Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
10/2009
10/15/2009US20090255466 Reagent dispensing apparatus and delivery method
10/15/2009US20090255324 Sealing structure of plasma processing apparatus, sealing method, and plasma processing apparatus including the sealing structure
10/15/2009DE112005002186T5 Nanoimprint-Form, Verfahren zum Bilden einer Nanoschablone sowie ein aus Harz gegossenes Produkt Nanoimprint-shape, method of forming a nano-template and a molded resin product
10/15/2009DE102009002178A1 Strangförmiges Kompositleitermaterial An extruded Kompositleitermaterial
10/15/2009DE102008018902A1 Vorrichtung und Verfahren zur inneren Oberflächenbehandlung von Hohlkörpern Apparatus and method for inner surface treatment of hollow bodies,
10/14/2009EP2108714A1 Microwave plasma cvd system
10/14/2009EP2108617A1 Reagent dispensing apparatus
10/14/2009EP2108616A1 Delivery method for a reagent using a reagent dispensing apparatus
10/14/2009EP2108195A1 Electronic field effect devices and methods for their manufacture
10/14/2009EP2108054A1 Plasma etching of diamond surfaces
10/14/2009EP2108053A1 Surface treating method for cutting tools
10/14/2009EP1579908B1 The combinatorial synthesis of novel materials
10/14/2009CN201326029Y Electrode gap adjusting device
10/14/2009CN201326014Y Air intake device for plasma-enhanced chemical vapor deposition (PECVD)
10/14/2009CN101558186A Processes and integrated systems for engineering a substrate surface for metal deposition
10/14/2009CN101556971A Back reflector for silicon-based thin film solar cell and preparation method thereof
10/14/2009CN101556948A Semiconductor device, method for manufacturing semiconductor device and gas for plasma cvd
10/14/2009CN101556917A Method for forming quantum well structure and method for manufacturing semiconductor light emitting element
10/14/2009CN101556916A Method for preparing GaAs-based InAs quantum rings on
10/14/2009CN101556909A Plasma processing device, sealing structure and sealing method thereof
10/14/2009CN101556904A Gas distributor and semiconductor processing equipment applying same
10/14/2009CN101555593A Method and system for preparing functional films in asynchronous pulse mode
10/14/2009CN101555592A Method and system for preparing functional films in phase control mode
10/14/2009CN101555591A Preparation of metal oxide thin film via cyclic cvd or ald
10/14/2009CN101555590A Environmental-protecting chemical gas-phase permeating technical method with stable running and device thereof
10/14/2009CN101555588A Low-temperature plasma system based on atmosphere pressure glow discharge
10/14/2009CN100550321C Method for manufacturing a semiconductor device with nitride and oxide layers
10/14/2009CN100550271C Showerhead electrode design for semiconductor processing reactor
10/14/2009CN100549226C Cleaning method of chemical vapor deposition equipment
10/14/2009CN100549225C Cooling device, and apparatus and method for manufacturing image display panel using cooling device
10/14/2009CN100549224C Apparatus for conveying gases to and from a chamber
10/14/2009CN100549223C Cleaning of chamber components
10/14/2009CN100549222C cutter embedding member
10/14/2009CN100549221C Preparation of strontium-barium titanate film material
10/14/2009CN100549217C Method for manufacturing ultra-hydrophilic thin film coated metal product, and ultra-hydrophilic thin film coated metal product
10/13/2009US7603194 Fabrication system and fabrication method
10/13/2009US7603028 Non-contact thermal platforms
10/13/2009US7602048 Semiconductor device and semiconductor wafer having a multi-layered insulation film
10/13/2009US7601934 Integrated thermal unit having a shuttle with a temperature controlled surface
10/13/2009US7601933 Heat processing apparatus and heat processing method
10/13/2009US7601631 Very low dielectric constant plasma-enhanced CVD films
10/13/2009US7601578 Defect control in gate dielectrics
10/13/2009US7601553 Method of manufacturing a gallium nitride semiconductor light emitting device
10/13/2009US7601405 DLC coating system and process and apparatus for making coating system
10/13/2009US7601404 Method for adjusting the nitrogen concentration of a chamber in a short time, so as to switch one DPN process to another more quickly; reduces the long switching time of the prior art; efficiency
10/13/2009US7601402 Method for forming insulation film and apparatus for forming insulation film
10/13/2009US7601393 Method that allows one part of an atomic layer deposition (ALD) process sequence to occur at a first temperature while allowing another part of the ALD process sequence to occur at a second temperature; can switch between these two thermal states in rapid succession
10/13/2009US7601242 Plasma processing system and baffle assembly for use in plasma processing system
10/13/2009US7601241 Plasma processing apparatus and plasma processing method
10/13/2009US7601240 Disturbance-free, recipe-controlled plasma processing system and method
10/13/2009US7601225 System for controlling the sublimation of reactants
10/13/2009US7601224 Method of supporting a substrate in a gas cushion susceptor system
10/13/2009US7601223 Showerhead assembly and ALD methods
10/08/2009WO2009123325A1 Process for producing silicon nitride film, process for producing silicon nitride film laminate, computer-readable storage medium, and plasma cvd device
10/08/2009WO2009123117A1 Organometallic-compound feeder
10/08/2009WO2009123049A1 Method for depositing high stress thin film and method for fabricating semiconductor integrated circuit device
10/08/2009WO2009122966A1 Liquid raw material vaporizer and film forming apparatus using the same
10/08/2009WO2009122938A1 Substrate for thin film solar cell, manufacturing method thereof, and thin film solar cell using thereof
10/08/2009WO2009122836A1 Production equipment and method of thin-film laminate
10/08/2009WO2009122790A1 Substrate processing apparatus and substrate processing method
10/08/2009WO2009122361A2 Preparation of lanthanide-containing precursors and deposition of lanthanide-containing films
10/08/2009WO2009122139A1 Chemical vapour deposition process
10/08/2009WO2009122036A1 Method for developing thin film from oxide or silicate of hafnium nitride, coordination compound used in said method, and method for producing integrated electronic circuit
10/08/2009WO2009121719A2 Piston ring
10/08/2009WO2009121324A1 Device for the plasma treatment of workpieces
10/08/2009WO2009121322A1 Atmospheric pressure chemical vapour deposition method for producing a n-semiconductive metal sulphide thin layer
10/08/2009WO2009121318A1 Method and arrangement for producing an n-semiconductive indium sulfide thin layer
10/08/2009WO2009101474A3 Semiconductor device and method for manufacturing the same
10/08/2009US20090253272 Method for manufacturing semiconductor device and substrate processing apparatus
10/08/2009US20090253269 Semiconductor manufacturing apparatus and semiconductor device manufacturing method
10/08/2009US20090253246 Plasma processing apparatus and plasma processing method
10/08/2009US20090253229 Method and Apparatus for Manufacturing Semiconductor Devices
10/08/2009US20090252985 Thermal barrier coating system and coating methods for gas turbine engine shroud
10/08/2009US20090252968 Method for applying a coating material and coating for a metallic surface
10/08/2009US20090252894 Moisture barrier coatings for organic light emitting diode devices
10/08/2009US20090252893 Plasma discharge treatment apparatus, and method of manufacturing gas barrier film
10/08/2009US20090252892 Processing chamber
10/08/2009US20090252873 Apparatus and method for treating materials with compositions
10/08/2009US20090252872 Method and device to prevent coating a dovetail of a turbine airfoil
10/08/2009US20090251758 Glass type electrochemical/ electrically controllable device with variable optical and/or energetic characteristic
10/08/2009US20090250444 Microwave plasma processing device
10/08/2009US20090250432 Method of controlling plasma distribution uniformity by time-weighted superposition of different solenoid fields
10/08/2009US20090250340 Ion source and plasma processing apparatus
10/08/2009US20090250334 Plasma generator systems and methods of forming plasma
10/08/2009US20090250008 Gas treatment apparatus
10/08/2009US20090250007 Apparatus for Depositing Thin Films Over Large-Area Substrates
10/08/2009US20090250006 Raw material feeding device and film formation system
10/08/2009US20090250005 Reaction tube and heat processing apparatus for a semiconductor process
10/08/2009US20090250004 Gas Head and Thin-Film Manufacturing Apparatus
10/08/2009DE102009014067A1 Plasmabearbeitungsvorrichtung The plasma processing apparatus
10/08/2009DE102008017492A1 Method for transporting band-shaped substrate through treatment regions of a vacuum coating plant, comprises moving the substrate through a treatment region and air-lock region lying before or behind the treatment region
10/08/2009DE102006040576B4 Verfahren zur Herstellung eines Dünnschicht-Thermogenerators A method for producing a thin-film thermal generator
10/08/2009DE10103463B4 Verbundmaterial aus metallischen Substraten und Verfahren zur Herstellung und dessen Verwendung Composite material of metallic substrates and methods of making and use thereof
10/07/2009EP2107592A2 Apparatus for mass-producing sulicon-based thin film and method for mass-producing silicon-based thin film
10/07/2009EP2107135A1 Methods and apparatus for mass-producing DLC films
10/07/2009EP2107131A1 Method and device for coating and treating the surfaces of substrates using a plasma beam
10/07/2009EP2106461A1 Container having improved ease of discharge product residue, and method for the production thereof
10/07/2009EP2106460A2 Method of densifying porous articles
10/07/2009EP2106459A1 Process for atomic layer deposition
10/07/2009EP2084752A9 Substrate provided with transparent conductive film for photoelectric conversion device, method for manufacturing the substrate, and photoelectric conversion device using the substrate