| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 01/26/2010 | US7652288 Epitaxial and polycrystalline growth of Si1-X-YGEXCY and Si1-YCY alloy layers on Si by UHV-CVD |
| 01/26/2010 | US7652227 Heating and cooling plate for a vacuum chamber |
| 01/26/2010 | US7652179 Gas for plasma reaction, process for producing the same, and use thereof |
| 01/26/2010 | US7651960 Chemical vapor deposition method preventing particles forming in chamber |
| 01/26/2010 | US7651956 Process for fabricating films of uniform properties on semiconductor devices |
| 01/26/2010 | US7651953 Method to form ultra high quality silicon-containing compound layers |
| 01/26/2010 | US7651775 Plastic optical components, optical unit using the same and method of forming inorganic moisture-proof coating on plastic optical components |
| 01/26/2010 | US7651734 Forming two micromechanical devices on common substrate; overcoating by vapor deposition; separation |
| 01/26/2010 | US7651733 Forming film on a surface of a tabular substrate such as a semiconductor wafer with a high uniformity, by a plurality of source gases including an organic-metal including gas |
| 01/26/2010 | US7651732 Magnesium-titanium solid solution alloys |
| 01/26/2010 | US7651731 Use of niobium, niobium oxides, niobium alloys and associations thereof with other metals, alloys or oxides as an anticorrosive coating applied by a thermal spraying technique over carbon steel surfaces and other metallic materials of current use in industrial centers |
| 01/26/2010 | US7651730 Method and apparatus for forming silicon oxide film |
| 01/26/2010 | US7651729 Fabricating hafnium silicate layer on semiconductor substrate while also precisely controlling thicknesses of the thin films and also controlling the composition ratios of hafnium and silicon in the resultant hafnium silicate layer |
| 01/26/2010 | US7651725 Low dielectric constant film produced from silicon compounds comprising silicon-carbon bond |
| 01/26/2010 | US7651722 Shortening a cycle time of forming an organic layer of the display and suppressing wasteful consumption of organic materials used for forming the layer. |
| 01/26/2010 | US7651587 Two-piece dome with separate RF coils for inductively coupled plasma reactors |
| 01/26/2010 | US7651586 Particle removal apparatus and method and plasma processing apparatus |
| 01/26/2010 | US7651585 Apparatus for the removal of an edge polymer from a substrate and methods therefor |
| 01/26/2010 | US7651584 Processing apparatus |
| 01/26/2010 | US7651583 Processing system and method for treating a substrate |
| 01/26/2010 | US7651571 Susceptor |
| 01/26/2010 | US7651570 Solid precursor vaporization system for use in chemical vapor deposition |
| 01/26/2010 | US7651569 Pedestal for furnace |
| 01/26/2010 | US7651568 Plasma enhanced atomic layer deposition system |
| 01/26/2010 | US7650853 Device for applying electromagnetic microwave radiation in a plasma cavity |
| 01/26/2010 | US7650684 Method for fabricating a magnetic head including a read sensor |
| 01/26/2010 | CA2455255C Method for processing and producing a surface having a degree of luster |
| 01/25/2010 | CA2673705A1 Interface-infused nanotube interconnect |
| 01/21/2010 | WO2010009048A2 Tube diffuser for load lock chamber |
| 01/21/2010 | WO2010008957A2 Bead pack brazing with energetics |
| 01/21/2010 | WO2010008477A2 Chuck and bridge connection points for tube filaments in a chemical vapor deposition reactor |
| 01/21/2010 | WO2010008021A1 Plasma treatment method and plasma treatment device |
| 01/21/2010 | WO2010007981A1 Film-forming apparatus and powder evaporation apparatus |
| 01/21/2010 | WO2010007356A2 Gas delivery device |
| 01/21/2010 | WO2010007134A1 Process and installation for despositing films simultaneously onto both sides of a substrate. |
| 01/21/2010 | WO2010007133A1 Process and installation for depositing films onto a substrate |
| 01/21/2010 | WO2010006951A1 Process for the internal coating of hollow bodies using a plasma beam at atmospheric pressure |
| 01/21/2010 | WO2010006902A1 Coating process using a plasma beam, wherein the layer contains nanozeolites loaded with dye |
| 01/21/2010 | WO2009126952A3 Large scale nanoelement assembly method for making nanoscale circuit interconnects and diodes |
| 01/21/2010 | US20100015799 Semiconductor device manufacturing method, semiconductor device manufacturing apparatus, computer program and storage medium |
| 01/21/2010 | US20100015786 Vapor growth apparatus, vapor growth method, and method for manufacturing semiconductor device |
| 01/21/2010 | US20100015731 Method of low-k dielectric film repair |
| 01/21/2010 | US20100015473 Multi-layer coating |
| 01/21/2010 | US20100015438 High colour diamond layer |
| 01/21/2010 | US20100015428 Method of fabricating a thermostructural composite material part, and a part obtained thereby |
| 01/21/2010 | US20100015402 Method for depositing a layer on a semiconductor wafer by means of cvd and chamber for carrying out the method |
| 01/21/2010 | US20100015361 Vapor deposition source, a vapor deposition apparatus and a method for forming an organic thin film |
| 01/21/2010 | US20100015359 Film deposition apparatus and method |
| 01/21/2010 | US20100015358 Apparatus and method for surface finishing of metals and metalloids, metal oxides and metalloid oxides, and metal nitrides and metalloid nitrides |
| 01/21/2010 | US20100015357 Capacitively coupled plasma etch chamber with multiple rf feeds |
| 01/21/2010 | US20100015356 In-line film forming apparatus and manufacturing method of magnetic recording medium |
| 01/21/2010 | US20100015335 Method for forming srtio3 film and storage medium |
| 01/21/2010 | US20100015334 Film forming method and apparatus, and storage medium |
| 01/21/2010 | US20100015324 Vapor deposition source, vapor deposition apparatus, and film-forming method |
| 01/21/2010 | US20100015322 Method And Apparatus For Coating A Film On A Substrate |
| 01/21/2010 | US20100014208 Substrate holder |
| 01/21/2010 | US20100013385 Display device, apparatus for producing display device, and method for producing display device |
| 01/21/2010 | US20100013052 Dual chamber system providing simultaneous etch and deposition on opposing substrate sides for growing low defect density epitaxial layers |
| 01/21/2010 | US20100012576 Nanoporous carbonaceous membranes and related methods |
| 01/21/2010 | US20100012483 drills; wear resistance; delays disintegration and diffusion of chromium nitrogen portion in aluminum chromiun nitrogen coating at high temperature; system comprises six cathodic arc sources, two TiSi targets associated with two of cathodic arc sources, four AlCrX targets associated with four arc sources |
| 01/21/2010 | US20100012390 Method and apparatus for selectively leaching portions of PDC cutters already mounted in drill bits |
| 01/21/2010 | US20100012275 Plasma processing apparatus |
| 01/21/2010 | US20100012153 Method of cleaning film forming apparatus and film forming apparatus |
| 01/21/2010 | US20100012037 Substrate transfer apparatus |
| 01/21/2010 | US20100012036 Isolation for multi-single-wafer processing apparatus |
| 01/21/2010 | US20100012034 Process And Apparatus For Depositing Semiconductor Layers Using Two Process Gases, One Of Which is Preconditioned |
| 01/21/2010 | US20100012033 Sheet Plasma Film Forming Apparatus |
| 01/21/2010 | US20100012032 Apparatus for high-rate chemical vapor deposition |
| 01/21/2010 | US20100012030 Process for Deposition of Semiconductor Films |
| 01/21/2010 | US20100012027 Device for injecting liquid precursors into a chamber in pulsed mode with measurement and control of the flowrate |
| 01/21/2010 | US20100012026 Evaporation supply apparatus for raw material and automatic pressure regulating device used therewith |
| 01/21/2010 | US20100011785 Tube diffuser for load lock chamber |
| 01/21/2010 | DE19734736B4 Behälter aus pyrolytischem Bornitrid Pyrolytic boron nitride container |
| 01/21/2010 | DE102009033265A1 Abdeckung für eine Rolle Cover for a role |
| 01/21/2010 | DE102009027476A1 Innenkammerelement-Temperatursteuerverfahren, kammerinternes Element, Substratanbringtisch und Plasmabearbeitungsvorrichtungsvorrichtung, die selbigen enthält Inner chamber element temperature control method, chamber internal element Substratanbringtisch and plasma processing apparatus apparatus including selfsame |
| 01/21/2010 | DE102009000544A1 Metallische bipolare Platte für eine Brennstoffzelle und Verfahren zum Bilden der Oberflächenschicht derselben Metallic bipolar plate for a fuel cell and method of forming the surface layer thereof |
| 01/21/2010 | DE102008047736B3 Biegeunempfindliche optische Faser, Quarzglasrohr als Halbzeug für seine Herstellung sowie Verfahren zur Herstellung der Faser Bend-insensitive optical fiber, quartz glass tube as semifinished product for its preparation as well as procedures for making the fiber |
| 01/21/2010 | DE102008033939A1 Verfahren zur Beschichtung A method of coating |
| 01/20/2010 | EP2145987A1 Fabrication method of a group III nitride crystal substance |
| 01/20/2010 | EP2145979A1 Method and installation for depositing layers on both sides of a substrate simultaneously |
| 01/20/2010 | EP2145978A1 Method and installation for depositing layers on a substrate |
| 01/20/2010 | EP2145977A2 Method for depositing layers on a substrate |
| 01/20/2010 | EP2145030A2 Method for low temperature thermal cleaning |
| 01/20/2010 | EP2144744A1 Edge healing and field repair of plasma coating |
| 01/20/2010 | EP1947081B1 Titanium complexes, process for production thereof, titanium -containing thin films, and method for formation thereof |
| 01/20/2010 | EP1274877B1 A method and a device for determining the end point of a cleaning operation of a cvd apparatus |
| 01/20/2010 | CN201386135Y Full-automatic large flat PECVD silicon nitride membrane preparation system |
| 01/20/2010 | CN101631894A Technique for atomic layer deposition |
| 01/20/2010 | CN101629283A Roll-to-roll plasma device for enhancing chemical vapor deposition |
| 01/20/2010 | CN101629282A Conversion device of silicon wafer carrier for PECVD |
| 01/20/2010 | CN101629281A Metallorganics chemical gas phase deposition liquid inlet device |
| 01/20/2010 | CN100583397C Doping method for III-v aluminum contained compound composed by direct or indirect band-gap |
| 01/20/2010 | CN100582301C Catalyst enhanced chemical vapor deposition apparatus and deposition method using the same |
| 01/20/2010 | CN100582300C Chemical vapor deposition apparatus for flat display |
| 01/20/2010 | CN100582299C Method and processing system for controlling a chamber cleaning process |
| 01/20/2010 | CN100582298C Process and apparatus for depositing semiconductor layers using two process gases, one of which is preconditioned |
| 01/20/2010 | CN100582297C Thin film-forming material and method for producing thin film |
| 01/20/2010 | CN100582296C Forming high-K dielectric layers on smooth substrates |
| 01/20/2010 | CN100582295C Vacuum deposition apparatus and method of producing vapor-deposited film |
| 01/20/2010 | CN100582294C Deposition system and method for measuring deposition thickness in the deposition system |