C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes

Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
10/2009
10/07/2009	EP1846322B1 Method of coating a surface with nanoparticles
10/07/2009	EP1025278B1 Vertically-stacked process reactor and cluster tool system for atomic layer deposition
10/07/2009	CN201322038Y Composite ceramic film driving shaft for joint adjuster of diesel locomotive
10/07/2009	CN201321491Y Heater base
10/07/2009	CN201321490Y Low pressure chemical vapor deposition system
10/07/2009	CN101553902A Apparatus and method for manufacturing semiconductor element and semiconductor element manufactured by the method
10/07/2009	CN101553900A Plasma confinement rings including RF absorbing material for reducing polymer deposition
10/07/2009	CN101553606A Reactor for growing crystals
10/07/2009	CN101553601A Method of forming a zinc oxide coated article
10/07/2009	CN101553600A Hybrid layers for use in coatings on electronic devices or other articles
10/07/2009	CN101553599A Multilayered coatings for use on electronic devices or other articles
10/07/2009	CN101553598A Sliding mating part in lubricated regime, coated by a thin film
10/07/2009	CN101553597A Treatment processes for a batch ald reactor
10/07/2009	CN101553596A Substrate placement determination using substrate backside pressure measurement
10/07/2009	CN101553595A Method and apparatus for sputtering onto large flat panels
10/07/2009	CN101552185A Reaction tube and heat processing apparatus for a semiconductor process
10/07/2009	CN101550545A Device for inserting and placing shank for precision cutter diamond coating
10/07/2009	CN101550544A Method for improving non-crystal hatching layer in high-speed deposition microcrystal silicon material
10/07/2009	CN101550531A Method for preparing silicon nano structures
10/07/2009	CN100547721C Deposition technique for producing high quality compound semiconductor materials
10/07/2009	CN100547110C Installation for depositing, by means of microwave plasma, an internal barrier coating in thermoplastic containers
10/07/2009	CN100547109C Deposition method
10/06/2009	US7598204 Metallic reagent
10/06/2009	US7598196 solid Ta2O4.82 is obtained from sintering a compacted Ta2O5 under reduced pressure; forming a homogeneous coatings on optical lens, spectacle lens, camera lens, binocular lens, beam splitter, prism, mirror or window
10/06/2009	US7597951 Coated cutting tool insert
10/06/2009	US7597940 Methods for preparing titania coatings by plasma CVD at atmospheric pressure
10/06/2009	US7597934 Corrosion coating for turbine blade environmental protection
10/06/2009	US7597932 Mesoporous permeation layers for use on active electronic matrix devices
10/06/2009	US7597930 Substrate with a photocatalytic coating
10/06/2009	US7597758 Chemical precursor ampoule for vapor deposition processes
10/06/2009	US7597531 Method of controlling mover device
10/04/2009	CA2658210A1 Method and apparatus for the coating and for the surface treatment of substrates by means of a plasma beam
10/01/2009	WO2009120862A2 Systems and methods for distributing gas in a chemical vapor deposition reactor
10/01/2009	WO2009120343A1 Selective oxidative removal of a self-assembled monolayer for controlled nanofabrication
10/01/2009	WO2009120342A1 Method for stm assisted ald
10/01/2009	WO2009120327A1 Apparatus for atomic force microscope-assisted deposition of nanostructures
10/01/2009	WO2009119805A1 Microwave plasma processing device
10/01/2009	WO2009119641A1 Process for producing monoatomic film
10/01/2009	WO2009119627A1 Method of depositing metallic film and memory medium
10/01/2009	WO2009119583A1 Material for chemical vapor deposition, silicon-containing insulating film and process for production thereof
10/01/2009	WO2009119580A1 Processing apparatus and processing method
10/01/2009	WO2009119500A1 Gas feeding device, treating device, treating method, and storage medium
10/01/2009	WO2009119418A1 Temperature-measuring apparatus, and mounting table structure and heat treatment apparatus having the same
10/01/2009	WO2009119357A1 Epitaxial substrate for semiconductor element, semiconductor element, and process for producing epitaxial substrate for semiconductor element
10/01/2009	WO2009119356A1 Epitaxial substrate for smeiconductor element, semiconductor element, and process for producing epitaxial substrate for semiconductor element
10/01/2009	WO2009119285A1 Shower plate and plasma processing device using the same
10/01/2009	WO2009119241A1 Plasma processing apparatus
10/01/2009	WO2009119177A1 Film forming method, film forming apparatus and storage medium
10/01/2009	WO2009119147A1 Method for film formation, apparatus for film formation, and computer-readable recording medium
10/01/2009	WO2009118901A1 Method for thin film formation
10/01/2009	WO2009118837A1 Control method and processor of exhaust gas flow rate of processing chamber
10/01/2009	WO2009118708A1 Deposition of ternary oxide films containing ruthenium and alkali earth metals
10/01/2009	WO2009118457A1 A coating and a method for producing a coating
10/01/2009	WO2009118361A1 Apparatus for plasma treatment of hollow bodies
10/01/2009	WO2009118360A1 Apparatus for plasma treatment of hollow bodies
10/01/2009	WO2009117983A1 Method and device for fixing and transporting impact-sensitive sheets in sputter feed systems
10/01/2009	US20090246962 Substrate processing method
10/01/2009	US20090246943 Apparatus for mass-producing silicon-based thin film and method for mass-producing silicon-based thin film
10/01/2009	US20090246942 Apparatus for depositing silicon-based thin film and method for depositing silicon-based thin film
10/01/2009	US20090246542 Plasma process apparatus, plasma process method, and object processed by the plasma process method
10/01/2009	US20090246514 Antireflection structure and manufacturing method thereof
10/01/2009	US20090246413 Method for fabricating thin films
10/01/2009	US20090246409 Method and apparatus for mass-producing DLC films
10/01/2009	US20090246406 Plasma processing apparatus, chamber internal part, and method of detecting longevity of chamber internal part
10/01/2009	US20090246402 Layer forming method and layer forming apparatus, and method of manufacturing radiation detector
10/01/2009	US20090246399 Method for activating reactive oxygen species for cleaning carbon-based film deposition
10/01/2009	US20090246375 Method for forming tantalum nitride film
10/01/2009	US20090246374 Gas distribution system and method for distributing process gas in a processing system
10/01/2009	US20090246373 Method of forming metallic film and program-storing recording medium
10/01/2009	US20090246372 Method of preventing premature drying
10/01/2009	US20090246371 Method of forming thin layers by a thermally activated process using a temperature gradient across the substrate
10/01/2009	US20090246370 Coating an atomically mixed thin film of a color-causing reagent and a toner on the surface of colorless gemstones or transparent crystals; heat treatment to produce colors of chemically-bonded coating shades on the crystals; radiation-free, environmentally friendly; decoration; jewelry; gemstones
10/01/2009	US20090243010 Thinfilm deposition method, thinfilm deposition apparatus, and thinfilm semiconductor device
10/01/2009	US20090242836 X-ray imaging photostimulable phosphor screen or panel
10/01/2009	US20090242134 Plasma processing apparatus
10/01/2009	US20090242132 Plasma processing apparatus and feeder rod used therein
10/01/2009	US20090242131 Ecr plasma source
10/01/2009	US20090242130 Plasma processing apparatus
10/01/2009	US20090242129 Thermal processing apparatus and processing system
10/01/2009	US20090241838 Polycrystalline silicon manufacturing apparatus
10/01/2009	US20090241837 Ceramic member, ceramic heater, substrate placing mechanism, substrate processing apparatus and method for manufacturing ceramic member
10/01/2009	US20090241836 Substrate stage of substrate processing apparatus and substrate processing apparatus
10/01/2009	US20090241835 Substrate processing apparatus
10/01/2009	US20090241834 Substrate processing apparatus
10/01/2009	US20090241833 Drilled cvd shower head
10/01/2009	DE19953843B4 Verfahren zur Herstellung einer Kupferverdrahtung für eine Halbleitervorrichtung A process for producing a copper wiring for a semiconductor device
10/01/2009	DE102009012995A1 Verfahren zum Beschichten von Brennstoffzellenkomponenten zur Wasserentfernung A process for coating of fuel cell components for water removal
10/01/2009	DE102008016923A1 Vorrichtung zur Plasmabehandlung von Werkstücken Apparatus for plasma treatment of workpieces
10/01/2009	DE102008016429A1 Verfahren zur Herstellung dünner Schichten durch einen thermisch aktivierten Prozess unter Anwendung eines Temperaturgradienten über das Substrat hinweg A method for producing thin layers by a thermally activated process, using a temperature gradient across the substrate
10/01/2009	DE10064042B4 Verfahren zur Herstellung einer Kupferverdrahtung in einem Halbleiterbauelement A process for producing a copper wiring in a semiconductor device
10/01/2009	CA2719306A1 A coating and a method for producing a coating
09/2009
09/30/2009	EP2105973A1 Iii nitride compound semiconductor element and method for manufacturing the same, iii nitride compound semiconductor light emitting element and method for manufacturing the same, and lamp
09/30/2009	EP2105960A2 Improved adhesion to copper and copper electromigration resistance
09/30/2009	EP2105953A1 Amorphous carbon film, semiconductor device, film forming method, film forming apparatus and storage medium
09/30/2009	EP2104751A1 Method for the production of quantum dots embedded in a matrix, and quantum dots embedded in a matrix produced using the method
09/30/2009	EP1771598B1 Atomic layer deposition (ald) system and method
09/30/2009	EP1345260B1 Vapor growth method, semiconductor producing method, and production method for semiconductor device
09/30/2009	CN101546834A Method of coating fuel cell components for water removal
09/30/2009	CN101545103A Device for distributing gas
09/30/2009	CN101545102A Baseplate carrier

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