Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
12/2009
12/30/2009EP1444390B1 Apparatus and method for diamond production
12/30/2009CN101617065A Methods for forming a ruthenium-based film on a substrate
12/30/2009CN101613857A Preparation device of high-quality barrier film of plastic bottle inner wall and preparation method thereof
12/30/2009CN101613856A Al-doped alpha-phase silicon nitride (alpha-Si3N4)-based material and preparation method thereof
12/30/2009CN100576503C A method of preparation of an epitaxial substrate
12/30/2009CN100576488C Wafer clamping device
12/30/2009CN100576449C Method for manufacturing compound semiconductor epitaxial substrate
12/30/2009CN100576438C Plasma confinement baffle and flow equalizer for enhanced magnetic control of plasma radial distribution
12/30/2009CN100575548C High-density plasma chemical vapor deposition method
12/30/2009CN100575547C Plasma uniformity control by gas diffuser
12/30/2009CN100575546C Method for preparing p-type ZnO film by doping Sb
12/30/2009CN100575545C Method for growing high quality nano-diamond membrane with low cost
12/30/2009CN100575544C Preparation of ultra-fine diamond coating adapted for cutting tools
12/30/2009CN100575290C Coated object
12/29/2009US7638645 Metal (IV) tetra-amidinate compounds and their use in vapor deposition
12/29/2009US7638413 Method of fabricating semiconductor by nitrogen doping of silicon film
12/29/2009US7638173 Method for operating an in-line coating installation
12/29/2009US7638170 Low resistivity metal carbonitride thin film deposition by atomic layer deposition
12/29/2009US7638169 via catalyst seed patterned layer
12/29/2009US7638168 Deposition system using sealed replenishment container
12/29/2009US7638167 vapor-phase deposition
12/29/2009US7638161 Method and apparatus for controlling dopant concentration during BPSG film deposition to reduce nitride consumption
12/29/2009US7638074 Precursor compositions for atomic layer deposition and chemical vapor deposition of titanate, lanthanate, and tantalate dielectric films
12/29/2009US7638003 Semiconductor processing apparatus with lift pin structure
12/29/2009US7638002 Multi-tray film precursor evaporation system and thin film deposition system incorporating same
12/29/2009US7637482 Liquid substance supply device for vaporizing system, vaporizer, vaporization performance appraisal method
12/29/2009US7637114 Temperature-adjusting unit, substrate processing apparatus with the unit, and method of regulating temperature in the apparatus
12/29/2009US7637001 Method of manufacturing a thin-film magnetic head
12/29/2009CA2507319C Method and device for microwave plasma deposition of a coating on a thermoplastic container surface
12/24/2009US20090317982 Atomic layer deposition apparatus and method for preparing metal oxide layer
12/24/2009US20090317929 Method of producing semiconductor optical device
12/24/2009US20090317708 Plastic laminate film
12/24/2009US20090317566 Microwave plasma processing apparatus and method of supplying microwaves using the apparatus
12/24/2009US20090317565 Plasma cvd equipment
12/24/2009US20090317562 Processing system and method for processing a substrate
12/24/2009US20090317548 Gas turbine component with a thermal barrier coating, thermal barrier coating for a gas turbine component and process for producing a thermal barrier coating on a gas turbine component
12/24/2009US20090317547 Chemical vapor deposition systems and methods for coating a substrate
12/24/2009US20090317233 Rotary nanotube bearing structure and methods for manufacturing and using the same
12/24/2009US20090314643 Electrophoresis Cassette and Method for Producing the Same
12/24/2009US20090314520 Method and Apparatus for Spraying on a Track, in Particular a Conductor Track, and Electrical Component with a Conductor Track
12/24/2009US20090314309 Method and system for supplying a cleaning gas into a process chamber
12/24/2009US20090314212 Vacuum vapor-deposition apparatus
12/24/2009US20090314211 Big foot lift pin
12/24/2009US20090314210 Epitaxial growth susceptor
12/24/2009US20090314209 Susceptor and semiconductor manufacturing apparatus including the same
12/24/2009US20090314208 Pedestal heater for low temperature pecvd application
12/24/2009US20090314207 Apparatus for producing polycrystalline silicon
12/24/2009US20090314206 Sheet Plasma Film-Forming Apparatus
12/24/2009US20090314199 Vacuum Chamber
12/24/2009DE112008000368T5 Herstellung von Verbundmaterialien unter Verwendung von Atomschichtabscheidung Manufacture of composite materials using atomic layer deposition
12/24/2009DE102008029681A1 Verfahren und Vorrichtung zum Aufbringen einer Schicht, insbesondere einer selbstreinigend und/oder antimikrobiell wirkenden photokatalytischen Schicht, auf eine Oberfläche Method and apparatus for applying a layer, in particular a self-cleaning and / or antimicrobial photocatalytic layer on a surface
12/24/2009DE102008002515A1 Dichtungsartikel Seal products
12/23/2009WO2009155520A1 Hafnium and zirconium pyrrolyl-based organometallic precursors and use thereof for preparing dielectric thin films
12/23/2009WO2009155507A1 Titanium pyrrolyl-based organometallic precursors and use thereof for preparing dielectric thin films
12/23/2009WO2009155451A1 High volume manufacture of electrochecmicals cells using physical vapor deposition
12/23/2009WO2009155028A1 Method and system for supplying a cleaning gas into a process chamber
12/23/2009WO2009154577A1 Method for growing monocrystalline diamonds
12/23/2009WO2009153059A1 Process device for processing in particular stacked processed goods
12/23/2009WO2009152670A1 Radio frequency electrode and apparatus for film formation
12/23/2009WO2009117745A3 Surface preheating treatment of plastics substrate
12/23/2009WO2009081380A3 Low decomposition storage of a tantalum precursor
12/23/2009EP2136423A1 Multilayer coating for protecting organic optic devices and manufacturing process thereof
12/23/2009EP2136392A1 Plasma processing apparatus, plasma processing method, and storage medium
12/23/2009EP2135977A2 Diamond composite substrate and a method for manufacturing same
12/23/2009EP2135734A1 Molded plastic with vapor-deposited film and process for producing the same
12/23/2009EP2134884A2 Method for the application of a high-strength coating to workpieces and/or materials
12/23/2009EP1548809B1 Heat treatment method and heat treatment apparatus
12/23/2009EP1448366B1 Forming thin films on substrates using a porous carrier
12/23/2009CN201367855Y Drilling polycrystalline diamond compact covered by CVD diamond coating
12/23/2009CN201367461Y Atomic layer deposition chamber and components thereof
12/23/2009CN101611472A Gas treatment systems
12/23/2009CN101611168A Continuous film forming apparatus
12/23/2009CN101611167A Atomic layer deposition systems and methods
12/23/2009CN101611166A Chemical vapor-phase growing apparatus, method of forming film and process for producing semiconductor device
12/23/2009CN101611043A Material for forming silicon-containing film, and silicon-containing insulating film and method for forming the same
12/23/2009CN101610610A Electrothermal film, coating process and device
12/23/2009CN101609861A Manufacturing process for laminated-silicon thin film solar cell
12/23/2009CN101609797A Method for reducing the surface roughness of SiGe virtual substrate
12/23/2009CN101608734A Reagent dispensing apparatus and delivery method
12/23/2009CN101608533A Drill bit impregnated with diamond film and manufacturing method thereof
12/23/2009CN100573836C Doped metal oxide films and systems for fabricating the same
12/23/2009CN100573825C Device and method for chemical vapour deposition (CVD)
12/23/2009CN100573817C Pressure reduction vessel and pressure reduction processing apparatus
12/23/2009CN100573816C Reaction cavity lining and reaction cavity including the same
12/23/2009CN100573813C Apparatus for fabricating semiconductor device, control method, and method of fabricating semiconductor device
12/23/2009CN100573803C Vacuum processing chamber for very large area substrates
12/23/2009CN100572596C Film forming equipment and film forming method
12/23/2009CN100572595C Chemical gaseous phase depositing process of avoiding reacting room particle pollution
12/23/2009CN100572594C Method and use of synthesizing nano diamond film on metal base
12/23/2009CN100572593C Heat radiator making process
12/23/2009CN100572592C Method for forming copper film
12/23/2009CN100572591C Method for increasing deposition rates of metal layers from metal-carbonyl precursors
12/23/2009CN100572590C Growth of in-situ thin films by reactive evaporation
12/23/2009CN100571868C Catalyst structure particularly for the production of field emission flat screens
12/22/2009US7635868 Silicon carbide epitaxial wafer, method for producing such wafer, and semiconductor device formed on such wafer
12/22/2009US7635528 Coated article
12/22/2009US7635503 Metal film is fabricated to provide uniform catalytic sites to facilitate uniform growth of carbon nanotubes; film comprises an active component and an inactive component wherein active component is capable of catalyzing formation of carbon nanotubes at 300-1200 degrees C. in presence of carbon precursor
12/22/2009US7635502 ALD apparatus and method
12/22/2009US7635501 Exhaust pipe having means for preventing deposition of a reaction by-product and method for preventing deposition of a reaction by-product
12/22/2009US7635418 Plasma processing apparatus and methods for removing extraneous material from selected areas on a substrate