| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
|---|
| 04/28/2009 | US7524532 Process for depositing thin layers on a substrate in a process chamber of adjustable height |
| 04/28/2009 | US7524397 Lower electrode design for higher uniformity |
| 04/28/2009 | CA2598761C Method and system for coating internal surfaces using reverse-flow cycling and other techniques |
| 04/23/2009 | WO2009052453A2 Plasma doping system with charge control |
| 04/23/2009 | WO2009052213A1 Multi-gas spiral channel showerhead |
| 04/23/2009 | WO2009052212A1 Multi-gas straight channel showerhead |
| 04/23/2009 | WO2009052002A1 Multi-gas concentric injection showerhead |
| 04/23/2009 | WO2009051595A1 High temperature solar selective coatings |
| 04/23/2009 | WO2009051163A1 Semiconductor device and method for manufacturing the same |
| 04/23/2009 | WO2009051087A1 Plasma film forming apparatus |
| 04/23/2009 | WO2009051046A1 Edge replacement-type cutting chip |
| 04/23/2009 | WO2009050958A1 High frequency plasma cvd apparatus, high frequency plasma cvd method and semiconductor thin film manufacturing method |
| 04/23/2009 | WO2009050849A1 Substrate processing apparatus |
| 04/23/2009 | WO2009050110A2 Bodies coated with a hard material and method for the production thereof |
| 04/23/2009 | WO2009049752A1 Apparatus for an irradiation unit |
| 04/23/2009 | WO2009049477A1 Process and apparatus for producing polysilicon sheets |
| 04/23/2009 | WO2009032062A3 Conductive composite compositions with fillers |
| 04/23/2009 | WO2009009306A3 Multilayer barrier stacks and methods for making them |
| 04/23/2009 | WO2007061633A3 Method and system for performing plasma enhanced atomic layer deposition |
| 04/23/2009 | WO2007027965A3 Delivery of low pressure dopant gas to a high voltage ion source |
| 04/23/2009 | WO2007027275A3 Interrupted deposition process for selective deposition of si-containing films |
| 04/23/2009 | WO2006130739A3 Graphitized carbon coatings for composite electrodes |
| 04/23/2009 | WO2005086588A3 Non-contact thermal platforms |
| 04/23/2009 | US20090105873 Method of dynamic temperature control during microcrystalline si growth |
| 04/23/2009 | US20090104788 Method of producing insulator thin film, insulator thin film, method of manufacturing semiconductor device, and semiconductor device |
| 04/23/2009 | US20090104787 Plasma nitriding method, method for manufacturing semiconductor device and plasma processing apparatus |
| 04/23/2009 | US20090104781 Plasma processing apparatus, ring member and plasma processing method |
| 04/23/2009 | US20090104761 Plasma Doping System With Charge Control |
| 04/23/2009 | US20090104760 Vertical cvd appparatus for forming silicon-germanium film |
| 04/23/2009 | US20090104758 Gallium nitride materials and methods |
| 04/23/2009 | US20090104732 Cvd process gas flow, pumping and/or boosting |
| 04/23/2009 | US20090104460 Silicon-based decorative coatings |
| 04/23/2009 | US20090104421 Process for making a laminate |
| 04/23/2009 | US20090104406 Plasmonic coatings for reflectors |
| 04/23/2009 | US20090104403 Evaporation Donor Substrate and Method for Manufacturing Light-Emitting Device |
| 04/23/2009 | US20090104377 Vapor deposition head apparatus and method of coating by vapor deposition |
| 04/23/2009 | US20090104376 Gas diffusion shower head design for large area plasma enhanced chemical vapor deposition |
| 04/23/2009 | US20090104375 Neutral ligand containing precursors and methods for deposition of a metal containing film |
| 04/23/2009 | US20090104374 Substrate Processing Method Using A Substrate Processing Apparatus |
| 04/23/2009 | US20090104353 Apparatus For Treating A Gas Stream |
| 04/23/2009 | US20090104352 Method of film formation and computer-readable storage medium |
| 04/23/2009 | US20090104351 Film forming apparatus and method, gas supply device and storage medium |
| 04/23/2009 | US20090104350 Nozzle device, film forming apparatus and method using the same, inorganic electroluminescence device, inkjet head, and ultrasonic transducer array |
| 04/23/2009 | US20090101284 Table for plasma processing apparatus and plasma processing apparatus |
| 04/23/2009 | US20090101214 Gas supply system for a pumping arrangement |
| 04/23/2009 | US20090101201 Nip-nip thin-film photovoltaic structure |
| 04/23/2009 | US20090101069 Rf return plates for backing plate support |
| 04/23/2009 | DE60133376T2 Vorrichtung zur thermischen verarbeitung von wafern A device for thermal processing of wafers |
| 04/23/2009 | DE112007001223T5 In-situ Reinigung eines CVD-Systemablasses In-situ cleaning of a CVD system indulgences |
| 04/23/2009 | DE102008019023A1 Vakuum-Durchlaufanlage zur Prozessierung von Substraten Continuous vacuum system for processing of substrates |
| 04/23/2009 | DE102007049930A1 Surface-modified structures, useful e.g. in optical or catalytic applications, comprise substrate, e.g. of glass, silicate primary coating and secondary coating, e.g. of metal |
| 04/23/2009 | DE102007049363A1 Producing polycrystalline silicon, useful for photovoltaic applications, comprises conducting a gas forming silicon compound by a microstructure apparatus or a micro gap, heating and isolating the polycrystalline silicon from the gas phase |
| 04/23/2009 | DE102007048564A1 Vorrichtung für eine Bestrahlungseinheit The apparatus for irradiation unit |
| 04/22/2009 | EP2051286A1 Semiconductor manufacturing apparatus |
| 04/22/2009 | EP2051282A2 Metal film production apparatus |
| 04/22/2009 | EP2050839A2 Method and apparatus for production of metal film |
| 04/22/2009 | EP2050831A1 Coated cutting tool insert for milling |
| 04/22/2009 | EP2050515A1 Cleaning member, delivery member with cleaning function, and method of cleaning substrate processing apparatus |
| 04/22/2009 | EP2049706A1 Method for depositing hard metallic coatings |
| 04/22/2009 | EP2049705A2 Improved methods for atomic layer deposition |
| 04/22/2009 | EP2049704A1 Method for depositing non-oxide ceramic coatings |
| 04/22/2009 | EP2049703A1 One-step method for applying a metal layer onto a substrate |
| 04/22/2009 | EP2049702A1 Apparatus for conveying a waste stream |
| 04/22/2009 | EP2049453A2 Method for densification of porous articles |
| 04/22/2009 | EP1039990A4 Fluorine-doped diamond-like coatings |
| 04/22/2009 | CN201224760Y Chemical vapor deposition furnace for preparing airplane carbon brake disc |
| 04/22/2009 | CN101416284A Processing apparatus and processing method |
| 04/22/2009 | CN101415862A Apparatus for atomic layer deposition |
| 04/22/2009 | CN101415861A Method for microcrystalline silicon film formation and solar cell |
| 04/22/2009 | CN101415860A Process for atomic layer deposition |
| 04/22/2009 | CN101415859A Gas manifolds for use during epitaxial film formation |
| 04/22/2009 | CN101415651A Process for functionalizing a glass reinforcement for composite material |
| 04/22/2009 | CN101414560A Plasma processing apparatus and plasma processing method |
| 04/22/2009 | CN101414537A Tunable multi-zone gas injection system |
| 04/22/2009 | CN101414162A Fluid flow distribution and supply unit and flow distribution control program |
| 04/22/2009 | CN101413116A Substrate constant temperature technology for preparing direct current arc discharge PCVD diamond film |
| 04/22/2009 | CN101413115A System and method for plasma assisted film deposition |
| 04/22/2009 | CN101413114A Substrate bearing device and processing apparatus for plasma |
| 04/22/2009 | CN101413113A Vertical plasma processing apparatus and use method thereof |
| 04/22/2009 | CN101413112A Multi-gas straight channel showerhead |
| 04/22/2009 | CN101413111A Film forming device and use method thereof |
| 04/22/2009 | CN101413110A Preparation of 1.3 micron waveband InAs quantum dot material |
| 04/22/2009 | CN101412730A Stabilizers to inhibit the polymerization of substituted cyclotetrasiloxane |
| 04/22/2009 | CN100482017C Vaporizing temperature sensitive materials for OLED |
| 04/22/2009 | CN100481577C Mask frame assembly for depositing a thin layer of an electroluminescent device and method for depositing a thin layer |
| 04/22/2009 | CN100481379C Method of adhesion improvement for low K dielectrics to conductive materials |
| 04/22/2009 | CN100481342C System and method for processing wafer using single frequency RF power in plasma processing chamber |
| 04/22/2009 | CN100481334C Method for forming a passivated metal layer |
| 04/22/2009 | CN100481330C III nitride semiconductor and fabricating method thereof |
| 04/22/2009 | CN100481307C Method and apparatus for the compensation of edge ring wear in a plasma processing chamber |
| 04/22/2009 | CN100480422C Method for curing low dielectric constant film using direct current bias |
| 04/22/2009 | CN100480421C Reaction container |
| 04/22/2009 | CN100480420C Vapor deposition method of low dielectric insulating film, thin film transistor using the same and preparation method thereof |
| 04/22/2009 | CN100480204C Photo-induced hydrophilic article and method of making the same |
| 04/21/2009 | US7521653 Plasma arc coating system |
| 04/21/2009 | US7521097 Using light source; adjust density, porosity; heat treatment; multilayer deposits of electroconductive material |
| 04/21/2009 | US7521089 Method and apparatus for controlling the movement of CVD reaction byproduct gases to adjacent process chambers |
| 04/21/2009 | US7521082 Coated high temperature superconducting tapes, articles, and processes for forming same |
| 04/21/2009 | US7520969 Notched deposition ring |
| 04/21/2009 | US7520957 Lid assembly for front end of line fabrication |