Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
03/2010
03/25/2010DE102007049363B4 Verfahren zur Herstellung von Silicium mittels Silanthermolyse A process for the production of silicon by means of Silanthermolyse
03/24/2010EP2166562A2 Method for forming a capacitor having a strontium/barium titanium oxide dielectric layer by means of ALD and memory device comprising such a capacitor
03/24/2010EP2166131A1 Thin film manufacturing apparatus and thin film manufacturing method
03/24/2010EP2166130A1 Plastic film with good barrier effect after a sterilisation treatment
03/24/2010EP2166129A1 Thin-film producing apparatus and method of producing thin film
03/24/2010EP2165006A1 Device for coating substrates disposed on a susceptor
03/24/2010EP2165005A1 Plasma-deposited barrier coating including at least three layers, method for obtaining one such coating and container coated with same
03/24/2010EP2165004A1 A continuous process for preparing and collecting nanotube films that are supported by a substrate
03/24/2010EP2164622A1 Surface modified aerosol particles, a method and apparatus for production thereof and powders and dispersions containing said particles
03/24/2010CN201430158Y Solar cell glass substrate fixing device
03/24/2010CN201427992Y PECVD system with inner heater
03/24/2010CN101681871A Device for coating a plurality of closest-packed substrates arranged on a susceptor
03/24/2010CN101681870A Dynamic temperature backside gas control for improved within-substrate processing uniformity
03/24/2010CN101681817A Compound-type thin film, method for compound-type thin film formation, and electronic apparatus using the thin film
03/24/2010CN101681785A Apparatus and methods for improving treatment uniformity in a plasma process
03/24/2010CN101680561A Fluid control apparatus
03/24/2010CN101680092A Device for the temperature control of the surface temperatures of substrates in a CVD reactor
03/24/2010CN101680091A Reactive flow deposition and synthesis of inorganic foils
03/24/2010CN101680090A Vacuum processing apparatus
03/24/2010CN101680089A Low temperature SACVD processes for pattern loading applications
03/24/2010CN101680088A Method and apparatus for production of metal oxide thin film
03/24/2010CN101680087A Technique for atomic layer deposition
03/24/2010CN101680086A New metal precursors for semiconductor applications
03/24/2010CN101680085A New cobalt precursors for semiconductor applications
03/24/2010CN101680084A Batch equipment robots and methods within equipment work-piece transfer for photovoltaic factory
03/24/2010CN101679655A Coated object
03/24/2010CN101678920A Biodegradable resin bottle and process for producing the same
03/24/2010CN101678642A Molded plastic with vapor-deposited film and process for producing the same
03/24/2010CN101678618A Edge healing and field repair of plasma coating
03/24/2010CN101678497A Gas distributor comprising a plurality of diffusion-welded panes and a method for the production of such a gas distributor
03/24/2010CN101677056A Carrying device and method for monitoring deposition machine
03/24/2010CN101677014A Alloy electrode material for resistor type random access memory and preparation technology thereof
03/24/2010CN101676433A Film deposition apparatus and film deposition method
03/24/2010CN101676432A Film deposition apparatus and film deposition method
03/24/2010CN100595910C Carburetor, various types of devices using carburetor, and method of vaporization
03/24/2010CN100595901C Static chuck plate
03/24/2010CN100595885C Plasma processing apparatus
03/24/2010CN100595883C Plasma processing device and medium window thereof
03/24/2010CN100595321C Method for preparing nano silicon-base porous luminescent material by normal pressure plasma gas phase deposition
03/24/2010CN100595187C Alkoxide compound, thin film-forming material and method for forming thin film
03/23/2010US7683293 depositing a silicon oxide film on the metal surface by plasma enhanced chemical vapor deposition, the precursor being a hexamethyldisiloxane or hexamethyldisilane; protects the metallic surface from scratching, staining and thermal yellowing
03/23/2010US7683291 Substrate processing method and manufacturing method of semiconductor device
03/23/2010US7683289 Apparatus and method for controlling plasma density profile
03/23/2010US7683195 Silver β-ketocarboxylate, material comprising the same for forming silver metal, and use thereof
03/23/2010US7683001 Yttrium metal-doped aluminum oxide consisting of yttrium, aluminum, and oxygen; semiconductor substrate; formed by chemical vapor deposition or atomic layer deposition
03/23/2010US7682982 Plasma processing apparatus and control method thereof
03/23/2010US7682710 consists of titanium oxide, ytterbium oxide, and gadolinium oxide and/or dysprosium oxide; for eyeglasses, lenses, cameras
03/23/2010US7682660 Organic vapor phase deposition (OVPD) uses carrier gas to transport organic vapors into deposition chamber, where molecules diffuse across a boundary layer and physisorb on the substrate.patterned deposition owithout shadow mask; controlled separation; sharp-edged pixels with a resolution of 1 mu m
03/23/2010US7682659 Post-suspended carbon structures using a negative photoresist exposed to ultraviolet light, and a two-step pyrolysis process. Electron beam photolithography is define the suspended structures; carbon micro- and nanoelectromechanical systems; electronics, sensors, batteries (lithium), microfluidics
03/23/2010US7682658 In a quartz boat, positioning a second catalyst adjacent to a substrate having a film of first catalyst; directing acetylene and argon carrier toward the second catalyst to the substrate to produce a carbonaeous product for promoting catalytic activity of the first catalyst to grow the tubes
03/23/2010US7682657 Sequential chemical vapor deposition
03/23/2010US7682496 Apparatus for depositing seed layers
03/23/2010US7682482 Plasma generation apparatus and work processing apparatus
03/23/2010US7682481 Vacuum processing apparatus
03/23/2010US7682479 Fin structure formation
03/23/2010US7682455 Device for storing and/or transporting plate-shaped substrates in the manufacture of electronic components
03/23/2010US7682454 Perimeter partition-valve with protected seals and associated small size process chambers and multiple chamber systems
03/23/2010CA2451726C Article having a plasma polymer coating and a method for the preparation thereof
03/18/2010WO2010031010A1 Solar photovoltaic devices and methods of making them
03/18/2010WO2010030419A1 Films containing an infused oxygenated gas and methods for their preparation
03/18/2010WO2010028808A1 Method for the production of carbon-modified titanium dioxide layers
03/18/2010WO2010028778A1 Sanitary object
03/18/2010WO2010010538A3 Heteroleptic cyclopentadienyl transition metal precursors for deposition of transition metal-containing films
03/18/2010WO2010009048A3 Tube diffuser for load lock chamber
03/18/2010WO2009148799A8 Method for making oriented tantalum pentoxide films
03/18/2010WO2008057616A8 Antimony and germanium complexes useful for cvd/ald of metal thin films
03/18/2010US20100068894 forming semiconductors from silicon-containing precursors and forming silicon-containing films, e.g., films including silicon carbonitride and silicon oxycarbonitride, on a substrate using low temperature (T<550 degrees C.) chemical vapor deposition (CVD) processes
03/18/2010US20100068893 Film deposition apparatus, film deposition method, and computer readable storage medium
03/18/2010US20100068561 Permeation protection for pressurized hydrogen storage tank
03/18/2010US20100068542 vaporizing a metal alkoxide, condensing the metal alkoxide to form a layer atop the substrate, and contacting the condensed metal alkoxide layer with water to cure; rapid, low cost; use as ophthalmic lens, security device
03/18/2010US20100068509 Media having improved surface smoothness and methods for making the same
03/18/2010US20100068503 Method for producing nanocrystalline diamond coatings on gemstones and other substrates
03/18/2010US20100068449 Perfluoroamidated and hydrolyzed maleic anhydride copolymers
03/18/2010US20100068415 Deposition of amorphous silicon films by electron cyclotron resonance
03/18/2010US20100068414 Substrate processing apparatus and substrate processing method
03/18/2010US20100068413 Vapor deposition reactor using plasma and method for forming thin film using the same
03/18/2010US20100068412 Process for coating a substrate, plant for implementing the process and feeder for feeding such a plant with metal
03/18/2010US20100068411 Vacuum treatment method and vacuum treatment apparatus
03/18/2010US20100068408 Methods for electron-beam induced deposition of material inside energetic-beam microscopes
03/18/2010US20100068384 High-Throughput CVD System
03/18/2010US20100068383 Film deposition apparatus, film deposition method, and computer readable storage medium
03/18/2010US20100068382 Method of curing metal alkoxide-containing films
03/18/2010US20100068381 Chemical vapor deposition reactor having multiple inlets
03/18/2010US20100068375 Evaporating apparatus and method for operating the same
03/18/2010US20100068374 Method for marking an item based on colour centres
03/18/2010US20100068118 High-pressure vessel for growing group III nitride crystals and method of growing group III nitride crystals using high-pressure vessel and group III nitride crystal
03/18/2010US20100067847 Tunable optofluidic device and method of its fabrication
03/18/2010US20100065216 Ring assembly for substrate processing chamber
03/18/2010US20100065215 Plasma generating apparatus
03/18/2010US20100065214 Showerhead electrode assembly for plasma processing apparatuses
03/18/2010US20100064973 Apparatus and method for making carbon nanotube array
03/18/2010US20100064972 Cvd film forming apparatus
03/18/2010US20100064971 Electrode for Generating Plasma and Plasma Generator
03/17/2010EP2163664A1 Method for depositing si-containing film, insulator film, and semiconductor device
03/17/2010EP2162564A2 Method of depositing silicon on carbon materials and forming an anode for use in lithium ion batteries
03/17/2010EP2162389A1 Recycle and reuse of silane
03/17/2010CN101675514A Tungsten digitlines and methods of forming and operating the same
03/17/2010CN101675180A Method for forming a film on a substrate
03/17/2010CN101673706A Materials for adhesion enhancement of copper film on diffusion barriers
03/17/2010CN101673655A Microwave plasma resonant cavity used for depositing diamond film