Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
06/2009
06/17/2009CN101460656A Controlling plasma processing using parameters derived through the use of a planar ion flux probing arrangement
06/17/2009CN101460655A Reduced contaminant gas injection system and method of using
06/17/2009CN101460654A A method of ultra-shallow junction formation using si film alloyed with carbon
06/17/2009CN101459215A Method for manufacturing gallium nitride single crystalline substrate using self-split
06/17/2009CN101457352A Source object quantity measuring method in chemical vapor coating process
06/17/2009CN101457351A Gas distribution system and semi-conductor processing arrangements employing the same
06/17/2009CN101457350A Air-intake installation, low pressure chemical vapor deposition equipment and chemical vapor deposition method
06/17/2009CN100501970C Limited thermal budget formation of PMD layers
06/17/2009CN100501954C Semiconductor device having epitaxial C49 titanium silicide (TiSi2)layer and its manufacturing method
06/17/2009CN100501945C Organic thin-film transistor device and method for manufacturing same
06/17/2009CN100501940C Microcontamination abatement method in semiconductor processing
06/17/2009CN100500934C Method and device for plating diamond like film on inner-outer wall of quartz round tube
06/17/2009CN100500933C Method for preparing sub-atmosphere pressure film
06/17/2009CN100500932C Vacuum ripple absorption pipe used for chemical gaseous phase deposition device
06/17/2009CN100500432C Packaging material
06/17/2009CN100500346C Coated cutting tool
06/16/2009US7548304 Chuck plate assembly with cooling means
06/16/2009US7547952 Method for hafnium nitride deposition
06/16/2009US7547860 Microwave plasma processing apparatus for semiconductor element production
06/16/2009US7547644 Methods and apparatus for forming barrier layers in high aspect ratio vias
06/16/2009US7547643 Techniques promoting adhesion of porous low K film to underlying barrier layer
06/16/2009US7547632 Methods of forming metal layers in the fabrication of semiconductor devices
06/16/2009US7547631 Organometallic compounds
06/16/2009US7547615 Deposition over mixed substrates using trisilane
06/16/2009US7547465 Multi-station deposition apparatus and method
06/16/2009US7547464 Organometallic precursor compounds
06/16/2009US7547363 Solid organometallic compound-filled container and filling method thereof
06/16/2009US7547357 Transparent film-forming composition
06/16/2009US7546840 Method for cleaning reaction container and film deposition system
06/16/2009CA2452637C Visible-light-responsive photoactive coating, coated article, and method of making same
06/16/2009CA2443114C Laminated material
06/11/2009WO2009072631A1 Method for manufacturing nitride semiconductor element, and nitride semiconductor element
06/11/2009WO2009072252A1 Susceptor for vapor phase epitaxy and vapor phase epitaxy apparatus
06/11/2009WO2009072187A1 Method of pressurized gas pulse control processing and pressurized gas pulse control processing apparatus
06/11/2009WO2009071741A1 Method for increasing the durability of glass and a glass product
06/11/2009WO2009071154A1 Slip ring of an axial face seal arrangement
06/11/2009WO2009071076A1 Substrate having a coating comprising copper and method for the production thereof by means of atomic layer deposition
06/11/2009WO2009070855A2 Enhancing catalytic activity of nanoporous materials
06/11/2009WO2009070820A1 Coated article
06/11/2009WO2007015933A3 Method and apparatus for sputtering onto large flat panels
06/11/2009WO2006069085A3 An in-situ chamber clean process to remove by-product deposits from chemical vapor etch chamber
06/11/2009US20090149033 Systems and methods for forming metal oxide layers
06/11/2009US20090149022 Method for improving uniformity and adhesion of low resistivity tungsten film
06/11/2009US20090148709 Method of making glass including surface treatment with aluminum chloride using combustion deposition prior to deposition of antireflective coating
06/11/2009US20090148704 Vapor-phase process apparatus, vapor-phase process method, and substrate
06/11/2009US20090148669 Methods structures and apparatus to provide group via and ia materials for solar cell absorber formation
06/11/2009US20090148628 Protective coating systems for gas turbine engine applications and methods for fabricating the same
06/11/2009US20090148626 System, method and apparatus for filament and support used in plasma-enhanced chemical vapor deposition for reducing carbon voids on media disks in disk drives
06/11/2009US20090148624 Plasma cvd apparatus and method
06/11/2009US20090148613 Method of fabricating optical fiber using an isothermal, low pressure plasma deposition technique
06/11/2009US20090148599 Pvd - vacuum coating unit
06/11/2009US20090148598 Methods and Apparatus to Provide Group VIA Materials to Reactors for Group IBIIIAVIA Film Formation
06/11/2009US20090147370 Nanoparticle and nanocomposite films
06/11/2009US20090146306 Semiconductor device with epitaxial C49-titanium silicide (TiSi2) layer and method for fabricating the same
06/11/2009US20090145555 Processing apparatus, exhaust processing process and plasma processing process
06/11/2009US20090145554 Procedure and device for the production of a plasma
06/11/2009US20090145553 Suppressor of hollow cathode discharge in a shower head fluid distribution system
06/11/2009US20090145484 Gas supply system, substrate processing apparatus and gas supply method
06/11/2009US20090145361 Evaporation apparatus
06/11/2009US20090145360 Method and apparatus for cleaning a cvd chamber
06/11/2009US20090145359 Gas Shower Plate for Palsma Processing Apparatus
06/11/2009US20090145358 Deposition material supplying module and thin film deposition system having the same
06/10/2009EP2067877A1 Coating device and method of producing an electrode assembly
06/10/2009EP2067876A2 ALD or CVD process for producing germanium-antimony-tellurium films
06/10/2009EP2067875A1 Method of forming film and film forming apparatus
06/10/2009EP2066825A1 Method for the deposition of a ruthenium containing film
06/10/2009EP1487531A4 Coated microfluidic delivery system
06/10/2009EP1339895B1 Method and device for treating the surface of electrically insulating substrates
06/10/2009EP1090159B8 Deposition of coatings using an atmospheric pressure plasma jet
06/10/2009DE102007058571A1 Substrat mit einer Kupfer enthaltenden Beschichtung und Verfahren zu deren Herstellung mittels Atomic Layer Deposition Substrate having a copper-containing coating, and process for their preparation by means of Atomic Layer Deposition
06/10/2009CN101454480A Plasma cvd method, method for forming silicon nitride film and method for manufacturing semiconductor device
06/10/2009CN101454479A Method for film formation, mold, and method for manufacturing mold
06/10/2009CN101452894A Gaas semiconductor substrate , group III-v compound semiconductor device and method of manufacturing the same
06/10/2009CN101451238A Pre-deposition method for forming protection film in chamber
06/10/2009CN101451237A Plasma reaction chamber with plurality of plasma reaction zones including plurality of treatment platforms
06/10/2009CN101451236A Apparatus and method for depositing film, and method of manufacturing luminescent device
06/10/2009CN101451235A Method for improving particle pollution in low pressure chemical vapor deposition equipment
06/10/2009CN101451234A Ti film forming methodand film forming device
06/10/2009CN100499040C Silicon nitride film, a semiconductor device, a display device and a method for manufacturing a silicon nitride film
06/10/2009CN100499033C Treatment device
06/10/2009CN100497730C Preparation process of porous SiO2 film
06/10/2009CN100497729C Method for preparing carbon coating cobalt nano particle by cobalt/aluminum catalytic chemical gaseous phase deposition
06/09/2009US7544916 Heating device
06/09/2009US7544827 Process for depositing low dielectric constant materials
06/09/2009US7544631 C and N-doped titaniumoxide-based photocatalytic and self-cleaning thin films and the process for production thereof
06/09/2009US7544615 Systems and methods of forming refractory metal nitride layers using organic amines
06/09/2009US7544419 Component scavenged by exhaust gases, notably engine set component, and method for coating such a component
06/09/2009US7544397 Recording media having protective overcoats of highly tetrahedral amorphous carbon and methods for their production
06/09/2009US7544389 Precursor for film formation and method for forming ruthenium-containing film
06/09/2009US7544388 Methods of depositing materials over substrates, and methods of forming layers over substrates
06/09/2009US7544270 Apparatus for processing a substrate
06/09/2009US7544269 Method and apparatus for electron density measurement
06/09/2009US7544251 Method and apparatus for controlling temperature of a substrate
06/09/2009US7544249 Large-diameter SiC wafer and manufacturing method thereof
06/09/2009US7543547 Electrode assembly for plasma processing apparatus
06/09/2009US7543546 Plasma processing apparatus, method for producing reaction vessel for plasma generation, and plasma processing method
06/05/2009CA2645293A1 Protective coating systems for gas turbine engine applications and methods for fabricating the same
06/04/2009WO2009070112A1 Coated cutting tool insert
06/04/2009WO2009070107A1 Coated cutting tool insert
06/04/2009WO2009070006A1 A device for layered deposition of various materials on a semiconductor substrate, as well as a lift pin for use in such a device