Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
09/2009
09/03/2009WO2007016999A3 Method for treating plasma under continuous atmospheric pressure of work pieces, in particular, material plates or strips
09/03/2009US20090221137 Semiconductor device and manufacturing method therefor
09/03/2009US20090220836 Process for the manufacture of an ion-conducting polymer membrane for a fuel cell
09/03/2009US20090220815 Method for manufacturing a welded component with very high mechanical characteristics from a coated lamination sheet
09/03/2009US20090220803 Film depositing apparatus, gas barrier film, and process for producing gas barrier films
09/03/2009US20090220767 Nanocarbon-activated carbon composite
09/03/2009US20090220692 Method of substrate treatment, recording medium and substrate treating apparatus
09/03/2009US20090220691 Evaporation apparatus and thin film forming method using the same
09/03/2009US20090220374 Method and apparatus for using solution precursors for atomic layer deposition
09/03/2009US20090220040 Tubular body and method for producing the same
09/03/2009US20090218324 Direct real-time monitoring and feedback control of rf plasma output for wafer processing
09/03/2009US20090218226 Separation device of molecules and production method thereof
09/03/2009US20090218219 Manufacturing Apparatus
09/03/2009US20090218045 Plasma processing apparatus
09/03/2009US20090218044 Microwave plasma processing apparatus, dielectric window for use in the microwave plasma processing apparatus, and method for manufacturing the dielectric window
09/03/2009US20090217878 System for thin film deposition utilizing compensating forces
09/03/2009US20090217877 Epitaxial reactor for mass production of wafers
09/03/2009US20090217876 Coating System For A Ceramic Evaporator Boat
09/03/2009US20090217874 Film depositing apparatus
09/03/2009US20090217873 Atomic layer deposition apparatus
09/03/2009US20090217872 Backside coating prevention device, coating chamber device for coating plate-shaped substrates, and method of coating
09/03/2009US20090217871 Thin film deposition apparatus and method of maintaining the same
09/03/2009DE202009004157U1 Fluidenergiemaschine mit Beschichtung Fluid Power engine with coating
09/03/2009DE10239083B4 Vorrichtung zum Versorgen einer Prozesskammer mit fluiden Medien und deren Verwendung Device for supplying a process chamber with fluid media and their use
09/03/2009DE102008017076B3 Chemisches Dampfabscheide-Verfahren unter Atmosphärendruck zur Herstellung einer n-halbleitenden Metallsulfid-Dünnschicht Chemical vapor deposition process under atmospheric pressure to produce an n-type semiconducting metal sulfide thin film
09/03/2009DE102008011774A1 Lock device for the continuous introduction and removal of containers e.g. bottles into and from a vacuum treatment chamber, comprises chamber elements, which are combined to conveyor and comprises chambers for containers, and lock plate
09/03/2009DE102008011185A1 Verfahren zur Herstellung einer dotierten organischen halbleitenden Schicht A process for the preparation of a doped organic semiconducting layer
09/03/2009DE102008009030A1 Valve needle for a valve of combustion chambers of internal-combustion engines, comprises seat area with a layer sequence of a first adhesive layer, a first wear-protection layer, a second adhesive layer and a second wear-protection layer
09/03/2009DE102007028293B4 Plasmareaktor, dessen Verwendung und Verfahren zur Herstellung einkristalliner Diamantschichten A plasma reactor, its use and methods for preparing single-crystal diamond films
09/02/2009EP2096679A1 Method for manufacturing solar cell and apparatus for manufacturing solar cell
09/02/2009EP2096192A1 Backside coating prevention device.
09/02/2009EP2096191A1 Ethylene-tetrafluoroethylene copolymer molded product and method for producing the same
09/02/2009EP2094879A1 Quartz encapsulated heater assembly
09/02/2009EP1774057B1 Device and method for high-throughput chemical vapor deposition
09/02/2009EP1374294A4 Fabrication of high resistivity structures using focused ion beams
09/02/2009EP1252361B1 Method of cleaning and conditioning plasma reaction chamber
09/02/2009CN201301341Y Microwave-plasma experimental facility
09/02/2009CN101522943A Precursor delivery system
09/02/2009CN101522942A Filming method for iii-group nitride semiconductor laminated structure
09/02/2009CN101522941A Method and device for plasma-assisted chemical vapour deposition on the inner wall of a hollow body
09/02/2009CN101521225A Heterojunction field effect transistor
09/02/2009CN101521143A Lining mechanism for semiconductor processing equipment and manufacturing method thereof
09/02/2009CN101519774A Plasma processing apparatus
09/02/2009CN101519773A U-shaped pipe connecting method for gas path of CVD material growing device
09/02/2009CN101519772A Method and device for distributing inlet gases of reaction source of chemical vapor deposition material growing device
09/02/2009CN101519771A Atomic layer deposition apparatus
09/02/2009CN100536086C Method of controlling the uniformity of PECVD-deposited thin films
09/02/2009CN100535181C Method of forming silicon thin film and silicon thin film solar cell
09/01/2009US7582970 Carbon containing silicon oxide film having high ashing tolerance and adhesion
09/01/2009US7582845 Microwave plasma processing device and plasma processing gas supply member
09/01/2009US7582507 Catalyst support substrate, method for growing carbon nanotubes using the same, and the transistor using carbon nanotubes
09/01/2009US7582487 Method and device for laminar flow on a sensing surface
09/01/2009US7582186 Method and apparatus for an improved focus ring in a plasma processing system
09/01/2009US7582185 Plasma-processing apparatus
09/01/2009US7582184 Plasma processing member
09/01/2009US7582182 Method and apparatus for measuring electron density of plasma and plasma processing apparatus
09/01/2009US7582181 Method and system for controlling a velocity field of a supercritical fluid in a processing system
09/01/2009US7582167 Apparatus for reducing entrapment of foreign matter along a moveable shaft of a substrate support
09/01/2009US7582166 Holder for supporting wafers during semiconductor manufacture
09/01/2009US7582156 Highly active photocatalyst particles, method of production therefor, and use thereof
09/01/2009US7581906 substrate of mixed oxides of alumina and zirconia, an intermediate layer comprising nitrides of zirconium, zirconium oxide and nitrides of aluminum, a wear resistance first coating of titanium nitride and second coating of titanium carbonitride; protective coatings
09/01/2009US7581550 Method of cleaning reaction chamber using substrate having catalyst layer thereon
09/01/2009US7581511 Apparatus and methods for manufacturing microfeatures on workpieces using plasma vapor processes
09/01/2009CA2373170C Method and apparatus for epitaxially growing a material on a substrate
08/2009
08/27/2009WO2009105668A1 Bicyclic guanidines, metal complexes thereof and their use in vapor deposition
08/27/2009WO2009105376A2 Multiple ampoule delivery systems
08/27/2009WO2009104732A1 Gas supply device
08/27/2009WO2009104621A1 Method for sr-ti-o-base film formation and recording medium
08/27/2009WO2009104620A1 Film production method and storage medium
08/27/2009WO2009104579A1 Plasma discharge device and thin film laminate
08/27/2009WO2009104507A1 Thin film and method for manufacturing semiconductor device using the thin film
08/27/2009WO2009104463A1 Vacuum processing device, method for maintaining vacuum processing device and vacuum processing factory
08/27/2009WO2009104443A1 Thin film forming method and thin film stack
08/27/2009WO2009104407A1 Resin molded body
08/27/2009WO2009104379A1 Atomic layer deposition apparatus and atomic layer deposition method
08/27/2009WO2009040542A3 Vapour delivery system
08/27/2009WO2008129528A3 Coated cutting tool
08/27/2009US20090215274 Plasma processing apparatus and plasma processing method
08/27/2009US20090215252 Methods of Depositing Materials Over Substrates, and Methods of Forming Layers over Substrates
08/27/2009US20090215224 Coating methods and apparatus for making a cigs solar cell
08/27/2009US20090215205 Shower head structure for processing semiconductor
08/27/2009US20090214894 PROCESS FOR PRODUCING AN ALUMINA COATING COMPOSED MAINLY OF a-TYPE CRYSTAL STRUCTURE
08/27/2009US20090214888 Method and apparatus for producing alloyed iron article
08/27/2009US20090214885 Light-induced directed self-assembly of periodic sub-wavelength nanostructures
08/27/2009US20090214858 Magnesium oxide coated glass article and a method for depositing magnesium oxide coatings on flat glass
08/27/2009US20090214800 Apparatus for and method of forming carbon nanotube
08/27/2009US20090214799 Method and Apparatus for the Continuous Production and Functionalization of Single-Walled Carbon Nanotubes Using a High Frequency Plasma Torch
08/27/2009US20090214787 Erosion Resistant Coatings
08/27/2009US20090214786 High speed, concurrent processing of multiple wafers using multi-stations separated by gas curtains where platens support and rotates wafers into specific deposition positions and where reactant gases are supplied through single- or multi-zone gas dispensing nozzles; atomic layer deposition
08/27/2009US20090214785 Thermalization of gaseous precursors in cvd reactors
08/27/2009US20090214783 Organic Vapor Jet Printing System
08/27/2009US20090214782 Organic vapor jet printing system
08/27/2009US20090214781 Cvi followed by coal tar pitch densification by vpi
08/27/2009US20090214780 Negative Coefficient of Thermal Expansion Particles and Method of Forming the Same
08/27/2009US20090214779 Multiple ampoule delivery systems
08/27/2009US20090214778 Multiple ampoule delivery systems
08/27/2009US20090214777 Multiple ampoule delivery systems
08/27/2009US20090214761 Real time imprint process diagnostics for defects
08/27/2009US20090214759 Solution treatment apparatus and solution treatment method
08/27/2009US20090214758 A processing method for processing a substrate placed on a placement stage in a process chamber