| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 05/13/2009 | CN100487159C Method for preparing nano silicone based luminescence composite film |
| 05/12/2009 | US7532322 Method and apparatus for measuring electron density of plasma and plasma processing apparatus |
| 05/12/2009 | US7531679 Composition and method for low temperature deposition of silicon-containing films such as films including silicon nitride, silicon dioxide and/or silicon-oxynitride |
| 05/12/2009 | US7531590 Additives to prevent degradation of alkyl-hydrogen siloxanes |
| 05/12/2009 | US7531468 System and method for forming a gate dielectric |
| 05/12/2009 | US7531467 Manufacturing method of semiconductor device and substrate processing apparatus |
| 05/12/2009 | US7531458 Organometallic compounds |
| 05/12/2009 | US7531422 Method for fabricating capacitor in semiconductor device using hafnium terbium oxide dielectric layer |
| 05/12/2009 | US7531232 Component for vacuum apparatus, production method thereof and apparatus using the same |
| 05/12/2009 | US7531214 Method for manufacturing an oxide coated cutting tool |
| 05/12/2009 | US7531213 Depositing by CVD, onto a cemented carbide, titanium based or ceramic substrate a hard layer system, layer selected from titanium carbide, titanium nitride, titanium carbonitride, titanium carboxide and aluminum oxide, and , aluminum oxide layer or (Al2O3+ZrO2)*N multilayer, penultimate outermost layer |
| 05/12/2009 | US7531212 Coating a base material with a metal component comprising Al and Ti and one or more of B, C, N and O (TiAlN) to form a primary coating,oxidizing the primary coating to form an oxide-containing layer, andforming an alumina coating of alpha crystal structure on the oxide-containing layer |
| 05/12/2009 | US7531207 MOCVD PGO thin films deposited on indium oxide for feram applications |
| 05/12/2009 | US7531205 High throughput ion beam assisted deposition (IBAD) |
| 05/12/2009 | US7531068 Method for manufacturing silicon nanodot film for light emission in nano-size photonic devices |
| 05/12/2009 | US7531061 Gas temperature control for a plasma process |
| 05/12/2009 | US7531059 Cleaning of semiconductor wafers by contaminate encapsulation |
| 05/12/2009 | US7531031 Copper (I) compounds useful as deposition precursors of copper thin films |
| 05/12/2009 | US7530359 Plasma treatment system and cleaning method of the same |
| 05/07/2009 | WO2009058562A1 Method and apparatus for sealing an opening of a processing chamber |
| 05/07/2009 | WO2009058006A1 Method for preparing a deposition from a vapour |
| 05/07/2009 | WO2009057583A1 Plasma processing system and plasma processing method |
| 05/07/2009 | WO2009057490A1 Laminate with hard coat layer |
| 05/07/2009 | WO2009057185A1 Cvd device |
| 05/07/2009 | WO2009057058A1 Alkaline earth metal containing precursor solutions |
| 05/07/2009 | WO2009029942A3 Mechanically integrated and closely coupled print head and mist source |
| 05/07/2009 | WO2009029938A3 Apparatus for anisotropic focusing |
| 05/07/2009 | WO2009024460A3 System and process for the continous vacuum coating of a material in web form |
| 05/07/2009 | WO2009021340A9 Method for producing a metal-oxide-coated workpiece surface with predeterminable hydrophobic behaviour |
| 05/07/2009 | WO2009014741A9 A plasma processing method for forming a film and an electronic component manufactured by the method |
| 05/07/2009 | WO2008125607A3 Method for the application of a high-strength coating to workpieces and/or materials |
| 05/07/2009 | WO2008048286A3 Nanostructured antennas and methods of manufacturing same |
| 05/07/2009 | WO2007040916A3 Apparatus temperature control and pattern compensation |
| 05/07/2009 | WO2007035212A3 Substrate placement determination using substrate backside pressure measurement |
| 05/07/2009 | WO2007015897A3 Deposition of multilayer structures including layers of germanium and/or germanium alloys |
| 05/07/2009 | WO2006107573A3 High strip rate downstream chamber |
| 05/07/2009 | WO2006081234A3 Ruthenium layer deposition apparatus and method |
| 05/07/2009 | WO2005052998A9 Gas distribution showerhead featuring exhaust apertures |
| 05/07/2009 | US20090118814 Endoprosthesis coating |
| 05/07/2009 | US20090117743 Film formation apparatus and method for using same |
| 05/07/2009 | US20090117721 Vapor phase growth apparatus |
| 05/07/2009 | US20090117372 Alloyed tungsten produced by chemical vapour deposition |
| 05/07/2009 | US20090117371 Weather-resistant layer system |
| 05/07/2009 | US20090117289 Method and apparatus for deposition of thin film materials for energy storage devices |
| 05/07/2009 | US20090117274 Solution based lanthanum precursors for atomic layer deposition |
| 05/07/2009 | US20090117273 Combustion deposition using aqueous precursor solutions to deposit titanium dioxide coatings |
| 05/07/2009 | US20090117272 Layer Depositing Device and Method for Operating it |
| 05/07/2009 | US20090117271 Film forming apparatus and a barrier film producing method |
| 05/07/2009 | US20090117270 Method for treating substrate and recording medium |
| 05/07/2009 | US20090117259 Processing system, processing method, and computer program |
| 05/07/2009 | US20090114159 Transporting means and vacuum coating installation for substrates of different sizes |
| 05/07/2009 | US20090114158 Workpiece Support With Fluid Zones For Temperature Control |
| 05/07/2009 | US20090114157 Ampoule splash guard apparatus |
| 05/07/2009 | US20090114156 Film formation apparatus for semiconductor process |
| 05/07/2009 | US20090114155 Processing apparatus, exhaust processing process and plasma processing process |
| 05/07/2009 | US20090114154 Plasma treatment apparatus |
| 05/07/2009 | US20090114153 Method and apparatus for sealing an opening of a processing chamber |
| 05/07/2009 | US20090113684 Uniformly Compressed Process Chamber Gate Seal for Semiconductor Processing Chamber |
| 05/07/2009 | DE112007001558T5 Organometallische Verbindungen mit sterisch gehinderten Amiden Organometallic compounds with sterically hindered amides |
| 05/07/2009 | DE112007000898T5 Vorrichtung und Verfahren zur chemischen Gasphasenabscheidung Apparatus and method for chemical vapor deposition |
| 05/07/2009 | DE102007000611A1 Kratzfeste und dehnbare Korrosionsschutzschicht für Leichtmetallsubstrate Scratch resistant and stretchable corrosion protective coating for aluminum substrates |
| 05/07/2009 | DE102006043755B4 Beschichtungssystem und Beschichtungsverfahren Coating system and coating method |
| 05/07/2009 | DE102005024118B4 Vorrichtung und Verfahren zur Reduktion von Partikeln bei der thermischen Behandlung rotierender Substrate Device and method for reduction of particles in the thermal treatment rotating substrates |
| 05/06/2009 | EP2055804A1 Method for preparing a deposition from a vapour |
| 05/06/2009 | EP2055803A1 Method for preparing a deposition from a vapour |
| 05/06/2009 | EP2055397A2 In-situ chamber cleaning method |
| 05/06/2009 | EP2054538A2 Plasma deposition apparatus and method for making polycrystalline silicon |
| 05/06/2009 | EP1948846B1 Method of monitoring a plasma and use of this method for depositing a film onto a PET hollow body |
| 05/06/2009 | EP1475459B1 Method for modifying surface of solid material, surface-modified solid material and device for modifying surface of solid material |
| 05/06/2009 | EP1305453B1 Ring-shaped high-density plasma source and method |
| 05/06/2009 | CN201232084Y Full-automatic gas replacement apparatus |
| 05/06/2009 | CN101426954A Apparatus and method for controlling the surface temperature of a substrate in a process chamber |
| 05/06/2009 | CN101426953A Apparatus and methods for chemical vapor deposition |
| 05/06/2009 | CN101426952A Film forming apparatus and barrier film manufacturing method |
| 05/06/2009 | CN101426951A Method and apparatus for coating glass |
| 05/06/2009 | CN101426950A Film deposition apparatus and film deposition method |
| 05/06/2009 | CN101426949A Integrated capacitive and inductive power sources for a plasma etching chamber |
| 05/06/2009 | CN101425551A Antireflective coatings for photovoltaic applications |
| 05/06/2009 | CN101425474A Method and apparatus for providing an electrostatic chuck with reduced plasma penetration and arcing |
| 05/06/2009 | CN101425450A Gas supply device, substrate processing apparatus and substrate processing method |
| 05/06/2009 | CN101423937A Multi-gas concentric injection showerhead |
| 05/06/2009 | CN101423936A Multi-gas spiral channel showerhead |
| 05/06/2009 | CN101423935A Substrate processing apparatus and method of controlling substrate processing apparatus |
| 05/06/2009 | CN101423934A Method for preparing solar thermal-collecting tube antireflecting coating |
| 05/06/2009 | CN101423933A Metal heat absorption tube and preparation method thereof |
| 05/06/2009 | CN101423932A Method for manufacturing a lanthanum oxide compound |
| 05/06/2009 | CN101423931A Method for forming metal oxide on surface of substrate |
| 05/06/2009 | CN101423930A Showerhead design with precursor source |
| 05/06/2009 | CN101423929A Amorphous Ge/Te deposition process |
| 05/06/2009 | CN101423928A Plasma processing apparatus and controlling method for plasma processing apparatus |
| 05/06/2009 | CN100485969C Method for fabricating semiconductor device |
| 05/06/2009 | CN100485955C Gallium nitride based semiconductor device and method of manufacturing same |
| 05/06/2009 | CN100485872C Method for preparing amorphous semiconductor film and semiconductor device |
| 05/06/2009 | CN100485871C Liquid quantity monitor, semiconductor manufacturing equipment provided with liquid quantity monitor and method for monitoring liquid material and liquid quantity |
| 05/06/2009 | CN100485870C Film forming apparatus and gasifier |
| 05/06/2009 | CN100485860C Film forming method, film forming device and storing medium |
| 05/06/2009 | CN100485232C Sliding member and production process thereof |
| 05/06/2009 | CN100485190C Gas supply system for a pumping arrangement |
| 05/06/2009 | CN100485085C High-density plasma reinforced chemical vapour deposition and etching device |
| 05/06/2009 | CN100485084C Atomic layer deposition method |