Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23C - Coating metallic material; Coating material with metallic material; Surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general › C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes
Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
03/2010
03/17/2010CN101671817A Plasma enhanced chemical vapor deposition treatment method
03/17/2010CN101671816A Method for depositing si-containing film, insulator film, and semiconductor device
03/17/2010CN101671815A Method for preparing lance-shaped ZnO nano/micron structure based on CVD method
03/17/2010CN101671814A Surface coating method of transmission mechanism
03/17/2010CN101671813A Film forming method of ti-series film
03/17/2010CN101671191A Method for using full preoxidized fiber preform to prepare high-performance carbon-based composite material
03/17/2010CN101671190A Method for regulating microstructure of carbon-based composite material through rapid directional infiltration
03/17/2010CN101671189A Method for using domestic carbon fiber to prepare high-performance carbon-based composite material through rapid directional infiltration
03/17/2010CN101671188A Gas flow control method of rapid directional infiltration for high-performance carbon-based composite material
03/17/2010CN101671187A Method for regulating performance of high-performance carbon-based composite material
03/17/2010CN100594588C Method and apparatus for forming silicon nitride film
03/17/2010CN100594261C Susceptor for vapor deposition apparatus
03/17/2010CN100594260C Method for coating the interior of a hollow component and a hollow component having an interior coating
03/17/2010CN100594259C Interface engineering to improve adhesion between low k stacks
03/17/2010CN100594258C Method for preparing carbon covered nickel nano grain enhanced silver based composite material
03/16/2010US7679034 Power-supplying member and heating apparatus using the same
03/16/2010US7678711 Semiconductor device, and method and apparatus for manufacturing the same
03/16/2010US7678708 forming a metal oxide layer, preferably a dielectric layer, on a substrate, particularly a semiconductor substrate, using a vapor deposition process and ozone with one or more metal organo-amine precursor compounds
03/16/2010US7678705 Plasma semiconductor processing system and method
03/16/2010US7678430 Method and device for microwave plasma deposition of a coating on a thermoplastic container surface
03/16/2010US7678422 Cyclic chemical vapor deposition of metal-silicon containing films
03/16/2010US7678421 Method for increasing deposition rates of metal layers from metal-carbonyl precursors
03/16/2010US7678420 Method of depositing germanium films
03/16/2010US7678298 Tantalum carbide nitride materials by vapor deposition processes
03/16/2010US7678226 Method and apparatus for an improved bellows shield in a plasma processing system
03/16/2010US7678225 Focus ring for semiconductor treatment and plasma treatment device
03/16/2010US7678198 Vertical-offset coater
03/16/2010US7678197 Susceptor device
03/16/2010US7678196 System and method for treating substrates
03/16/2010US7678194 Method for providing gas to a processing chamber
03/16/2010US7677199 Surface treatment system and method
03/16/2010US7677058 Process and apparatus for making glass sheet
03/11/2010WO2010027841A2 High speed deposition of materials having low defect density
03/11/2010WO2010027112A1 Method of manufacturing multi-level metal thin film and apparatus for manufacturing the same
03/11/2010WO2010026879A1 Gas supply member and plasma processing device
03/11/2010WO2010026815A1 Heat treatment apparatus
03/11/2010WO2010026092A2 Wear and corrosion resistant layered composite
03/11/2010WO2009087609A3 Solid precursor sublimator
03/11/2010US20100062613 Method of processing a substrate
03/11/2010US20100062547 Technique for monitoring and controlling a plasma process with an ion mobility spectrometer
03/11/2010US20100062244 Process for Preparing Flake-Form Particles
03/11/2010US20100062196 Partially metallized film having barrier properties
03/11/2010US20100062185 Method for plating film on a transmission mechanism
03/11/2010US20100062183 Method of producing gas barrier film
03/11/2010US20100062182 Method for Repairing Display Device and Apparatus for Same
03/11/2010US20100062181 Metal film production apparatus and metal film production method
03/11/2010US20100062158 Gas supply method and gas supply device
03/11/2010US20100062157 Manufacturing apparatus and manufacturing method for alined carbon nanotubes
03/11/2010US20100061908 Gs Abatement
03/11/2010US20100061093 Illumination devices and methods for making the same
03/11/2010US20100061063 Process for Preparing Conductive Films and Articles Prepared Using the Process
03/11/2010US20100060870 Lithographic apparatus, method of manufacturing an article for a lithographic apparatus and device manufacturing method
03/11/2010US20100059366 Textured chamber surface
03/11/2010US20100058988 Manufacturing apparatus of polycrystalline silicon
03/11/2010US20100058987 Device For Vacuum Processing
03/11/2010US20100058986 System and method for plasma plating
03/11/2010US20100058985 Photoresist supply apparatus and photoresist supply method
03/11/2010US20100058984 Substrate Processing Apparatus
03/11/2010US20100058954 Novel Carbon-Modified Photocatalyst Films and Method for Producing Same
03/11/2010DE19581483B4 Verfahren und Vorrichtung zur Bildung von Dünnschichten Method and apparatus for formation of thin films
03/11/2010DE102008046673A1 Verbundkörper Composite body
03/10/2010EP2161352A1 Vapour trap for atomic layer deposition (ALD)
03/10/2010EP2160759A1 Device for coating a plurality of closest-packed substrates arranged on a susceptor
03/10/2010EP2160456A1 Non-flammable solvents for semiconductor applications
03/10/2010EP1396554B1 Plasma cvd apparatus
03/10/2010CN101668879A Roll-to-roll plasma enhanced chemical vapor deposition method of barrier layers comprising silicon and carbon
03/10/2010CN101668878A Ti-film formation method
03/10/2010CN101665928A Damping device and thin film deposition system
03/10/2010CN101665927A Film deposition apparatus, substrate processor, film deposition method
03/10/2010CN101665926A Film deposition apparatus exposing substrate to plural gases in sequence
03/10/2010CN101665925A Film deposition apparatus, film deposition method
03/10/2010CN101665924A Film deposition apparatus and substrate processing apparatus
03/10/2010CN101665923A Film deposition apparatus, substrate processing apparatus and film deposition method
03/10/2010CN101665922A Film deposition apparatus, substrate processing apparatus and film deposition method
03/10/2010CN101665921A Film deposition apparatus, substrate processing apparatus and film deposition method
03/10/2010CN101665920A Film deposition apparatus, substrate process apparatus, and turntable
03/10/2010CN101665919A Film deposition apparatus, substrate processing apparatus, film deposition method
03/10/2010CN101665918A Film forming method and film forming apparatus
03/10/2010CN100593585C Microwave electron cyclotron resonance plasma chemistry gas phase sedimentation device
03/09/2010US7675174 Method and structure of a thick metal layer using multiple deposition chambers
03/09/2010US7675069 InAlGaN emitting light in ultraviolet short-wavelength region and process for preparing the same as well as ultraviolet light-emitting device using the same
03/09/2010US7674727 Nitrous oxide anneal of TEOS/ozone CVD for improved gapfill
03/09/2010US7674723 Plasma immersion ion implantation using an electrode with edge-effect suppression by a downwardly curving edge
03/09/2010US7674721 Semiconductor device, semiconductor wafer, and methods of producing same device and wafer
03/09/2010US7674715 Method for forming tungsten materials during vapor deposition processes
03/09/2010US7674497 Film-forming apparatus, method of cleaning the same, and method of manufacturing a light-emitting device
03/09/2010US7674353 Apparatus to confine plasma and to enhance flow conductance
03/09/2010US7674351 Plasma processing apparatus
03/09/2010US7674337 Gas manifolds for use during epitaxial film formation
03/09/2010US7674336 Processing apparatus
03/09/2010US7673856 Vaporizer and various devices using the same and an associated vaporizing method
03/09/2010US7673583 Locally-efficient inductive plasma coupling for plasma processing system
03/09/2010US7673485 Hot press forming method
03/04/2010WO2010024902A2 Wear resistant coatings for tool dies
03/04/2010WO2010024814A1 Methods and apparatus for depositing a uniform silicon film with flow gradient designs
03/04/2010WO2010024671A1 Apparatus and method for atomic layer deposition
03/04/2010WO2010024334A1 Plasma processing apparatus, plasma processing method, method for cleaning plasma processing apparatus and pressure control valve for plasma processing apparatus
03/04/2010WO2010024128A1 Plasma surface processing method and plasma surface processing apparatus
03/04/2010WO2010024037A1 Method for forming amorphous carbon nitride film, amorphous carbon nitride film, multilayer resist film, method for manufacturing semiconductor device, and storage medium in which control program is stored
03/04/2010WO2010023964A1 Insulating film material, method for forming film by using the insulating film material, and insulating film
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