Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
06/2009
06/04/2009WO2009069695A1 Transparent electroconductive film and process for producing the transparent electroconductive film
06/04/2009WO2009069286A1 Iii nitride structure and method for manufacturing iii nitride structure
06/04/2009WO2009069211A1 Plasma process electrode and plasma process device
06/04/2009WO2009069204A1 Dielectric barrier discharging device
06/04/2009WO2009068769A1 Process for depositing boron compounds by cvd or pvd
06/04/2009WO2009068454A1 Metal-organic compounds containing an amidinate ligand and their use of vapour phase deposition of metal containing thin films
06/04/2009WO2009068150A1 Frame-based vacuum chamber for coating systems
06/04/2009WO2009042054A3 Organosiloxane materials for selective area deposition of inorganic materials
06/04/2009WO2009031886A3 Method and apparatus for atomic layer deposition using an atmospheric pressure glow discharge plasma
06/04/2009WO2009001220A3 Functionalization of microscopy probe tips
06/04/2009WO2007047542A3 Method of preventing analyte alteration in diagnostic apparatuses involving contact of liquid and electrode
06/04/2009WO2006118774A3 Silicon shelf towers
06/04/2009US20090142524 Fine laminar barrier protective layer
06/04/2009US20090142513 Film formation method, cleaning method and film formation apparatus
06/04/2009US20090142491 Method of Film Deposition and Film Deposition System
06/04/2009US20090142490 Film forming method and film forming apparatus
06/04/2009US20090142489 Linear deposition sources for deposition processes
06/04/2009US20090142475 Apparatus and method for depositing film, and method of manufacturing luminescent device
06/04/2009US20090142227 Parylene Coating and Method for the Production Thereof
06/04/2009US20090140717 Structures and methods for measuring beam angle in an ion implanter
06/04/2009US20090140628 Inner coating of lamp vessels, such as discharge vessels of gas discharge lamps
06/04/2009US20090140390 GaAs SEMICONDUCTOR SUBSTRATE AND METHOD OF MANUFACTURING THE SAME, AND GROUP III-V COMPOUND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
06/04/2009US20090140353 Method of Film Deposition and Film Deposition System
06/04/2009US20090139960 Method of fabricating an apparatus of fabricating an flat panel display device and method for fabricating flat panel display device
06/04/2009US20090139808 Method of fabricating carbon fiber reinforced composite material parts
06/04/2009US20090139658 Plasma processing apparatus
06/04/2009US20090139453 Multi-station plasma reactor with multiple plasma regions
06/04/2009US20090139451 Process of monitoring dispensing of process fluids in precision processing operations
06/04/2009DE102007058052A1 Transferkammer für eine Vakuumbeschichtungsanlage und Vakuumbeschichtungsanlage Transfer chamber for vacuum coating machine and vacuum coating machine
06/04/2009DE102007057644A1 Vakuumkammer auf Rahmenbasis für Beschichtungsanlagen Vacuum chamber on a frame basis for coating systems
06/03/2009EP2065489A1 PROCESS FOR PRODUCING GaN SINGLE-CRYSTAL, GaN THIN-FILM TEMPLATE SUBSTRATE AND GaN SINGLE-CRYSTAL GROWING APPARATUS
06/03/2009EP2065390A1 Metal organic compounds containing an amidinate ligand and their use for vapour phase deposition of metal containing thin films
06/03/2009EP2065364A1 Metal complexes of tridentate beta-ketoiminates
06/03/2009CN101448972A Hot source
06/03/2009CN101448971A Film forming method and film forming apparatus
06/03/2009CN101445919A Semiconductor manufacturing apparatus and manufacturing method of semiconductor device
06/03/2009CN101445918A Apparatus for depositting atomic layer
06/03/2009CN101445917A Gas piping structure of PECVD device
06/03/2009CN100495739C Stacked photovoltaic device
06/03/2009CN100495655C Gas treatment device and heat readiting method
06/03/2009CN100495588C Method for producing transparent base with transparent conductive fil
06/03/2009CN100495413C A method for adjoining adjacent coatings on a processing element
06/03/2009CN100495181C Thin film transistor substrate using low dielectric constant and method for manufacturing the same
06/03/2009CN100494821C Heating medium circulating device and thermal treatment equipment usint the device
06/03/2009CN100494488C Dielectric barrier discharge plasma hot wire chemical gaseous phase deposition method and its device
06/03/2009CN100494487C Film-forming apparatus and film-forming method
06/03/2009CN100494486C Method for developing m-face or a-face ZnO film by metal organic chemical vapour deposition
06/03/2009CN100494485C Method for preparing superconducting band of oxides
06/03/2009CN100494484C Chemical vapour deposition device
06/02/2009US7541102 Protective layer for a body, and process and arrangement for producing protective layers
06/02/2009US7541069 Method and system for coating internal surfaces using reverse-flow cycling
06/02/2009US7541061 Vacuum chamber load lock structure and article transport mechanism
06/02/2009US7540923 Shower head structure for processing semiconductor
06/02/2009US7540920 Silicon-containing layer deposition with silicon compounds
06/02/2009US7540305 Chemical processing system and method
06/02/2009US7540257 Plasma processing apparatus and semiconductor device manufactured by the same apparatus
05/2009
05/28/2009WO2009067284A1 Quick-change precursor manifold for large-area cvd and pecvd
05/28/2009WO2009066630A1 Water-repellent or antifouling article and window glass for building, window glass for vehicle, display member, and optical part all employing the same
05/28/2009WO2009066464A1 Nitride semiconductor and nitride semiconductor crystal growth method
05/28/2009WO2009065545A1 The use of a binary coating comprising first and second different metallic elements
05/28/2009WO2009065410A1 Object having a ductile and corrosion resistant surface layer
05/28/2009WO2009041774A3 Electrospray vaporizer
05/28/2009WO2009036722A3 Device for the plasma treatment of workpieces
05/28/2009US20090137108 Semiconductor device, semiconductor wafer, and methods of producing the same device and wafer
05/28/2009US20090137099 Mbe device and method for the operation thereof
05/28/2009US20090137087 Method of manufacturing semiconductor device, film deposition method, and film deposition apparatus
05/28/2009US20090137043 Methods for modification of polymers, fibers and textile media
05/28/2009US20090136686 Methods for Controllably Induction Heating an Article
05/28/2009US20090136685 Metal Complexes of Tridentate Beta-Ketoiminates
05/28/2009US20090136684 Organometallic compounds, processes for the preparation thereof and methods of use thereof
05/28/2009US20090136682 Carbon nanotube synthesis for nanopore devices
05/28/2009US20090136677 vapor deposition; atomic layer deposition; heat resistance
05/28/2009US20090136668 Method and apparatus to help promote contact of gas with vaporized material
05/28/2009US20090136667 Novel pore-forming precursors composition and porous dielectric layers obtained therefrom
05/28/2009US20090136666 Method for manufacturing polycrystalline silicon
05/28/2009US20090136665 Atomic layer deposition apparatus
05/28/2009US20090136664 Method for forming aluminide diffusion coatings
05/28/2009US20090136663 Vacuum vapor deposition apparatus and method, and vapor deposited article formed therewith
05/28/2009US20090136652 Showerhead design with precursor source
05/28/2009US20090136408 Polycrystalline silicon manufacturing apparatus and manufacturing method
05/28/2009US20090134121 Plasma processing apparatus and method
05/28/2009US20090134120 Plasma Processing Method and Plasma Processing Apparatus
05/28/2009US20090134010 Sputtering apparatus and sputtering method
05/28/2009US20090133838 Plasma Processor Apparatus
05/28/2009US20090133836 Adjustable height pif probe
05/28/2009US20090133835 Processing apparatus
05/28/2009US20090133755 Gas supply system and proessing system
05/28/2009US20090133742 Solar cell and method of manufacturing the same
05/28/2009US20090133715 Cleaning method
05/28/2009US20090133632 Safe liquid source containers
05/28/2009US20090133631 Coating device and method of producing an electrode assembly
05/28/2009US20090133630 Batch-Type Remote Plasma Processing Apparatus
05/28/2009US20090133629 In-line film-formation apparatus
05/28/2009US20090133628 Vacuum device for continuous processing of substrates
05/28/2009US20090133627 Substrate processing apparatus and method, and gas nozzle for improving purge efficiency
05/28/2009US20090133626 Apparatus for pecvd deposition of an internal barrier layer on a receptacle, the apparatus including an optical plasma analysis device
05/28/2009US20090133623 Metal film production apparatus and metal film production method
05/28/2009US20090133622 Plasma assisted apparatus for organic film deposition
05/28/2009US20090133515 Devices and Methods For Performing Inspections, Repairs, and/or Other Operations Within Vessels
05/28/2009CA2706255A1 Quick-change precursor manifold for large-area cvd and pecvd