Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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01/20/2010 | CN100582043C Titanium silicide nano-nail prepared by chemical vapor deposition under normal pressure and preparation method thereof |
01/20/2010 | CN100582033C Ceramic mould core |
01/19/2010 | US7649184 Processing method and system |
01/19/2010 | US7648926 Systems and methods for forming metal oxides using metal diketonates and/or ketoimines |
01/19/2010 | US7648895 Vertical CVD apparatus for forming silicon-germanium film |
01/19/2010 | US7648736 Coated cutting tool for turning of steel |
01/19/2010 | US7648735 Oxidized zirconium on a porous structure for bone implant use |
01/19/2010 | US7648611 Plasma etching equipment |
01/19/2010 | US7648610 Baffle plate, apparatus for producing the same, method of producing the same, and gas processing apparatus containing baffle plate |
01/19/2010 | US7648579 Substrate support system for reduced autodoping and backside deposition |
01/19/2010 | US7648578 Substrate processing apparatus, and method for manufacturing semiconductor device |
01/19/2010 | US7647887 Thin film forming apparatus |
01/19/2010 | US7647886 Systems for depositing material onto workpieces in reaction chambers and methods for removing byproducts from reaction chambers |
01/19/2010 | CA2360719C Method of forming thin film of inorganic solid electrolyte |
01/14/2010 | WO2010005439A1 Solar cells and methods and apparatuses for forming the same |
01/14/2010 | WO2010005111A1 Group iii nitride semiconductor laminate structure and process for producing the group iii nitride semiconductor laminate structure |
01/14/2010 | WO2010005070A1 Plasma processing device and plasma processing method |
01/14/2010 | WO2010004998A1 Film forming method and processing system |
01/14/2010 | WO2010004836A1 Plasma processing device |
01/14/2010 | WO2010004360A1 Sige matrix nanocomposite materials with an improved thermoelectric figure of merit |
01/14/2010 | WO2010003922A1 Method for making nanodiamond grains by homogenous nucleation in a plasma |
01/14/2010 | WO2010003816A1 Coating process and corrosion protection coating for turbine components |
01/14/2010 | WO2010003477A1 Method for depositing a scratch protection coating on a plastic substrate |
01/14/2010 | WO2010003476A1 Coating method and device using a plasma-enhanced chemical reaction |
01/14/2010 | WO2010003179A1 A method of fabricating a material |
01/14/2010 | WO2009122361A3 Preparation of lanthanide-containing precursors and deposition of lanthanide-containing films |
01/14/2010 | WO2009116004A3 Alkali earth metal precursors for depositing calcium and strontium containing films |
01/14/2010 | WO2009114851A3 Method for preparing electrically conducting materials and devices including same |
01/14/2010 | US20100009535 Methods and systems for barrier layer surface passivation |
01/14/2010 | US20100009489 Method and system for producing a solar cell using atmospheric pressure plasma chemical vapor deposition |
01/14/2010 | US20100009474 Method of growing carbon nanotubes and method of manufacturing field emission device using the same |
01/14/2010 | US20100009267 Metal oxide fibers and nanofibers, method for making same, and uses thereof |
01/14/2010 | US20100009123 Czochralski Growth of Randomly Oriented Polysilicon and Use of Randomly Oriented Polysilicon Dummy Wafers |
01/14/2010 | US20100009098 Atmospheric pressure plasma electrode |
01/14/2010 | US20100009097 Deposition Apparatus and Deposition Method Using the Same |
01/14/2010 | US20100009096 Vacuum processing apparatus and deposition method using the vacuum processing apparatus |
01/14/2010 | US20100009095 Method and Apparatus for Producing a Coating on a Substrate |
01/14/2010 | US20100009080 Fluidized bed evaporator |
01/14/2010 | US20100009079 Method for processing substrate and substrate processing apparatus |
01/14/2010 | US20100009078 Synthesis and Use of Precursors for ALD of Tellurium and Selenium Thin Films |
01/14/2010 | US20100009065 Droplet jetting applicator and method of manufacturing coated body |
01/14/2010 | US20100009064 Chemical vapor deposition (CVD) apparatus usable in the manufacture of superconducting conductors |
01/14/2010 | US20100007847 Process for manufacturing a series of ophthalmic lenses and sheet of film used in such a process |
01/14/2010 | US20100006836 Epitaxial growth method, epitaxial crystal structure, epitaxial crystal growth apparatus, and semiconductor device |
01/14/2010 | US20100006543 Plasma processing apparatus, plasma processing method and storage medium |
01/14/2010 | US20100006539 Apparatus for manufacturing semiconductor |
01/14/2010 | US20100006447 Method of preparing an ultra sharp tip, apparatus for preparing an ultra sharp tip, and use of an apparatus |
01/14/2010 | US20100006142 Deposition apparatus for improving the uniformity of material processed over a substrate and method of using the apparatus |
01/14/2010 | US20100006033 Vaporizer, vaporization module and film forming apparatus |
01/14/2010 | US20100006032 Chamber components for cvd applications |
01/14/2010 | US20100006031 Gas distribution plate and substrate treating apparatus including the same |
01/14/2010 | US20100006030 Take-up type vacuum vapor deposition apparatus |
01/14/2010 | DE112008000169T5 Gasbehandlungssysteme Gas treatment systems |
01/14/2010 | DE102008032656A1 Coating method for gearwheels comprises masking troughs between adjacent teeth on wheels so that only sides of teeth are coated |
01/13/2010 | EP2144026A1 Processing device for processing stacked goods for processing |
01/13/2010 | EP2143819A1 Coating method and corrosion protection coating for turbine components |
01/13/2010 | EP2142682A2 Cobalt nitride layers for copper interconnects and methods for forming them |
01/13/2010 | EP2142679A2 Method and device for the plasma-assisted surface treatment of large-volume components |
01/13/2010 | CN201381361Y Organic metal chemical vapor deposition device |
01/13/2010 | CN101627148A Floating slit valve for transfer chamber interface |
01/13/2010 | CN101624697A Synthetic resin composite body and method for producing the same |
01/13/2010 | CN101624696A Method for depositing dielectric material and used precursor |
01/13/2010 | CN100580900C Substrate supporting member |
01/13/2010 | CN100580893C Multilayer structure comprising substrate and layer of silicon and germanium deposited heteroepitaxially thereon, and process for producing same |
01/13/2010 | CN100580881C Nitride semiconductor device and method for manufacturing same |
01/13/2010 | CN100580870C Heat-conducting gas supply mechanism, supply method and substrate processing device and method |
01/13/2010 | CN100580136C Device for depositing internal barrier coating in thermoplastic container by using microwave plasma |
01/13/2010 | CN100580135C Method for cleaning reaction chamber |
01/12/2010 | US7646081 Low-K dielectric material |
01/12/2010 | US7645630 Manufacturing method for thin-film transistor |
01/12/2010 | US7645513 High film adherence to the substrate for a diamond layer and a layer of substantially pure cubic boron nitride adjacent to and in contact with the diamond layer in an epitaxial relationship; passivation; chemical/oxidation resistance; antipeeling agents; cutting tools; semiconductors |
01/12/2010 | US7645495 Method and apparatus for treating a substrate |
01/12/2010 | US7645492 A plasma coating system includes a coating station with a first side and a second side defining a pathway with a bend; a coating station also includes a first plasma arc that provides a plasma jet positioned on either the first side or the second side of the bend; automobile parts |
01/12/2010 | US7645486 Method of manufacturing a silicon dioxide layer |
01/12/2010 | US7645485 Chromium and other active metals are mixed into a packing along with inert material and a halide activator, the packing surrounding a target in a diffusion box; diffusion during a coating thermal cycle onto a target by pack cementation methods; gas turbine blades; jet engines; corrosion resistance |
01/12/2010 | US7645484 Forming the tantalum-containing film in a pure ATOMIC LAYER DEPOSITIONduring initial deposition of the film to obtain conformality, and then heating to form the film in a chemical vapor deposition regime to achieve improved adhesion reducing the carbon content |
01/12/2010 | US7645483 Two-dimensional aperture array for vapor deposition |
01/12/2010 | US7645482 A modified chemical-vapor-deposition reaction chamber reduces the turbulence of the hydrocarbon gas flow during the growth phase to promote an environment for ultra-long nanotube formation; freely suspended from the substrate to form electrical contacts by bridging the gap between catalyst pads |
01/12/2010 | US7645481 Fabrication of low dielectric constant insulating film |
01/12/2010 | US7645342 Restricted radiated heating assembly for high temperature processing |
01/12/2010 | US7645341 Showerhead electrode assembly for plasma processing apparatuses |
01/12/2010 | US7645340 Vapor phase growth method for A1-containing III-V group compound semiconductor, and method and device for producing A1-containing III-V group compound semiconductor |
01/12/2010 | US7645339 Silicon-containing layer deposition with silicon compounds |
01/12/2010 | US7644680 Electrode assembly for non-equilibrium plasma treatment |
01/07/2010 | WO2010002572A2 Layered coating and method for forming the same |
01/07/2010 | WO2010001931A1 Method for thin-film formation and apparatus for thin-film formation |
01/07/2010 | WO2010001880A1 Plasma cvd device, dlc film, and method for depositing thin film |
01/07/2010 | WO2010001879A1 Plasma cvd device, method for depositing thin film, and method for producing magnetic recording medium |
01/07/2010 | WO2010001854A1 Polyester container and process for producing the same |
01/07/2010 | WO2010001849A1 Vacuum processing device and gas supply method |
01/07/2010 | WO2010001815A1 Insulating film for semiconductor device, process and apparatus for producing insulating film for semiconductor device, semiconductor device, and process for producing the semiconductor device |
01/07/2010 | WO2010000830A1 Deposition method for passivation of silicon wafers |
01/07/2010 | WO2009121719A3 Piston ring |
01/07/2010 | WO2009117624A3 Mono-energetic neutral beam activated chemical processing system and method of using |
01/07/2010 | WO2009094176A3 Layer transfer for large area inorganic foils |
01/07/2010 | US20100005553 Sidewall tracing nanoprobes, method for making the same, and method for use |
01/07/2010 | US20100004388 Method of manufacturing composite material |
01/07/2010 | US20100003832 Vapor phase deposition apparatus, method for depositing thin film and method for manufacturing semiconductor device |
01/07/2010 | US20100003829 Clamped monolithic showerhead electrode |
01/07/2010 | US20100003824 Clamped showerhead electrode assembly |