1556886B1 Atomic layer deposition method and atomic layer deposition tool
04/01/2009CN101400821A Apparatus for treating a gas stream
04/01/2009CN101399330A Negative electrode for non-aqueous electrolyte secondary battery, production method thereof and non-aqueous electrolyte secondary battery
04/01/2009CN101399198A Method of manufacturing electronic device material
04/01/2009CN101399176A Substrate processing system, control method for substrate processing apparatus and program
04/01/2009CN101399169A Film-forming method, film-forming apparatus, storage medium, and semiconductor device
04/01/2009CN101397655A Chemical vapor deposition equipment for material preparation
04/01/2009CN101397654A Hot filament and heat evaporation vapor deposition membrane equipment
04/01/2009CN101397653A Metal film forming method and computer-readable storage medium
04/01/2009CN101397652A Metal microfiber-nano carbon composite material and preparation method
04/01/2009CN101397651A Method for plating carbon film on ampoule internal wall for CdZnTe crystal growth and apparatus thereof
04/01/2009CN101396872A Solar cell slice continuous PECVD slide boat forming method
04/01/2009CN100474613C Dielectric layer for semiconductor device and method for manufacturing the same
04/01/2009CN100474570C Methods for the control of flatness and electron mobility of diamond coated silicon and structures formed thereby
04/01/2009CN100474531C Growth of silicon-nitride film
04/01/2009CN100474528C Film formation method and apparatus for semiconductor process
04/01/2009CN100474517C Ti film method for forming the same
04/01/2009CN100474515C Film formation apparatus and method for semiconductor process
04/01/2009CN100474514C Fabrication method of semiconductor integrated circuit device
04/01/2009CN100473761C Titanium product with improved corrosion resistant property
04/01/2009CN100473757C Aluminum phosphate coatings
04/01/2009CN100473454C Method of oxidizing substance and oxidizing apparatus thereof
04/01/2009CN100473446C Exhaust gas collection device