Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
09/2009
09/15/2009US7588799 Metal film production apparatus
09/15/2009US7588736 Apparatus and method for generating a chemical precursor
09/15/2009US7588036 Chamber clean method using remote and in situ plasma cleaning systems
09/15/2009US7587989 Plasma processing method and apparatus
09/15/2009CA2469150C Boron doped diamond
09/11/2009WO2009110625A1 Submerged plasma coating apparatus, electrode for submerged plasma, and coating method using submerged plasma
09/11/2009WO2009110436A1 Nitride semiconductor crystal and manufacturing method thereof
09/11/2009WO2009110330A1 Semiconductor device manufacturing method, semiconductor manufacturing apparatus and storage medium
09/11/2009WO2009109896A1 Apparatus for the heat treatment of disc shaped substrates
09/11/2009WO2009109464A1 Coating apparatus with rotation module
09/11/2009WO2009109350A1 Method for manufacturing an interference-colour-free protective layer
09/11/2009WO2009091721A3 Cmas-resistant thermal barrier coatings
09/10/2009US20090226758 Metal Carbonitride Layer and Method for the Production of a Metal Carbonitride Layer
09/10/2009US20090226718 Carbon film
09/10/2009US20090226715 Coated article and method of making the same
09/10/2009US20090226645 Acrylate-modified aspartates and gel coat compositions made therefrom
09/10/2009US20090226644 Gel coat compositions from acrylate-modified aspartates
09/10/2009US20090226638 Method and Apparatus for Producing Ultra-Thin Graphitic Layers
09/10/2009US20090226614 Porous gas heating device for a vapor deposition system
09/10/2009US20090226613 Methods for making high-temperature coatings having pt metal modified gamma-ni + gamma'-ni3al alloy compositions and a reactive element
09/10/2009US20090226612 Alkaline earth metal containing precursor solutions
09/10/2009US20090226611 Void-free copper filling of recessed features using a smooth non-agglomerated copper seed layer
09/10/2009US20090226610 Coating apparatus with rotation module
09/10/2009US20090226293 Method and Apparatus for Manufacturing Semiconductor Wafer
09/10/2009US20090223928 Inductively coupled plasma processing apparatus
09/10/2009US20090223594 Passivating internal metal surfaces of pipes, piping manifold, tubes to increase shelf-life of gas compositions, especially low concentration gas products; passivation coatings made from reacting a silane compound with oxygen to improve storage stability
09/10/2009US20090223551 Process for making solar cells
09/10/2009US20090223453 Equipment for high volume manufacture of group iii-v semiconductor materials
09/10/2009US20090223452 Gas heating device for a vapor deposition system
09/10/2009US20090223451 Method and apparatus for precursor delivery system for irradiation beam instruments
09/10/2009US20090223449 Cover part, process gas diffusing and supplying unit, and substrate processing apparatus
09/10/2009US20090223447 Apparatus for producing silicon carbide single crystal
09/10/2009US20090223441 High volume delivery system for gallium trichloride
09/10/2009US20090223411 Organosilane-nonionic-water stable quaternary ammonium compositions and methods
09/10/2009DE4447977B4 Vorrichtung und Verfahren zur Plasmabehandlung von flachen Werkstücken, insbesondere flachen, aktiven Bildschirmen, sowie Verwendung der Vorrichtung Apparatus and method for plasma treatment of flat workpieces, in particular flat active screens, as well as using the apparatus
09/10/2009DE4428992B4 CVD-Beschichtungsvorrichtung und deren Verwendung CVD coating apparatus and the use thereof
09/10/2009DE102008013166A1 Verfahren zur Herstellung einer interferenzfarbenfreien Schutzschicht A method for producing a protective layer free of interference colors
09/10/2009DE102008011921A1 Beschichtung von Bauteilen einer Brennkraftmaschine zur Verminderung von Reibung, Verschleiß und Adhäsionsneigung Coating of components of an internal combustion engine to reduce friction, wear and adhesion tendency
09/10/2009DE102008011444A1 Thermochrom beschichtete Substrate und Verfahren zu deren Herstellung Thermochromic coated substrates and processes for their preparation
09/10/2009DE10064041B4 Verfahren zur Herstellung einer Kupferverdrahtung in einem Halbleiterbauelement A process for producing a copper wiring in a semiconductor device
09/09/2009EP2099063A1 Film forming apparatus and method of forming film
09/09/2009EP2099062A1 Film deposition apparatus and film deposition method
09/09/2009EP2098609A1 Coating apparatus with rotation module
09/09/2009EP2098608A1 Coating apparatus with rotation module
09/09/2009EP2097555A1 Hybrid layers for use in coatings on electronic devices or other articles
09/09/2009EP1597406B1 Foodware with multilayer stick resistant ceramic coating and method of making
09/09/2009EP1533833B1 Vapor phase epitaxy device
09/09/2009EP1397528B8 Cvd reactor with exhaust ring made of graphite
09/09/2009CN101528978A Method for forming thin film
09/09/2009CN101528977A Film deposition apparatus
09/09/2009CN101528976A Ethylene-tetrafluoroethylene copolymer molded product and method for producing the same
09/09/2009CN101528975A Method for easy-to-clean substrates and articles therefrom
09/09/2009CN101528974A Formation of high quality dielectric films of silicon dioxide for sti: usage of different siloxane-based precursors for harp II-remote plasma enhanced deposition processes
09/09/2009CN101528973A Vortex chamber lids for atomic layer deposition
09/09/2009CN101527263A Production method for semiconductor device and substrate processing apparatus
09/09/2009CN101527258A Cover part, process gas diffusing and supplying unit, and substrate processing apparatus
09/09/2009CN101525743A Method for depositing semi-conductor film on substrate by using close-space sublimation technology and device thereof
09/09/2009CN101525742A Method for sample loading, sampling and sample transferring of chemical vapor deposition material growing equipment
09/09/2009CN101525741A Precipitation equipment for manufacturing thin film type solar battery
09/09/2009CN101525740A Method for growing high-quality indium nitride single crystal epitaxial film
09/09/2009CN100539027C Epitaxially growing equipment
09/09/2009CN100537844C Method and apparatus for maintaining by-product volatility in deposition process
09/09/2009CN100537843C Microfeature workpiece processing apparatus and methods for batch deposition of materials on microfeature workpieces
09/09/2009CN100537842C Preparation of metal silicon nitride films via cyclic deposition
09/09/2009CN100537841C Forced pulse chemical gas phase permeating process
09/09/2009CN100537840C Method for forming CVD film
09/09/2009CN100537839C Methods of forming a phosphorus doped silicon dioxide comprising layer, and methods of forming trench isolation in the fabrication of integrated circuitry
09/09/2009CN100537838C Low temp polysilicon film device and its manufacturing method and equipment
09/09/2009CN100537837C Process for formation of copper-containing film
09/09/2009CN100537836C Method for cleaning chemical vapour deposition chamber
09/09/2009CN100537824C Method for manufacturing ultra-hydrophilic thin film coated metal product, and ultra-hydrophilic thin film coated metal product
09/08/2009US7585752 Process for deposition of semiconductor films
09/08/2009US7585584 Carbon nanotubes for fuel cells, method for manufacturing the same, and fuel cell using the same
09/08/2009US7585547 Positioning precursor layers of Group 1B metal and at least one of Group 3A and Group 6a on a base facing one another with spacing inbetween; controlled localized heating when applying an electrical current to alloy; uniformity; high throughput; cost efficiency; solar cells; transisters; semiconductors
09/08/2009US7585546 Surface passivation and sealing of micro-optics devices for improved performance in harsh environments
09/08/2009US7585545 such that the hydrogen sulfur gas or vapour is provided at a high concentration, suitable flow rate, high temperature and energy to cause decomposition of the gas or vapour during the volatization of the source material(s) and deposition of the phosphor; full color displays
09/08/2009US7585480 Highly pure ultra-fine SiOx powder and method for production thereof
09/08/2009US7585386 Plasma processing apparatus, electrode plate for plasma processing apparatus, and electrode plate manufacturing method
09/08/2009US7585385 Plasma processing apparatus, control method thereof and program for performing same
09/08/2009US7585384 Apparatus and method to confine plasma and reduce flow resistance in a plasma reactor
09/08/2009US7585383 Vacuum processing apparatus
09/08/2009US7585371 Substrate susceptors for receiving semiconductor substrates to be deposited upon
09/08/2009US7585370 Gas-purged vacuum valve
09/08/2009US7584942 Ampoules for producing a reaction gas and systems for depositing materials onto microfeature workpieces in reaction chambers
09/08/2009US7584714 Method and system for improving coupling between a surface wave plasma source and a plasma space
09/08/2009CA2475966C Crystal production method
09/08/2009CA2281788C Method of producing silicon oxide film, method of manufacturing semiconductor device, semiconductor device, display, and infrared irradiating device
09/03/2009WO2009108323A2 Real time imprint process diagnostics for defects
09/03/2009WO2009108221A2 Thermalization of gaseous precursors in cvd reactors
09/03/2009WO2009107669A1 Thin film of metal silicon compound and process for producing the thin film of metal silicon compound
09/03/2009WO2009107664A1 Load lock apparatus and substrate cooling method
09/03/2009WO2009107648A1 Surface coated member and cutting tool
09/03/2009WO2009107501A1 Thin-film deposition system
09/03/2009WO2009107239A1 Semiconductor producing apparatus and method of pipe purging therefor
09/03/2009WO2009107196A1 Method for plasma deposition and plasma cvd system
09/03/2009WO2009106942A1 Semiconductor growth system which includes a boron carbide reactor component
09/03/2009WO2009106433A1 Method for forming a titanium-containing layer on a substrate using an atomic layer deposition (ald) process
09/03/2009WO2009106201A1 Coating components of an internal combustion engine for reducing friction, wear, and adhesion tendency
09/03/2009WO2009106023A1 Method of making nucleation layer for diamond growth
09/03/2009WO2008039916A8 Organometallic precursor compounds