| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 04/01/2010 | US20100081288 Substrate processing apparatus and semiconductor device producing method |
| 04/01/2010 | US20100081284 Methods and apparatus for improving flow uniformity in a process chamber |
| 04/01/2010 | US20100080994 Methods for producing carbon nanostructures |
| 04/01/2010 | US20100080958 Metal coating |
| 04/01/2010 | US20100080934 depositing a first layer, then second layer, the layers contacting each other and having respective compositions effective to undergo an intermetallic reaction when activated, and introducing hydrogen into at least one of the layers by plasma hydrogenation; titanium, zirconium, zinc, boron, carbon layers |
| 04/01/2010 | US20100080933 Multi-electrode pecvd source |
| 04/01/2010 | US20100080929 System and method for applying a conformal barrier coating |
| 04/01/2010 | US20100080905 Solute stabilization of sheets formed from a melt |
| 04/01/2010 | US20100080904 Substrate processing chamber with off-center gas delivery funnel |
| 04/01/2010 | US20100080902 Method and apparatus for low cost production of polysilicon using siemen's reactors |
| 04/01/2010 | US20100080901 Evaporator for organic materials |
| 04/01/2010 | US20100079866 Substrate comprising unmatched refractive index primer at optically significant thickness |
| 04/01/2010 | US20100079555 Lead-containing perovskite-type oxide film and method of producing the same, piezoelectric device using a lead-containing perovskite-type oxide film, as well as liquid ejecting apparatus using a piezoelectric device |
| 04/01/2010 | US20100079060 System and method for applying a conformal barrir coating with pretreating |
| 04/01/2010 | US20100078746 Semiconductor device and method of manufacturing the same |
| 04/01/2010 | US20100078601 Preparation of Lanthanide-Containing Precursors and Deposition of Lanthanide-Containing Films |
| 04/01/2010 | US20100078308 Process for depositing a coating on a blisk |
| 04/01/2010 | US20100078045 Semiconductor manufacturing apparatus and method for cleaning same |
| 04/01/2010 | DE112008000279T5 Verfahren zur Herstellung von Gruppe III-V-Verbindungshalbleitern A process for the production of group III-V compound semiconductors |
| 04/01/2010 | DE102008042450A1 Verfahren zum Strukturieren von Siliziumcarbid mittels fluorhaltiger Verbindungen Method for structuring of silicon carbide using fluorine-containing compounds |
| 03/31/2010 | EP2168763A1 Resin substrate |
| 03/31/2010 | EP2168138A2 Magnetron co-sputtering device |
| 03/31/2010 | EP2167703A2 Reactive flow deposition and synthesis of inorganic foils |
| 03/31/2010 | EP2167702A1 Deposition process |
| 03/31/2010 | EP2167701A1 Method for providing a crystalline germanium layer on a substrate |
| 03/31/2010 | EP2167270A1 Gas distributor comprising a plurality of diffusion-welded panes and a method for the production of such a gas distributor |
| 03/31/2010 | CN101689592A III nitride semiconductor light emitting element, method for manufacturing the iii nitride semiconductor light emitting element, and lamp |
| 03/31/2010 | CN101689501A Lubricating oil composition for buffer |
| 03/31/2010 | CN101689500A Film forming apparatus and film forming method |
| 03/31/2010 | CN101689499A Vaporizer and film forming apparatus |
| 03/31/2010 | CN101689490A Filming method, and treating system |
| 03/31/2010 | CN101688311A Coated cutting tool, cutting member or wear part |
| 03/31/2010 | CN101688307A Device for coating substrates disposed on a susceptor |
| 03/31/2010 | CN101688306A Apparatus and method for depositing multiple coating materials in a common plasma coating zone |
| 03/31/2010 | CN101688305A Deposition process |
| 03/31/2010 | CN101688304A Method for controlling process gas concentration |
| 03/31/2010 | CN101688303A Vacuum processing system |
| 03/31/2010 | CN101688302A Deposition apparatus |
| 03/31/2010 | CN101688301A Plasma-enhanced substrate processing method and apparatus |
| 03/31/2010 | CN101688300A Method in depositing metal oxide materials |
| 03/31/2010 | CN101688299A AI-Ti-Ru-N-C hard material coating |
| 03/31/2010 | CN101688298A Method and device for preparing a multilayered coating on a substrate |
| 03/31/2010 | CN101688297A An apparatus for depositing a uniform silicon film and methods for manufacturing the same |
| 03/31/2010 | CN101688296A Vacuum processing system and substrate transfer method |
| 03/31/2010 | CN101687389A Resin substrate |
| 03/31/2010 | CN101685791A Substrate supporting device and method for discharging static electricity by using same |
| 03/31/2010 | CN101684550A Vapor deposition systems and methods |
| 03/31/2010 | CN101684549A Method for manufacturing nitride semiconductor device |
| 03/31/2010 | CN101684548A Method for preparing amorphous silicon nano wire and application thereof in cathode of lithium battery |
| 03/31/2010 | CN101684547A Method for forming copper film |
| 03/30/2010 | US7687117 generally applicable to rectangular (or square) large area plasma processing equipment, which is used in but not limited to LCD, Plasma Display and Solar Cell production) or any other reactor using electromagnetic waves (RF, VHF) for processing |
| 03/30/2010 | US7687114 coating fiber with barrier-forming material that creates diffusion barrier with metal; coating barrier-forming material with first compound that is wettable by metal; coating first compound with second compound that is wettable by metal, and coating second compound with metal through liquid metal bath |
| 03/30/2010 | US7687110 Method of in-line purification of CVD reactive precursor materials |
| 03/30/2010 | US7687109 Apparatus and method for making carbon nanotube array |
| 03/30/2010 | US7687108 depositing sacrificial layer on substrate, depositing and annealing stressed metal or alloy material film in which deposition parameters of stressed metal or alloy material film are controlled to induce stress or produce stress gradient in stressed metal or alloy, removing sacrificial layer |
| 03/30/2010 | US7687099 Spray coating |
| 03/30/2010 | US7686971 Plasma processing apparatus and method |
| 03/30/2010 | US7686926 A tantalum nitride/Ta barrier is first sputter deposited with high target power and wafer bias, argon etching is performed with even higher wafer bias. a flash step is applied with reduced target power and wafer bias; different magnetic field distributions |
| 03/30/2010 | US7686917 Plasma processing system and apparatus and a sample processing method |
| 03/30/2010 | US7686889 Susceptor for semiconductor manufacturing apparatus |
| 03/30/2010 | US7686881 TiCl4 is vaporised at temperatures of less than 200 degree C., formed vapours are transferred to a mixing chamber by means of a carrier gas of defined moisture content, separately from this, hydrogen, primary air and steam are added to the mixing chamber, combustion in the chamber sealed from air |
| 03/30/2010 | US7686879 styrene-acrylate copolymer or silicone resin as binder, sulfur or nitrogen doped titanium dioxide pigment as photocatalytic active agent adapted to absorb light at one or more absorption wavelengths; for thermal insulation composite systems; coating walls; algae and fungus growth resistance |
| 03/30/2010 | US7685965 Apparatus for shielding process chamber port |
| 03/30/2010 | US7685674 Exhaust gas treatment |
| 03/30/2010 | CA2441490C Method for vapor phase aluminiding of a gas turbine blade partially masked with a masking enclosure |
| 03/30/2010 | CA2386078C Uniform gas distribution in large area plasma source |
| 03/25/2010 | WO2010034004A1 Systems, apparatus and methods for coating the interior of a container using a photolysis and/or thermal chemical vapor deposition process |
| 03/25/2010 | WO2010033304A2 Solar cells fabricated by using cvd epitaxial si films on metallurgical-grade si wafers |
| 03/25/2010 | WO2010032913A1 Method for depositing amorphous silicon thin film by chemical vapor deposition |
| 03/25/2010 | WO2010032745A1 Temperature adjustment mechanism, and plasma treatment apparatus |
| 03/25/2010 | WO2010032708A1 Method for reducing temperature of substrate placing table, computer-readable storage medium, and substrate processing system |
| 03/25/2010 | WO2010032679A1 Material used for forming nickel-containing film and method for manufacturing the nickel-containing film |
| 03/25/2010 | WO2010032673A1 Nickel-containing film‑formation material, and nickel-containing film‑fabrication method |
| 03/25/2010 | WO2010032530A1 Thin film structural body and method for manufacturing the same |
| 03/25/2010 | WO2010032386A1 Semiconductor device |
| 03/25/2010 | WO2010031461A1 Plastic product having good barrier action after sterilization treatment |
| 03/25/2010 | WO2010002572A3 Layered coating and method for forming the same |
| 03/25/2010 | WO2009151492A3 Metal and electronic device coating process for marine use and other environments |
| 03/25/2010 | US20100075508 Method of fabricating a semiconductor device |
| 03/25/2010 | US20100075489 Method for producing semiconductor device and semiconductor producing apparatus |
| 03/25/2010 | US20100075488 Cvd reactor with multiple processing levels and dual-axis motorized lift mechanism |
| 03/25/2010 | US20100075191 Textured solid oxide fuel cell having reduced polarization losses |
| 03/25/2010 | US20100075177 Tnalspreparation method of zinc-tin composite transparent conductive oxide films by using electron cyclotron resonance plasma chemical vapor deposition |
| 03/25/2010 | US20100075150 Method of forming a gas barrier layer, a gas barrier layer formed by the method, and a gas barrier film |
| 03/25/2010 | US20100075077 Container having improved ease of discharge product residue, and method for the production thereof |
| 03/25/2010 | US20100075067 Preparation of Metal Oxide Thin Film Via Cyclic CVD or ALD |
| 03/25/2010 | US20100075066 Plasma film forming apparatus and plasma film forming method |
| 03/25/2010 | US20100075065 Film deposition of amorphous films by electron cyclotron resonance |
| 03/25/2010 | US20100075037 Deposition Systems, ALD Systems, CVD Systems, Deposition Methods, ALD Methods and CVD Methods |
| 03/25/2010 | US20100075036 Deposition apparatus and method for manufacturing film by using deposition apparatus |
| 03/25/2010 | US20100075035 Film formation method and film formation apparatus |
| 03/25/2010 | US20100075034 Controlled deposition of silicon-containing coatings adhered by an oxide layer |
| 03/25/2010 | US20100075033 Localized Linear Microwave Source Array Pumping to Control Localized Partial Pressure in Flat and 3 Dimensional PECVD Coatings |
| 03/25/2010 | US20100072057 Process for forming a ceramic oxide material with a pyrochlore structure having a high dielectric constant and implementation of this process for applications in microelectronics |
| 03/25/2010 | US20100071625 Shutter disk having a tuned coefficient of thermal expansion |
| 03/25/2010 | US20100071624 Substrate support frame, and substrate processing apparatus including the same and method of loading and unloading substrate using the same |
| 03/25/2010 | US20100071623 Evaporating apparatus |
| 03/25/2010 | US20100071621 Device for forming a film by deposition from a plasma |
| 03/25/2010 | US20100071548 Method of Treating Gas |
| 03/25/2010 | DE102008037387A1 Verfahren sowie Vorrichtung zum Abscheiden lateral strukturierter Schichten mittels einer magnetisch auf einem Substrathalter gehaltenen Schattenmaske A method and apparatus for depositing laterally structured layers by means of a shadow mask magnetically held on a substrate holder |