Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
02/2010
02/04/2010US20100028663 Method for manufacturing ultra-hydrophilic thin film coated metal product, and ultra-hydrophilic thin film coated metal product
02/04/2010US20100028573 Aa' stacked graphite and fabrication method thereof
02/04/2010US20100028561 Method for producing a coating by atmospheric pressure plasma technology
02/04/2010US20100028556 Chemical vapor deposition colored diamond
02/04/2010US20100028536 Metal compound, material for thin film formation, and process of forming thin film
02/04/2010US20100028534 Evaporation unit, evaporation method, controller for evaporation unit and the film forming apparatus
02/04/2010US20100028533 Methods and Devices for Processing a Precursor Layer in a Group VIA Environment
02/04/2010US20100028529 Substrate processing apparatus, and magnetic recording medium manufacturing method
02/04/2010US20100028238 Plasma source and methods for depositing thin film coatings using plasma enhanced chemical vapor deposition
02/04/2010US20100028122 Atomic layer deposition apparatus and loading methods
02/04/2010US20100025939 Sealing Device and Method of Producing the Same
02/04/2010US20100025821 Ion implanting apparatus and ion implanting method
02/04/2010US20100025370 Reactive gas distributor, reactive gas treatment system, and reactive gas treatment method
02/04/2010US20100025091 Printed Circuit Boards
02/04/2010US20100024733 Film formation apparatus and film formation method using the same
02/04/2010US20100024732 Systems for Flash Heating in Atomic Layer Deposition
02/04/2010US20100024731 Processing tool with combined sputter and evaporation deposition sources
02/04/2010US20100024730 Processing system
02/04/2010US20100024729 Methods and apparatuses for uniform plasma generation and uniform thin film deposition
02/04/2010US20100024728 Substrate processing apparatus
02/04/2010US20100024727 Showerhead and chemical vapor deposition apparatus including the same
02/04/2010US20100024726 Fastening apparatus
02/04/2010DE102008033977A1 Method for surface coating of a base material with layer materials, comprises providing the base material with a protective material, wearing out upper most part of the protective layer and providing the protective layer with a cover layer
02/04/2010CA2732584A1 Biocompatibility layer and coated articles
02/04/2010CA2731327A1 Item in slab form made from stone agglomerate coated with thin transparent films of tio2 or zno by means of dry deposition techniques with high resistance to solar degradation
02/03/2010EP2148940A2 Coated cutting tool
02/03/2010EP2148939A1 Vacuum treatment unit and vacuum treatment process
02/03/2010EP2148938A1 Apparatuses and methods for cryogenic cooling in thermal surface treatment processes
02/03/2010EP2148899A1 Transparent barrier film and method for producing the same
02/03/2010EP1397830B1 Method of manufacturing copper vias in low-k technology
02/03/2010EP1345703B1 Corrosion resistant component of semiconductor processing equipment and method of manufacture thereof
02/03/2010CN201397806Y Heater regulating device
02/03/2010CN101641459A Vaporizer, vaporization module, and film forming device
02/03/2010CN101638776A Pretreatment method in chemical vapor deposition
02/03/2010CN101638765A Resistive heaters and uses thereof
02/03/2010CN100587109C Method and apparatus for applying coating on substrate
02/03/2010CN100587108C Substrate processing method and substrate processing apparatus
02/02/2010US7655491 P-type Group III nitride semiconductor and production method thereof
02/02/2010US7655299 Surface-coated cutting tool made of hard metal and manufacturing method for same
02/02/2010US7655274 Aqueous based precursor system for the deposition of titanium oxide coatings via combustion chemical vapor deposition includes titanium (IV) bis(ammonium lactate)dihydroxide, oxalic acid salts of titanium (potassium titanyl oxalate), water-soluble salts of titanium acetate and citrate; low cost
02/02/2010US7655111 Plasma processing apparatus and plasma processing method
02/02/2010US7655093 Wafer support system
02/02/2010US7655092 Tandem process chamber
02/02/2010US7655091 Formation of single-crystal silicon carbide
02/02/2010US7654224 Method and apparatus for cleaning a CVD chamber
02/02/2010CA2356042C A tool of a surface-coated boron nitride sintered compact
01/2010
01/28/2010WO2010010956A1 Apparatus and method for manufacturing thin film solar cell, and thin film solar cell
01/28/2010WO2010010668A1 Semiconductor device and manufacturing method therefor
01/28/2010WO2010010538A2 Heteroleptic cyclopentadienyl transition metal precursors for deposition of transition metal-containing films
01/28/2010WO2010010176A1 Process for microstructuring a diamond film
01/28/2010WO2010010088A1 Chemical vapor deposition reactor for depositing layers made of a reaction gas mixture onto workpieces
01/28/2010WO2010009724A1 Device for plasma-assisted coating of the inner side of tubular components
01/28/2010WO2009148913A3 Method for treating substrates
01/28/2010WO2009120862A3 Systems and methods for distributing gas in a chemical vapor deposition reactor
01/28/2010WO2009017962A3 Low-volatility compounds for use in forming deposited layers
01/28/2010WO2006026018A3 Atomic layer deposition of high quality high-k transition metal and rare earth oxides
01/28/2010US20100023154 Compensation techniques for substrate heating processes
01/28/2010US20100021757 Bright coatings for aluminum or steel motor vehicle wheels and their production
01/28/2010US20100021747 Heteroleptic cyclopentadienyl transition metal precursors for deposition of transition metal-containing films
01/28/2010US20100021727 Method of forming continuous thin film and linear glass substrate with thin film
01/28/2010US20100021655 plasma electrode
01/28/2010US20100021650 Method of manufacturing micro structure, and method of manufacturing mold material
01/28/2010US20100021632 Method and devices for the application of transparent silicon dioxide layers from the gas phase
01/28/2010US20100021631 Coating apparatus and coating method
01/28/2010US20100021565 Pearlescent Pigments
01/28/2010US20100018851 Carbon nanotubes for fuel cells, method for manufacturing the same, and fuel cell using the same
01/28/2010US20100018815 C-c composite brakes with improved wear rates
01/28/2010US20100018649 Plasma Processing Apparatus And Method
01/28/2010US20100018617 Aluminum alloy for anodizing having durability, contamination resistance and productivity, method for producing the same, aluminum alloy member having anodic oxide coating, and plasma processing apparatus
01/28/2010US20100018464 Dlc coating system and process and apparatus for making coating system
01/28/2010US20100018463 Plural Gas Distribution System
01/28/2010DE112008000752T5 Großflächiger transparenter elektisch leitfähiger Film und Verfahren zu seiner Herstellung Large-area transparent conductive film are electrical and process for its production
01/28/2010DE102008034991A1 Verfahren zur Herstellung eines Schichtsystems auf einem Substrat, sowie Schichtsystem A method for producing a layer system on a substrate, as well as layer system
01/28/2010DE102008034330A1 CVD-Reaktor zur Abscheidung von Schichten aus einem Reaktionsgasgemisch auf Werkstücken CVD reactor for depositing layers of a reaction gas mixture on workpieces
01/28/2010DE102008033941A1 Verfahren zum Beschichten A method of coating
01/28/2010DE102008033938A1 Verfahren zur Abscheidung von Schichten auf einem Substrat A process for the deposition of layers on a substrate
01/27/2010EP2147988A1 Barrier-film forming apparatus, barrier-film forming method, and barrier-film coated container
01/27/2010EP2147987A1 Vapor growth apparatus, vapor growth method, and method for manufacturing semiconductor device
01/27/2010EP2147452A2 Treatment system for flat substrates
01/27/2010EP2146806A2 Silicon nitride passivation for a solar cell
01/27/2010EP1885658B1 Method of making scratch resistant coated glass article including layer(s) resistant to fluoride-based etchant(s)
01/27/2010EP1313134B1 Semiconductor polysilicon component and method of manufacture thereof
01/27/2010CN101636523A Barrier-film forming apparatus, barrier-film forming method, and barrier-film coated container
01/27/2010CN101634017A Hook of silicon wafer loading device for PECVD
01/27/2010CN101634016A Modifying device of silicon wafer loading devices for PECVD
01/27/2010CN101634015A Converting device of silicon wafer loading devices for PECVD
01/27/2010CN101634014A Method for depositing a layer on a semiconductor wafer by means of CVD and chamber for carrying out the method
01/27/2010CN101634013A Plural gas distribution system
01/27/2010CN100585828C Substrate carrying platform, substrate processing device and temperature control method
01/27/2010CN100585814C Method of processing plasma
01/27/2010CN100585795C Chamber isolation valve RF grounding
01/27/2010CN100585704C Magnetic recording media and production method therefor
01/27/2010CN100584999C Chemical vapor depositing method of low dielectric constant silicon oxide membrane
01/27/2010CN100584998C Method for preparing carboxyl apatite coating by single-chamber sacrificial anode hydrothermal synthesis
01/27/2010CN100584997C Method and device for realizing matrix temperature equalization in preparation process of diamond film spherical cap
01/27/2010CN100584996C Thin diamond film coating method and cemented carbide member coated with diamond thin film
01/27/2010CN100584992C Foodware with multilayer stick resistant ceramic coating and method of making
01/27/2010CN100584387C Device for sterilizing objects
01/26/2010US7652774 Interferometric endpoint determination in a substrate etching process
01/26/2010US7652341 Semiconductor apparatus having a semicondutor element with a high dielectric constant film