Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
08/2009
08/04/2009US7569284 Incorporation of nitrogen into high k dielectric film
08/04/2009US7569256 Plasma CVD apparatus and dry cleaning method of the same
08/04/2009US7569251 Method of forming a thermal protective coating on a super alloy metal substrate
08/04/2009US7569191 Pentakis(dimethylamino) tantalum; vapor deposition; sublimation to produce the gas
08/04/2009CA2486594C Connector for expandable downhole tubulars
07/2009
07/30/2009WO2009094263A1 Organometallic compounds, processes and methods of use
07/30/2009WO2009094262A1 Organometallic compounds, processes and methods of use
07/30/2009WO2009094259A1 Organometallic compounds processes and methods of use
07/30/2009WO2009093994A1 Metal catalyzed selective deposition of materials including germanium and antimony
07/30/2009WO2009093581A1 Insulating film material, film forming method using the insulating film material, and insulating film
07/30/2009WO2009093527A1 Alloy to be surface-coated and sliding members
07/30/2009WO2009093459A1 Atomic layer growing apparatus and thin film forming method
07/30/2009WO2009093417A1 Susceptor and vapor phase growth system and vapor phase growth method
07/30/2009WO2009093366A1 Metal compound, chemical vapor deposition material containing the same, and method for producing metal-containing thin film
07/30/2009WO2009093171A1 Improved phase control in hf- or zr-based high-k oxides
07/30/2009WO2009092459A1 Vacuum coating apparatus and method
07/30/2009WO2009061668A8 Solution based lanthanum precursors for atomic layer deposition
07/30/2009US20090192652 Substrate processing apparatus and substrate processing method
07/30/2009US20090191717 Atomic layer deposition apparatus
07/30/2009US20090191352 Combustion-Assisted Substrate Deposition Method For Producing Carbon Nanosubstances
07/30/2009US20090191349 Aerosol generator, method for generating aerosol, film forming apparatus, and method for manufacturing film forming body
07/30/2009US20090191340 Substrate processing method and system
07/30/2009US20090191339 electrodeposition; chemical vapor deposition; atomic layer deposition
07/30/2009US20090191338 Film-Deposition Apparatus and Film-Deposition Method
07/30/2009US20090191337 Gas supply system, substrate processing apparatus and gas supply method
07/30/2009US20090191336 Method and apparatus for simpified startup of chemical vapor deposition of polysilicon
07/30/2009US20090191109 Exhaust structure of film-forming apparatus, film-forming apparatus, and method for processing exhaust gas
07/30/2009US20090191042 Semiconductor device manufacturing apparatus and wafer loading/unloading method thereof
07/30/2009US20090188643 Creping blade
07/30/2009US20090188626 Plasma jet device
07/30/2009US20090188526 Process of cleaning a semiconductor manufacturing system and method of manufacturing a semiconductor device
07/30/2009US20090188431 Substrate processing apparatus and method for manufacturing a semiconductor device
07/30/2009DE112007001521T5 Organometallische Verbindungen Organometallic compounds
07/30/2009DE102005051685B4 Werkstück aus einem Siliciumnitridsubstrat sowie Verfahren zu seiner Herstellung Workpiece made of a silicon nitride substrate, and methods for its preparation
07/29/2009EP2083096A1 Antimony precursors for GST Films In ALD/CVD processes
07/29/2009EP2083095A2 Diamond-like carbon film for sliding parts and method for production thereof
07/29/2009EP2082996A1 Improved method for depositing a metal-containing coating on a substrate
07/29/2009EP2082856A2 Mold for extrusion forming of ceramic articles
07/29/2009EP2082814A1 Reactor cleaning apparatus
07/29/2009EP2082078A2 Formation of high quality dielectric films of silicon dioxide for sti: usage of different siloxane-based precursors for harp ii - remote plasma enhanced deposition processes
07/29/2009EP2082077A2 System and method including a particle trap/filter for recirculating a dilution gas
07/29/2009EP2007917B1 Method for depositing silicon nitride films and/or silicon oxynitride films by chemical vapor deposition
07/29/2009EP1937867A4 Deposition apparatus for the formation of polycrystalline materials on mobile substrates
07/29/2009EP1834008B1 Al2o3 multilayer plate
07/29/2009EP1815041A4 Wafer fab
07/29/2009EP1592822B1 Disk coating system
07/29/2009EP1390174A4 Apparatus and method for controlling temperature uniformity of substrates
07/29/2009EP1312695B1 Sputtering target producing few particles, backing plate provided with the target, and a method of producing the target
07/29/2009CN101495675A Chemical vapor deposition reactor having multiple inlets
07/29/2009CN101495674A Method for forming porous insulating film
07/29/2009CN101495673A CVD film forming method and CVD film forming apparatus
07/29/2009CN101495672A Antimony and germanium complexes useful for CVD/ALD of metal thin films
07/29/2009CN101495671A System architecture and method for solar panel formation
07/29/2009CN101495670A Plasma confinement ring assemblies having reduced polymer deposition characteristics
07/29/2009CN101495669A Bonded multi-layer RF window
07/29/2009CN101495668A Wafer support pin assembly
07/29/2009CN101492812A Nozzle system capable of continuously evening chemical vapour deposition of large area
07/29/2009CN100521103C Plasma processing apparatus and method
07/29/2009CN100521086C Methods of forming metal-comprising materials and capacitor electrodes, and capacitor constructions
07/29/2009CN100521083C Processing method, compress control method, transmitting method and transmitting device
07/29/2009CN100521013C Foil for negative electrode of capacitor and process for producing the same
07/29/2009CN100520503C Vacuum pumping system, driving method thereof, apparatus having the same, and method of transferring substrate by using the system
07/29/2009CN100520382C Plasma monitoring method, plasma monitor and plasma treatment appts.
07/29/2009CN100519837C Thin films and a method for producing the same
07/29/2009CN100519836C Large area VHF-PECVD reaction chamber special-shaped electrode capable of obtaining even electric field
07/29/2009CN100519835C Growth silicon based thin film and PECVD equipment for high-efficiency silicon based thin-film solar cell
07/29/2009CN100519834C Device and method for manufacturing thin films
07/29/2009CN100519833C Shower head, thin films manufacturing device and manufacturing method
07/29/2009CN100519832C Method for forming film
07/29/2009CN100519831C Annealing single crystal chemical vapor depositon diamonds
07/29/2009CN100519830C Machine for the treatment of bottles that are equipped with an interchangeable connection cartridge
07/28/2009US7566957 Support device with discrete getter material microelectronic devices
07/28/2009US7566938 Deposition of hafnium oxide and/or zirconium oxide and fabrication of passivated electronic structures
07/28/2009US7566665 Semiconductor device manufacturing method and manufacturing line thereof
07/28/2009US7566481 Method of making scratch resistant coated glass article including layer(s) resistant to fluoride-based etchant(s)
07/28/2009US7566478 Methods of making carbon nanotube films, layers, fabrics, ribbons, elements and articles
07/28/2009US7566477 Thermal chemical vapor deposition
07/28/2009US7566438 Method for manufacturing nanostructured manganese oxide having dendritic structure, and oxygen reduction electrode comprising nanostructured transition metal oxide having dendritic structure
07/28/2009US7566379 Method and apparatus for an improved upper electrode plate with deposition shield in a plasma processing system
07/28/2009US7566378 Arrangement of electronic semiconductor components on a carrier system for treating said semiconductor components with a liquid medium
07/28/2009US7566368 Method and apparatus for an improved upper electrode plate in a plasma processing system
07/28/2009US7565880 Plasma CVD apparatus, and method for forming film and method for forming semiconductor device using the same
07/28/2009US7565879 Plasma processing apparatus
07/23/2009WO2009091724A1 Low thermal conductivity, cmas-resistant thermal barrier coatings
07/23/2009WO2009091721A2 Cmas-resistant thermal barrier coatings
07/23/2009WO2009091384A1 Nanofilm protective and release matrices
07/23/2009WO2009091376A2 Method and apparatus for high-pressure atomic-beam laser induced deposition/etching
07/23/2009WO2009091311A1 A biocompatible filter member for body fluid dialysis and fabrication and use thereof
07/23/2009WO2009090987A1 Atmospheric plasma discharge treating apparatus, and atmospheric plasma discharge treating method
07/23/2009WO2009090904A1 Method for growing group iii nitride crystal
07/23/2009WO2009090899A1 Placing table apparatus, processing apparatus and temperature control method
07/23/2009WO2009090839A1 Film-forming apparatus
07/23/2009WO2009090504A1 Apparatus for providing material on a deposition surface
07/23/2009WO2009070855A3 Enhancing catalytic activity of nanoporous materials
07/23/2009US20090186980 Manufacturing method of low-k thin films and low-k thin films manufactured therefrom
07/23/2009US20090186479 Semiconductor processing system including vaporizer and method for using same
07/23/2009US20090186467 Substrate Processing Apparatus and Producing Method of Semiconductor Device
07/23/2009US20090186214 Method of growing carbon nanomaterials on various substrates
07/23/2009US20090186206 Diamond-like carbon film for sliding parts and method for production thereof
07/23/2009US20090186194 Batch Process for Coating Nanoscale Features and Devices Manufactured From Same