Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
09/2009
09/22/2009US7592256 Method of forming tungsten film
09/22/2009US7592190 Method of evaluating characteristics of and forming of an insulating film for a semiconductor device
09/22/2009US7592066 Roofing articles with reflective thin films and the process of producing the same
09/22/2009US7592043 Method and apparatus for coating a patterned thin film on a substrate from a fluid source with continuous feed capability
09/22/2009US7592032 Picturing a nozzle hole of a ink jet print ejection head where the hole is pictured synchronously by applying a driving waveform to the head causing single-period micromotion of a meniscus surface of the nozzle hole after a liquid droplet ejection head is attached; accurate replacement
09/22/2009US7591957 Method for atmospheric pressure reactive atom plasma processing for surface modification
09/22/2009US7591922 Substrate processing apparatus and substrate processing method
09/22/2009US7591908 Vapor deposition apparatus and vapor deposition method
09/22/2009US7591907 Apparatus for hybrid chemical processing
09/22/2009US7591232 Internal coil with segmented shield and inductively-coupled plasma source and processing system therewith
09/22/2009CA2346457C Method for manufacturing a preform of an active fiber
09/17/2009WO2009114851A2 Method for preparing electrically conducting materials and devices including same
09/17/2009WO2009114130A2 Process and apparatus for diamond synthesis
09/17/2009WO2009114112A2 Method and apparatus for precursor delivery system for irradiation beam instruments
09/17/2009WO2009114060A1 In situ nano-particle matrix loading of metal oxide coatings via combustion deposition
09/17/2009WO2009113472A1 Graphene or graphite thin film, manufacturing method thereof, thin film structure and electronic device
09/17/2009WO2009113458A1 Group iii nitride semiconductor device and method for manufacturing the same, group iii nitride semiconductor light-emitting device and method for manufacturing the same, and lamp
09/17/2009WO2009113400A1 Raw material supplying device
09/17/2009WO2009112738A1 Method and system for depositing a metal or metalloid on carbon nanotubes
09/17/2009WO2009112255A1 Packaging laminate, method for manufacturing of the packaging laminate and packaging container produced therefrom
09/17/2009WO2009112117A1 Body coated with hard material
09/17/2009WO2009112116A1 Body coated with hard material
09/17/2009WO2009112115A1 Body coated with hard material
09/17/2009WO2009112053A1 Plasma system
09/17/2009WO2009086494A3 Multi-pass vacuum coating systems
09/17/2009WO2009079184A3 Coated article with nanolayered coating scheme
09/17/2009US20090234450 Lens surface enhancement
09/17/2009US20090233442 Method and apparatus for production of metal film or the like
09/17/2009US20090233441 Interconnections for integrated circuits
09/17/2009US20090233429 Semiconductor device manufacturing method and substrate processing apparatus
09/17/2009US20090233423 Method of manufacturing nitride semiconductor substrate
09/17/2009US20090233387 Linear plasma source for dynamic (moving substrate) plasma processing
09/17/2009US20090233385 Plasma Doping Method and Plasma Doping Apparatus
09/17/2009US20090233108 Vacuum film formation method for inorganic layer, barrier laminate, device, and optical component
09/17/2009US20090233105 Composite coatings comprising hollow and/or shell like metal oxide particles deposited via combustion deposition
09/17/2009US20090233082 Glass or glass-ceramic articles with decorative coating
09/17/2009US20090233058 Carbon nanotube structure and method for producing the same
09/17/2009US20090233007 Chemical vapor deposition reactor and method
09/17/2009US20090233003 Methods and systems relating to light sources for use in industrial processes
09/17/2009US20090232987 Composition for Chemical Vapor Deposition Film-Formation and Method for Production of Low Dielectric Constant Film
09/17/2009US20090232986 Heated valve manifold for ampoule
09/17/2009US20090232985 Method of forming silicon oxide containing films
09/17/2009US20090232984 Apparatus and Method of Film Formation
09/17/2009US20090232983 Substrate temperature control for combustion chemical vapor deposition
09/17/2009US20090232982 Porous film production method and apparatus
09/17/2009US20090232976 Evaporating method for forming thin film
09/17/2009US20090232967 Thermal processing apparatus, method for regulating temperature of thermal processing apparatus, and program
09/17/2009US20090232965 Method and apparatus for producing aligned carbon nanotube aggregate
09/17/2009US20090232721 Sintered silicon oxide for film vapor deposition, its production method, and method for producing silicon oxide vapor deposition film
09/17/2009US20090230821 Ceramic and method of manufacturing the same, dielectric capacitor, semiconductor device, and element
09/17/2009US20090229971 Thin-Film Deposition System
09/17/2009US20090229857 Electrode and method of forming the electrode
09/17/2009US20090229856 Master Electrode and Method of Forming the Master Electrode
09/17/2009US20090229855 electrode and method of forming the master electrode
09/17/2009US20090229755 Plasma processing apparatus
09/17/2009US20090229754 Shower head and substrate processing apparatus
09/17/2009US20090229753 Method for manufacturing shower plate, shower plate manufactured using the method, and plasma processing apparatus including the shower plate
09/17/2009US20090229525 Vaporizer and film forming apparatus
09/17/2009US20090229524 Multiple Nozzle Evaporator for Vacuum Thermal Evaporation
09/17/2009US20090229523 Film depositing apparatus
09/17/2009US20090229522 Plasma processing apparatus
09/17/2009US20090229521 Method and device for microwave plasma deposition of a coating on a thermoplastic container surface
09/17/2009US20090229520 Film depositing apparatus
09/17/2009US20090229519 Apparatus for manufacturing semiconductor thin film
09/17/2009DE10250564B4 Verfahren zur Beschichtung einer Oberfläche, Erzeugnis und Verwendung des Erzeugnisses A method for coating a surface, product and use of the product
09/17/2009DE102009012878A1 Schauerkopf und Substratbearbeitungsvorrichtung Shower head and substrate processing apparatus
09/17/2009DE102008013966A1 Hartstoffbeschichteter Körper Hard coated body
09/17/2009DE102008013965A1 Hartstoffbeschichteter Körper Hard coated body
09/17/2009DE102008013964A1 Hartstoffbeschichteter Körper Hard coated body
09/17/2009DE102008012931A1 Method for cooling of substrates in a treatment chamber, comprises subjecting the substrate to a heat treatment, where the substrates are arranged as substrate arrangement on a substrate carrier rotatable around an axis
09/17/2009CA2718253A1 Plasma system
09/17/2009CA2717188A1 Body coated with hard material
09/17/2009CA2717187A1 Body coated with hard material
09/16/2009EP2101348A1 Method for removing moisture from substrate coated with transparent electrode
09/16/2009EP2101347A1 Annealing method of zinc oxide thin film
09/16/2009EP2101345A1 Film deposition apparatus and film deposition method
09/16/2009EP2099951A2 Substrate support structure with rapid temperature change
09/16/2009EP1979965B1 Cathode for electrochemical reactor, electrochemical reactor incorporating such cathodes and method for making said cathode
09/16/2009EP1608794B1 Apparatus for depositing compounds on a substrate by means of metalorganic chemical vapor deposition
09/16/2009CN201309965Y Full-automatic large plate PECVD crystal silicon photovoltaic anti-reflection film preparation device
09/16/2009CN201309964Y Improved structure of heater
09/16/2009CN201309963Y Water-cooling base bracket device for preparing DC arc-discharge PCVD diamond films
09/16/2009CN101535525A In situ cleaning of CVD system exhaust
09/16/2009CN101535524A Method and system for performing plasma enhanced atomic layer deposition
09/16/2009CN101535523A Density-matching alkyl push flow for vertical flow rotating disk reactors
09/16/2009CN101533846A Photoluminescent dosimeter element used for radiant metering and method for preparing same
09/16/2009CN101533763A Method for manufacturing shower plate, shower plate manufactured, and plasma processing apparatus
09/16/2009CN101532127A Hanging tool for silicon wafer carriers
09/16/2009CN101532126A Film formation apparatus for semiconductor process and method for using same
09/16/2009CN100541735C Stress reduction of SIOC low K films
09/16/2009CN100540734C Chemical vapor deposition equipment
09/16/2009CN100540733C Method and apparatus for depositing materials with tunable characteristics
09/16/2009CN100540732C Manufacturing apparatus for planar displaying device
09/16/2009CN100540731C Vaporizer
09/16/2009CN100540730C Method for manufacturing carbon silicon nitride film
09/15/2009US7589345 Nitride-based compound semiconductor substrate and method for fabricating the same
09/15/2009US7589336 Apparatus and method for exposing a substrate to UV radiation while monitoring deterioration of the UV source and reflectors
09/15/2009US7589029 Atomic layer deposition and conversion
09/15/2009US7589002 Oxidizing or nitriding the crystal/amorphous silicon film by plasma gas treating the substrate by applying a high frequency electric field to the oxidizing or nitriding gas atmosphere; controlling particle sizes to accuracy of 1-2 nm. high density; efficiency; cost efficiency; light-emitting elements
09/15/2009US7588804 Reactors with isolated gas connectors and methods for depositing materials onto micro-device workpieces