| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 02/17/2010 | CN101649449A Preparation method and preparation mould of ZnS/ZnSe composite infrared transmission material |
| 02/17/2010 | CN100590223C Apparatus for depositing atomic layer using gas separation type showerhead |
| 02/16/2010 | US7662741 Forming a carbon covered alumina catalyst and depositing silver thereon, wherein the silver is deposited on the carbon covered alumina by electrodeposition; for water purification |
| 02/16/2010 | US7662728 Substrate processing method |
| 02/16/2010 | US7662696 Method for fabricating semiconductor devices |
| 02/16/2010 | US7662649 Methods for assessing alignments of substrates within deposition apparatuses; and methods for assessing thicknesses of deposited layers within deposition apparatuses |
| 02/16/2010 | US7662441 High-speed diamond growth using a microwave plasma in pulsed mode |
| 02/16/2010 | US7662437 Template for arranging spacers on a preform and method of densifying a preform including the use of spacers positioned by a template |
| 02/16/2010 | US7662427 organic films can be chemical vapor deposited on all surfaces of the substrate provided with the scintillator, and the substrate can easily be taken up from the turntable after the organic films of polyxylene are deposited; waterproof coating |
| 02/16/2010 | US7662423 Method for ejecting liquid material, method for manufacturing organic electroluminescense device, and method for manufacturing color filter |
| 02/16/2010 | US7662302 Lifting and supporting device |
| 02/16/2010 | US7662253 Apparatus for the removal of a metal oxide from a substrate and methods therefor |
| 02/16/2010 | US7662233 ALD apparatus and method |
| 02/16/2010 | US7662232 Plasma processing apparatus |
| 02/16/2010 | US7661388 Plasma reactor for the treatment of large size substrates |
| 02/16/2010 | US7661386 Film forming device |
| 02/11/2010 | WO2010017088A1 Hybrid dielectric material for thin film transistors |
| 02/11/2010 | WO2010016852A1 Chemical vapor deposition method and system for semiconductor devices |
| 02/11/2010 | WO2010016500A1 Raw material recovery method and trapping mechanism for recovering raw material |
| 02/11/2010 | WO2010016499A1 Placing table structure |
| 02/11/2010 | WO2010016417A1 Plasma processing apparatus |
| 02/11/2010 | WO2010016414A1 Microwave plasma generation device and microwave plasma processing device |
| 02/11/2010 | WO2010016282A1 Component for rotary machine |
| 02/11/2010 | WO2010016134A1 Reaction vessel made of carbon |
| 02/11/2010 | WO2010016133A1 Reactor made of carbon |
| 02/11/2010 | WO2010015385A1 Device and method for producing dielectric layers in microwave plasma |
| 02/11/2010 | WO2009134081A3 Method for depositing ultra fine crystal particle polysilicon thin film |
| 02/11/2010 | US20100036144 Methods for atomic layer deposition |
| 02/11/2010 | US20100035495 Flame retardant products |
| 02/11/2010 | US20100035432 Chemical vapor deposition method and system for semiconductor devices |
| 02/11/2010 | US20100035410 Method for Manufacturing InGaN |
| 02/11/2010 | US20100035152 Electrochemical cell including functionally graded and architectured components and methods |
| 02/11/2010 | US20100035030 Indium tin oxide (ito) layer forming |
| 02/11/2010 | US20100034985 Apparatus and Method for the Plasma Treatment of Hollow Bodies |
| 02/11/2010 | US20100034984 Microwave plasma reactors |
| 02/11/2010 | US20100034971 Method for the deposition of a ruthenium containing film |
| 02/11/2010 | US20100034970 Apparatus and method for chemical vapor deposition |
| 02/11/2010 | US20100034695 Metal piperidinate and metal pyridinate precursors for thin film deposition |
| 02/11/2010 | US20100032857 Ceramic components, coated structures and methods for making same |
| 02/11/2010 | US20100032842 MODULATED DEPOSITION PROCESS FOR STRESS CONTROL IN THICK TiN FILMS |
| 02/11/2010 | US20100032581 Micro-gripper |
| 02/11/2010 | US20100032410 Substrate processing apparatus and substrate processing method |
| 02/11/2010 | US20100032287 Method of making window unit including diamond-like carbon (DLC) coating |
| 02/11/2010 | US20100032096 Apparatus for Holding Semiconductor Wafers |
| 02/11/2010 | US20100032095 Substrate processing apparatus |
| 02/11/2010 | US20100032094 Ceiling plate and plasma process apparatus |
| 02/11/2010 | US20100031887 Supply Device |
| 02/11/2010 | US20100031886 Method of gap-filling using amplitude modulation radiofrequency power and apparatus for the same |
| 02/11/2010 | US20100031884 Susceptor ring |
| 02/11/2010 | DE102008037160A1 Versorgungsvorrichtung Supply device |
| 02/11/2010 | DE102008037159A1 Vorrichtung und Verfahren zur Plasmabehandlung von Hohlkörpern Apparatus and method for plasma treatment of hollow bodies |
| 02/10/2010 | EP2151853A1 Compound-type thin film, method for compound-type thin film formation, and electronic apparatus using the thin film |
| 02/10/2010 | EP2151510A1 Device and method for plasma treating hollow bodies |
| 02/10/2010 | EP2151509A1 Reactive gas distributor, reactive gas treatment system, and reactive gas treatment method |
| 02/10/2010 | EP2151395A1 Biodegradable resin bottle and process for producing the same |
| 02/10/2010 | EP2151253A1 Biocompatibility coating and coated objects |
| 02/10/2010 | EP2150685A1 Regulation of a plasma-regenerated soot filter |
| 02/10/2010 | EP2150634A1 Method for controlling process gas concentration |
| 02/10/2010 | EP2150633A2 Method for coating a substrate |
| 02/10/2010 | CN201400713Y Baffle plate structure of vacuum coating |
| 02/10/2010 | CN101646804A Cvd film-forming apparatus |
| 02/10/2010 | CN101646803A Gas supply method and gas supply device |
| 02/10/2010 | CN101646802A Deposition source unit, deposition apparatus and temperature control apparatus for deposition source unit |
| 02/10/2010 | CN101646801A Method for low temperature thermal cleaning |
| 02/10/2010 | CN101646800A System and method for glass sheet semiconductor coating and resultant product |
| 02/10/2010 | CN101643896A Method and apparatus for silicon oxide deposition on large area substrates |
| 02/10/2010 | CN101643895A Plasma reaction chamber pretreatment method |
| 02/10/2010 | CN101643894A Method for preparing PtIr alloy film and coating |
| 02/10/2010 | CN100588738C Method for coating silicon nitride film layer on piston ring surface |
| 02/09/2010 | USRE41111 Tool base comprising tungsten carbide-based cemented carbide or titanium carbonitride-based cermet, hard coating layer including a titanium compound and/or zirconium compound layer, and an aluminum oxide layer having an alpha crystal structure; improved chipping resistance |
| 02/09/2010 | US7660644 Atomic layer deposition apparatus |
| 02/09/2010 | US7659001 Coating with infrared and ultraviolet blocking characteristics |
| 02/09/2010 | US7658973 Incorporating nitrogen into a dielectric film using a nitridation gas and a rapid thermal annealing process, wherein an ultra-low pressure of equal to or less than about 10 Torr is used for the rapid thermal annealing process |
| 02/09/2010 | US7658971 Method of producing carbon nanostructure |
| 02/09/2010 | US7658970 Forming a cobalt layer on a tungsten barrier layer using a cyclical deposition process to sequentially expose the substrate to a precursor gas of cobalt having a cyclopentadienyl ligand and a silicon reducing gas; copper plating to fill high aspect ratio, nano-interconnect semiconductor features |
| 02/09/2010 | US7658969 Chemical vapor deposition chamber with dual frequency bias and method for manufacturing a photomask using the same |
| 02/09/2010 | US7658816 Focus ring and plasma processing apparatus |
| 02/09/2010 | US7658815 Plasma processing apparatus capable of controlling plasma emission intensity |
| 02/09/2010 | US7658801 Heat treatment apparatus |
| 02/09/2010 | US7658800 Gas distribution assembly for use in a semiconductor work piece processing reactor |
| 02/09/2010 | US7658799 Plasma film-forming apparatus and plasma film-forming method |
| 02/09/2010 | US7658204 Semiconductor manufacturing apparatus enabling inspection of mass flow controller maintaining connection thereto |
| 02/04/2010 | WO2010013746A1 Deposition film forming apparatus and deposition film forming method |
| 02/04/2010 | WO2010013624A1 Current introducing terminal, plasma surface processing apparatus provided with the current introducing terminal, and plasma surface processing method |
| 02/04/2010 | WO2010013333A1 Vacuum device and vacuum treatment method |
| 02/04/2010 | WO2010013293A1 Plasma device and method of manufacturing crystal |
| 02/04/2010 | WO2010012879A1 Method for using a super-slippery thin layer characterised by the method for making same |
| 02/04/2010 | WO2010012863A1 Atomic layer deposition apparatus and loading methods |
| 02/04/2010 | WO2010012849A1 Stone agglomerate slab or flag with tio2 or zno coating |
| 02/04/2010 | WO2010012836A2 Biocompatibility layer, and coated objects |
| 02/04/2010 | WO2010012595A1 Method of forming a tantalum-containing layer on a substrate |
| 02/04/2010 | WO2010012293A1 Arrangement and method for generating a plasma having a defined and stable ionization state |
| 02/04/2010 | US20100029094 Method and Apparatus for Forming a High Quality Low Temperature Silicon Nitride Layer |
| 02/04/2010 | US20100029093 Plasma oxidizing method, plasma processing apparatus, and storage medium |
| 02/04/2010 | US20100029082 Method and apparatus for angular high density plasma chemical vapor deposition |
| 02/04/2010 | US20100029067 Roll-to-roll continuous thin film pv manufacturing process and equipment with real time online iv measurement |
| 02/04/2010 | US20100029066 Susceptor, vapor phase growth apparatus, and method of manufacturing epitaxial wafer |
| 02/04/2010 | US20100029065 Method and apparatus for producing group iii nitride |
| 02/04/2010 | US20100029038 Manufacturing method of solar cell and manufacturing apparatus of solar cell |
| 02/04/2010 | US20100028714 Fine-Grained Metallic Coatings Having the Coefficient of Thermal Expansion Matched to the One of the Substrate |