Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
12/2009
12/03/2009US20090297706 Film forming system and method for forming film
12/03/2009US20090297092 Thermo-optic phase shifter and method for manufacturing same
12/03/2009US20090294088 Forming foam structures with carbon foam substrates
12/03/2009US20090294062 Plasma reactor with plasma load impedance tuning for engineered transients by synchronized modulation of a source power or bias power rf generator
12/03/2009US20090294061 Plasma reactor with plasma load impedance tuning for engineered transients by synchronized modulation of an unmatched low power rf generator
12/03/2009US20090293810 Arrangement for coating a substrate
12/03/2009US20090293809 Stage unit for supporting a substrate and apparatus for processing a substrate including the same
12/03/2009US20090293808 Light-Emitting Device, Film-Forming Method and Manufacturing Apparatus Thereof, and Cleaning Method of the Manufacturing Apparatus
12/03/2009US20090293807 Apparatus for filtration and gas-vapor mixing in thin film deposition
12/03/2009DE102008024372A1 Method for transporting substrates into the vacuum coating devices, comprises moving past the substrates in a vacuum chamber in a transport direction at a treatment device
12/02/2009EP2128717A1 Intermediate transfer member and image formation apparatus
12/02/2009EP2128304A1 Metal film production apparatus and method
12/02/2009EP2126161A1 Device and method for selectively depositing crystalline layers using mocvd or hvpe
12/02/2009EP2126154A1 Coating for gas turbine components, and method and device for providing a coating
12/02/2009CN101595768A Induction coil, plasma generating apparatus and plasma generating method
12/02/2009CN101595250A Method for producing group 3-5 compound semiconductor
12/02/2009CN101595245A Method and apparatus for stabilizing a coating
12/02/2009CN101595244A Vapor deposition methods for forming a metal- containing layer on a substrate
12/02/2009CN101595243A Compositions and methods for forming and depositing metal films on semiconductor substrates using supercritical solvents
12/02/2009CN101595242A Anti-pooling vest for patients undergoing hemodialysis and in critical care
12/02/2009CN101593724A Method for forming via
12/02/2009CN101593667A Method for improving consistency of thickness of dielectric layers deposited on different substrates
12/02/2009CN101591796A Production process for preparing high-performance diamond wire saw
12/02/2009CN101591780A Method for preparing abrasion resistant coating layer of cutter
12/02/2009CN101591776A Method for operating chemical vapor deposition chamber
12/02/2009CN101591775A Thin film deposition system device suitable for diamond heat-sink membrane
12/02/2009CN101591774A Chemical vapor deposition apparatus
12/02/2009CN101591773A Vapor deposition system
12/02/2009CN101591772A Process stability of nbde using substituted phenol stabilizers
12/02/2009CN101591771A Device for positioning and supporting base of vacuum equipment
12/02/2009CN101591763A Insulating type multifunctional ion chemical heat treatment device
12/02/2009CN100565790C Plasma processing method and plasma processing apparatus
12/02/2009CN100565787C Substrate support having temperature control surface
12/02/2009CN100564590C Inductive plasma system with sidewall magnet
12/02/2009CN100564589C Apparatus for processing substrate and method for processing thin film on the substrate
12/02/2009CN100564588C Plasma processing method and apparatus thereof
12/02/2009CN100564587C Film formation method for Ti film
12/02/2009CN100564586C Apparatus for forming carbon film on internal surface of plastic container and method of manufacturing plastic container
12/02/2009CN100564585C Method and device for coating non-metallic material with ferromagnetic and magnetic metal plating coat
12/02/2009CN100563884C Coated cutting blade and manufacture method and uses
12/02/2009CN100563791C Method and system for characterizing porous materials
12/02/2009CN100563440C Antimicrobial composite material
12/01/2009US7625840 Catalytic nanoporous membranes
12/01/2009US7625794 Dielectrics; atomic layer deposition, pulsing
12/01/2009US7625604 Conveying plurality of substrates in holder into reaction container; heating a plurality of zones of thermal process atmosphere in the reaction container by means of a plurality of heating units; forming uniform thin films; oxidation, chemical vapor deposition; semiconductors
12/01/2009US7625603 oxidation of a silicon precursor gas in an oxygen-rich environment followed by annealing; use in microelectromechanical systems (MEMS)
12/01/2009US7625602 Heating to vaporize, providing thermally conductive path from perforated member at feeding location to heat sink, providing auger enclosure and rotatable auger for receiving powder; uniformity; OLED surfaces
12/01/2009US7625601 Controllably feeding organic material in making OLEDs
12/01/2009US7625600 For use in explosives, pyrotechnics, gas generators, and semiconductor interconnects
12/01/2009US7625472 Plasma-assisted sputter deposition system
12/01/2009US7625460 Multifrequency plasma reactor
12/01/2009US7625450 Film forming apparatus
12/01/2009US7625448 Inlet system for an MOCVD reactor
11/2009
11/26/2009WO2009143460A1 HIGH-K DIELECTRIC FILMS AND METHODS OF PRODUCING USING TITANIUM-BASED β-DIKETONATE PRECURSORS
11/26/2009WO2009143458A1 High-k dielectric films and methods of producing using titanium-based precursors
11/26/2009WO2009143456A1 HIGH-K DIELECTRIC FILMS AND METHODS OF PRODUCING USING CERIUM-BASED β-DIKETONATE PRECURSORS
11/26/2009WO2009143452A1 High-k dielectric films and methods of producing using cerium-based precursors
11/26/2009WO2009142905A1 Deposition method and apparatus
11/26/2009WO2009142488A1 Apparatus and method for high-throughput atomic layer deposition
11/26/2009WO2009142487A1 Apparatus and method for high-throughput atomic layer deposition
11/26/2009WO2009142138A1 Plasma processing apparatus
11/26/2009WO2009142016A1 Plasma generating apparatus and plasma processing apparatus
11/26/2009WO2009141839A1 Valve assembly for an injection valve and injection valve
11/26/2009WO2009141804A1 Deposition method
11/26/2009WO2009141304A1 Vapour deposition process and device
11/26/2009WO2009141234A1 Process for the phase transformation of substances
11/26/2009WO2009140961A1 Method for producing nanoscalar electrically conductive multilayer systems
11/26/2009WO2009062877A3 Corrosion-resistant coating and method for producing same
11/26/2009US20090291566 Substrate Processing Apparatus, Coolant Gas Supply Nozzle and Semiconductor Device Manufacturing Method
11/26/2009US20090291563 Plasma processing apparatus and plasma processing method
11/26/2009US20090291557 Microreactor for solution deposition and method of use
11/26/2009US20090291323 Dispersion strengthened ceramic thermal barrier coating
11/26/2009US20090291233 Process for producing gas barrier films
11/26/2009US20090291232 Method and apparatus for growing plasma atomic layer
11/26/2009US20090291231 Method and apparatus for producing a solar cell module with integrated laser patterning
11/26/2009US20090291226 Apparatus and Method for Double-Plasma Graft Polymerization at Atmospheric Pressure
11/26/2009US20090291212 VOLATILE METAL COMPLEXES OF PERFLUORO-tert-BUTANOL
11/26/2009US20090291211 Apparatus for atomic layer deposition and method of atomic layer deposition using the same
11/26/2009US20090291210 Additives to Prevent Degradation of Cyclic Alkene Derivatives
11/26/2009US20090291209 Apparatus and method for high-throughput atomic layer deposition
11/26/2009US20090291208 Atomic layer deposition using metal amidinates
11/26/2009US20090291207 Gas-purged vacuum valve
11/26/2009US20090290614 Nano-composites for thermal barrier coatings and thermo-electric energy generators
11/26/2009US20090289390 Direct silicon or reactive metal casting
11/26/2009US20090289222 Process for preparing composites comprising carbon and magnesium for hydrogen storage
11/26/2009US20090289035 Plasma Processing Apparatus And Plasma Processing Method
11/26/2009US20090289029 Mold having nanometric features, method for realizing such a mold and corresponding use of it in a method for realizing an array of carbon nanotubes
11/26/2009US20090288772 Method and Apparatus for Processing Metal Bearing Gases
11/26/2009US20090288684 Vacuum processing apparatus and vacuum processing method
11/26/2009US20090288604 Chemical vapor deposition apparatus
11/26/2009US20090288603 Plasma and electron beam etching device and method
11/26/2009US20090288602 Electrode and Vacuum Processing Apparatus
11/26/2009US20090288601 Coating formation by reactive deposition
11/26/2009US20090288600 Apparatus for supplying source and apparatus for deposition thin film having the same
11/26/2009US20090288599 Self-welded metal-catalyzed carbon nanotube bridges and solid electrolytic non-volatile memories
11/26/2009DE112007003196T5 Ringplasmastrahlverfahren und Vorrichtung zum Herstellen einer Vorform für eine optische Faser Ring plasma jet method and apparatus for producing a preform for an optical fiber
11/26/2009DE102008025108A1 Verfahren zur Herstellung von nanoskaligen elektrisch leitfähigen Mehrschichtsystemen A process for preparing nanoscale electrically conductive multi-layer systems
11/25/2009EP2123802A1 N-type conductive aluminum nitride semiconductor crystal and method for producing the same
11/25/2009EP2123801A1 Method and equipment for producing group-iii nitride
11/25/2009EP2123793A1 Vapour deposition process