Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
11/2009
11/25/2009EP2123792A1 Process and apparatus for producing carbonaceous film
11/25/2009EP2123658A1 Material for forming silicon-containing film, and silicon-containing insulating film and method for forming the same
11/25/2009EP2123446A1 Transparent gas barrier film and method for producing transparent gas barrier film
11/25/2009EP2123445A1 Transparent gas barrier film and method for producing the same
11/25/2009EP2122017A1 Reactor for growing crystals
11/25/2009EP2122007A1 Method for forming a film on a substrate
11/25/2009EP2122006A2 Methods and apparatus for forming diamond-like coatings
11/25/2009EP2122005A1 Deposition system and method
11/25/2009CN201351174Y Chemical vapor deposition furnace tail gas discharging electromagnetic valve self-cleaning device
11/25/2009CN101589172A High strip rate downstream chamber
11/25/2009CN101589171A Apparatus and method for large area multi-layer atomic layer chemical vapor processing of thin films
11/25/2009CN101587917A Method for preparing zinc oxide film solar cell
11/25/2009CN101587821A Electrode plate
11/25/2009CN101587156A Method and apparatus for measuring electron density of plasma and plasma processing apparatus
11/25/2009CN101586235A Apparatus for supplying source and apparatus for deposition thin film having the same
11/25/2009CN101585857A Organic phosphine stabilized N-hydroxysuccinimide silver complex, synthesis method and application thereof
11/25/2009CN100562976C Vapor-phase epitaxial growth method and vapor-phase epitaxy apparatus
11/25/2009CN100562975C Method for adopting boron dope on the diamond surface to prepare semi-conductor conductive film
11/24/2009US7622401 Method of producing insulator thin film, insulator thin film, method of manufacturing semiconductor device, and semiconductor device
11/24/2009US7622396 Method of producing a semiconductor device
11/24/2009US7622161 Method of making window unit including diamond-like carbon (DLC) coating
11/24/2009US7622153 contacting the oxidizable component (Fe, Al or alloy) in particle form with a gas containing a vapour of the activating component(AlCl3, FeCl3 etc.) and depositing activating component from the gas onto the oxidizable component in either a liquid or solid form; utility in packaging
11/24/2009US7622152 MoSi2-Si3N4 composite coating and manufacturing method thereof
11/24/2009US7622151 Method of plasma enhanced chemical vapor deposition of diamond using methanol-based solutions
11/24/2009US7622150 Overcoating molybdenum silicide with heat barrier
11/24/2009US7622149 Reactive metal sources and deposition method for thioaluminate phosphors
11/24/2009US7622017 Processing apparatus and gas discharge suppressing member
11/24/2009US7622008 Gate valve and vacuum container for semiconductor processing system
11/24/2009US7622007 Substrate processing apparatus and semiconductor device producing method
11/24/2009US7622006 Processed body carrying device, and processing system with carrying device
11/24/2009US7622005 Uniformity control for low flow process and chamber to chamber matching
11/24/2009US7621998 Single crystalline gallium nitride thick film having reduced bending deformation
11/24/2009US7621570 Pre-expanded connector for expandable downhole tubulars
11/19/2009WO2009140417A1 Method of coating inner and outer surfaces of pipes for thermal solar and other applications
11/19/2009WO2009139116A1 Apparatus for vapor-phase growth and a method for the vapor-phase growth of a thin film
11/19/2009WO2009138537A1 Sand trap for a golf course and corresponding methods and uses
11/19/2009WO2008110151A3 Method and device for the plasma-assisted surface treatment of large-volume components
11/19/2009US20090286674 Activation of surfaces through gas phase reactions
11/19/2009US20090286405 Shower plate, and plasma processing apparatus, plasma processing method and electronic device manufacturing method using the shower plate
11/19/2009US20090286398 Chemical vapor deposition apparatus, film forming method, and method of manufacturing semiconductor device
11/19/2009US20090286397 Selective inductive double patterning
11/19/2009US20090286342 Semiconductor light-emitting device, surface-emission laser diode, and production apparatus thereof, production method, optical module and optical telecommunication system
11/19/2009US20090286066 Patterned, dense and high-quality swnts arrays
11/19/2009US20090286011 Plasma Processing Device, Plasma Processing Method, and Plasma Surface Processing Method
11/19/2009US20090286010 High throughput processes and systems for barrier film deposition and/or encapsulation of optoelectronic devices
11/19/2009US20090286009 Method for operating a chemical deposition chamber
11/19/2009US20090285999 Coating device with insulation
11/19/2009US20090285998 Plasma processing apparatus, electrode plate for plasma processing apparatus, and electrode plate manufacturing method
11/19/2009US20090285987 Perfluoroparacyclophane and related methods therefor
11/19/2009US20090285986 Methods of forming a material layer and methods of fabricating a memory device
11/19/2009US20090285665 Substrate processing module exchange unit, vacuum coating installation, method of exchanging a substrate processing module for a vacuum coating installation, and use of a substrate processing module exchange unit
11/19/2009US20090283216 Method of and apparatus for manufacturing semiconductor device
11/19/2009US20090283158 Laminated walls for uniform fluid flow
11/19/2009US20090283042 Susceptor positioning and supporting device of vacuum apparatus
11/19/2009US20090283041 Solid organometallic compound-filled container and filling method thereof
11/19/2009US20090283040 Device for temperature-controlled accommodation of a container
11/19/2009US20090283039 Robust outlet plumbing for high power flow remote plasma source
11/19/2009US20090283038 Film forming method and apparatus
11/19/2009US20090283037 Edge Profiling For Process Chamber Shields
11/19/2009US20090283029 Abatement of reaction gases from gallium nitride deposition
11/19/2009DE112005002692B3 Verwendung polydentater Liganden zum Versiegeln von Poren in Low-k-Dielektrika, sowie damit hergestellte Halbleitervorrichtungen Use of polydentate ligands for sealing pores in low-k dielectrics, and thus produced semiconductor devices
11/19/2009DE102006036403B4 Verfahren zur Beschichtung eines Substrats mit einer definierten Schichtdickenverteilung A process for coating a substrate with a defined layer thickness distribution
11/19/2009CA2724334A1 Method of coating inner and outer surfaces of pipes for thermal solar and other applications
11/18/2009EP2119815A1 Method for producing self-supporting nitride semiconductor substrate and self-supporting nitride semiconductor substrate
11/18/2009EP2119811A1 Continuous film forming apparatus
11/18/2009EP2118340A1 Coated cutting tool for medium- rough to rough turning of stainless steels and superalloys
11/18/2009EP2118339A1 Coated cutting tool for fine to medium-rough turning of stainless steels
11/18/2009EP2118336A1 Method of curing metal alkoxide-containing films
11/18/2009EP2118335A1 High uniformity boron doped diamond material
11/18/2009EP2118334A1 Vacuum coating apparatus
11/18/2009EP2118332A2 Method for the production of a coating
11/18/2009EP2118003A2 Method, material and apparatus for enhancing dynamic stiffness
11/18/2009EP1601888B1 One piece shim
11/18/2009CN201347452Y Chemical vapor deposition equipment and boat thereof
11/18/2009CN101583837A Microwave reactor having a slotted array waveguide
11/18/2009CN101583738A Method and apparatus for preventing the formation of a plasma inhibiting substance
11/18/2009CN101583737A Film deposition of amorphous films by electron cyclotron resonance
11/18/2009CN101583736A Plasma immersion chamber
11/18/2009CN101583234A Inductive couple plasma processing device
11/18/2009CN101583233A Normal-pressure plasma device
11/18/2009CN101582461A Novel multilayer transparent conductive film structure and preparation method thereof
11/18/2009CN101581036A Preparation method of continuous SiC fiber surface C/AIN composite gradient coating.
11/18/2009CN101580932A Device for realizing temperature equalization of matrix in preparation process of diamond film spherical crown
11/18/2009CN101580931A Method of applying a diamond layer to a graphite substrate
11/18/2009CN101580930A Growing method of AlN buffering layer
11/18/2009CN101580224A Patterning preparation method for nano array
11/18/2009CN100562196C Anti-active oxygen corrosion new plane antenna radiation heater
11/18/2009CN100561766C Method and apparatus for forming superconductor material on a tape substrate
11/18/2009CN100561708C Integration process for fabricating stressed transistor structure
11/18/2009CN100561686C Plasma processing apparatus and gas permeable plate
11/18/2009CN100561680C Plasma processing apparatus, process vessel for plasma processing apparatus and dielectric plate
11/18/2009CN100560793C Method for preparing nano composite diamond coating
11/18/2009CN100560792C Growth of very uniform silicon carbide epitaxial layers
11/18/2009CN100560257C Coated cutting tool
11/17/2009US7619107 Copper (II) complexes for deposition of copper films by atomic layer deposition
11/17/2009US7618901 Process for growing a dielectric layer on a silicon-containing surface using a mixture of N2O and O3
11/17/2009US7618830 Rapid thermal processing apparatus and methods
11/17/2009US7618769 Textured chamber surface
11/17/2009US7618686 Method and apparatus for sequential plasma treatment
11/17/2009US7618682 by reacting a vapor of perfluorooctylhydroxamic acid with metal surface to chelate with the metal atoms; higher temperature resistance; relatively large vapor pressures; enhance coating durability and stability, while reducing coating volatility; microelectromechanical systems