Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
11/2009
11/03/2009US7611990 Deposition methods for barrier and tungsten materials
11/03/2009US7611971 Method of removing residual contaminants from an environment
11/03/2009US7611959 Zr-Sn-Ti-O films
11/03/2009US7611758 Plasma vapor deposition; tunable etch resistant film; electrode coupled to radio frequency power source; substrate holder coupled to second radio frequency
11/03/2009US7611757 Method to improve mechanical strength of low-K dielectric film using modulated UV exposure
11/03/2009US7611751 Vapor deposition of metal carbide films
11/03/2009US7611640 Minimizing arcing in a plasma processing chamber
11/03/2009US7611603 Plasma processing apparatus having impedance varying electrodes
11/03/2009US7611587 Thin-film deposition evaporator
11/03/2009US7611586 Reactor for extended duration growth of gallium containing single crystals
11/03/2009US7611585 Plasma reaction chamber with a built-in magnetic core
11/03/2009US7611579 Systems and methods for synthesis of extended length nanostructures
11/03/2009US7611322 Processing thin wafers
11/03/2009US7610874 Poled plasma deposition
11/03/2009US7610667 Method of connecting expandable tubulars
11/03/2009CA2283160C Novel copper(i) precursors for chemical deposit in gas phase of metallic copper
10/2009
10/29/2009WO2009132207A2 Synthesis and use of precursors for ald of tellurium and selenium thin films
10/29/2009WO2009131842A1 Metalorganic chemical vapor deposition of zinc oxide
10/29/2009WO2009131136A1 Heat insulation resin base and architectural member using the same
10/29/2009WO2009131048A1 Plasma processing apparatus and plasma processing method using the same
10/29/2009WO2009130375A1 Apparatus and methods for deposition reactors
10/29/2009WO2009130288A1 Device for thermohydraulic applications with improved water softening properties, lower release of heavy metals, and relative method of manufacturing
10/29/2009WO2009130252A2 Electroconductive diamond-like layer
10/29/2009WO2009111575A3 Substrates for silicon solar cells and methods of producing the same
10/29/2009WO2009085561A3 Methods for in-situ chamber cleaning process for high volume manufacture of semiconductor materials
10/29/2009US20090269940 Method for nitriding substrate and method for forming insulating film
10/29/2009US20090269937 Substrate processing apparatus and method of manufacturing semiconductor device
10/29/2009US20090269933 Substrate Processing Apparatus and Semiconductor Device Manufacturing Method
10/29/2009US20090269921 Method for growing carbon nanotubes, and electronic device having structure of ohmic connection to carbon element cylindrical structure body and production method thereof
10/29/2009US20090269914 Process for forming a dielectric on a copper-containing metallization and capacitor arrangement
10/29/2009US20090269879 Metalorganic Chemical Vapor Deposition of Zinc Oxide
10/29/2009US20090269587 Hydrophobic nanostructured thin films
10/29/2009US20090269579 Multilayer structured particle
10/29/2009US20090269512 Nonplanar faceplate for a plasma processing chamber
10/29/2009US20090269511 Process for producing hybrid nano-filament electrodes for lithium batteries
10/29/2009US20090269507 Selective cobalt deposition on copper surfaces
10/29/2009US20090269494 Film-forming apparatus, film-forming method and recording medium
10/29/2009US20090269493 Method of manufacturing polycrystalline silicon rod
10/29/2009US20090269492 Apparatus and Method for Deposition Organic Compounds, and Substrate Treating Facility With the Apparatus
10/29/2009US20090269490 Coating apparatus and coating method
10/29/2009US20090269486 Evaporation method, evaporation device and method of fabricating light emitting device
10/29/2009US20090269010 Optical interconnection structure and method for manufacturing the same
10/29/2009US20090266487 Microwave introduction device
10/29/2009US20090266300 Substrate processing apparatus and substrate placing table
10/29/2009US20090266299 Low profile process kit
10/29/2009US20090266296 Atomic layer growing apparatus
10/29/2009US20090265929 Method of mounting electronic circuit constituting member and relevant mounting apparatus
10/29/2009DE102008020468A1 Elektrisch leitfähige diamantähnliche Schicht Electrically conductive diamond-like layer
10/29/2009DE102008005283B4 Verfahren zur Herstellung einer mit einem transparenten, Metalloxid beschichtetn Glasscheibe für ein photovoltaisches Modul und eine solche beschichtete Glasscheibe A process for preparing a beschichtetn with a transparent metal oxide glass sheet for a photovoltaic module and such coated glass pane
10/28/2009EP2112249A1 Systems and methods for thermal management of electronic components
10/28/2009EP2112248A1 Method for producing a fire resistant titanium gas turbine component and the titanium component.
10/28/2009EP2111481A1 Plasma deposited microporous carbon material
10/28/2009EP2111480A2 Method of making inorganic or inorganic/organic hybrid films
10/28/2009EP1982371B1 Dli-mocvd process for making electrodes for electrochemical reactors
10/28/2009EP0748260B2 Ion beam process for deposition of highly abrasion-resistant coatings
10/28/2009CN101568993A Film forming apparatus and method of forming film
10/28/2009CN101568667A Vaporization apparatus, film forming apparatus, film forming method, computer program and storage medium
10/28/2009CN101568666A Metal gas supply apparatus and remaining gas removal apparatus used for thin film depositing apparatus and method thereof
10/28/2009CN101567407A Graded zinc diffusing method based on MOCVD (Metal-Organic Chemical Vapor Deposition) system for producing chip of indium-gallium-arsenic photoelectric detector
10/28/2009CN101567400A Thin film silicon solar cell and manufacturing method thereof
10/28/2009CN101567230A Preparation method of transparent conductive thin film
10/28/2009CN101565829A Method for forming noble metal layer using ozone reaction gas
10/28/2009CN101565822A Release method of residual compression stress in nanocrystalline cubic boron nitride pellicle
10/28/2009CN101565821A Method for coating film on surface of drill point and drill point coated with film
10/28/2009CN100555582C Method and equipment for forming oxide film
10/28/2009CN100555581C Method and apparatus for silicone oxide deposition on large area substrates
10/28/2009CN100555572C Method for manufacturing semiconductor device
10/28/2009CN100555571C CVD apparatus and method of cleaning the CVD apparatus using the CVD apparatus
10/28/2009CN100554506C Film formation method and apparatus for semiconductor process
10/28/2009CN100554505C Vapor deposition systems and methods
10/28/2009CN100554504C Chemical vapor deposition apparatus for high purity zinc oxide and preparation method thereof
10/28/2009CN100554140C Gas phase self-assembled growth silicon quantum torus nano structure preparation method
10/27/2009US7608766 Polymer treated surfaces and methods for making
10/27/2009US7608539 ALD method and apparatus
10/27/2009US7608307 laser evaporation method by shining a laser beam upon a target position; forming a thin films of ferroelectric substances, insulators, conducting oxides, oxide superconductors, magnetic materials; depositing while performing rotation; uniformity of thickness
10/27/2009US7608301 Process for forming a protective coating containing aluminium and zirconium on a metal
10/27/2009US7608300 Methods and devices to reduce defects in dielectric stack structures
10/27/2009US7608299 Process for the deposition by CVD of a silver film on a substrate
10/27/2009US7608294 Transparent substrate with transparent conductive film, method of manufacturing the same, and photoelectric conversion element including the substrate
10/27/2009US7608162 Plasma processing apparatus and method
10/27/2009US7608151 Method and system for coating sections of internal surfaces
10/27/2009US7607414 Member for internal combustion engine and production method thereof
10/27/2009CA2436001C Method of forming a silicon dioxide film
10/22/2009WO2009129194A2 Large-area single- and few-layer graphene on arbitrary substrates
10/22/2009WO2009128888A1 Manufacturing apparatus for depositing a material and an electrode for use therein
10/22/2009WO2009128887A1 Manufacturing apparatus for depositing a material on an electrode for use therein
10/22/2009WO2009128886A1 Manufacturing apparatus for depositing a material and an electrode for use therein
10/22/2009WO2009128301A1 Diamond semiconductor device and method for manufacturing the same
10/22/2009WO2009127373A1 Transparent barrier layer system
10/22/2009WO2009127294A1 Apparatus and method for inner surface treatment of hollow bodies
10/22/2009WO2009126978A1 Process for producing a ti(c,n,o) coating layer
10/22/2009WO2009106079A3 Corrosion resistant object with alloying zone
10/22/2009US20090264845 Absorbent composite and method for producing same, asorbent article and nozzle
10/22/2009US20090264037 Oleophobic polyolefin fiber materials
10/22/2009US20090263961 Hardware set for growth of high k & capping material films
10/22/2009US20090263667 Method of making scratch resistant coated glass article including layer(s) resistant to fluoride-based etchant(s)
10/22/2009US20090263649 Method for manufacturing ultra-hydrophilic thin film coated metal product, and ultra-hydrophilic thin film coated metal product
10/22/2009US20090263641 Method and apparatus to coat objects with parylene
10/22/2009US20090263594 Low-frequency bias power in hdp-cvd processes
10/22/2009US20090263592 Plasma-enhanced chemical vapor deposition of advanced lubricant for thin film storage medium