| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 04/21/2009 | US7520937 Thin film forming apparatus and method of cleaning the same |
| 04/21/2009 | US7520246 Power supply antenna and power supply method |
| 04/21/2009 | US7520245 Plasma processing apparatus |
| 04/21/2009 | US7520244 Plasma treatment apparatus |
| 04/16/2009 | WO2009049213A1 Rf return plates for backing plate support |
| 04/16/2009 | WO2009049020A2 Chemical vapor deposition reactor |
| 04/16/2009 | WO2009048703A1 Showerhead electrode assemblies and plasma processing chambers incorporating the same |
| 04/16/2009 | WO2009048702A1 Cleaning fixtures and methods of cleaning electrode assembly plenums |
| 04/16/2009 | WO2009048697A1 Apparatus and method for measuring vapor flux density |
| 04/16/2009 | WO2009048490A1 Chemical vapor deposition reactor chamber |
| 04/16/2009 | WO2009048189A1 Voltage variable type thinfilm deposition method and apparatus thereof |
| 04/16/2009 | WO2009048080A1 Heating device |
| 04/16/2009 | WO2009048056A1 Compound semiconductor epitaxial wafer and process for producing the same |
| 04/16/2009 | WO2009048021A1 Cutting tip of edge replacement type |
| 04/16/2009 | WO2009047442A1 Device for very high frequency plasma assisted cvd under atmospheric pressure, and applications thereof |
| 04/16/2009 | WO2009046928A1 Workpiece carrier device |
| 04/16/2009 | WO2009046577A1 Method for fabricating an n-type semiconductor material using silane as a precursor |
| 04/16/2009 | WO2009024738A3 Method of patterning vapour deposition by printing |
| 04/16/2009 | WO2008135516A3 Gas supply system and method for providing a gaseous deposition medium |
| 04/16/2009 | WO2008127220A3 Methods for in-situ generation of reactive etch and growth specie in film formation processes |
| 04/16/2009 | WO2007040908A3 Film formation apparatus and methods including temperature and emissivity/pattern compensation |
| 04/16/2009 | WO2007038050A3 Treatment processes for a batch ald reactor |
| 04/16/2009 | WO2007035241A3 Methods for synthesis of high quality carbon single-walled nanotubes |
| 04/16/2009 | WO2006128018A3 Device and method for the reduction of particles in the thermal treatment of rotating substrates |
| 04/16/2009 | WO2006124966A3 Low temperature absorption layer deposition and high speed optical annealing system |
| 04/16/2009 | WO2006101889A3 Plasma confinement ring assemblies having reduced polymer deposition characteristics |
| 04/16/2009 | WO2006096205A3 Carbon and metal nanomaterial composition and synthesis |
| 04/16/2009 | WO2006094285A3 Surface treatment methods including metallization, apparatus for carrying out the methods, and articles produced thereby |
| 04/16/2009 | WO2006088697A3 Methods of making gas distribution members for plasma processing apparatuses |
| 04/16/2009 | WO2006083326A3 Gas dispersion manufacture of nanoparticulates and nanoparticulate-containing products and processing thereof |
| 04/16/2009 | WO2006081233A3 Confinement ring drive |
| 04/16/2009 | WO2006078585A3 Wafer support pin assembly |
| 04/16/2009 | WO2006031260A3 Molecular memory and processing systems and methods therefor |
| 04/16/2009 | WO2006028779A3 Electrically floating diagnostic plasma probe with ion property sensors |
| 04/16/2009 | WO2006022905A3 Discharge-enhanced atmospheric pressure chemical vapor deposition |
| 04/16/2009 | WO2006011954A3 Diagnostic plasma measurement device having patterned sensors and features |
| 04/16/2009 | US20090099016 Production of carbon nanotubes |
| 04/16/2009 | US20090098742 System and Process for Heating Semiconductor Wafers by Optimizing Absorption of Electromagnetic Energy |
| 04/16/2009 | US20090098459 Electrochemical element, and method and apparatus for manufacturing electrode thereof |
| 04/16/2009 | US20090098400 Barrier laminate, barrier film substrate, device, and method for producing barrier laminate |
| 04/16/2009 | US20090098361 Member for cavitation erosion resistance and method for manufacturing same |
| 04/16/2009 | US20090098346 Atomic layer deposition for turbine components |
| 04/16/2009 | US20090098310 Method for bonding a tantalum structure to a cobalt-alloy substrate |
| 04/16/2009 | US20090098307 Manufacturing method for far-infrared irradiating substrate |
| 04/16/2009 | US20090098293 Method of providing an encapsulation layer stack, coating device and coating system |
| 04/16/2009 | US20090098291 Method of producing solid support for biological analysis using plastic material |
| 04/16/2009 | US20090098290 Process for formation of copper-containing films |
| 04/16/2009 | US20090098280 Vapor deposition apparatus and method of vapor deposition making use thereof |
| 04/16/2009 | US20090098276 Multi-gas straight channel showerhead |
| 04/16/2009 | US20090098186 Method and system for coating a surface of a medical device with a therapeutic agent and drug eluting medical devices made thereby |
| 04/16/2009 | US20090097831 Liquid material vaporizer |
| 04/16/2009 | US20090097165 Method of manufacturing magnetic recording medium, magnetic recording medium and surface treatment apparatus |
| 04/16/2009 | US20090096349 Cross flow cvd reactor |
| 04/16/2009 | US20090095621 Support assembly |
| 04/16/2009 | US20090095451 Method and apparatus for temperature change and control |
| 04/16/2009 | US20090095425 Apparatus for the formation of a metal film |
| 04/16/2009 | US20090095424 Showerhead electrode assemblies and plasma processing chambers incorporating the same |
| 04/16/2009 | US20090095420 Processing apparatus, exhaust processing process and plasma processing process |
| 04/16/2009 | US20090095334 Showerhead assembly |
| 04/16/2009 | US20090095222 Multi-gas spiral channel showerhead |
| 04/16/2009 | US20090095221 Multi-gas concentric injection showerhead |
| 04/16/2009 | US20090095219 Temperature controlled showerhead |
| 04/16/2009 | US20090095218 Temperature controlled showerhead |
| 04/16/2009 | US20090095217 Plasma treatment system and cleaning method of the same |
| 04/16/2009 | DE112005001470T5 Abscheidungsvorrichtung zum Erzeugen eines gleichmäßigen Dielektrikums mit niedriger Dielektrizitätskonstante Deposition apparatus for producing a uniform dielectric having a low dielectric constant |
| 04/15/2009 | EP2048264A1 Plasma arc coating apparatus and method of coating a substrate with a reagent |
| 04/15/2009 | EP2048263A1 Workpiece mount device |
| 04/15/2009 | EP2047980A1 Plastic molded article comprising vapor deposition film formed by plasma cvd method |
| 04/15/2009 | EP2047517A2 Methods and systems for manufacturing polycrystalline silicon and silicon-germanium solar cells |
| 04/15/2009 | EP2047010A2 Cvd coating scheme including alumina and/or titanium-containing materials and method of making the same |
| 04/15/2009 | EP2047009A2 Methods and apparatus for the vaporization and delivery of solution precursors for atomic layer deposition |
| 04/15/2009 | EP2046506A2 Method for the plasma treatment of a surface |
| 04/15/2009 | EP1359610B1 Substrate heating device |
| 04/15/2009 | EP1294961B1 Method of making carbide coated steel articles |
| 04/15/2009 | CN201220963Y Solar cell plate type PECVD apparatus auxiliary tooling |
| 04/15/2009 | CN201220962Y Mask apparatus for manufacturing film coated rubber plug |
| 04/15/2009 | CN201220961Y Earthing structure, heater and chemical vapor deposition apparatus |
| 04/15/2009 | CN101410999A Membrane structure element and method of manufacturing same |
| 04/15/2009 | CN101410958A Plasma CVD apparatus, method for forming thin film and semiconductor device |
| 04/15/2009 | CN101410554A Composite material component with silicon-containing ceramic matrix, protected against corrosion |
| 04/15/2009 | CN101410549A Microwave plasma CVD system |
| 04/15/2009 | CN101410548A Liquid material vaporizer |
| 04/15/2009 | CN101410547A Pallet based system for forming thin-film solar cells |
| 04/15/2009 | CN101409251A Electrostatic chuck apparatus |
| 04/15/2009 | CN101409234A Semiconductor structure and manufacture method thereof |
| 04/15/2009 | CN101409233A Method for depositing group III/V compounds |
| 04/15/2009 | CN101409213A Gas supply device, semiconductor manufacturing device and component for gas supply device |
| 04/15/2009 | CN101407910A Film forming device for processing semiconductor |
| 04/15/2009 | CN101407909A Methods for high temperature deposition of an amorphous carbon layer |
| 04/15/2009 | CN101407902A Electrical contact strengthening apparatus and method for improving binding force of coating and workpiece |
| 04/15/2009 | CN101407124A Nb/Re composite multilayer material and preparation thereof |
| 04/15/2009 | CN101406967A Coated cutting tool insert for milling |
| 04/15/2009 | CN100479114C Method for forming copper wiring |
| 04/15/2009 | CN100479113C Method of fabricating metal silicate layer using atomic layer deposition technique |
| 04/15/2009 | CN100479111C Plasma processing apparatus |
| 04/15/2009 | CN100479110C Oxide film forming method and oxide film forming apparatus |
| 04/15/2009 | CN100479108C Plasma process device |
| 04/15/2009 | CN100478745C Substrate supporting means having wire and apparatus using the same |
| 04/15/2009 | CN100478498C Insertion piece with hard metal coating |
| 04/15/2009 | CN100478491C Metal inserting layer in hydride gas phase epitaxial growth gallium nitride film and process for preparing the same |