Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23C - Coating metallic material; Coating material with metallic material; Surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general › C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes
Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
11/2009
11/17/2009US7618681 Producing bismuth-containing ferroelectric or superconducting films by the Atomic Layer Deposition where a silylamido ligand is used as a source material for the bismuth; e.g. tris(bis(trimethylsilyl)amido)bismuth(III)
11/17/2009US7618680 pretreating a substrate surface by subliming a oxidant iron(III) chloride, heating before plasma polymerization of polythiophenes; organic light-emitting diodes (OLEDs), photovoltaics, electrochromics, and supercapacitors
11/17/2009US7618674 Deposition mask and method for manufacturing organic light emitting display using the same
11/17/2009US7618599 an enclosure including a furnace, gas intake and discharge apertures and a heat exchanger, used for manufacturing carbon nanotube to ensure a high purity and production efficiency
11/17/2009US7618516 Method and apparatus to confine plasma and to enhance flow conductance
11/17/2009US7618494 Substrate holding structure and substrate processing device
11/17/2009US7618493 Device and method for manufacturing thin films
11/12/2009WO2009136019A2 Device and process for chemical vapor phase treatment
11/12/2009WO2009135344A1 Method of self-assembly growing carbon nanotubess by chemical-vapor-deposition without the use of metal catalyst
11/12/2009WO2009117262A3 Method and system for depositing silicon carbide film using a gas cluster ion beam
11/12/2009WO2009117229A3 Coaxial microwave assisted deposition and etch systems
11/12/2009WO2009064345A3 A chemical mechanical planarization pad conditioner and methods of forming thereof
11/12/2009WO2009048080A9 Heating device
11/12/2009US20090281344 semiconductors; low dielectric thin films; chemical vapor deposition
11/12/2009US20090280276 Method and Device for Plasma-Assisted Chemical Vapour Deposition on the Inner Wall of a Hollow Body
11/12/2009US20090280270 Method and Device for the Hot Dip Coating of a Metal Strip
11/12/2009US20090280268 Method and apparatus for application of thin coatings from plasma onto inner surfaces of hollow containers
11/12/2009US20090280267 Plasma-enhanced pulsed deposition of metal carbide films
11/12/2009US20090280264 Method for selective immobilization of macromolecules on self assembled monolayer surfaces
11/12/2009US20090280249 Process and apparatus for flash evaporation
11/12/2009US20090280248 Porous substrate holder with thinned portions
11/12/2009US20090280247 Apparatus and method for deposition for organic thin films
11/12/2009US20090280052 Binary and Ternary Metal Chalcogenide Materials and Method of Making and Using Same
11/12/2009US20090278114 Control of carbon nanotube diameter using cvd or pecvd growth
11/12/2009US20090277588 Semiconductor producing device and semiconductor device producing method
11/12/2009US20090277586 Gas Introducing Apparatus, Manufacturing Method for the Gas Introducing Apparatus and Processing Apparatus
11/12/2009US20090277390 Source, an Arrangement for Installing a Source, and a Method for Installing and Removing a Source
11/12/2009US20090277389 Processing apparatus
11/12/2009US20090277388 Heater with detachable shaft
11/12/2009US20090277387 Susceptor and chemical vapor deposition apparatus including the same
11/12/2009US20090277386 Catalytic chemical vapor deposition apparatus
11/12/2009US20090277382 Semiconductor manufacturing apparatus
11/11/2009EP2116633A1 Preparation of metal oxide thin film via cyclic CVD or ALD
11/11/2009EP2116632A2 Porogens, porogenated precursors and methods for using the same to provide porous organosilica glass films with low dielectric constants
11/11/2009EP2116368A1 Transparent gas barrier film and method for producing the same
11/11/2009EP2115184A1 Method and apparatus for stabilizing a coating
11/11/2009EP1572593B1 Burner for chemical vapour deposition of glass
11/11/2009CN201343570Y Temperature control spray header
11/11/2009CN101578715A III nitride compound semiconductor element and method for manufacturing the same, III nitride compound semiconductor light emitting element and method for manufacturing the same, and lamp
11/11/2009CN101578391A Deposition system and method
11/11/2009CN101578390A Cobalt-containing film-forming material and method for forming cobalt silicide film using the material
11/11/2009CN101578389A Highly corrosion-resistant members and processes for production thereof
11/11/2009CN101578388A Film deposition of amorphous films with a graded bandgap by electron cyclotron resonance
11/11/2009CN101578386A Method and apparatus for converting precursor layers into photovoltaic absorbers
11/11/2009CN101577211A Reaction chamber component resisting plasma corrosion, preparation method thereof and plasma reaction chamber comprising same
11/11/2009CN101575701A Method for producing an epitaxially coated semiconductor wafer
11/11/2009CN101575700A Porogens, porogenated precursors and methods for using the same to provide porous organosilica glass films with low dielectric constants
11/11/2009CN100559513C Transparent conductive film
11/11/2009CN100558933C Method for preparing cubic boron nitride thin film
11/11/2009CN100558932C Heat preservation apparatus of foam charcoal in use for vacuum induction gaseous phase deposition stove
11/10/2009USRE40962 Tungsten, tantalum, titanium carbides; milling, spray drying, compacting, sintering; wear resistance
11/10/2009US7615259 Method and apparatus for processing workpiece
11/10/2009US7615251 Processing device using shower head structure and processing method
11/10/2009US7615250 Dimethylethyl ethylenediamine methylaluminum; non-pyrophoric , long shelf life; thin films for liquid crystal displays, electroluminescent displays, solar cells, semiconductors
11/10/2009US7615205 forming a catalyst layer on Si substrate heating the substrate to a predetermined temperature; intermittently introducing/providing and then interrupting a reaction gas ethylene, proximate the substrate to grow a patterned carbon nanotube array, each carbon nanotube having at least one line mark
11/10/2009US7615204 Direct synthesis of long single-walled carbon nanotube strands
11/10/2009US7615133 Electrostatic chuck module and cooling system
11/10/2009US7615132 Plasma processing apparatus having high frequency power source with sag compensation function and plasma processing method
11/10/2009US7615131 Plasma etching chamber and plasma etching system using same
11/10/2009US7615121 Susceptor system
11/10/2009US7615120 Pulsed mass flow delivery system and method
11/10/2009US7615116 Method for producing silicon epitaxial wafer and silicon epitaxial wafer
11/10/2009US7614840 Wafer processing apparatus having dust proof function
11/10/2009US7614253 Method of reducing stress-induced mechanical problems in optical components
11/05/2009WO2009134305A1 Composite coatings comprising hollow and/or shell-like metal oxide particles deposited via combustion deposition
11/05/2009WO2009134081A2 Method for depositing ultra fine crystal particle polysilicon thin film
11/05/2009WO2009133841A1 METHOD FOR PRODUCTION OF WATER-REACTIVE Al FILM, AND STRUCTURAL MEMBER FOR FILM-FORMING CHAMBER
11/05/2009WO2009133840A1 WATER-REACTIVE Al COMPOSITE MATERIAL, WATER-REACTIVE Al FILM, METHOD FOR PRODUCTION OF THE AL FILM, AND STRUCTURAL MEMBER FOR FILM-FORMING CHAMBER
11/05/2009WO2009133839A1 Water-reactive al composite material, water-reactive al film, method for production of the al film, and structural member for film-forming chamber
11/05/2009WO2009133838A1 WATER-REACTIVE Al COMPOSITE MATERIAL, WATER-REACTIVE Al FILM, PROCESS FOR PRODUCTION OF THE Al FILM, AND CONSTITUENT MEMBER FOR FILM DEPOSTION CHAMBER
11/05/2009WO2009133837A1 WATER-REACTIVE Al COMPOSITE MATERIAL, WATER-REACTIVE Al FILM, PROCESS FOR PRODUCTION OF THE Al FILM, AND CONSTITUENT MEMBER FOR FILM DEPOSITION CHAMBER
11/05/2009WO2009133836A1 PROCESS FOR PRODUCTION OF WATER-REACTIVE Al FILM AND CONSTITUENT MEMBERS FOR FILM DEPOSITION CHAMBERS
11/05/2009WO2009133699A1 Heating device, film forming apparatus, film forming method, and device
11/05/2009WO2009133500A1 Method of forming a nanocluster-comprising dielectric layer and device comprising such a layer
11/05/2009WO2009105565A3 Index modified coating on polymer substrate
11/05/2009US20090275907 Absorbent sanitary article for absorbing body fluid
11/05/2009US20090275209 Plasma processing apparatus and method
11/05/2009US20090275202 Silicon structure having an opening which has a high aspect ratio, method for manufacturing the same, system for manufacturing the same, and program for manufacturing the same, and method for manufacturing etching mask for the silicon structure
11/05/2009US20090275150 Film formation apparatus and method for semiconductor process
11/05/2009US20090274872 Device and Method for Coating a Micro-and/or Nano-Structured Structural Substrate and Coated Structural Substrate
11/05/2009US20090274870 method of fabricating a membrane having a tapered pore
11/05/2009US20090274865 Cellular lattice structures with multiplicity of cell sizes and related method of use
11/05/2009US20090274851 chemical vapor deposition; plasma polymerization
11/05/2009US20090274848 Impingement part cooling
11/05/2009US20090274835 Diffuser/shutter design for vapor phase lubrication process
11/05/2009US20090274830 Roll to roll oled production system
11/05/2009US20090274826 Coating apparatus capable of controlling mixing ratio and method thereof
11/05/2009US20090272935 Aligned Carbon Nanotube Bulk Aggregate, Process for Producing The Same and Uses Thereof
11/05/2009US20090272719 System and method for pedestal adjustment
11/05/2009US20090272324 Slit valve having increased flow uniformity
11/05/2009US20090272323 Susceptor, semiconductor manufacturing apparatus, and semiconductor manufacturing method
11/05/2009US20090272322 Film depositing apparatus
11/05/2009DE112007002459T5 Plasmafilmbildungsvorrichtung und Plasmafilmbildungsverfahren Plasma film forming apparatus and film forming method plasma
11/05/2009DE102008023571A1 Dünne Gehäusefolie für galvanische Elemente Thin film housing for galvanic elements
11/05/2009DE102008022039A1 Wear-resistant coating of amorphous carbon, is deposited in layers with varying oxygen content to control hardness, friction and wear rate
11/05/2009DE102007023803B4 Verfahren zur Herstellung von Schichtsystemen mit Zwischenschichten sowie Gegenstand mit Schichtsystem mit Zwischenschichten Process for the preparation of layer systems with intermediate layers and having a layer system with the subject interlayers
11/04/2009EP2113585A1 Apparatus and method for coating of a web in vacuum by twisting and guiding the web multiple times along a roller past a processing region
11/04/2009CN201341268Y Nozzle electrode
11/03/2009US7612015 Member having photocatalytic function and method for manufacture thereof
11/03/2009US7611996 Multi-stage curing of low K nano-porous films
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