| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 06/25/2009 | US20090159440 Batch-Type Remote Plasma Processing Apparatus |
| 06/25/2009 | US20090159431 Method for Forming Tantalum Nitride Film |
| 06/25/2009 | US20090159430 Method for Forming Tantalum Nitride Film |
| 06/25/2009 | US20090159214 Microwave plasma source and plasma processing apparatus |
| 06/25/2009 | US20090159212 Jet plasma gun and plasma device using the same |
| 06/25/2009 | US20090159007 Substrate support |
| 06/25/2009 | US20090159006 Thin film production apparatus and inner block for thin film production apparatus |
| 06/25/2009 | US20090159005 Coatings for semiconductor processing equipment |
| 06/25/2009 | US20090159004 Vertical chemical vapor deposition apparatus having nozzle for spraying reaction gas toward wafers |
| 06/25/2009 | US20090159003 Device for supplying organic metal compound |
| 06/25/2009 | US20090159002 Gas distribution plate with annular plenum having a sloped ceiling for uniform distribution |
| 06/25/2009 | US20090159001 Shower head of chemical vapor deposition apparatus |
| 06/25/2009 | DE102007063380A1 Beschichtungsvorrichtung zur Beschichtung eines Substrates bei Atmosphärenbedingungen A coating apparatus for coating a substrate under atmospheric conditions |
| 06/25/2009 | DE102007062977A1 Verfahren und Vorrichtung zur Herstellung von Prozessgasen für die Dampfphasenabscheidung Method and apparatus for the production of process gases for the vapor phase deposition |
| 06/25/2009 | DE102007025068B4 Gasbrenner Gas burner |
| 06/25/2009 | DE102005045718B4 Träger für ein Substrat Support for a substrate |
| 06/25/2009 | CA2706784A1 Coated article with nanolayered coating scheme |
| 06/24/2009 | EP2073253A1 Method for manufacturing electronic device using plasma reactor processing system |
| 06/24/2009 | EP2072633A2 Combustion deposition of metal oxide coatings deposited via infrared burners |
| 06/24/2009 | EP2072149A2 Device and method for manufacturing process gases for steam phase separation |
| 06/24/2009 | EP1261753B1 Machine for coating hollow bodies |
| 06/24/2009 | CN101466868A Device for introducing, injecting or spraying a mixture of a carrier gas and liquid compounds and method for implementing said device |
| 06/24/2009 | CN101466867A Catalyst body chemical vapor phase growing apparatus |
| 06/24/2009 | CN101466866A Thin film production apparatus and inner block for thin film production apparatus |
| 06/24/2009 | CN101466865A Method for making sedimentation of silicon nitride film and/or silicon nitride oxide film through chemical vapor deposition |
| 06/24/2009 | CN101466864A Film forming apparatus, film forming method, computer program and storage medium |
| 06/24/2009 | CN101466863A Process for forming cobalt-containing materials |
| 06/24/2009 | CN101463473A Shower plate electrode for plasma cvd reactor |
| 06/24/2009 | CN101463472A Deposition apparatus and deposition method |
| 06/24/2009 | CN100505175C Gas processing apparatus and film-forming apparatus |
| 06/24/2009 | CN100505167C Thermal treating apparatus |
| 06/24/2009 | CN100503883C Diamond cone and its making process |
| 06/24/2009 | CN100503882C Plasma assisted reaction heat chemical gas phase deposition method for preparing microcrystalline silicon germanium film |
| 06/24/2009 | CN100503879C Support for microelectronic, microoptoelectronic or micromechanical devices |
| 06/24/2009 | CN100503102C TiBN coating |
| 06/23/2009 | US7550816 Filled trench isolation structure |
| 06/23/2009 | US7550180 utilizing glow discharge produced by supplying high-frequency power into an inside-evacuated reactor through a high-frequency power supply means to treat the surface of a treatment target substrate; good efficiency; low cost |
| 06/23/2009 | US7550179 dissolving a copper precursor such as 1,3,4,5-Tetramethlylpyrazole(2,2,7-trimethyloctane-3,5-dionato)copper in a solvent (dodecane), contacting the substrate ( Si, SiO2 ) with the solution, heating, forming copper film |
| 06/23/2009 | US7550048 Method of manufacture using heat forming |
| 06/23/2009 | US7550046 Vapor deposition system using benzotriazole (BTA) and isopropyl alcohol for protecting copper interconnects |
| 06/23/2009 | CA2399951C Method and apparatus for inductively coupled plasma treatment |
| 06/23/2009 | CA2391911C Plasma processing apparatus with an electrically conductive wall |
| 06/18/2009 | WO2009075705A1 Method of making glass including surface treatment with aluminum chloride using combustion deposition prior to deposition of antireflective coating |
| 06/18/2009 | WO2009075650A1 A method of doping and apparatus for doping |
| 06/18/2009 | WO2009075629A1 Plasma activated chemical vapour deposition method and apparatus therefor |
| 06/18/2009 | WO2009075585A1 Method of depositing a doped zinc oxide film, a conductive zinc oxide film and use of the doped zinc oxide film |
| 06/18/2009 | WO2009075257A1 Silicon substrate and method for manufacturing the same |
| 06/18/2009 | WO2009074720A1 An hvpe reactor arrangement |
| 06/18/2009 | WO2009074715A1 Method for manufacturing an extremely hydrophobic surface |
| 06/18/2009 | WO2009073917A1 Method of metal coating and coating produced thereby |
| 06/18/2009 | WO2009040501A3 Method of patterning vapour deposition by printing |
| 06/18/2009 | WO2007001865A3 Plasma confinement rings including rf absorbing material for reducing polymer deposition |
| 06/18/2009 | WO2005079233A3 Films for optical use and methods of making such films |
| 06/18/2009 | US20090156852 such as di-tert-butyl germane; for use as vapor phase deposition precursors for Group IV metal-containing films; useful in the manufacture of electronic devices |
| 06/18/2009 | US20090156015 Deposition apparatus |
| 06/18/2009 | US20090156004 Method for forming tungsten materials during vapor deposition processes |
| 06/18/2009 | US20090156003 Method for depositing tungsten-containing layers by vapor deposition techniques |
| 06/18/2009 | US20090156002 Manufacturing method for semiconductor device and manufacturing apparatus for semiconductor device |
| 06/18/2009 | US20090155986 Method for manufacturing gallium nitride single crystalline substrate using self-split |
| 06/18/2009 | US20090155934 Deposition apparatus and deposition method |
| 06/18/2009 | US20090155619 Light Transmittance Optimizing Coated Glass Article for Solar Cell and Method for Making |
| 06/18/2009 | US20090155492 Method and apparatus for coating glass |
| 06/18/2009 | US20090155491 Film-forming method for forming metal oxide on substrate surface |
| 06/18/2009 | US20090155490 Method and device for the internal plasma treatment of hollow bodies |
| 06/18/2009 | US20090155489 generally applicable to rectangular (or square) large area plasma processing equipment, which is used in but not limited to LCD, Plasma Display and Solar Cell production) or any other reactor using electromagnetic waves (RF, VHF) for processing |
| 06/18/2009 | US20090155488 Shower plate electrode for plasma cvd reactor |
| 06/18/2009 | US20090155452 Thin film deposition apparatus and method thereof |
| 06/18/2009 | US20090154908 Delivery of Iodine Gas |
| 06/18/2009 | US20090152686 Film Forming Method for Dielectric Film |
| 06/18/2009 | US20090152243 Plasma processing apparatus and method thereof |
| 06/18/2009 | US20090152097 Plasma generating device and plasma generating method |
| 06/18/2009 | US20090151872 Low cost high conductance chamber |
| 06/18/2009 | US20090151781 Solar cell having spherical surface and method of manufacturing the same |
| 06/18/2009 | US20090151639 Gas processing apparatus and gas processing method |
| 06/18/2009 | US20090151638 Plasma processing apparatus |
| 06/18/2009 | US20090151637 Microwave-excited plasma source using ridged wave-guide line-type microwave plasma reactor |
| 06/18/2009 | US20090151636 Rpsc and rf feedthrough |
| 06/18/2009 | US20090151635 Adaptively Coupled Plasma Source Having Uniform Magnetic Field Distribution and Plasma Chamber Having the Same |
| 06/18/2009 | US20090151634 Apparatus for Manufacturing Magnetic Recording Disk, and In-Line Type Substrate Processing Apparatus |
| 06/18/2009 | US20090151633 Method and apparatus for generating a precursor for a semiconductor processing system |
| 06/18/2009 | DE112007001605T5 Zinkoxiddünnfilm vom p-Typ und Verfahren zur Ausbildung desselben The same p-type zinc oxide thin film and method of forming |
| 06/18/2009 | DE102008052750A1 Device for metal organic chemical vapor deposition, comprises reactor with upper- and lower cover, wafer-applying unit with susceptors, heating unit, rotary drive unit, gas supply unit with gas supply connections, and gas output unit |
| 06/17/2009 | EP2071054A2 Aluminia coating, coated product and method of making the same |
| 06/17/2009 | EP2071053A1 Filming method for iii-group nitride semiconductor laminated structure |
| 06/17/2009 | EP2071052A2 Copper film vapor phase deposition apparatus |
| 06/17/2009 | EP2069551A2 Apparatus and method of forming thin layers on substrate surfaces |
| 06/17/2009 | EP2069373A1 Organometallic precursor compounds |
| 06/17/2009 | EP2069369A1 Heteroleptic organometallic compounds |
| 06/17/2009 | EP1753958B1 Gas supply system for a pumping arrangement |
| 06/17/2009 | EP1729892B1 Method for coating a substrate using dielectric barrier discharge |
| 06/17/2009 | EP1718783B1 Pressure gradient cvi/cvd apparatus and method |
| 06/17/2009 | EP1687457A4 Metal carbide gate structure and method of fabrication |
| 06/17/2009 | EP1678353A4 Atomic layer deposition of hafnium-based high-k dielectric |
| 06/17/2009 | EP1628807A4 Substrate handling system |
| 06/17/2009 | EP1287187B1 Chemical vapor deposition process |
| 06/17/2009 | CN201258359Y Conveying station at charging and discharging ends of PECVD equipment |
| 06/17/2009 | CN101460660A Method of forming a layer of material using an atomic layer deposition process |
| 06/17/2009 | CN101460659A Gas flow control by differential pressure measurements |
| 06/17/2009 | CN101460658A Method of forming mixed rare earth oxide and aluminate films by atomic layer deposition |
| 06/17/2009 | CN101460657A Method of forming high-k dielectric films based on novel titanium, zirconium, and hafnium precursors and their use for semiconductor manufacturing |