Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
05/2009
05/20/2009DE102007054851A1 MBE-Einrichtung und Verfahren zu deren Betrieb MBE device and method for its operation
05/20/2009CN101438429A III nitride compound semiconductor laminated structure
05/20/2009CN101438387A Batch processing platform for ALD and CVD
05/20/2009CN101437979A Batch processing chamber with diffuser plate and injector assembly
05/20/2009CN101437770A Method of depositing zinc oxide coatings on a substrate
05/20/2009CN101436538A Method of forming porous film and computer-readable recording medium
05/20/2009CN101435075A Plasma processing gas supply member
05/20/2009CN101435074A Substrate processing apparatus
05/20/2009CN101435073A Method of forming amorphous carbon layer using cross type hydrocarbon compound and method of forming low-K dielectric layer using the same
05/20/2009CN100490223C Negative electrode material of nonaqueous electrolyte secodary battery
05/20/2009CN100490092C Selective W-CVD process and process for producing Cu multilayer wiring
05/20/2009CN100490086C Substrate processing method
05/20/2009CN100490075C Susceptor and vapor growth device
05/20/2009CN100490074C Method for producing polycrystal silicon thin film and method for producing transistor using the same
05/20/2009CN100490073C Plasma processing apparatus and plasma processing method
05/20/2009CN100490063C Methods and apparatus for processing semiconductor wafers with plasma processing chambers in a wafer track environment
05/20/2009CN100489155C Method and apparatus for treating a substrate
05/20/2009CN100489154C Carbon film coating method and device for quartz crucible for use in crystal growth
05/20/2009CN100489153C Method for directly printing circuit by nozzle
05/19/2009US7535047 Semiconductor device containing an ultra thin dielectric film or dielectric layer
05/19/2009US7534658 Process for manufacturing microelectronic, microoptoelectronic or micromechanical devices
05/19/2009US7534469 Semiconductor-processing apparatus provided with self-cleaning device
05/19/2009US7534468 Process for obtaining spatially-organised nanostructures on thin films
05/19/2009US7534466 Methods and equipment for depositing coatings having sequenced structures
05/19/2009US7534301 RF grounding of cathode in process chamber
05/19/2009US7534293 Method and solution for forming anatase titanium dioxide, and titanium dioxide particles, colloidal dispersion and film
05/19/2009US7533629 Arrangement, method and electrode for generating a plasma
05/19/2009US7533628 Volume-optimized reactor for simultaneously coating eyeglasses on both sides
05/14/2009WO2009061738A1 Gas mixing swirl insert assembly
05/14/2009WO2009061668A1 Solution based lanthanum precursors for atomic layer deposition
05/14/2009WO2009061666A1 Atomic layer deposition process
05/14/2009WO2009061599A1 Methods of selectively depositing silicon-containing films
05/14/2009WO2009060914A1 Epitaxial wafer
05/14/2009WO2009060913A1 Method for manufacturing epitaxial wafer
05/14/2009WO2009060912A1 Epitaxial film growing method, wafer supporting structure and susceptor
05/14/2009WO2009060770A1 Susceptor for vapor deposition
05/14/2009WO2009060766A1 Heating apparatus
05/14/2009WO2009060756A1 Plasma treatment apparatus and external air shielding vessel
05/14/2009WO2009060597A1 Thin film forming apparatus and forming method for thin film
05/14/2009WO2009060194A2 Plasma deposition apparatus
05/14/2009WO2009059740A1 Oxide compounds as a coating composition
05/14/2009WO2009009604A3 Diamond film deposition
05/14/2009WO2008057565A3 Artificial cushion joints and methods of making the same
05/14/2009WO2007047888A3 Method and apparatus for converting precursor layers into photovoltaic absorbers
05/14/2009US20090124087 Vertical plasma processing apparatus and method for using same
05/14/2009US20090124033 Process for producing organiclight-emitting display device
05/14/2009US20090123779 chemical vapor deposition; titanium, aluminum nitrides; improved friction-wear resistance and oxidation resistance
05/14/2009US20090123735 Low contamination components for semiconductor processing apparatus and methods for making components
05/14/2009US20090123663 High velocity method for depositing diamond films from a gaseous phase in SHF discharge plasma and a plasma reactor for carrying out said method
05/14/2009US20090123662 Plasma Coating Device and Method
05/14/2009US20090123649 Method of manufacturing silicon nanotubes using doughnut-shaped catalytic metal layer
05/14/2009US20090123648 Diamond-diamond composites
05/14/2009US20090123646 Method and plant for simultaneously coating internal and external surfaces of metal elements, in particular blades for turbines
05/14/2009US20090123640 Pretreatment apparatus and method for window glass adhesive coating
05/14/2009US20090123198 Intermediate transfer member, method of producing intermediate transfer member, and image forming apparatus provided with intermediate transfer member
05/14/2009US20090122310 Method of making microarrays
05/14/2009US20090121613 Method for producing carbon nanotube assembly, carbon nanotube assembly, catalyst particle dispersed film, electron emitting element, and field emission display
05/14/2009US20090121333 Flexible substrates having a thin-film barrier
05/14/2009US20090121182 Carbon nanotube foam and method of making and using thereof
05/14/2009US20090121132 Material processing system and method
05/14/2009US20090120790 Low contamination components for semiconductor processing apparatus and methods for making components
05/14/2009US20090120583 Methods of making gas distribution members for plasma processing apparatuses
05/14/2009US20090120581 Systems and methods for plasma processing of microfeature workpieces
05/14/2009US20090120464 Multi-port pumping system for substrate processing chambers
05/14/2009US20090120368 Rotating temperature controlled substrate pedestal for film uniformity
05/14/2009US20090120367 Plasma immersion ion implantation reactor with extended cathode process ring
05/14/2009US20090120366 Microwave plasma cvd device
05/14/2009US20090120365 Substrate processing apparatus
05/14/2009US20090120364 Gas mixing swirl insert assembly
05/14/2009US20090120363 Gas Supply Pipe for Plasma Treatment
05/14/2009US20090120293 Method of making a leak stable gas separation membrane system
05/14/2009US20090120158 Articles Of Manufacture Containing Increased Stability Low Concentration Gases And Methods Of Making And Using The Same
05/14/2009DE112007001523T5 Vorreinigung von Substraten in Epitaxiekammern Pre-cleaning of substrates in epitaxy
05/14/2009DE102007054074A1 System zum Bearbeiten eines Objekts System for processing an object
05/14/2009DE102007054073A1 System und Verfahren zum Bearbeiten eines Objekts System and method for processing an object
05/13/2009EP2058845A1 Thin film manufacturing apparatus using discharge electrode, and solar cell manufacturing method
05/13/2009EP2058843A2 Multi-port pumping system for substrate processing chambers
05/13/2009EP2058419A1 Method for separating surface layer or growth layer of diamond
05/13/2009EP2058416A2 Preparation of a metal-containing film via ALD or CVD processes
05/13/2009EP2058295A1 Imide complex, method for producing the same, metal-containing thin film and method for producing the same
05/13/2009EP2058239A1 Bottle made of synthetic resin
05/13/2009EP2058070A1 Cutting tool, process for producing the same, and method of cutting
05/13/2009EP2057301A2 Continuous dopant addition
05/13/2009EP2057008A2 Nano structured phased hydrophobic layers on substrates
05/13/2009EP1751325A4 Controlled vapor deposition of multilayered coatings adhered by an oxide layer
05/13/2009EP1240659B1 Arrangement for coupling microwave energy into a treatment chamber
05/13/2009CN201238415Y Plasma excitation component and plasma processing apparatus including the same
05/13/2009CN201236209Y Reaction cavity with window slice shielding gas channel
05/13/2009CN201236208Y Air-float type reaction cavity
05/13/2009CN201236207Y Heater protection ring
05/13/2009CN101432460A Increased polysilicon deposition in a cvd reactor
05/13/2009CN101432345A Glazing system with high glass transition temperature decorative ink
05/13/2009CN101431119A Slide boat metal lift hook of solar cell panel
05/13/2009CN101431017A Method for improving GaN thick film integrality on sapphire substrate
05/13/2009CN101431003A Exhaustion ring and plasma processing device
05/13/2009CN101429651A Multi-port pumping system for substrate processing chambers
05/13/2009CN101429650A Method for in-situ preparation of self-supporting gallium nitride underlay
05/13/2009CN101429649A Producing method of semiconductor device and substrate processing apparatus
05/13/2009CN100487948C Method and apparatus for measuring thickness of deposited film and method and apparatus for forming material layer
05/13/2009CN100487857C In-situ dry clean chamber for front end of line fabrication