Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
07/2009
07/23/2009US20090186191 Method of making a transparent metal oxide coated glass panel for photovoltaic module
07/23/2009US20090186154 Method of forming a diffusion bonding enhanced layer on al2o3 ceramic tools
07/23/2009US20090183834 Plasma generation apparatus
07/23/2009US20090183833 Plasma processing apparatus
07/23/2009US20090183771 Plasma processing apparatus, plasma processing method and photoelectric conversion element
07/23/2009US20090183684 Plasma Treatment Device
07/23/2009US20090183683 Plasma Processing Apparatus and Method for Venting the Same to Atmosphere
07/23/2009US20090183682 Source container of a vpe reactor
07/23/2009US20090183681 Slotted Electrode and Plasma Apparatus Using the Same
07/23/2009US20090183680 Electrode with Improved Plasma Uniformity
07/23/2009US20090183679 Ion source gas reactor
07/23/2009DE102008036642A1 Sprühkopf und CVD-Vorrichtung, welche diesen aufweist Spray head and CVD apparatus having this
07/23/2009DE102008005283A1 Verfahren zur Herstellung einer mit einem transparenten Metalloxid beschichteten Glasscheibe für ein photovoltaisches Modul A process for preparing a coated glass sheet with a transparent metal oxide for a photovoltaic module
07/23/2009CA2712249A1 Low thermal conductivity, cmas-resistant thermal barrier coatings
07/22/2009EP2080821A1 Article having cobalt-phosphorous coating and method for heat treating
07/22/2009EP2080817A1 Method and apparatus for chamber cleaning by in-situ plasma excitation
07/22/2009EP2080613A1 Gas barrier film laminate
07/22/2009EP2080216A1 Method for forming a film with a graded bandgap by deposition of an amorphous material from a plasma
07/22/2009EP2079783A1 Picvd coating for plastic containers
07/22/2009EP2079751A1 New group v metal containing precursors and their use for metal containing film deposition
07/22/2009EP2006414A9 Atomic layer growing apparatus
07/22/2009EP1423551B1 Method for producing a nanostructured functional coating and a coating that can be produced according to said method
07/22/2009CN101490307A Film formation method, cleaning method, and film formation device
07/22/2009CN101490306A Apparatus and method for controlling plasma potential
07/22/2009CN101487114A Low temperature polysilicon thin-film device and method of manufacturing the same
07/22/2009CN100517729C Thin film transistor array substrate and method of fabricating the same
07/22/2009CN100517608C Amorphous dielectric thin film and manufacturing method thereof
07/22/2009CN100517598C Shower head and film-forming device using the same
07/22/2009CN100517589C Teater
07/22/2009CN100517553C System and method for inductive coupling of an expanding thermal plasma
07/22/2009CN100516576C Counter track joint having track inflection point, and transmission shaft and motor vehicle comprising the same
07/22/2009CN100516292C Method for detecting exception condition of tungsten chemical vapor deposition equipment
07/22/2009CN100516291C Plasma treatment device
07/22/2009CN100516290C High heat-resistance hollow out substrate working platform capable of multiple-surface depositing CVD diamond film
07/22/2009CN100516289C Organometallic compounds
07/22/2009CN100516288C Ultrasonic-atomizing heat-decomposing compound semiconductor film preparing system
07/22/2009CN100516287C Apparatus for cleaning chamber using gas separation type showerhead
07/21/2009US7564008 Alumina member and manufacturing method thereof
07/21/2009US7563729 Method of forming a dielectric film
07/21/2009US7563728 Methods of modifying interlayer adhesion
07/21/2009US7563696 Semiconductor device manufacturing apparatus and semiconductor device manufacturing method
07/21/2009US7563659 Method of fabricating poly-crystalline silicon thin film and method of fabricating transistor using the same
07/21/2009US7563488 Construction of a sputtering target by spraying
07/21/2009US7563481 Method and apparatus for processing polysilazane film
07/21/2009US7563328 Method and apparatus for gas injection system with minimum particulate contamination
07/21/2009US7563042 Substrate carrying apparatus, substrate carrying method, and coating and developing apparatus
07/21/2009US7562638 Methods and arrangement for implementing highly efficient plasma traps
07/16/2009WO2009088867A2 Method for printing high quality images on curved substrates
07/16/2009WO2009088522A2 Cobalt nitride layers for copper interconnects and methods for forming them
07/16/2009WO2009088471A1 Low thermal conductivity low density pyrolytic boron nitride material, method of making, and articles made therefrom
07/16/2009WO2009088444A1 Vaporization apparatus with precise powder metering
07/16/2009WO2009087906A1 Film forming method and film forming apparatus
07/16/2009WO2009087887A1 Plasma processing apparatus
07/16/2009WO2009087708A1 Photoelectromotive element, and its manufacturing method
07/16/2009WO2009087104A1 Dosimeter based on monocrystalline synthetic diamond
07/16/2009WO2009086772A1 Gas distribution system and semiconductor processing device using the gas distribution system
07/16/2009WO2009049020A3 Chemical vapor deposition reactor
07/16/2009US20090181526 Plasma Doping Method and Apparatus
07/16/2009US20090181524 Method of manufacturing semiconductor device and apparatus for processing substrate
07/16/2009US20090181523 Method of manufacturing semiconductor device and apparatus for processing substrate
07/16/2009US20090181441 Porous silicon-polymer composites for biosensor applications
07/16/2009US20090181283 Regeneration method of separator for fuel cell, regenerated separator for fuel cell and fuel cell
07/16/2009US20090181249 Paper substrate comprising vapour deposited triazine, and process for making a laminate comprising said substrate
07/16/2009US20090181212 Process for fabricating amorphous hydrogenated silicon carbide films provided with through-pores and films thus obtained
07/16/2009US20090181186 Plasma arc coating system
07/16/2009US20090181185 Method and apparatus for surface treatment of containers or objects
07/16/2009US20090181178 SiCOH DIELECTRIC MATERIAL WITH IMPROVED TOUGHNESS AND IMPROVED Si-C BONDING, SEMICONDUCTOR DEVICE CONTAINING THE SAME, AND METHOD TO MAKE THE SAME
07/16/2009US20090181169 Method for growing thin films
07/16/2009US20090181168 Solid precursor sublimator
07/16/2009US20090178762 Substrate processing apparatus
07/16/2009US20090178694 Substrate processing apparatus
07/16/2009US20090178621 Substrate treating system for depositing a metal gate on a high-k dielectric film and improving high-k dielectric film and metal gate interface
07/16/2009US20090178620 Process for Depositing Thin Layers on a Substrate in a Process Chamber of Adjustable Height
07/16/2009US20090178619 Substrate processing apparatus
07/16/2009US20090178618 Multilayered boron nitride/silicon nitride fiber coatings
07/16/2009US20090178617 Rf grounding of cathode in process chamber
07/16/2009US20090178616 Apparatus for chemical vapor deposition (cvd) with showerhead
07/16/2009US20090178615 Showerhead and chemical vapor deposition apparatus having the same
07/16/2009US20090178614 Film-forming apparatus
07/16/2009US20090178611 Gallium trichloride injection scheme
07/16/2009DE102008004308A1 Durchführung für eine Batterie, Verfahren zur Herstellung derselben und Batterie Implementation for a battery, method of preparing the same and battery
07/16/2009DE10155712B4 Zinkoxid-Schicht und Verfahren zu dessen Herstellung Zinc oxide layer, and process for its preparation
07/15/2009EP2078103A1 Method for easy-to-clean substrates and articles therefrom
07/15/2009EP2078102A2 Antimony and germanium complexes useful for cvd/ald of metal thin films
07/15/2009EP1472195B1 Method for coating the quartz burner of an hid lamp
07/15/2009CN101484609A Film deposition method, film deposition apparatus, and storage medium
07/15/2009CN101481798A Film forming method and film forming device using plasma CVD
07/15/2009CN101481797A Gas injection unit and thin film deposition apparatus having the same
07/15/2009CN101481796A Gas injector and film deposition apparatus having the same
07/15/2009CN101481795A Continuous plasma reinforced chemical vapor deposition reaction chamber for preparing amorphous silicon film
07/15/2009CN101481794A Film formation method and apparatus for semiconductor process
07/15/2009CN101481793A Large area microwave plasma CVD device
07/15/2009CN101481792A Preparation of boron doped diamond superconduction material
07/15/2009CN100514574C Method for forming film, method for manufacturing semiconductor device, semiconductor device and substrate treatment system
07/15/2009CN100513637C Method for producing semi-conducting devices and devices obtained with this method
07/15/2009CN100513636C Organometallic compounds
07/15/2009CN100513635C Driving mechanism for vacuum process equipment
07/15/2009CN100513632C Thin film forming device and thin film forming method
07/14/2009US7560793 Atomic layer deposition and conversion
07/14/2009US7560668 Substrate processing device