Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
02/2010
02/25/2010US20100048028 Surface treated aluminum nitride baffle
02/25/2010US20100048022 Semiconductor manufacturing apparatus and method of manufacturing semiconductor device
02/25/2010US20100048003 Plasma processing apparatus and method thereof
02/25/2010US20100047614 Combustion turbine component having bond coating and associated methods
02/25/2010US20100047574 Coated filaments and their manufacture
02/25/2010US20100047566 Thin films with high near-infrared reflectivity deposited on building materials
02/25/2010US20100047475 Coated filaments and their manufacture
02/25/2010US20100047473 Method of forming a film by deposition from a plasma
02/25/2010US20100047472 Film forming method
02/25/2010US20100047471 Barrier metal film production apparatus, barrier metal film production method, metal film production method, and metal film production apparatus
02/25/2010US20100047464 Method of making heat treatable coated article with protective layer
02/25/2010US20100047458 Palladium complex and catalyst-imparting treatment solution using the same
02/25/2010US20100047450 Chemical Vapor Deposition Reactor and Method
02/25/2010US20100047449 Process for deposition of non-oxide ceramic coatings
02/25/2010US20100047448 Film forming apparatus and method
02/25/2010US20100047447 Multiple substrate item holder and reactor
02/25/2010US20100047439 Barrier coating corrosion control methods and systems for interior piping systems
02/25/2010US20100044771 Zr-Sn-Ti-O FILMS
02/25/2010US20100044213 Coating chamber with a moveable shield
02/25/2010US20100044018 Porous Layer
02/25/2010US20100043975 Movable gas introduction structure and substrate processing apparatus having same
02/25/2010US20100043888 Ald apparatus and method
02/25/2010US20100043712 Substrate processing apparatus
02/25/2010US20100043711 Thin-film deposition evaporator
02/25/2010US20100043710 Inner plate and crucible assembly for deposition having the same
02/25/2010US20100043709 Chemical vapor deposition apparatus for equalizing heating temperature
02/25/2010US20100043708 Ceramic heater, method of manufacturing the same, and apparatus for forming a thin layer having the same
02/24/2010EP2157206A1 Supply device
02/24/2010EP2157051A2 Harvest apparatus for harvesting polycrystalline silicon rods, combined apparatus and method of using the same
02/24/2010EP2155926A1 Device for the temperature control of the surface temperatures of substrates in a cvd reactor
02/24/2010EP2155925A1 Atomic layer deposition methods, methods of forming dielectric materials, methods of forming capacitors, and methods of forming dram unit cells
02/24/2010EP2155924A2 New cobalt precursors for semiconductor applications
02/24/2010EP2155923A1 Method and device for preparing a multilayered coating on a substrate
02/24/2010EP2078103B1 Method for easy-to-clean substrates and articles therefrom
02/24/2010EP1699077B1 Plasma processing apparatus
02/24/2010EP1377138B1 Device and control method for micro wave plasma processing
02/24/2010EP1371271B1 Plasma installation and method for producing a functional coating
02/24/2010EP1183210B1 Multilayer carbon nanotube films
02/24/2010CN101657565A Film forming apparatus
02/24/2010CN101657564A Fabrication of composite materials using atomic layer deposition
02/24/2010CN101654774A Method for inhibiting corrosion of metal pad
02/24/2010CN101654773A Metal organic chemical vapor deposition device
02/24/2010CN100591801C Device for rapid large-area preparation of thin film material and setting method
02/24/2010CN100591800C Surface treatment process for ultra-low friction film
02/23/2010US7667212 Method for depositing a film using a charged particle beam, method for performing selective etching using the same, and charged particle beam equipment therefor
02/23/2010US7666801 Systems and methods for forming metal oxides using metal compounds containing aminosilane ligands
02/23/2010US7666793 Method of manufacturing amorphous metal oxide film and methods of manufacturing capacitance element having amorphous metal oxide film and semiconductor device
02/23/2010US7666766 Film formation apparatus, method for forming film, and method for manufacturing photoelectric conversion device
02/23/2010US7666479 pressurization; cyclic flow
02/23/2010US7666478 Applying alternative voltage difference between electrodes, generating and maintaining cold atmospheric pressure plasma in volumetric space between, and depositing coating on surface to immobilize
02/23/2010US7666475 for gas turbines; crack resistance, toughness; vanes, airfoils
02/23/2010US7666474 Plasma enhanced atomic layer deposition by alternately and sequentially pulsing a carbon-containing precursor (methane, CH4), a metal precursor (tantalum fluoride, TaF5), and plasma-excited argon gas into a reaction chamber accommodating the substrate; thin films; transistor electrodes
02/23/2010US7666464 RF measurement feedback control and diagnostics for a plasma immersion ion implantation reactor
02/23/2010US7666463 Methods for manufacturing porous nuclear fuel elements for high-temperature gas-cooled nuclear reactors
02/23/2010US7666260 Vaporizer and semiconductor processing apparatus
02/23/2010US7665416 Apparatus for generating excited and/or ionized particles in a plasma and a method for generating ionized particles
02/18/2010WO2010018768A1 Metal recovery method, metal recovery apparatus, exhaust system, and film forming device using same
02/18/2010WO2010017958A1 Method for producing a packaging material
02/18/2010WO2010017920A1 Method for electron beam induced deposition of conductive material
02/18/2010WO2009150384A3 Machine for processing vessels made of thermoplastic material
02/18/2010US20100041245 Hdp-cvd process, filling-in process utilizing hdp-cvd, and hdp-cvd system
02/18/2010US20100041240 Focus ring, plasma processing apparatus and plasma processing method
02/18/2010US20100041238 Tunable multi-zone gas injection system
02/18/2010US20100041213 Vapor Deposition Reactor For Forming Thin Film
02/18/2010US20100041165 Probe-immobilized carrier storing manufacturing condition data and manufacturing method and apparatus thereof, detecting method of target substance by use of the probe-immobilized carrier, and measuring apparatus, recording medium, kit and system for use in the detecting method
02/18/2010US20100041155 Fabrication technique for metallic devices with embedded optical elements, optical devices, or optical and electrical feedthroughs
02/18/2010US20100040979 Systems and method for fabricating substrate surfaces for sers and apparatuses utilizing same
02/18/2010US20100040888 Metallized barrier material
02/18/2010US20100040803 Apparatus and methods for preparation of high-purity silicon rods using mixed core means
02/18/2010US20100040802 Method and apparatus for production of metal film or the like
02/18/2010US20100040780 Large volume evaporation source
02/18/2010US20100040768 Temperature controlled hot edge ring assembly
02/18/2010US20100040534 Radical generating apparatus and zno-based thin film
02/18/2010US20100040529 Enhanced carbon nanotube
02/18/2010US20100039730 Magnetic recording medium, method of manufacturing the same, and magnetic recording/reproducing apparatus
02/18/2010US20100038033 Anchoring inserts, electrode assemblies, and plasma processing chambers
02/18/2010US20100037827 CVD Device with Substrate Holder with Differential Temperature Control
02/18/2010US20100037824 Plasma Reactor Having Injector
02/18/2010US20100037823 Showerhead and shadow frame
02/18/2010US20100037822 Vacuum processing apparatus
02/18/2010US20100037821 Vacuum processing apparatus
02/18/2010US20100037820 Vapor Deposition Reactor
02/18/2010US20100037819 Device for positioning nano materials
02/18/2010DE102009034872A1 Vorrichtung zur plasmagestützten Beschichtung der Innenseite von rohrförmigen Bauteilen mittels eines hochfrequenten Magnetfeldes Apparatus for plasma-assisted coating the inside of tubular components by means of a high-frequency magnetic field
02/18/2010DE102008037944A1 Verfahren zum elektronenstrahlinduzierten Abscheiden von leitfähigem Material A method for electron beam induced deposition of conductive material
02/17/2010EP2154711A1 Vaporizing apparatus and film forming apparatus provided with vaporizing apparatus
02/17/2010EP2154271A1 Method and apparatus for growing III-nitride-bulk crystals
02/17/2010EP2154270A2 Non-polar a-plane gallium nitride thin films grown by metalorganic chemical vapor deposition
02/17/2010EP2154141A2 Precursors for depositing silicon-containing films and methods for making and using same
02/17/2010EP2152931A1 Apparatus and method for depositing multiple coating materials in a common plasma coating zone
02/17/2010EP2152930A2 Gas supply system and method for providing a gaseous deposition medium
02/17/2010EP2152929A1 Semiconductor component, method for the production thereof, and use thereof
02/17/2010EP2152928A1 Modified multichannel structures
02/17/2010EP2152787A1 Coated object
02/17/2010EP1055250B1 Plasma processing apparatus
02/17/2010CN201406469Y Heating device for process chamber of vapor deposition equipment
02/17/2010CN201406468Y Metallic organic matter chemical gas phase settling device assisting by electromagnetic field
02/17/2010CN101652501A Method for film formation, apparatus for film formation, and recording medium
02/17/2010CN101652500A Multilayer CVD coating
02/17/2010CN101649450A Improving water-barrier performance of an encapsulating film