Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
07/2009
07/14/2009US7560581 reaction of vapors of tungsten bis(alkylimide)bis(dialkylamide) and a Lewis base or hydrogen plasma; very uniform thickness and excellent step coverage; good electrical conductors; microelectronics; similarly depositing molybdenum nitride suitable for layers alternating with silicon in X-ray mirrors
07/14/2009US7560393 Systems and methods of forming refractory metal nitride layers using disilazanes
07/14/2009US7560377 Plasma processes for depositing low dielectric constant films
07/14/2009US7560376 Method for adjoining adjacent coatings on a processing element
07/14/2009US7560160 Multifunctional particulate material, fluid, and composition
07/14/2009US7560139 Thermostructural composite structure with a compositional gradient, its manufacturing process
07/14/2009US7560138 Oxidation resistant coatings for ultra high temperature transition metals and transition metal alloys
07/14/2009US7560136 Methods of using thin metal layers to make carbon nanotube films, layers, fabrics, ribbons, elements and articles
07/14/2009US7560038 Thin film forming method and system
07/14/2009US7559992 Semiconductor processing apparatus and method
07/14/2009CA2468270C Method of making window unit including diamond-like carbon (dlc) coating
07/14/2009CA2466900C Method of manufacturing windshield using ion beam milling of glass substrate(s)
07/14/2009CA2444766C Method and apparatus for sequential plasma treatment
07/09/2009WO2009086263A1 Methods for preparing thin films using substituted pyrrolyl-metal precursors
07/09/2009WO2009086259A1 Epitaxial barrel susceptor having improved thickness uniformity
07/09/2009WO2009086257A2 Susceptor with support bosses
07/09/2009WO2009086038A1 Method for sputter targets for electrolyte films
07/09/2009WO2009085974A2 Low wet etch rate silicon nitride film
07/09/2009WO2009085561A2 Methods for in-situ chamber cleaning process for high volume manufacture of semiconductor materials
07/09/2009WO2009085376A2 Separate injection of reactive species in selective formation of films
07/09/2009WO2009085094A2 Euv light source components and methods for producing, using and refurbishing same
07/09/2009WO2009084966A1 Formation of a lithium comprising structure on a substrate by ald
07/09/2009WO2009084437A1 Vacuum processing device, vacuum processing method, and computer-readable storage medium
07/09/2009WO2009084431A1 Semiconductor material, method for manufacturing semiconductor material, and semiconductor element
07/09/2009WO2009084408A1 Film formation device and film formation method
07/09/2009WO2009084154A1 Susceptor for epitaxial growth
07/09/2009WO2009084005A1 A process for the preparation of photo luminescent nanostructured silicon thin films
07/09/2009WO2009083778A2 Silicon nitride sealing rings with diamond coating
07/09/2009WO2009083673A1 Method of producing a hydrogenated amorphous carbon coating
07/09/2009WO2009083245A2 A method of giving an article a coloured appearance and an article having a coloured appearance
07/09/2009WO2009082986A1 Plasma enhanced chemical vapor deposition method as well as the system therefor
07/09/2009WO2009082985A1 A system and process for processing the substrate in the chamber
07/09/2009US20090177432 Apparatus and method for real time measurement of substrate temperatures for use in semiconductor growth and wafer processing
07/09/2009US20090176646 Catalyst support using cellulose fibers, preparation method thereof, supported catalyst comprising nano-metal catalyst supported on carbon nanotubes directly grown on surface of the catalyst support, and method of preparing the supported catalyst
07/09/2009US20090176355 Plasma Doping Method and Plasma Processing Device
07/09/2009US20090176142 Corrosion resistant metal composite for electrochemical devices and methods of producing the same
07/09/2009US20090176120 Highly electrically conductive surfaces for electrochemical applications
07/09/2009US20090176116 Gas-barrier film, device and optical component comprising same, and method for producing gas-barrier film
07/09/2009US20090176064 Membrane Structure Element and Method for Manufacturing Same
07/09/2009US20090176036 Method of organic material vacuum evaporation and apparatus thereof
07/09/2009US20090176020 Apparatus and method for treating and impregnating porous structures
07/09/2009US20090176017 Substrate processing apparatus
07/09/2009US20090176016 Vaporization apparatus with precise powder metering
07/09/2009US20090176008 Method and arrangement for synchronized positioning of at least one essentially continuous material web
07/09/2009US20090175777 Single crystal diamond prepared by cvd
07/09/2009US20090173446 Substrate support, substrate processing apparatus including substrate support, and method of aligning substrate
07/09/2009US20090173444 Surface processing apparatus
07/09/2009US20090173280 Vacuum coating system comprising a transport unit for transporting substrates
07/09/2009US20090173279 Vacuum vapor deposition apparatus
07/09/2009DE102007055936A1 Aerosolerzeugerdüse, Aerosolerzeugersystem, Beschichtungssystem und Verfahren Aerosolerzeugerdüse, aerosol generator system, coating system and method
07/08/2009EP2077345A1 Method for manufacturing gallium nitride single crystalline substrate using self-split
07/08/2009EP2077344A1 Method of applying a diamond layer to a graphite substrate
07/08/2009EP2077341A1 Method for aluminising a metal part of a turbomachine in vapour phase
07/08/2009EP1680528B1 Heat treatable coated article with diamond-like carbon (dlc) coating
07/08/2009EP1620294A4 Chemical vapor deposition epitaxial growth
07/08/2009EP1550144A4 System for and method of gas cluster ion beam processing
07/08/2009EP1532156B1 Dihydrocarbylamino metal compounds
07/08/2009EP1451118B1 Buffing diamond-like carbon (dlc) to improve scratch resistance
07/08/2009EP1412175B1 Insulating and functionalizing fine metal-containing particles with comformal ultra-thin films
07/08/2009EP1397528B1 Cvd reactor with exhaust ring made of graphite
07/08/2009CN101479403A Plasma deposition apparatus and method for making solar cells
07/08/2009CN101479402A Vaporizer/supplier of material and automatic pressure regulator for use therein
07/08/2009CN101479401A Wear-resistant coating and production method for the same
07/08/2009CN101477846A Method for producing a transparent base with transparent conductive film
07/08/2009CN101476116A Device and method for deposition
07/08/2009CN101476115A Vaporizer delivery ampoule
07/08/2009CN101476114A Pretreatment method for plasma apparatus cavity maintenance
07/08/2009CN101476113A Method for preparing boron doped conductive diamond thin film by chemical vapor deposition
07/08/2009CN101476112A ALD or CVD process for producing germanium-antimony-tellurium films
07/08/2009CN100511594C Hafnium-aluminum oxide dielectric films
07/08/2009CN100511583C Plasma processing device
07/08/2009CN100510170C System and technique for chemically gas-phase Zn(O,S) film through DC glow discharge plasma
07/08/2009CN100510169C Large area VHF-PECVD reaction chamber electrode capable of obtaining even electric field
07/08/2009CN100510168C Two-layer film for next generation damascene barrier application with good oxidation resistance
07/08/2009CN100510167C Inverse baking deposition structure in chemical vapor deposition equipment for metal organic matter
07/08/2009CN100510154C Al composite material being crumbled with water, Al film and al powder comprising the material and methods for preparation thereof, constitutional member for film-forming chamber method for recovering
07/08/2009CN100509115C Device and method for processing discharged air current and a system for pumping vacuum for processing chamber
07/07/2009US7557229 Atomic layer deposition using metal amidinates
07/07/2009US7556982 Method to grow pure nanocrystalline diamond films at low temperatures and high deposition rates
07/07/2009US7556840 Subjecting engine components to chemical vapor deposition by treatment with one or more precursors for about five hours to form an inert oxide layer over surface of the engine component having a thickness of approximately 1-5 microns; protective coatings
07/07/2009US7556839 Method of manufacturing semiconductor device and apparatus for processing substrate
07/07/2009US7556721 Physical vapor deposition; allows for deposition of blue thin film electroluminescent phosphors with high luminance and colors required for TV applications
07/07/2009US7556720 Electrostatic charge-free container and method of manufacturing such a container
07/07/2009US7556695 Apparatus to make nanolaminate thermal barrier coatings
07/07/2009US7556244 Method and apparatus to help promote contact of gas with vaporized material
07/02/2009WO2009082608A1 Apparatus for delivering precursor gases to an epitaxial growth substrate
07/02/2009WO2009081903A1 System for processing subject to be processed and method for controlling the system
07/02/2009WO2009081897A1 Filming treatment jig, plasma cvd apparatus, and metal plate and osmium film forming method
07/02/2009WO2009081797A1 Material for formation of nickel-containing film, and method for production thereof
07/02/2009WO2009081383A1 Germanium precursors for gst film deposition
07/02/2009WO2009081380A2 Low decomposition storage of a tantalum precursor
07/02/2009WO2009080943A1 Apparatus and method for treating a surface by means of a dielectric barrier discharge in a gas, enabling two substrates to be treated simultaneously
07/02/2009WO2009080889A1 Coating method
07/02/2009WO2009080610A1 A substrate coated with amorphous hydrogenated carbon
07/02/2009WO2009080010A1 Coating device for coating a substrate under atmospheric conditions
07/02/2009US20090170343 Method and apparatus for treating a semi-conductor substrate
07/02/2009US20090169968 Amorphous carbon film, process for forming amorphous carbon film, conductive member provided with amorphous carbon film, and fuel cell separator
07/02/2009US20090169868 Methods and apparatus for transferring a material onto a substrate using a resonant infrared pulsed laser
07/02/2009US20090169866 Nanocomposite materials with dynamically adjusting refractive index and methods of making the same
07/02/2009US20090169790 Reinforced tube