Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
08/2009
08/06/2009WO2009096515A1 Microwave plasma processing device
08/06/2009WO2009096379A1 Heating device for pressure measurement and pressure measuring device
08/06/2009WO2009096363A1 Resistance nonvolatile memory device and method for manufacturing same
08/06/2009WO2009096264A1 Semiconductor device manufacturing method, semiconductor device, electronic device, semiconductor manufacturing apparatus and storage medium
08/06/2009WO2009096259A1 Plasma processing method and plasma processing system
08/06/2009WO2009096251A1 Method of aftertreatment of amorphous hydrocarbon film and method for manufacturing electronic device by using the aftertreatment method
08/06/2009WO2009096249A1 Load lock apparatus and substrate cooling method
08/06/2009WO2009096125A1 Iii-group nitride single-crystal ingot, iii-group nitride single-crystal substrate, method for manufacturing iii-group nitride single-crystal ingot, and method for manufacturing iii-group nitride single-crystal substrate
08/06/2009WO2009096084A1 Deposition apparatus and deposition method
08/06/2009WO2009095898A1 New metal precursors containing beta-diketiminato ligands
08/06/2009WO2009030751A3 Part for a hydraulic circuit of a machine for preparing drinks that comprises a coating
08/06/2009WO2009001220A4 Functionalization of microscopy probe tips
08/06/2009WO2008134467A9 Apparatuses and methods for cryogenic cooling in thermal surface treatment processes
08/06/2009WO2008099220A3 Methods and apparatus for forming diamond-like coatings
08/06/2009US20090197425 Substrate processing apparatus
08/06/2009US20090197424 Substrate processing apparatus and method for manufacturing semiconductor device
08/06/2009US20090197418 Substrate processing apparatus
08/06/2009US20090197409 Substrate processing apparatus and method of manufacturing semiconductor device
08/06/2009US20090197406 Sequential deposition of tantalum nitride using a tantalum-containing precursor and a nitrogen-containing precursor
08/06/2009US20090197402 Substrate processing apparatus, method for manufacturing semiconductor device, and process tube
08/06/2009US20090197399 Method of growing group iii-v compound semiconductor, and method of manufacturing light-emitting device and electron device
08/06/2009US20090197376 Plasma cvd method, method for forming silicon nitride film and method for manufacturing semiconductor device
08/06/2009US20090197356 Substrate positioning on a vacuum chuck
08/06/2009US20090197101 Gas barrier layer deposition method, gas barrier film and organic el device
08/06/2009US20090197075 Coatings and coating processes for molybdenum substrates
08/06/2009US20090197038 Carbon nanotube film structure and method for making the same
08/06/2009US20090197016 Hose with sealing layer, direct-connect assembly including the same and method of manufacturing the same
08/06/2009US20090197015 Method and apparatus for controlling plasma uniformity
08/06/2009US20090197012 Plasma cvd apparatus
08/06/2009US20090196993 Carbon Nanohorn Carried Material And Process For Producing Carbon Nanotube
08/06/2009US20090196992 Gas mixer and manifold assembly for ald reactor
08/06/2009US20090196982 Method for making coaxial cable
08/06/2009US20090196978 Method for repairing pattern defect on electronic circuit and apparatus therefor
08/06/2009US20090196801 Hydrogen power, plasma and reactor for lasing, and power conversion
08/06/2009US20090196584 Evaporation crucible and evaporation apparatus with adapted evaporation characteristic
08/06/2009US20090195931 Head slider and method of manufacturing head suspension assembly
08/06/2009US20090194507 Apparatus and method for cleaning, etching, activation and subsequent treatment of glass surfaces, glass surfaces coated by metal oxides, and surfaces of other si02-coated materials
08/06/2009US20090194505 Vacuum coating techniques
08/06/2009US20090194238 Plasma processing apparatus
08/06/2009US20090194237 Plasma processing system
08/06/2009US20090194236 Plasma processing equipment
08/06/2009US20090194233 Component for semicondutor processing apparatus and manufacturing method thereof
08/06/2009US20090194028 Plasma processing device
08/06/2009US20090194027 Twin-type coating device with improved separating plate
08/06/2009US20090194026 Processing system for fabricating compound nitride semiconductor devices
08/06/2009US20090194024 Cvd apparatus
08/06/2009US20090194023 Plasma processing apparatus
08/06/2009DE112007002179T5 Vorrichtung zur chemischen Dampfabscheidung mit einem Brausekopf, zum positiven Regulieren der Injektionsgeschwindigkeit von reaktiven Gasen und Verfahren dafür An apparatus for chemical vapor deposition with a shower head, to the positive regulating the rate of injection of reactive gases and methods therefor
08/05/2009EP2086003A2 Method of growing group III-V compound semiconductor, and method of manufacturing light-emitting device and electronic device
08/05/2009EP2085500A2 Surface-coated cutting tool with hard coating layer having excellent abrasion resistance
08/05/2009EP2085497A1 Method for producing functional film
08/05/2009EP2085496A1 Method for producing functional film
08/05/2009EP2085495A2 Gas barrier layer deposition method, gas barrier film and organic el device
08/05/2009EP2084735A1 Temperature controlled multi-gas distribution assembly
08/05/2009EP2084304A2 Gallium trichloride injection scheme
08/05/2009EP2083756A2 A device
08/05/2009EP1957429B1 Coated hard metal member
08/05/2009EP1929066B1 Device and method for continuous chemical vapour deposition under atmospheric pressure and use thereof
08/05/2009EP1838640B1 Fine-laminar barrier protection layer
08/05/2009EP0757884B1 Method of forming a fluorinated silicon oxide layer using plasma chemical vapor deposition
08/05/2009CN201284372Y Reaction cavity of multi-airflow metallorganic chemical vapor deposition apparatus
08/05/2009CN101501244A Gas feeder and substrate treatment device
08/05/2009CN101501243A Patterning during film growth
08/05/2009CN101500989A Metal(IV) tetra-amidinate compounds and their use in vapor deposition
08/05/2009CN101499416A Method of growing group III-V compound semiconductor, and method of manufacturing light-emitting device and electronic device
08/05/2009CN101499415A Method for producing group III nitride-based compound semiconductor, wafer, and group III nitride-based compound semiconductor device
08/05/2009CN101499407A Gas dispensing device and semiconductor process plant employing the same
08/05/2009CN101497999A Antimony precursors for GST films in ALD/CVD processes
08/05/2009CN101497998A Preparation of iridium aluminum high temperature oxidation coating
08/05/2009CN101497994A Method for preparing DLC film, DLC membrane vessel manufactured thereby and production apparatus
08/05/2009CN101497993A Film formation method and apparatus for forming silicon-containing insulating film
08/05/2009CN101497443A Reactor cleaning apparatus
08/05/2009CN100524889C 有机电致发光器件及其制造方法 Organic electroluminescent device and manufacturing method
08/05/2009CN100524847C Method for improving quality of reflection reduction film of single crystal silicon solar battery
08/05/2009CN100524822C Gate insulating film forming method, computer-readable storage medium, and computer program
08/05/2009CN100524692C Integration of ald tantalum nitride and alpha-phase tantalum for copper metallization application
08/05/2009CN100524650C Formation of silicon nitride film by using atomic layer deposition method
08/05/2009CN100524648C An improved method for fabricating an ultralow dielectric constant material as an intralevel or interlevel dielectric in a semiconductor device and electronic device made
08/05/2009CN100524647C Organic siloxane copolymer film, method and deposition apparatus for producing same, and semiconductor device using such copolymer film
08/05/2009CN100524641C Plasma processing device
08/05/2009CN100524625C Gallium nitride-based semiconductor stacked structure, production method thereof, and compound semiconductor and light-emitting device each using the stacked structure
08/05/2009CN100523299C Substrate covered with an intermediate coating and a hard carbon coating
08/05/2009CN100523296C Apparatus for the deposition of high dielectric constant films
08/05/2009CN100523295C No-brush temperature measuring method and device with CVD system substrate
08/05/2009CN100523294C Method for improving inner evenness of high-temperature deposition oxidation film
08/05/2009CN100523293C Method of forming film, film forming apparatus
08/05/2009CN100523292C Method of plasma chemistry vapor depositing fluoridation amorphous carbon membrane and membrane layer structure thereof
08/05/2009CN100523291C Thin film forming method and thin film forming apparatus
08/05/2009CN100523290C Surface treatment method and device
08/05/2009CN100523289C Method and apparatus for the delivery of precursor materials
08/05/2009CN100523288C High velocity method for deposing diamond films from a gaseous phase in shf discharge plasma and device for carrying out said method
08/05/2009CN100523287C Film-forming apparatus and film-forming method
08/05/2009CN100523286C Preparation method of nano-grade capsule material based on composite mould plate technology
08/05/2009CN100523285C Method of manufacturing crystalline film, method of manufacturing crystalline-film-layered substrate, method of manufacturing thermoelectric conversion element, and thermoelectric conversion element
08/05/2009CN100523272C Method of forming shadow mask pattern
08/05/2009CN100522621C Droplet ejection head, method of producing the same and droplet ejection apparatus
08/04/2009US7570876 Method and system for loading substrate supports into a substrate holder
08/04/2009US7569995 Apparatus for magnetic and electrostatic confinement of plasma
08/04/2009US7569501 Atomic layer deposition (ALD); tetrakis(diethylamido)hafnium; hafium oxides/nitrides; capacitors
08/04/2009US7569500 Atomic layer deposition (ALD); vaporization; uniformity