Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
07/2009
07/02/2009US20090169781 Low thermal conductivity low density pyrolytic boron nitride material, method of making, and articles made therefrom
07/02/2009US20090169770 Moisture barrier coatings
07/02/2009US20090169769 Deposition apparatus and deposition method
07/02/2009US20090169768 Substrate processing method and substrate processing apparatus
07/02/2009US20090169744 Apparatus of chemical vapor deposition with a showerhead regulating injection velocity of reactive gases postively and method thereof
07/02/2009US20090169743 Arrangement in Connection with ALD Reactor
07/02/2009US20090169742 Coated silicon comprising material for protection against environmental corrosion
07/02/2009US20090169726 Body having a junction and method of manufacturing the same
07/02/2009US20090169720 Vacuum vapor desposition apparatus
07/02/2009US20090169719 Method for printing high quality images on curved substrates
07/02/2009US20090169718 Unit and method for preparing an opening device for gluing to a respective sealed package of a pourable food product
07/02/2009US20090169344 Substrate processing apparatus and substrate processing method
07/02/2009US20090169315 CVD Coated Cutting Tool Insert for Milling
07/02/2009US20090168297 Semiconductor device and method for manufacturing the same
07/02/2009US20090166622 Plasma processing apparatus and semiconductor element manufactured by such apparatus
07/02/2009US20090165955 Plasma processing apparatus and method with controlled biasing functions
07/02/2009US20090165954 Electrically enhancing the confinement of plasma
07/02/2009US20090165953 Plasma Reactor
07/02/2009US20090165722 Apparatus for treating substrate
07/02/2009US20090165721 Susceptor with Support Bosses
07/02/2009US20090165720 Substrate treating apparatus
07/02/2009US20090165719 Epitaxial barrel susceptor having improved thickness uniformity
07/02/2009US20090165718 Gas injector and film deposition apparatus having the same
07/02/2009US20090165717 Gas injection unit and thin film deposition apparatus having the same
07/02/2009US20090165716 Method and system for plasma enhanced chemical vapor deposition
07/02/2009US20090165715 Vapor deposition reactor
07/02/2009US20090165714 Method and system for processing substrates in chambers
07/02/2009US20090165713 Chemical vapor deposition apparatus
07/02/2009DE3907799A1 Hochgradig breitbandige Signalverarbeitungsvorrichtung aus supraleitendem Material, Anwendung auf Mikrowellenschaltung und Verfahren zur Herstellung einer solchen Vorrichtung Highly wideband signal processing apparatus of superconducting material, application to the microwave circuit and method for manufacturing such a device
07/02/2009DE10211332B4 Vorrichtung und Verfahren zur Aktivierung von Gasen im Vakuum sowie Verwendung der Vorrichtung Apparatus and method for activation of gases in the vacuum as well as using the apparatus
07/02/2009DE102008057909A1 Vorrichtung für die chemische Gasphasenabscheidung An apparatus for chemical vapor deposition
07/02/2009DE102007061647A1 Implantat mit einem Grundkörper aus einer biokorrodierbaren Legierung Implant with a body of a biocorrodible alloy
07/01/2009EP2075233A2 Silicon seed rod assembly of polycrystalline silicon, method of forming the same, polycrystalline silicon producing apparatus, and method of producing polycrystalline silicon
07/01/2009EP2074244A2 Crystal growth method and reactor design
07/01/2009EP2074241A1 Coated cutting tool
07/01/2009EP2074239A1 Low temperature method of making a zinc oxide coated article
07/01/2009EP2074129A1 Silicon precursors and method for low temperature cvd of silicon-containing films
07/01/2009CN101473064A Silicon thin-film and method of forming silicon thin-film
07/01/2009CN101473063A CVD coating scheme including alumina and/or titanium-containing materials and method of making the same
07/01/2009CN101473062A Methods to improve the in-film defectivity of PECVD amorphous carbon films
07/01/2009CN101473061A Apparatuses, systems and methods for rapid cleaning of plasma confinement rings with minimal erosion of other chamber parts
07/01/2009CN101473060A Vacuum processing chamber suitable for etching high aspect ratio features and components of same
07/01/2009CN101469418A Control method for plasma reinforced chemical meteorology deposition apparatus
07/01/2009CN101469417A Deposition apparatus and deposition method
07/01/2009CN101469416A Apparatus for treating substrate
07/01/2009CN101469415A Plasma auxiliary organic thin film deposition apparatus
07/01/2009CN101469414A Reaction chamber structure of plate type plasma reinforced chemical vapor deposition apparatus
07/01/2009CN101469413A Method for forming film
07/01/2009CN101469412A Thin film deposition device and method thereof
07/01/2009CN101469411A Chemical vapor deposition apparatus
07/01/2009CN101469410A Substrate processing using the vapor supplying apparatus
07/01/2009CN101469409A Composite aluminum oxide /erbium hydrogen resistance coating and preparation thereof
07/01/2009CN101469408A Method for depositing diamond-like carbon film on stainless steel substrate
07/01/2009CN100508134C Plasma processing method and plasma processing apparatus
07/01/2009CN100508112C Method for manufacturing semiconductor device
07/01/2009CN100507073C Receptor system
06/2009
06/30/2009US7554161 HfAlO3 films for gate dielectrics
06/30/2009US7554053 Corrugated plasma trap arrangement for creating a highly efficient downstream microwave plasma system
06/30/2009US7553518 Substrate processing method
06/30/2009US7553517 Method of applying a cerium diffusion coating to a metallic alloy
06/30/2009US7553516 System and method of reducing particle contamination of semiconductor substrates
06/30/2009US7553514 perfluoropolyether endcapped with hydroxyperfluoroalkylsilanetriol containing sulfide in backbone compounds; treating substrates having a hard surface such as ceramics or glass, to render them water, oil, stain, and dirt repellent; used in ophthalmic eyewear; reduce eyestrain
06/30/2009US7553467 Tubular reaction vessel and process for producing silicon therewith
06/30/2009US7553370 Crystal growth method for nitride semiconductor and formation method for semiconductor device
06/30/2009US7553368 Process for manufacturing a gallium rich gallium nitride film
06/30/2009US7552521 Method and apparatus for improved baffle plate
06/25/2009WO2009079184A2 Coated article with nanolayered coating scheme
06/25/2009WO2009078980A2 Electrode tuning method and apparatus for a layered heater structure
06/25/2009WO2009078354A1 Processing method and semiconductor device manufacturing method
06/25/2009WO2009078310A1 Heat treatment apparatus, and method for controlling the same
06/25/2009WO2009078293A1 Liquid material vaporization apparatus
06/25/2009WO2009078153A1 Apparatus and method for manufacturing photoelectric conversion elements, and photoelectric conversion element
06/25/2009WO2009078124A1 Epitaxial growth method
06/25/2009WO2009077660A1 A glass product and a method for manufacturing a glass product
06/25/2009WO2009077658A1 Method and apparatus for generating plasma
06/25/2009WO2009060194A3 Plasma deposition apparatus
06/25/2009WO2009052453A3 Plasma doping system with charge control
06/25/2009WO2009045740A3 Method for depositing films using gas cluster ion beam processing
06/25/2009WO2007038195A3 Microwave reactor having a slotted array waveguide
06/25/2009WO2005084231A3 Germanium deposition
06/25/2009US20090163040 Substrate Processing Apparatus and Manufacturing Method of Semiconductor Device
06/25/2009US20090163038 Heat treatment method, heat treatment apparatus and substrate processing apparatus
06/25/2009US20090163037 Manufacturing method of semiconductor device and substrate processing apparatus
06/25/2009US20090163034 Composite showerhead electrode assembly for a plasma processing apparatus
06/25/2009US20090162997 Thin diamond like coating for semiconductor processing equipment
06/25/2009US20090162952 Apparatus and method for controlling edge performance in an inductively coupled plasma chamber
06/25/2009US20090162697 Chlorine, fluorine and lithium co-doped transparent conductive films and methods for fabricating the same
06/25/2009US20090162673 Cubic nitride templates
06/25/2009US20090162572 Systems and Methods for the Production of Highly Tetrahedral Amorphous Carbon Coatings
06/25/2009US20090162571 Method and Device for Producing Process Gases for Vapor Phase Deposition
06/25/2009US20090162570 Apparatus and method for processing a substrate using inductively coupled plasma technology
06/25/2009US20090162565 Method for Forming Tantalum Nitride Film
06/25/2009US20090162562 Methods for Applying Thermal Barrier Coating Systems
06/25/2009US20090162561 Methods for making barrier coatings comprising taggants and components having the same
06/25/2009US20090162551 Hafnium oxide ald process
06/25/2009US20090162550 Copper (i) amidinates and guanidinates, mixed ligand copper complexes, and compositions for chemical vapor deposition, atomic layer deposition, and rapid vapor deposition of copper
06/25/2009US20090162549 Method for Applying a Diamond Layer Onto a Graphite Substrate
06/25/2009US20090162535 Method of forming a phosphor or scintillator material and vapor deposition apparatus used therefor
06/25/2009US20090159808 EUV light source components and methods for producing, using and refurbishing same
06/25/2009US20090159566 Method and apparatus for controlling temperature of a substrate