Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
09/2009
09/30/2009CN101545101A Substrate cassette with electrode array
09/30/2009CN101545100A Conveyor for baseplate carrier
09/30/2009CN101545099A Heating system
09/30/2009CN101544476A Super-hydrophobic transparent coating and preparation method thereof
09/30/2009CN100546005C Plasma generation device, plasma control method, and substrate manufacturing method
09/30/2009CN100545304C Ceramics for semiconductor processing equipment
09/30/2009CN100545303C Alkyl push flow for vertical flow rotating disk reactors
09/29/2009US7596305 Method and apparatus for preparing vaporized reactants for chemical vapor deposition
09/29/2009US7595414 complex capable of being used for chemical vapor deposition of thin metal , or metal oxide films
09/29/2009US7595263 Atomic layer deposition of barrier materials
09/29/2009US7595098 Method and apparatus for depositing material on a substrate
09/29/2009US7595097 Expanding thermal plasma deposition system
09/29/2009US7595096 Method of manufacturing vacuum plasma treated workpieces
09/29/2009US7595089 supporting bars
09/29/2009US7595088 Hydrogen assisted HDP-CVD deposition process for aggressive gap-fill technology
09/29/2009US7595083 Table with adjustment mark; adjustment plate; syringe; supplying material through nozzle; imaging camera; detection
09/29/2009US7595010 one non-silicon precursor (such as a germanium precursor, a carbon precursor, etc.) during formation of a silicon nitride, silicon oxide, silicon oxynitride or silicon carbide film improves the deposition rate and/or makes possible tuning of properties of the film
09/29/2009US7594970 Web coating apparatus with a vacuum chamber and a coating cylinder
09/29/2009US7594479 Plasma CVD device and discharge electrode
09/29/2009CA2388375C Color shifting carbon-containing interference pigments
09/24/2009WO2009117745A2 Surface preheating treatment of plastics substrate
09/24/2009WO2009117229A2 Coaxial microwave assisted deposition and etch systems
09/24/2009WO2009116588A1 Surface treatment method, showerhead, treatment container, and treatment apparatus using same
09/24/2009WO2009116579A1 Plasma processing method and plasma processing apparatus
09/24/2009WO2009116576A1 Atomic layer film-forming device
09/24/2009WO2009116472A1 Placing table structure and heat treatment apparatus
09/24/2009WO2009116191A1 Diruthenium complex and material and method for chemical vapor deposition
09/24/2009WO2009116004A2 Alkali earth metal precursors for depositing calcium and strontium containing films
09/24/2009WO2009115359A1 Exhaust gas treatment device for a cvd device, cvd device and exhaust gas treatment method
09/24/2009WO2009085974A3 Low wet etch rate silicon nitride film
09/24/2009WO2009083778A3 Silicon nitride sealing rings with diamond coating
09/24/2009WO2007089712A3 Composite diamond assembly
09/24/2009US20090239387 Producing method of semiconductor device and substrate processing apparatus
09/24/2009US20090239386 Producing method of semiconductor device and substrate processing apparatus
09/24/2009US20090239385 Substrate-supporting device having continuous concavity
09/24/2009US20090239364 Method for forming insulating film and method for manufacturing semiconductor device
09/24/2009US20090239356 Device manufacturing method
09/24/2009US20090239085 SiC SEMICONDUCTOR ELEMENT, METHOD OF MANUFACTURING THE SAME, AND MANUFACTURING APPARATUS THEREOF
09/24/2009US20090239078 Process and apparatus for diamond synthesis
09/24/2009US20090239042 Material Assisted Laser Ablation
09/24/2009US20090239022 Information recording medium and method for production thereof
09/24/2009US20090238999 Organic electroluminescent display device and method of preparing the same
09/24/2009US20090238998 Coaxial microwave assisted deposition and etch systems
09/24/2009US20090238997 Method and apparatus for deposition using pulsed atmospheric pressure glow discharge
09/24/2009US20090238996 Substrate For Growth of Carbon Nanotube, Method for Growth of Carbon Nanotube, Method for Control of Particle Diameter of Catalyst for Growth of Carbon Nanotube and Method for Control of Carbon Nanotube Diameter
09/24/2009US20090238995 Sheet-like plasma generator and film deposition method and equipment employing such sheet-like plasma generator
09/24/2009US20090238990 SAM oxidative removal for controlled nanofabrication
09/24/2009US20090238985 Systems and methods for deposition
09/24/2009US20090238972 Methods and apparatus for using reduced purity silane to deposit silicon
09/24/2009US20090238971 Epitaxial wafer manufacturing apparatus and manufacturing method
09/24/2009US20090238970 Organic ruthenium compound for chemical vapor deposition, and chemical vapor deposition method using the organic ruthenium compound
09/24/2009US20090238968 Method for Producing Component for Vacuum Apparatus, Resin Coating Forming Apparatus and Vacuum Film Forming System
09/24/2009US20090238966 Densification of c-c composites with pitches followed by cvi/cvd
09/24/2009US20090238951 Vacuum deposition apparatus and control method thereof
09/24/2009US20090237837 Magnetic recording head
09/24/2009US20090236642 Transistor and cvd apparatus used to deposit gate insulating film thereof
09/24/2009US20090236568 Alkali earth metal precursors for depositing calcium and strontium containing films
09/24/2009US20090236447 Method and apparatus for controlling gas injection in process chamber
09/24/2009US20090236315 Shielded lid heater assembly
09/24/2009US20090236214 Tunable ground planes in plasma chambers
09/24/2009US20090236043 Plasma processing apparatus
09/24/2009US20090236042 Silent discharge plasma apparatus
09/24/2009US20090236041 Shower head and substrate processing apparatus
09/24/2009US20090236040 Electrode assembly and plasma processing chamber utilizing thermally conductive gasket
09/24/2009US20090236014 Treatment of metal components
09/24/2009US20090235867 Susceptor for vapor phase epitaxial growth device
09/24/2009US20090235866 Ceramic heater
09/24/2009US20090235591 Fixed abrasive articles utilizing coated abrasive particles
09/24/2009DE102009013854A1 Schauerkopf und Substratbearbeitungsvorrichtung Shower head and substrate processing apparatus
09/24/2009DE102008027984A1 Substratkassette mit Elektrodenarray Substrate cassette with electrode array
09/24/2009DE102008019023B4 Vakuum-Durchlaufanlage zur Prozessierung von Substraten Continuous vacuum system for processing of substrates
09/24/2009DE102008015013A1 Highly-bonding hard material coating system on cubic boron nitride substrates, comprises multi-layer laminated composite introduced on the substrate
09/24/2009DE102008000719A1 Modifying functional layers containing at least two materials, e.g. functional layers of catalysts for car exhaust treatment, involves concentrating materials in the active surface by applying a voltage across the layer
09/23/2009EP2104134A2 Semiconductor device manufacturing method
09/23/2009EP2103720A1 Susceptor for vapor phase epitaxial growth device
09/23/2009EP2103711A1 Highly corrosion-resistant members and processes for production thereof
09/23/2009EP2102383A2 Delivery device for thin film deposition
09/23/2009EP2102382A1 Delivery device for deposition
09/23/2009EP2102381A1 Antimicrobial material, and a method for the production of an antimicrobial material
09/23/2009EP1771258B1 Plasma coating system for coating of substrates, and related method
09/23/2009CN201313936Y Normal pressure plasma generator
09/23/2009CN201313935Y Chemical gas deposition reactor and reaction chamber thereof
09/23/2009CN201313934Y Gas charger for chemical gas deposition
09/23/2009CN101542016A Method of forming film and film forming apparatus
09/23/2009CN101542015A Solid precursor-based delivery of fluid utilizing controlled solids morphology
09/23/2009CN101542014A Silicon shelf towers
09/23/2009CN101541111A U-shaped heating element of silicon tetrachloride hydrogenation furnace and manufacturing process thereof
09/23/2009CN101540345A Nanometer silica film three-layer stacked solar cell and preparation method thereof
09/23/2009CN101540276A Plasma processing apparatus and method for manufacturing semiconductor device
09/23/2009CN101538703A Glass substrate carrying device
09/23/2009CN101538702A Equipment with gas connection mechanism
09/23/2009CN101538277A Novel tin amino-alkoxide complexes and process for preparing thereof
09/23/2009CN101538062A Nano ZnO semiconductor junction array and preparation method thereof
09/23/2009CN100543947C Low electric inductivity organic silicate film mixture for deposition
09/23/2009CN100543179C Process kit design for deposition chamber
09/23/2009CN100543178C Deposition processes using group 8 (VIII) metallocene precursors
09/23/2009CN100543177C Gradient method preprocessing technique for depositing CVD diamond film on hard metal surface
09/22/2009US7592569 Substrate processing apparatus, pressure control method for substrate processing apparatus and recording medium having program recorded therein
09/22/2009US7592471 Tantalum compound, method for producing same, tantalum-containing thin film and method for forming same
09/22/2009US7592275 Method and apparatus for manufacturing active matrix device including top gate type TFT