Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
10/2009
10/22/2009US20090263581 Method and apparatus to coat objects with parylene and boron nitride
10/22/2009US20090263580 Apparatus for manufacturing a quantum-dot element
10/22/2009US20090263579 Dry Composition, Its Use, Layer System and Coating Process
10/22/2009US20090263578 Apparatus and methods for deposition reactors
10/22/2009US20090263306 Silicon carbide substrate, semiconductor device, wiring substrate, and silicon carbide manufacturing method
10/22/2009US20090263237 Coated turbine component and method of coating a turbine component
10/22/2009US20090260762 Process gas introducing mechanism and plasma processing device
10/22/2009US20090260572 Chemical vapor deposition apparatus
10/22/2009US20090260571 Showerhead for chemical vapor deposition
10/22/2009US20090260570 Oxygen ion implantation equipment
10/22/2009US20090260569 Chemical vapor deposition apparatus
10/22/2009DE102008051801A1 Vorrichtung zum Behandeln einer inneren Oberfläche eines Werkstücks An apparatus for treating an inner surface of a workpiece
10/22/2009DE102008019665A1 Transparentes Barriereschichtsystem Transparent barrier layer system
10/22/2009DE102008016864B3 Kolbenring Piston ring
10/22/2009DE102006042327B4 Vorrichtung und Verfahren zur Ausbildung dünner Siliciumnitridschichten auf Oberflächen von kristallinen Silicium-Solarwafern Apparatus and method for forming thin silicon nitride films on surfaces of crystalline silicon solar wafers
10/22/2009CA2721194A1 Manufacturing apparatus for depositing a material and an electrode for use therein
10/22/2009CA2721192A1 Manufacturing apparatus for depositing a material and an electrode for use therein
10/22/2009CA2721095A1 Manufacturing apparatus for depositing a material and an electrode for use therein
10/21/2009EP2110460A1 Yttrium-containing ceramic coating
10/21/2009EP2110459A1 Precursors for CVD silicon carbo-nitride films
10/21/2009EP2110458A1 Thermal treatment furnace with induction heating
10/21/2009EP2110456A1 Mask support, mask assembly, and assembly comprising a mask support and a mask
10/21/2009EP2110199A1 Interference fit assembly, a thermal compensation arrangment of an injection valve and method for producing an interference fit assembly
10/21/2009EP2109878A1 System and method for chemical vapor deposition process control
10/21/2009EP2109693A1 A hydrogenated amorphous carbon coating
10/21/2009EP1845553B1 Semiconductor manufacturing apparatus, abnormality detection in such semiconductor manufacturing apparatus, method for specifying abnormality cause or predicting abnormality, and recording medium wherein computer program for executing such method is recorded
10/21/2009CN101563763A Methods and systems for low interfacial oxide contact between barrier and copper metallization
10/21/2009CN101563762A Showerhead electrode assembly with gas flow modification for extended electrode life
10/21/2009CN101563480A Process and apparatus for producing carbonaceous film
10/21/2009CN101562237A Organic light-emitting device
10/21/2009CN101562230A Organic solar cell adopting weak epitaxial growth film as donor
10/21/2009CN101562220A Process for manufacturing amorphous silicon thin film solar cell
10/21/2009CN101562215A Preparation method for improving efficiency of monolocular precipitation microcrystal silicon-based thin film solar cell
10/21/2009CN101562133A Film formation method and apparatus for forming silicon-containing insulating film doped with metal
10/21/2009CN101560692A Growth method of non-polar plane InN material
10/21/2009CN101560653A Method for preparing gradient-index film
10/21/2009CN101560652A Plasma assistant chemical vapor deposition device
10/21/2009CN101560651A Heat treatment oven with inductive heating
10/21/2009CN101560650A Multiple spray header chemical vapor deposition reaction chamber structure
10/21/2009CN101560649A Multipurpose industrial equipment for mass production of CVD diamond film
10/21/2009CN101560648A Device and method for depositing acid-resistant and alkaline-resistant diamond film on surface of compact disc
10/21/2009CN101560647A Preparation method of GaN-based material featuring epitaxial layer growth
10/21/2009CN101560646A Butyl rubber film coating production technology
10/21/2009CN101560645A Large vacuum coating equipment
10/21/2009CN101559921A Method and device for preparing tin dioxide nano-belt through vapor deposition
10/21/2009CN100552890C Electronic structure and method for forming medium film
10/21/2009CN100552871C Plasma treatment apparatus and plasma treatment method
10/21/2009CN100552084C Method for forming dielectric film and dielectric film
10/21/2009CN100552083C Shield body and vacuum processing apparatus
10/21/2009CN100552082C Precursor solution collocation method for controlling MOCVD deposition PZT
10/21/2009CN100551686C Protective coatings for micro-optical elements
10/20/2009US7605436 Manufacture of semiconductor device having insulation film of high dielectric constant
10/20/2009US7605094 Method of forming metal oxide using an atomic layer deposition process
10/20/2009US7605093 Method of fabricating iridium-based materials and structures on substrates, and iridium source reagents therefor
10/20/2009US7605083 Formation of composite tungsten films
10/20/2009US7604841 Method for extending time between chamber cleaning processes
10/20/2009US7604840 Formation of copper films on substrates or in or on porous solids; exposing a substrate to a surface-activating agent to form a deposit of the activating group, exposing the deposit to a copper precursor to form a deposit of a copper complex, reacting the deposited copper complex with a reducing agent
10/20/2009US7604834 Substrate covered with porous DLC film having odd layers with no pores and even layers with closed pores filled with nitrogen to reduce intrinsic compressive stress; an opening in the film contains a conductor; for use in manufacturing semiconductor integrated circuits
10/20/2009US7604716 Methods and apparatus for generating high-density plasma
10/20/2009US7604709 Plasma processing apparatus
10/20/2009US7604708 Cleaning of native oxide with hydrogen-containing radicals
10/20/2009US7604701 Method and apparatus for removing external components from a process chamber without compromising process vacuum
10/20/2009US7604697 Heteroepitaxial growth method for gallium nitride
10/20/2009US7604042 Cooling mechanism with coolant, and treatment device with cooling mechanism
10/20/2009US7603963 Controlled zone microwave plasma system
10/20/2009US7603962 Rotary type CVD film forming apparatus for mass production
10/20/2009CA2412855C Thick single crystal diamond layer method for making it and gemstones produced from the layer
10/15/2009WO2009125803A1 Film deposition apparatus and film deposition method
10/15/2009WO2009125477A1 Cathode electrode for plasma cvd and plasma cvd apparatus
10/15/2009WO2009101425A3 Vapour delivery system
10/15/2009WO2009085376A3 Separate injection of reactive species in selective formation of films
10/15/2009WO2009076309A3 Methods structures and apparatus to provide group via and ia materials for solar cell absorber formation
10/15/2009WO2008049392A3 Vapour-deposited coating and thermally stressable component having such a coating, and also a process and apparatus for producing such a coating
10/15/2009US20090258507 Substrate Treatment Device and Substrate Treatment Method
10/15/2009US20090258504 Substrate processing apparatus and method of manufacturing semiconductor device
10/15/2009US20090258481 Semiconductor device manufacturing apparatus and semiconductor device manufacturing method
10/15/2009US20090258476 Apparatus and methods for manufacturing thin-film solar cells
10/15/2009US20090258255 Method for Producing Diamond Having Acicular Projection Array Structure on Surface thereof, Diamond Material, Electrode and Electronic Device
10/15/2009US20090258214 Vapor-deposited coating and thermally stressable component having such a coating, and also a process and apparatus for producing such a coating
10/15/2009US20090258205 tin oxide, conductive thin film having surface with concavities and convexities of increased height; light emitting diodes, solid state lasers
10/15/2009US20090258166 Device and method for patterning structures on a substrate
10/15/2009US20090258165 Platinum-modified cathodic arc coating
10/15/2009US20090258164 Carbon structure manufacturing device and manufacturing method
10/15/2009US20090258163 Method for manufacturing nickel silicide nano-wires
10/15/2009US20090258162 Plasma processing apparatus and method
10/15/2009US20090258144 Heteroleptic Iridium Precursors To Be Used For The Deposition Of Iridium-Containing Films
10/15/2009US20090258143 Reagent dispensing apparatus and delivery method
10/15/2009US20090258142 Organic deposition apparatus and method of depositing organic substance using the same
10/15/2009US20090258134 Method for controlling thin-film forming velocity, method for manufacturing thin-film using the same and system for manufacturing a thin-film using the same
10/15/2009US20090257947 Method of manufacturing zinc aluminate nano-material
10/15/2009US20090257839 Coating method for drill bits
10/15/2009US20090257056 Surface enhanced raman detection on metalized nanostructured polymer films
10/15/2009US20090255901 Plasma processing apparatus, plasma processing method, and tray
10/15/2009US20090255800 Plasma processing apparatus, plasma processing method, and computer readable storage medium
10/15/2009US20090255798 Method to prevent parasitic plasma generation in gas feedthru of large size pecvd chamber
10/15/2009US20090255631 Plasma Processing Apparatus and the Upper Electrode Unit
10/15/2009US20090255581 Thin film silicon solar cell and manufacturing method thereof
10/15/2009US20090255470 Ald reactor
10/15/2009US20090255469 Apparatus and methods for manufacturing thin-film solar cells
10/15/2009US20090255467 Apparatus and methods for manufacturing thin-film solar cells